| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 11/30/1999 | US5994026 Developable relief image layer on support |
| 11/30/1999 | US5994025 Mixture of polymer and acid generator |
| 11/30/1999 | US5994023 Acid-sensitive substance and photosensitive compositions therewith |
| 11/30/1999 | US5994022 Radiation sensitive resin composition |
| 11/30/1999 | US5994009 Computer aided design |
| 11/30/1999 | US5994007 Forming a semiconductor integrated circuit pattern including fine patterns with a high superposing accuracy and with a high through-put. |
| 11/30/1999 | US5994006 Projection exposure methods |
| 11/30/1999 | US5994003 A lithographic process for scanning a mask with exposure light such as synchrotron radiation light to transfer a pattern of the mask onto a wafer. |
| 11/30/1999 | US5993702 The pattern has ridges and valleys with the horizontal distance between adjacent ridges and/or valleys being greater than the depth between the ridges and the valleys. |
| 11/30/1999 | US5993600 Continuous film laminating and delaminating system |
| 11/30/1999 | US5993595 Ozone asher |
| 11/30/1999 | US5993552 Processing apparatus |
| 11/30/1999 | US5993547 Edge rinse mechanism for removing a peripheral portion of a resist film formed on a wafer |
| 11/30/1999 | US5993081 In-line processing system |
| 11/30/1999 | US5993043 Lithography processing apparatus for manufacturing semiconductor devices |
| 11/30/1999 | US5992324 Method and apparatus for making lithographic printing plates in an automated computer to plate imaging system |
| 11/30/1999 | US5992322 Waterless lithographic printing plate having a cyanoacrylate image |
| 11/30/1999 | CA2188094C Film rewinder |
| 11/30/1999 | CA2092135C Onium or organometallic borates as cationic poymerization initiators |
| 11/29/1999 | CA2273387A1 Compositions and methods involving direct write optical lithography |
| 11/29/1999 | CA2271370A1 Photoimageable composition having improved flexibility |
| 11/29/1999 | CA2266159A1 Photoimageable composition having improved flexibility |
| 11/28/1999 | CA2273459A1 Composite substrate carrier |
| 11/25/1999 | WO1999060679A1 Reliable modular production quality narrow-band high rep rate f2 laser |
| 11/25/1999 | WO1999060674A1 RELIABLE MODULAR PRODUCTION QUALITY NARROW-BAND HIGH REP RATE ArF EXCIMER LASER |
| 11/25/1999 | WO1999060625A1 Method and apparatus for wafer transportation, exposure system, micro device, and reticle library |
| 11/25/1999 | WO1999060616A1 Exposure method and apparatus |
| 11/25/1999 | WO1999060448A1 Silicate-containing alkaline compositions for cleaning microelectronic substrates |
| 11/25/1999 | WO1999060447A1 Stripping compositions for semiconductor substrates |
| 11/25/1999 | WO1999060446A1 Photosensitive paste, substrate for plasma display panel using the same, and method of production of the substrate |
| 11/25/1999 | WO1999060445A1 Apparatus and method for exposing substrates |
| 11/25/1999 | WO1999060361A1 Aberration measuring instrument and measuring method, projection exposure apparatus provided with the instrument and device-manufacturing method using the measuring method, and exposure method |
| 11/25/1999 | WO1999060156A2 Method and device for photolithographic production of dna, pna and protein chips |
| 11/25/1999 | WO1999060083A1 Cleaning composition and method for removing residues |
| 11/25/1999 | WO1999059693A1 Apparatus and method for recovering photoresist developers and strippers |
| 11/25/1999 | DE19922758A1 Production of a lithographic drawing using electron or ion beam |
| 11/25/1999 | DE19922545A1 Multicolumn electron-beam lithography system |
| 11/25/1999 | DE19912047A1 Negative resist composition useful in microlithography for producing (very) large scale integrated circuits |
| 11/25/1999 | DE19843089A1 Malonate dissolution inhibitor for use in photolithography |
| 11/25/1999 | DE19823454A1 Photolithographic production of oligonucleotide array for manufacture of DNA chips |
| 11/25/1999 | DE19822510A1 Catadioptric projection lens with object plane and image plane |
| 11/25/1999 | DE19820049A1 Thermomechanisches Verfahren zum Planarisieren einer fototechnisch strukturierbaren Schicht, insbesondere Verkapselung für elektronische Bauelemente A thermo-mechanical method for planarizing a photo technically be structured layer, in particular encapsulation of electronic components |
| 11/25/1999 | CA2332390A1 Stripping compositions for semiconductor substrates |
| 11/25/1999 | CA2332245A1 Apparatus and method for recovering photoresist developers and strippers |
| 11/24/1999 | EP0959501A2 System and method of manufacturing semicustom integrated circuits using reticle primitives and interconnect reticles |
| 11/24/1999 | EP0959390A1 Photoresist removal process. |
| 11/24/1999 | EP0959389A1 Diazodisulfone compound and radiation-sensitive resin composition |
| 11/24/1999 | EP0958941A1 Plate precursor for lithographic printing plate, method for making lithographic printing plate using the same, and method for producing the plate precursor for lithographic printing plate |
| 11/24/1999 | EP0958718A1 Process and apparatus for the coating of boards |
| 11/24/1999 | EP0958592A1 Digital direct write electron beam lithography |
| 11/24/1999 | EP0958326A1 Method for gluing a surface to a component |
| 11/24/1999 | EP0958255A1 Silica with low compaction under high energy irradiation |
| 11/24/1999 | EP0923613A4 Aqueous developable photosensitive polyurethane-methacrylate |
| 11/24/1999 | EP0819267B1 Coating compositions |
| 11/24/1999 | EP0693978B1 Removal of surface contaminants by irradiation |
| 11/24/1999 | EP0672950B1 Waterless lithographic plate |
| 11/24/1999 | CN1236116A 曝光设备 Exposure Equipment |
| 11/24/1999 | CN1236115A Photosensitive ink inhibitor composition |
| 11/23/1999 | US5991554 Exposure apparatus for manufacturing color cathode ray tube |
| 11/23/1999 | US5991360 Laser plasma x-ray source, semiconductor lithography apparatus using the same and a method thereof |
| 11/23/1999 | US5991324 Reliable. modular, production quality narrow-band KRF excimer laser |
| 11/23/1999 | US5991101 UV-resistant jointing technique for lenses and mounts |
| 11/23/1999 | US5991088 Illumination system and exposure apparatus |
| 11/23/1999 | US5991009 Illumination optical apparatus using different number of light sources under different exposure modes, method of operating and method of manufacturing thereof |
| 11/23/1999 | US5991007 Step and scan exposure system and semiconductor device manufactured using said system |
| 11/23/1999 | US5991006 Method and apparatus for correcting exposure patterns, and exposure mask, method of exposing and semiconductor device |
| 11/23/1999 | US5991005 Stage apparatus and exposure apparatus having the same |
| 11/23/1999 | US5991004 Lens focus shift sensor |
| 11/23/1999 | US5990926 Projection lens systems for excimer laser exposure lithography |
| 11/23/1999 | US5990567 System for in-line monitoring of photo processing tilt in VLSI fabrication |
| 11/23/1999 | US5990540 Semiconductor device and method for manufacturing the same |
| 11/23/1999 | US5990338 Negative-working chemical-sensitization photoresist composition |
| 11/23/1999 | US5990269 Copolymer of vinylpyrrolidone and vinylimidazole |
| 11/23/1999 | US5990193 A photosensitive crosslinked polymer network of branched macromeric polymers functionalized with photochromic moieties, preferably cinnamylidene; cyclization and photoscission using different wavelengths; biodegradable ?bandages? |
| 11/23/1999 | US5990189 Unsaturated material comprising the reaction product of a polyepoxide, an unstaturated carboxylic acid, a saturated acid and an anhydride; production of a solder photoresist for the manufacture of a printed circuit board; quick-setting |
| 11/23/1999 | US5990002 Method of making an antireflective structure |
| 11/23/1999 | US5989788 Etching portion of protective intermediate layer exposed through secondary photoresist pattern forming a secondary photoresist pattern overlapping wiht the primary photoresist pattern so the resulting pattern has vertical profile |
| 11/23/1999 | US5989786 Embossed metal gasket and method of manufacturing the same |
| 11/23/1999 | US5989781 Method for producing printing plates |
| 11/23/1999 | US5989780 Carriage assembly has cap resin doctor blade maintained at constant distance above the lower glass plate, irregardless the spacing between the crosslinked resin layer reservoir on the carriage and the lower glass plate for constant thickness |
| 11/23/1999 | US5989776 Photoresist composition for extreme ultraviolet lithography |
| 11/23/1999 | US5989775 An amide-grafted polyhydroxyphenol resin of given formula useful in a photoresist composition which allows for a good pattern even though a post-baking process is carried out in a delayed time |
| 11/23/1999 | US5989764 Creating a plurality of latent images in the resist, each image being characterized by at least one lithographic parameter, interrogating the latent images and utilizing the results of the interrogation to form additional latent images |
| 11/23/1999 | US5989763 Chemical gas analysis during processing of chemically amplified photoresist systems |
| 11/23/1999 | US5989762 Method of producing a semiconductor device |
| 11/23/1999 | US5989761 Exposure methods for overlaying one mask pattern on another |
| 11/23/1999 | US5989759 Pattern forming method using alignment from latent image or base pattern on substrate |
| 11/23/1999 | US5989756 Transparent substrate, and at least two light blocking regions, separated by a first opening and arranged at a first pitch, formed with second openings at smaller pitches which transmit exposure light of weaker intensity; depth of focus |
| 11/23/1999 | US5989752 Reconfigurable mask |
| 11/23/1999 | US5989632 Coating solution applying method and apparatus |
| 11/23/1999 | US5989475 Uniformly dispersing filler while liquid resin resides in container during stereolithography process step of coating new layer to be cured onto uppermost layer of object being built-up in cross-sectional layers within container |
| 11/23/1999 | US5989462 Photopolymerizing within a mold a plastic lens forming liquid mixture comprising monomers, light absorbing compound, photoinitiator and co-initiator whereby the co-initiator activated by photoinitiator causes complete cure |
| 11/23/1999 | US5989354 Method for removing thin, organic materials from semiconductor dies and micro-lenses |
| 11/23/1999 | US5989342 Apparatus for substrate holding |
| 11/23/1999 | US5988186 Aqueous stripping and cleaning compositions |
| 11/23/1999 | US5988102 Pop-up temperature indicating device |
| 11/18/1999 | WO1999059192A1 Omni-directional high precision friction drive positioning stage |
| 11/18/1999 | WO1999059183A1 Electron beam exposure method and electron beam exposure apparatus |
| 11/18/1999 | WO1999059035A1 Holographic patterning method and tool employing prism coupling |
| 11/18/1999 | WO1999059031A1 Method and apparatus for coating a solution onto a substrate |