Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/1999
11/10/1999CN1234338A Degradated-scrap reduced offset-printing imaging method and structure thereof
11/09/1999US5982800 Narrow band excimer laser
11/09/1999US5982795 Excimer laser having power supply with fine digital regulation
11/09/1999US5982558 REMA objective for microlithographic projection exposure systems
11/09/1999US5982496 Thin film thickness and optimal focus measuring using reflectivity
11/09/1999US5982489 Method and apparatus for measuring depth of a depression in a pattern by light interference from crossed light beams
11/09/1999US5982476 Process of forming pattern and exposure apparatus
11/09/1999US5982475 Raster-scan photolithographic reduction system
11/09/1999US5982474 Periphery exposing apparatus and method
11/09/1999US5982128 Lithography apparatus with movable stage and mechanical isolation of stage drive
11/09/1999US5981616 Oxetane compound, epoxy compound consisting of expoxidized polymers of conjugated diene monomers, expoxidized copolymers of diene monomers and compounds having an ethylenically unsaturated bond, and expoxidized natural rubber
11/09/1999US5981454 Post clean treatment composition comprising an organic acid and hydroxylamine
11/09/1999US5981307 Fabrication process of optical semiconductor device having a diffraction grating
11/09/1999US5981150 Forming a substrate including, on the surface, first and second domains having different reflectivity to first light, covering the domains with positive resist, radiating to form pattern on the parts of domain with first light, developing
11/09/1999US5981149 Exposing resist film by radiation coated on a substrate to be etched via a photomask on which atleast a first and a second opening pattern are formed, developing to obtain pattern, etching the substrate to obtain predermined pattern
11/09/1999US5981148 Method for forming sidewall spacers using frequency doubling hybrid resist and device formed thereby
11/09/1999US5981147 Stable, ionomeric photoresist emulsion and process of preparation and use thereof
11/09/1999US5981146 Resist coating film
11/09/1999US5981145 Light absorbing polymers
11/09/1999US5981143 Chemically treated photoresist for withstanding ion bombarded processing
11/09/1999US5981142 Photoresist copolymer
11/09/1999US5981141 A blend of silane containing acrylate or methacrylate, copolymer of ethylene or propylene and styrene or derivatives, ethylene or propylene-maleic anhydride copolymer, a terpolymer and a tetrapolymer
11/09/1999US5981140 Positive photosensitive composition
11/09/1999US5981139 Photosensitive composition containing an aliphaticamine
11/09/1999US5981136 An image is obtained which is free from contamination by the light-to-heat conversion layer, useful for making colored images including color proofs and color filter elements
11/09/1999US5981135 Consisting of a photoacid generator and an acid functional cellulosic resin
11/09/1999US5981119 Exposing the resist to first monochromatic light of first frequency, a respective first machine focus is determined for first light, interrogating each latent image, determining maximum scattered energy, then averaging
11/09/1999US5981118 Providing single scanning stage where samples are mounted and providing a balancing stage, scanning said scanning stage based on exposure data; scanning balancing stage so that barycenter of both stages become a fixed point
11/09/1999US5981117 Scanning exposure method utilizing identical scan direction across multiple mask pattern layers
11/09/1999US5981116 A pattern of mask is transferred onto a photosensitive substrate by scanning the mask and photosensitive substrate in a synchronous manner
11/09/1999US5981112 Positiong transferable colorant layer on second substrate in a preferencial relationship from first substrate and heating the second substrate to transfer the colorant from heat transferable colorant layer to first substrate
11/09/1999US5981075 For optical lenses, mirrors; durability
11/09/1999US5981001 Processing method for selectively irradiating a surface in presence of a reactive gas to cause etching
11/09/1999US5980998 Deposition of substances on a surface
11/09/1999US5980768 Introducing substrate having thereon photoresist mask into plasma reactor; flowing into plasma reactor an etchant oxygen-free source gas comprising nitrogen; removing defects by employing plasma struck with etchant source gas
11/09/1999US5980643 Workpiece, including exposed aluminum metallized surfaces, is treated with alkaline, water-based solution containing one or more components that form aluminosilicate on exposed aluminum metallized surfaces to remove residues
11/09/1999US5980088 Laser drawing apparatus with precision scaling-correction
11/09/1999US5980026 Process for production of ink jet head
11/09/1999CA2063769C Fabrication methods for micromechanical elements
11/04/1999WO1999056178A1 Fast-etching, thermosetting anti-reflective coatings derived from cellulosic binders
11/04/1999WO1999056177A1 Heavy metal-free coating formulations
11/04/1999WO1999056176A1 Low-cost photoplastic cantilever
11/04/1999WO1999056157A2 Optical system with anti-reflection coating
11/04/1999WO1999055789A1 Coating liquid for forming silica-based film having low dielectric constant and substrate having film of low dielectric constant coated thereon
11/04/1999DE19919958A1 Production of semiconductor device, e.g. DRAM
11/04/1999DE19827684A1 Simple production of red filter film useful in cathode ray tube with little pollution
11/04/1999DE19817714A1 Verfahren zur Messung der Lage von Strukturen auf einer Maskenoberfläche Method for measuring the position of structures on a mask surface
11/04/1999CA2330689A1 Fast-etching, thermosetting anti-reflective coatings derived from cellulosic binders
11/04/1999CA2329012A1 Heavy metal-free coating formulations
11/03/1999EP0953880A2 Aqueous developing solutions for reduced developer residue
11/03/1999EP0953879A2 Aqueous developing solutions for reduced developer residue
11/03/1999EP0953878A2 Contact exposure process and device
11/03/1999EP0953877A1 Method for producing screen-printing forms and light exposure apparatus therefor
11/03/1999EP0953835A1 Apparatus for detection of a fluorescence pattern corresponding to ligand binding on a substrate
11/03/1999EP0953613A2 Ink, ink-jet recording method using the same, and photopolymerization initiator
11/03/1999EP0953590A1 Polyimides, process for producting the same and photosensitive composition containing the same
11/03/1999EP0953441A1 Antireflection direct write lithographic printing plates
11/03/1999EP0953166A2 Pattern-forming methods
11/03/1999EP0953165A1 Lithographic plate precursor
11/03/1999EP0952925A1 Lithographic plate precursor
11/03/1999EP0879400A4 Multiple field of view calibration plate for use in semiconductor manufacturing
11/03/1999EP0867106B1 Solder mask for manufacture of printed circuit boards
11/03/1999EP0749352B1 Microfabricated particle filter
11/03/1999CN1233848A Method of forming photoresist pattern
11/03/1999CN1233847A Testing bench used for image exposure apparatus
11/03/1999CN1233783A Aqueous developing solutions for reduced developer residue
11/03/1999CN1233782A Aqueous developing solutions for reduced developer residue
11/03/1999CN1046144C Stainless steel plate with color and topographic surface and making method thereof
11/02/1999US5978441 Extreme ultraviolet lithography mask blank and manufacturing method therefor
11/02/1999US5978409 Line narrowing apparatus with high transparency prism beam expander
11/02/1999US5978406 Fluorine control system for excimer lasers
11/02/1999US5978394 Wavelength system for an excimer laser
11/02/1999US5978391 Wavelength reference for excimer laser
11/02/1999US5978138 Projection exposure systems
11/02/1999US5978094 Alignment device and method based on imaging characteristics of the image pickup system
11/02/1999US5978085 Apparatus method of measurement and method of data analysis for correction of optical system
11/02/1999US5978081 Multiple field of view calibration plate for use in semiconductor manufacturing
11/02/1999US5978078 System and method for detecting particles on substrate-supporting chucks of photolithography equipment
11/02/1999US5978072 Exposure apparatus
11/02/1999US5978071 Projection exposure apparatus and method in which mask stage is moved to provide alignment with a moving wafer stage
11/02/1999US5978070 Projection exposure apparatus
11/02/1999US5978069 Exposure apparatus and methods
11/02/1999US5978068 Apparatus for protecting a reference mark used in exposure equipment
11/02/1999US5978010 Printing plate exposure apparatus for recording image data spirally
11/02/1999US5977724 Bulb rotation for eliminating partial discharges
11/02/1999US5977709 Mercury lamp of the short arc type
11/02/1999US5977550 Charged-particle-beam optical systems
11/02/1999US5977542 Restoration of CD fidelity by dissipating electrostatic charge
11/02/1999US5977357 Phenyl alkyl ketone substituted by cyclic amine and a process for the preparation thereof
11/02/1999US5977288 Fractionated novolak resin and photoresist composition therefrom
11/02/1999US5977041 Aqueous rinsing composition
11/02/1999US5976770 Reaction product of a phenolic compound and anthracene compound as dye
11/02/1999US5976769 Intermediate layer lithography
11/02/1999US5976768 Masking, exposure, development
11/02/1999US5976766 Forming a stepped layer on semiconductor; coating with negative photoresist; patterning; etching
11/02/1999US5976765 Solid-capped liquid photopolymer printing elements
11/02/1999US5976764 Water-less lithographic plates
11/02/1999US5976763 Highly sensitive water-developable photoreactive resin compositions and printing plates prepared therefrom
11/02/1999US5976762 Photosensitive element and process for producing multilayer printed wiring board
11/02/1999US5976761 Ion exchanging a film forming novolak phenol-formaldehyde resin
1 ... 995 996 997 998 999 1000 1001 1002 1003 1004 1005 1006 1007 1008 1009 1010 1011 1012 1013 1014 1015 ... 1272