Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/1999
12/21/1999US6004047 Method of and apparatus for processing photoresist, method of evaluating photoresist film, and processing apparatus using the evaluation method
12/21/1999US6003828 Means for supporting a mask
12/21/1999US6003230 Magnetic positioner having a single moving part
12/21/1999US6003223 Common alignment target image field stitching method for step and repeat alignment in photoresist
12/16/1999WO1999065066A1 Transfer method and aligner
12/16/1999WO1999064933A1 Crossed grating photonic crystals and multiple exposure processes for making them
12/16/1999WO1999064932A1 193 nm positive-working photoresist composition
12/16/1999WO1999064931A1 Photocurable elastomeric compositions
12/16/1999WO1999064930A1 Offset printing plate having a high support stability
12/16/1999WO1999064929A1 Methods of making optical microstructures which can have profile heights exceeding fifteen microns
12/16/1999WO1999064817A1 Interferometer
12/16/1999WO1999064642A1 Method for fabricating metal nanostructures
12/16/1999WO1999064471A1 Photopolymerizable resin composition and use thereof
12/16/1999WO1999056157A3 Optical system with anti-reflection coating
12/16/1999DE19919795A1 New photoresist polymer useful for manufacturing semiconductors in the top surface image process
12/16/1999DE19826377A1 Druckmaschine und Druckverfahren Press and printing method
12/16/1999DE19825828A1 Kontrollelement für ein strahlungsempfindliches Aufzeichnungsmaterial und Verfahren zum Bestimmen der Belichtungsenergie für ein strahlungsempfindliches Aufzeichnungsmaterial mittels eines Kontrollelements Control element for a radiation-sensitive recording material and method for determining the exposure energy for a radiation-sensitive recording material by means of a control element
12/16/1999DE19825716A1 Baugruppe aus optischem Element und Fassung Assembly of optical element and mount
12/16/1999DE19825244A1 Offsetdruckplatte mit hoher Auflagenstabilität Offset printing plate with high circulation stability
12/16/1999CA2334692A1 Crossed grating photonic crystals and multiple exposure processes for making them
12/16/1999CA2333998A1 Photocurable elastomeric compositions
12/15/1999EP0964317A1 Total internal reflection holographic recording and imaging apparatus and a method of forming a hologram and reconstructing an image therefrom
12/15/1999EP0964308A2 Exposure method and apparatus and device manufacturing method using the same
12/15/1999EP0964307A2 Projection exposure apparatus and method
12/15/1999EP0964306A1 Control strip for lightsensitive recording element; process for determining the exposure energy for a photosensitive recording element using a control strip
12/15/1999EP0964305A1 Method of making a photonic crystal
12/15/1999EP0964282A2 Projection exposure apparatus with a catadioptric projection optical system
12/15/1999EP0964281A1 Assembly comprising an optical element and its mounting
12/15/1999EP0963840A1 Method and apparatus for laser imaging
12/15/1999EP0963839A1 Printing machine and printing process
12/15/1999EP0963573A1 Alignment device and lithographic apparatus comprising such a device
12/15/1999EP0963572A1 POSITIONING DEVICE HAVING THREE COIL SYSTEMS MUTUALLY ENCLOSING ANGLES OF 120o, AND LITHOGRAPHIC DEVICE COMPRISING SUCH A POSITIONING DEVICE
12/15/1999EP0963552A1 System for detecting amine and other basic molecular contamination in a gas
12/15/1999EP0963257A1 Method and apparatus for temperature controlled spin-coating systems
12/15/1999EP0644059B1 Seal manufacturing apparatus
12/15/1999CN1238474A Apparatus and method for drying photosensitive material using radiant heat and air flow passages
12/15/1999CN1238461A Method and apparatus for reducing measurement error for inspection measurements
12/15/1999CN1238344A Polymer and forming method of micro pattern using the same
12/14/1999US6002987 Methods to control the environment and exposure apparatus
12/14/1999US6002744 Method and apparatus for generating X-ray or EUV radiation
12/14/1999US6002740 Method and apparatus for X-ray and extreme ultraviolet inspection of lithography masks and other objects
12/14/1999US6002487 Alignment method for performing alignment between shot areas on a wafer
12/14/1999US6002467 Exposure apparatus and method
12/14/1999US6002466 Lithography exposure device
12/14/1999US6002465 Stage device, exposure apparatus using the same, and device production method
12/14/1999US6002108 Baking apparatus and baking method
12/14/1999US6001739 Forming organic insulating film of low dielectric constant on surface of silicon wafer, forming a photoresist film on insulating film, exposing photoresist film to light to form pattern, reacting silicon compound, reactive ion etching
12/14/1999US6001542 Removal beads of photoresist on semiconductor using solvent;high speed spinning
12/14/1999US6001535 Monomers with cyclic carbonate groups
12/14/1999US6001534 Photosensitive resin composition
12/14/1999US6001533 Light-shielding layer contains an alkali-soluble binder, a photopolymerizable monomer, a photoinitiator, a solvent, and a pigment comprises mixed oxide of copper-manganese in which a part of manganese is replaced with iron, cobalt or nickel
12/14/1999US6001532 Consists of strippable cover sheet; a photosensitive layer; an essentially non-photosensitive, non-tacky layer of block or random polymer of an aromatic monomer and a nonaromatic monomer; and a support
12/14/1999US6001517 Positive photosensitive polymer composition, method of forming a pattern and electronic parts
12/14/1999US6001513 Method for forming a lithographic mask used for patterning semiconductor die
12/14/1999US6001512 Method of blind border pattern layout for attenuated phase shifting masks
12/14/1999US6001511 Exposure mask having a thickness profile for controlling the amount of charged particles per unit area passing through the mask; forms a uniform pattern on a semiconductor wafer by correcting a proximity effect
12/14/1999US6001488 Composition of epoxy group-containing cycloolefin resin
12/14/1999US6001417 Resist coating method and resist coating apparatus
12/14/1999US6001298 Method for making a mould
12/14/1999US6001168 For pigmenting high molecular mass material, such as for inks, toners, coating materials, color filters and cosmetics, resins, caseins, cellulose ethers, celulose esters, polymers, polyolefins
12/14/1999US6000999 Preparatory abrading method for support of lithographic plate
12/14/1999US6000947 Method of fabricating transistor or other electronic device using scanning probe microscope
12/14/1999US6000862 Substrate developing method and apparatus
12/14/1999US6000411 Cleaning compositions for removing etching residue and method of using
12/14/1999US6000337 Method and apparatus for an automated plate handler with elevator and table support mechanism
12/09/1999WO1999063790A1 Laser-excited plasma light source, exposure apparatus and its manufacturing method, and device manufacturing method
12/09/1999WO1999063585A1 Scanning aligner, method of manufacture thereof, and method of manufacturing device
12/09/1999WO1999063536A2 Very-high-density memory device utilizing a scintillating data-storage medium
12/09/1999WO1999063407A1 Lithographic printing plate precursors
12/09/1999WO1999063404A1 Polymer remover/photoresist stripper
12/09/1999WO1999063386A1 Multiple parallel source scanning device
12/09/1999WO1999063385A1 Digital optical chemistry micromirror imager
12/09/1999WO1999063010A1 Composition for reflection reducing coating
12/09/1999WO1999062964A1 PURIFIED METHYL α-CHLOROACRYLATE/α-METHYLSTYRENE COPOLYMER AND ELECTRON BEAM RESIST COMPOSITION CONTAINING THE SAME
12/09/1999WO1999062962A1 Novel photoinitiators and applications therefor
12/09/1999WO1999062961A1 Novel photoinitiators and their applications
12/09/1999WO1999032938A3 Illumination system for projector
12/09/1999DE19919794A1 New photoresist polymer useful for manufacturing semiconductors in the top surface image process
12/09/1999DE19824546A1 Herstellung vernetzbarer wasserlöslicher oder wasserdispergierbarer Zusammensetzungen und daraus erhältlicher strahlungsempfindlicher Gemische Preparation of crosslinkable soluble or water compositions and obtainable therefrom radiation-sensitive mixtures
12/09/1999CA2298468A1 Novel photoinitiators and applications therefor
12/08/1999EP0963104A1 System and method for proofing
12/08/1999EP0962962A2 Patterning technique using a template, and a ink jet system
12/08/1999EP0962830A1 Ringfield four mirror system with convex primary mirror for EUV lithography
12/08/1999EP0962829A1 Protective layer for color proofs
12/08/1999EP0962828A1 Production of water-soluble or water-dispersible compositions and light-sensitive materials containing such compositions
12/08/1999EP0962827A2 Photoimageable composition having improved photoinitiator system
12/08/1999EP0962826A1 A positive resist composition
12/08/1999EP0962825A1 Photosensitive resin composition and process for producing the same
12/08/1999EP0962824A2 Optimizing workflow in a prepress printing system
12/08/1999EP0962823A1 Apparatus and method for drying photosensitive material using radiant heat and air flow passages
12/08/1999EP0961954A1 Repetitively projecting a mask pattern using a time-saving height measurement
12/08/1999EP0961953A1 Chemical microreactors and method for producing same
12/08/1999EP0783728B1 Radiation-sensitive adducts comprising diazonium cations, quaternary cations, and sulfonated polyester anions
12/08/1999EP0656378B1 Photosensitive resin composition for corrugated board printing plate
12/08/1999CN2352976Y Focusing device for sumillimeter photoetching machine
12/08/1999CN2352975Y Optical grating diffraction coaxial alignment device of submillimeter photoetching machine
12/08/1999CN2352974Y Phase optical grating off axis illumination optical system for etching machine
12/08/1999CN1237927A Inverted stamping process
12/08/1999CN1237720A Photoimageable composition having improved photoinitiator system
12/08/1999CN1237719A Positive resist composition
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