Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/1999
11/02/1999US5976760 Chemical-sensitization resist composition
11/02/1999US5976759 Polymer composition and resist material
11/02/1999US5976757 Cycles of lamination a photpolymerizable material, exposure, development
11/02/1999US5976741 Methods for determining illumination exposure dosage
11/02/1999US5976740 Controlled lithographic process
11/02/1999US5976738 Exposure and alignment method
11/02/1999US5976737 Exposure of pattern using projector lens
11/02/1999US5976735 Photopolymerisable composition
11/02/1999US5976733 Integrated circuit photofabrication masks and methods for making same
11/02/1999US5976620 Coating solution applying method and apparatus
11/02/1999US5976444 Nanochannel glass replica membranes
11/02/1999US5976342 Method for manufacturing an orifice plate
11/02/1999US5976307 Method and apparatus for removing a pellicle frame from a photomask plate
11/02/1999US5976284 Liquid crystal displays, which contain such a patterned conducting polymer surface.
11/02/1999US5976256 Film coating apparatus
11/02/1999US5975709 Reflecting system
11/02/1999US5974816 Temperature-control method and apparatus
11/02/1999CA2135413C Energy sensitive materials and methods for their use
11/02/1999CA2131507C Resist materials and related processes
10/1999
10/29/1999CA2270013A1 Aqueous developing solutions for reduced developer residue
10/29/1999CA2266609A1 Aqueous developing solutions for reduced developer residue
10/28/1999WO1999054788A1 Photosensitive resin composition
10/28/1999WO1999054787A1 Positive resist composition
10/28/1999WO1999054786A1 Elastomeric mask and use in fabrication of devices, inlcuding pixelated electroluminescent displays
10/28/1999WO1999054785A1 Method for measuring the position of structures on a surface of a mask
10/28/1999WO1999054784A1 Free-form nanofabrication using multi-photon excitation
10/28/1999WO1999054761A1 Structure for micro-machine optical tooling and method for making and using
10/28/1999WO1999054363A1 Novel photoinitiators and applications therefor
10/28/1999WO1999054114A1 Method for making a weld run for floor covering and resulting weld run
10/28/1999WO1999030210A8 Solution of tetramethyl ammonium hydroxide in water and process for preparing the solution
10/28/1999DE19818440A1 Method of generating data for the production of a structure defined by design data, e.g. for electron beam lithography, overcomes some disadvantages with respect to increase in layout complexity and data quantity to be processed
10/28/1999DE19811081C1 Haltevorrichtung für Photoblanks Holding device for Blanks Photo
10/27/1999EP0952491A2 Lithography apparatus
10/27/1999EP0952490A2 Lens barrel and projection aligner
10/27/1999EP0952489A1 Positive photosensitive resin composition
10/27/1999EP0952166A2 Filmforming polymers
10/27/1999EP0951664A1 Positioning device with h-drive
10/27/1999EP0951661A1 Process and composition for generating acid
10/27/1999EP0951657A1 Three-mirror system for lithographic projection, and projection apparatus comprising such a mirror system
10/27/1999EP0951655A1 Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
10/27/1999EP0951631A1 Spherical shaped semiconductor integrated circuit
10/27/1999EP0820609B1 Liquid photocurable compositions
10/27/1999EP0815494B1 Scanning lithography system with opposing motion
10/27/1999CN1232993A Squaric acid dye/iodate composite and its use
10/27/1999CN1232990A Photoimageable compositions having hydrophilic binder polymers and hydrophilic monomers
10/27/1999CN1232826A Novel monomer and polymer for photoresist, and photoresist using the same
10/26/1999USRE36352 High-efficiency, multilevel, diffractive optical elements
10/26/1999US5973863 Exposure projection apparatus
10/26/1999US5973843 Reflector method for producing reflector and reflection type liquid crystal display
10/26/1999US5973826 Reflective optical imaging system with balanced distortion
10/26/1999US5973773 Lens distortion measurement using moire fringes
10/26/1999US5973771 Pupil imaging reticle for photo steppers
10/26/1999US5973767 Off-axis illuminator lens mask for photolithographic projection system
10/26/1999US5973766 Exposure method and exposure device
10/26/1999US5973764 Vacuum assisted debris removal system
10/26/1999US5973316 Sub-wavelength aperture arrays with enhanced light transmission
10/26/1999US5973202 Preparation of poly-o-hydroxyamides and poly o-mercaptoamides
10/26/1999US5973187 Positive-working chemical-sensitization photoresist composition
10/26/1999US5973176 Hydrolyzable, fluorinated silanes, method of their production and their use for producing silicic acid polycondensates and hetero silicic acid polycondensates
10/26/1999US5972862 Comprising a fluorine-containing compound, a water-soluble or water-miscible organic solvent, an organic acid, and a quaternary ammonium salt
10/26/1999US5972772 Electron beam drawing process
10/26/1999US5972727 Reticle sorter
10/26/1999US5972572 Developer for irradiated, radiation-sensitive recording materials
10/26/1999US5972571 Negative resist composition and use thereof
10/26/1999US5972570 Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby
10/26/1999US5972569 Applying photoresist, exposing phtotoresist area, developing exposed photoresist, performing contact etch, performing reisist etch
10/26/1999US5972568 Method of making surface wave devices
10/26/1999US5972567 Positioning die relative to a pattern transfer tool so that opaque region of pattern transfer tool is centered over first region of resist layer, projecting radiant energy through pattern transfer tool, positioning, projecting radiant energy
10/26/1999US5972566 Releasable photopolymer printing plate and method of forming same
10/26/1999US5972565 A photopolymerizable mixture for photopolymerizable printing plates with an improved resistance to uv-hardenable printing inks
10/26/1999US5972564 Alkali development type photocurable conductive paste composition and plasma display panels having electrodes formed thereof
10/26/1999US5972563 Liquid, radiation-curable composition, especially for stereolithography
10/26/1999US5972562 Visible radiation-curable solder resist compositions, and method for forming solder resist patterns
10/26/1999US5972561 Applying matting agent on surface of moving web of continuous photosensitive printing plate and winding web into roll; wherein the quantity of matting agent applied on leading portion of web is larger than that applied on trailing portion
10/26/1999US5972560 High molecular weight silicone compound, chemically amplified positive resist composition and patterning method
10/26/1999US5972559 Chemically amplified positive resist compositions
10/26/1999US5972558 Method for producing a positive as well as a negative multicolor color-proof image
10/26/1999US5972556 Thermographic and photothermographic materials for producing lithographic printing elements and processes therefor
10/26/1999US5972541 Modifying the layout design for the metallization integrated circuit pattern at the locations by increasing the line width to correct the depth of focus problems; photolithography techniques
10/26/1999US5972426 Supplying the coating solution from a reservoir through passages and coating solution holder, rotating the substrate to spread the applied coating solution uniformly over the surface of the substrate under centrifugal forces
10/26/1999US5971577 Light source device and illumination system
10/26/1999US5970746 Method for preparing silica glass article
10/26/1999US5970717 Cooling method, cooling apparatus and treatment apparatus
10/21/1999WO1999053600A1 Linear motor having polygonal coil unit
10/21/1999WO1999053519A1 Shaped shadow projection for an electron beam column
10/21/1999WO1999053518A1 Detecting registration marks with a low energy electron beam
10/21/1999WO1999053381A1 Photoresist developer and method of development
10/21/1999WO1999053380A1 Scanning of non-circular image field formed by asymmetric lens of photolithographic reduction system
10/21/1999WO1999053379A1 Method for producing small and micro-sized ceramic parts
10/21/1999WO1999053378A1 Pattern forming method
10/21/1999WO1999053377A1 Chemically amplified resist composition
10/21/1999WO1999053217A1 Vibration eliminating device and exposure system
10/21/1999WO1999052957A1 Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations
10/21/1999WO1999052691A1 Ticket dispensing modules and method
10/21/1999WO1999052654A1 Process and apparatus for treating a workpiece such as a semiconductor wafer
10/21/1999WO1999044100B1 Curable compositions
10/21/1999DE19907700A1 Terpolymer used in chemically amplified photoresists for the manufacture of semiconductor devices
10/21/1999DE19905568A1 Polymer mixture used in chemically amplified photoresists for the manufacture of semiconductor devices
10/21/1999DE19820785A1 Absolute sphericity measurement of aspherical surface for micro-lithography
10/21/1999CA2292645A1 Detecting registration marks with a low energy electron beam
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