| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/12/2000 | EP0991959A2 Microlens scanner for microlithography and wide-field confocal microscopy |
| 04/12/2000 | EP0991728A1 Matting paste for cationic systems |
| 04/12/2000 | EP0991697A1 Functionalized poly(alkylene carbonate), and use thereof |
| 04/12/2000 | EP0991682A1 A curable, water-borne one-component coating system using thermally labile hydrophilic groups |
| 04/12/2000 | EP0886806B1 2-substituted malondialdehyde compounds as co-developers for black-and-white photothermographic and thermographic elements |
| 04/12/2000 | EP0749594B1 Stable, ionomeric photoresist emulsion and process of preparation and use thereof |
| 04/12/2000 | EP0496891B1 Method and device for optical exposure |
| 04/12/2000 | CN1250488A Method for manufacturing a stent |
| 04/11/2000 | US6049660 Simulation method in lithographic process |
| 04/11/2000 | US6049650 Structure for micro-machine optical tooling and method for making and using |
| 04/11/2000 | US6049588 X-ray collimator for lithography |
| 04/11/2000 | US6049374 Illumination apparatus, a projection exposure apparatus having the same, a method of manufacturing a device using the same, and a method of manufacturing the projection exposure apparatus |
| 04/11/2000 | US6049372 Exposure apparatus |
| 04/11/2000 | US6049186 Method for making and operating an exposure apparatus having a reaction frame |
| 04/11/2000 | US6049086 Large area silent discharge excitation radiator |
| 04/11/2000 | US6049084 Charged-particle-beam optical system |
| 04/11/2000 | US6048799 Device fabrication involving surface planarization |
| 04/11/2000 | US6048786 Process for forming fluorinated resin or amorphous carbon layer and devices containing same |
| 04/11/2000 | US6048672 Relief images on substrates with titanium nitride surfaces, heating, coating, exposure and development |
| 04/11/2000 | US6048671 Ultra-fine microfabrication method using an energy beam |
| 04/11/2000 | US6048670 Forming a pattern on a plate by powder blasting, rolling a coating, providing a transparent coating, curing for masking to form a blast resistant coating |
| 04/11/2000 | US6048669 Optical recording material with photoresists with heat treatment and ulraviolet radiation focusing with lenses |
| 04/11/2000 | US6048668 Polarity electric charge, applying resist to face of film, exposure and development then etching |
| 04/11/2000 | US6048667 Free radicals or cation polymerizable or photocrosslinkable monomers, substrates and photoinitiators, bonding with substrates |
| 04/11/2000 | US6048666 Radiation sensitive resin composition |
| 04/11/2000 | US6048665 Process for making a photoactive compound and photoresist therefrom |
| 04/11/2000 | US6048664 Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material |
| 04/11/2000 | US6048663 Negative-working photoresist compositions and and use thereof |
| 04/11/2000 | US6048662 Film forming resin for photolithography |
| 04/11/2000 | US6048661 Polymer with hydroxy and carboxy groups and ether ester groups for photoresists |
| 04/11/2000 | US6048660 Non-volatile phenylglyoxalic esters |
| 04/11/2000 | US6048659 Photosensitivity, alkalinity, quinonediazide and monoketone |
| 04/11/2000 | US6048655 Method of carrying and aligning a substrate |
| 04/11/2000 | US6048653 (meth)acrylate copolymer with alicyclic(meth)acryloyl group on the side chain and an unsaturated double bond a photopolymerizable initiator and colorant |
| 04/11/2000 | US6048651 Photomasking |
| 04/11/2000 | US6048649 Programmed defect mask with defects smaller than 0.1 μm |
| 04/11/2000 | US6048623 Having specified limits of transparency coated with metal and self-assembling monolayer printed on it in a firstnon-diffracting pattern and a second diffraction pattern;optical sensors |
| 04/11/2000 | US6048588 Flow of inert gas over substrate surface while irradiating the undesired material with energetic photons. |
| 04/11/2000 | US6048400 Substrate processing apparatus |
| 04/11/2000 | US6048188 Stereolithographic curl reduction |
| 04/11/2000 | US6047733 Method and apparatus for selectively drawing air from a plurality of vacuum channels |
| 04/11/2000 | CA2003439C Method for separation of microcapsules and preparation of printing inks |
| 04/06/2000 | WO2000019568A1 Line narrowing apparatus with high transparency prism beam expander |
| 04/06/2000 | WO2000019508A1 Silicon carbide deposition method and use as a barrier layer and passivation layer |
| 04/06/2000 | WO2000019498A1 In situ deposition of low k si carbide barrier layer, etch stop, and anti-reflective coating for damascene applications |
| 04/06/2000 | WO2000019496A1 Laser plasma x-ray generator, semiconductor aligner having the generator, and semiconductor exposure method |
| 04/06/2000 | WO2000019277A1 Method and assembly for producing printing plates |
| 04/06/2000 | WO2000019276A1 Novel photosensitive resin compositions |
| 04/06/2000 | WO2000019275A1 Novel photosensitive resin compositions |
| 04/06/2000 | WO2000019274A1 Method for forming micropattern of resist |
| 04/06/2000 | WO2000019273A1 Novel photosensitive polybenzoxazole precursor compositions |
| 04/06/2000 | WO2000019272A1 Methods of reducing proximity effects in lithographic processes |
| 04/06/2000 | WO2000019271A1 Photomask and exposure method |
| 04/06/2000 | WO2000019270A1 Method for forming a critical dimension test structure and its use |
| 04/06/2000 | WO2000019261A1 Image formation position adjusting device, exposure system, image formation adjusting method and exposure method |
| 04/06/2000 | WO2000019260A1 Pedestal substrate for optical coatings |
| 04/06/2000 | WO2000019259A1 Surface figure control for coated optics |
| 04/06/2000 | WO2000019247A2 Multilayer optical element |
| 04/06/2000 | WO1999057940A3 Smif pod including independently supported wafer cassette |
| 04/06/2000 | DE19942455A1 Power control method for gas discharge laser comprises comparing property of laser output beam as function of voltage applied to discharge chamber for optimal, current gas mixture states |
| 04/06/2000 | DE19845605A1 Konzentrat und daraus hergestellter wäßriger Entwickler für bildmäßig bestrahlte Aufzeichnungsmaterialien Concentrate and derived aqueous developer for imagewise irradiated recording materials |
| 04/05/2000 | EP0990950A1 Processing method and apparatus for imaged elements |
| 04/05/2000 | EP0990949A1 Negative photoresist composition |
| 04/05/2000 | EP0990933A2 Projection optical system for projection exposure apparatus |
| 04/05/2000 | EP0990673A2 Polybenzoxazole resin and precursor thereof |
| 04/05/2000 | EP0990612A2 Exposure device for a stripe-like workpiece |
| 04/05/2000 | EP0990517A2 Processless direct write printing plate having heat sensitive positively-charged polymers and methods of imaging and printing |
| 04/05/2000 | EP0990516A1 Processless direct write printing plate and methods of imaging and printing |
| 04/05/2000 | EP0990286A1 Very narrow band laser |
| 04/05/2000 | EP0990252A1 Detecting registration marks with a low energy electron beam |
| 04/05/2000 | EP0990195A1 Low-cost photoplastic cantilever |
| 04/05/2000 | EP0990147A1 Acrylic microchannels and their use in electrophoretic applications |
| 04/05/2000 | EP0927381A4 Phase shifting circuit manufacture method and apparatus |
| 04/05/2000 | EP0854850B1 Low metal ion containing 4,4'-(1-(4-(1-(4-hydroxyphenyl)-1-methylethyl)phenyl)ethylidene)bisphenol and photoresist compositions therefrom |
| 04/05/2000 | EP0775940B1 Photosensitive paste, plasma display, and process for the production thereof |
| 04/05/2000 | CN1249826A 液态光敏组合物 The photosensitive composition of the liquid |
| 04/05/2000 | CN1249825A Photosensitive quinolone compounds and process of preparation |
| 04/05/2000 | CN1249824A Positive photoresists contg. novel photoactive compounds |
| 04/05/2000 | CN1249447A Photosensitive composition and image forming method |
| 04/05/2000 | CN1249214A Method and system for preventing incontinent drop |
| 04/04/2000 | US6046793 Proximity printing device with variable irradiation angle |
| 04/04/2000 | US6046792 Differential interferometer system and lithographic step-and-scan apparatus provided with such a system |
| 04/04/2000 | US6046539 Use of sacrificial masking layer and backside exposure in forming openings that typically receive light-emissive material |
| 04/04/2000 | US6046459 Method and system for charged particle beam exposure |
| 04/04/2000 | US6046115 Method for removing etching residues and contaminants |
| 04/04/2000 | US6046094 Method of forming wafer alignment patterns |
| 04/04/2000 | US6045981 Method of manufacturing semiconductor device |
| 04/04/2000 | US6045979 Method of photolithographically metallizing at least the inside of holes arranged in accordance with a pattern in a plate of an electrically insulating material |
| 04/04/2000 | US6045978 Chemically treated photoresist for withstanding ion bombarded processing |
| 04/04/2000 | US6045977 Process for patterning conductive polyaniline films |
| 04/04/2000 | US6045976 Using a projection lens to transfer a mask pattern onto a photoresist layer of a wafer |
| 04/04/2000 | US6045975 Photosensitive, heat-resistant resin composition for forming patterns |
| 04/04/2000 | US6045974 Borate photoinitiators from monoboranes |
| 04/04/2000 | US6045973 Photoimageable compositions having improved chemical resistance and stripping ability |
| 04/04/2000 | US6045972 Coating method using aqueous photopolymerizable compositions |
| 04/04/2000 | US6045970 A chemically amplified photoresist having an acid-labile group which is easily hydrolysis by an acidic catalyst; for forming a pattern having an excellent profile due to the high contrast and high thermal decomposition temperature |
| 04/04/2000 | US6045968 Photosensitive composition |
| 04/04/2000 | US6045967 Method and device using ArF photoresist |
| 04/04/2000 | US6045966 Condensation polymerization of novolak resin, purification with solvents, separation to produce a film forming novolak resin solution |
| 04/04/2000 | US6045964 Forming an optical interference structure, the structure reflecting incident light to emphasize a visible color and to form color printing |