Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/2000
04/04/2000US6045963 Negative-working dry planographic printing plate
04/04/2000US6045957 Photoconductor for electrophotography
04/04/2000US6045953 Comprises a substrate, a photosensitive layer formed on the substrate by coating a photosensitive solution containing an alicyclic, solvent soluble, cationic polymerizable epoxy resin and an acrylate polymer
04/04/2000US6045857 Curable, water-borne one-component coating system using thermally labile hydrophillic groups
04/04/2000US6045681 Manufacturing method of planographic printing plate support and presensitized planographic printing plate
04/04/2000US6044981 Microfabricated filter with specially constructed channel walls, and containment well and capsule constructed with such filters
04/04/2000CA2151754C Optical apparatus having lens-system drive device for temperature correction in direction of optical axis
04/04/2000CA2115605C Differential virtual ground beam blanker
03/2000
03/30/2000WO2000018199A1 Method for producing etched circuits
03/30/2000WO2000017916A1 Method of adjusting optical projection system
03/30/2000WO2000017712A1 Photoresists, polymers and processes for microlithography
03/30/2000WO2000017711A1 Radiation sensitive coating composition useful for lithographic printing plates and the like
03/30/2000WO2000017710A1 Fabrication of sub-micron etch-resistant metal/semiconductor structures using resistless electron beam lithography
03/30/2000WO2000017605A1 Dynamic beam steering interferometer
03/30/2000WO2000017275A1 Substituted phthalocyanine
03/30/2000WO2000016988A1 Lithographic printing plates for use with laser imaging apparatus
03/30/2000WO2000016987A1 Thermosensitive, polymeric image recording material and method for use
03/30/2000WO2000016833A1 Surface micromachined microneedles
03/30/2000DE19934076A1 Ion or electron beam exposure apparatus for semiconductor wafer
03/30/2000DE19840833A1 Geometrical correction of structure faults in structure manufacture on substrate caused by proximity effect in electron beam lithography process
03/30/2000DE19829986C1 Verfahren zur Direktbelichtung von Leiterplattensubstraten Process for the direct exposure of circuit board substrates
03/30/2000CA2344398A1 Surface micromachined microneedles
03/30/2000CA2342195A1 Fabrication of sub-micron etch-resistant metal/semiconductor structures using resistless electron beam lithography
03/29/2000EP0989663A2 Circuit for reducing voltage fluctuation and flicker
03/29/2000EP0989465A1 Method for one-shot removal of resist member and sidewall protection layer
03/29/2000EP0989464A2 Processing method and apparatus for production of lithographic printing plates
03/29/2000EP0989463A2 Bottom anti-reflective coating material composition for photoresist and method of forming resist pattern
03/29/2000EP0989462A1 Resist polymer and chemical amplified resist composition containing the same
03/29/2000EP0989461A1 Photosensitive compositions and pattern formation method
03/29/2000EP0989460A1 Pattern forming method
03/29/2000EP0989459A1 Chemically amplified resist composition
03/29/2000EP0989458A2 Chemically amplified positive photoresist composition
03/29/2000EP0989434A2 Catadioptric optical system and exposure apparatus having the same
03/29/2000EP0988647A1 Shaped shadow projection for an electron beam column
03/29/2000EP0988116A1 High efficiency photoresist coating
03/29/2000CN1248730A Stripping agent, stripping method, stripping agent circulation equipment and stripping agent controller
03/29/2000CN1248729A Light-sensitive resin and compositions and the method for forming pattern using said compositions
03/28/2000US6044007 Modification of mask layout data to improve writeability of OPC
03/28/2000US6043892 Exposure field sensor of a chip leveling apparatus having an aperture for changing at least one dimension of the incident light of the sensor
03/28/2000US6043864 Alignment method and apparatus using previous layer calculation data to solve critical alignment problems
03/28/2000US6043863 Holder for reflecting member and exposure apparatus having the same
03/28/2000US6043857 Liquid crystal display apparatus
03/28/2000US6043841 Apparatus for observing arc of lamp
03/28/2000US6043572 Linear motor, stage device, and exposing device
03/28/2000US6043547 Circuit structure with an anti-reflective layer
03/28/2000US6043500 Exposure apparatus and its control method
03/28/2000US6043496 Method of linewidth monitoring for nanolithography
03/28/2000US6043481 Optoelectronic array device having a light transmissive spacer layer with a ridged pattern and method of making same
03/28/2000US6043456 Method and device for regulating the temperature in a laser-operated printing plate imaging unit of a printing press, particularly of an offset printing press
03/28/2000US6043437 Alumina insulation for coating implantable components and other microminiature devices
03/28/2000US6043323 Diacrylates and dimethacrylates
03/28/2000US6043295 Photopolymerizable composition comprising blend of epoxy resins, photoinitiator system comprising iodonium salt, visible light sensitizer, electron donor
03/28/2000US6043164 Method for transferring a multi-level photoresist pattern
03/28/2000US6043005 A 2-pyrrolidinone; lactic acid; and a peroxide wherein the peroxide is hydrogen peroxide or a peroxycarboxylic acid.
03/28/2000US6043004 Ashing method
03/28/2000US6043003 E-beam application to mask making using new improved KRS resist system
03/28/2000US6043002 Utilizing a specially treated anion exchange resin.
03/28/2000US6043001 Dual mask pattern transfer techniques for fabrication of lenslet arrays
03/28/2000US6043000 Method for manufacturing a semiconductor device
03/28/2000US6042999 Protecting substrate substructure from etching damage in a damascene process by filling a hole opening with protective coating prior to forming conductive line opening of damascene structure having an etch-stop layer separating dielectrics
03/28/2000US6042998 Obtaining a pattern whose fourier transform contains high spatial frequencies, by combining nonlinear functions of intensity of two exposures combined with one nonlinear processing step intermediate between the two exposures
03/28/2000US6042997 Copolymers and photoresist compositions comprising copolymer resin binder component
03/28/2000US6042993 Photolithographic structure generation process
03/28/2000US6042992 Use of a suitably selected monomeric and/or polymeric dye which brings the real part of the refractive index into a range which is optimal for the suppression of reflection-related effects
03/28/2000US6042991 Positive working photosensitive composition
03/28/2000US6042990 Thermosetting polyester anti-reflective coatings for multilayer photoresist processes
03/28/2000US6042989 Radiation sensitive compositions of terpolymers containing organosilicon side chains
03/28/2000US6042988 Chemical-amplification-type negative resist composition
03/28/2000US6042977 Method and apparatus for manufacturing photomask and method of manufacturing a semiconductor device
03/28/2000US6042976 Method of calibrating WEE exposure tool
03/28/2000US6042973 Subresolution grating for attenuated phase shifting mask fabrication
03/28/2000US6042972 Opaque material on substrate surface, reflective material configured to provide first alignment detection indication on portion of surface, second alignment detection indication is distributed among spaced regions on a second surface
03/28/2000US6042647 Nozzle system for feeding treatment liquid such as a liquid developer on a workpiece
03/28/2000US6042257 Correction method and correction apparatus of mask pattern
03/28/2000CA2140462C Seamless offset lithographic printing members for use with laser-discharge imaging apparatus
03/28/2000CA2073253C Silicone coating formulations and planographic printing plates made therewith
03/23/2000WO2000016381A1 Exposure apparatus and its manufacturing method, and device producing method
03/23/2000WO2000016163A2 Method and apparatus for developing photoresist patterns
03/23/2000WO2000016162A1 Method of using a modulated exposure mask
03/23/2000WO2000016161A1 Environment exchange control for material on a wafer surface
03/23/2000WO2000016160A1 Positive radiation-sensitive composition
03/23/2000WO2000016159A1 Method for producing a body having microstructures comprised of material applied by thermal spraying
03/23/2000WO2000016134A1 Diffraction grating and fabrication technique for same
03/23/2000WO2000015591A1 Alicyclic compounds and curable resin composition
03/23/2000WO2000015354A1 Device and method for lamination
03/23/2000WO2000003357A8 Identifying and handling device tilt in a three-dimensional machine-vision image
03/23/2000WO2000003198A8 Machine vision and semiconductor handling
03/23/2000WO2000000868A9 Surfaces with release agent
03/23/2000WO1999065803A9 Automated opening and closing of ultra clean storage containers
03/23/2000DE19944729A1 A resist composition containing a binder and a radiation-sensitive component for use in a fine working of semiconductors
03/22/2000EP0987601A2 An exposure apparatus and exposure method using same
03/22/2000EP0987600A1 Antireflective coating compositions
03/22/2000EP0987599A2 High-definition printing process, particularly for security strips for currency bills and the like
03/22/2000EP0987538A1 Light-transmitting optical element for optical lithography apparatus
03/22/2000EP0987104A1 Imaging member containing heat sensitive thiosulfate polymer and methods of use
03/22/2000EP0986894A1 Method and device for removing light
03/22/2000EP0986777A1 Lithography system
03/22/2000EP0986776A1 Liquid photosensitive composition
03/22/2000EP0986486A1 Method of making lithographic printing plates
03/22/2000EP0986485A1 A heat sensitive printing plate precursor
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