| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/09/2000 | DE19940516A1 New photoresist monomer for producing copolymer for manufacture of semiconductor comprises 5-norbornene-2-carboxylic acid-3-hydroxyalkyl carboxylate or oxabicyclo(2.2.1)-hept-5-ene-2-carboxylic acid-3-hydroxyalkyl carboxylate derivatives |
| 03/09/2000 | DE19940515A1 A photoresist monomer useable in photolithography for producing highly integrated semiconductor elements |
| 03/09/2000 | DE19915704A1 Resistzusammensetzung und Musterbildungsprozess Resist composition and patterning process |
| 03/09/2000 | DE19840928A1 Multibeam laser scanner for exposing material to be copied has a laser exposure unit for generating one or more laser beams and a control for regulating beam brightness according to the item to be scanned. |
| 03/09/2000 | DE19838847A1 Reduction of reflection effects in photolithographic processes, used in semiconductor processing, comprises forming a dielectric anti-reflection coating layer below a hard mask layer |
| 03/09/2000 | CA2341896A1 Support for a method for determining an analyte and a method for producing the support |
| 03/09/2000 | CA2341894A1 Method and device for preparing and/or analyzing biochemical reaction carriers |
| 03/09/2000 | CA2341403A1 Methods and apparatus for measuring the thickness of a film, particularly of a photoresist film on a semiconductor substrate |
| 03/08/2000 | EP0984329A2 Position detection apparatus having a plurality of detection sections, and exposure apparatus |
| 03/08/2000 | EP0984053A1 Photochromic polymerizable composition |
| 03/08/2000 | EP0983533A1 Printing plate and method of making using digital imaging photopolymerization |
| 03/08/2000 | EP0983481A2 Two piece mirror arrangement for interferometrically controlled stage |
| 03/08/2000 | EP0983320A1 Curable sealant composition |
| 03/08/2000 | EP0983277A1 Polyborate coinitiators for photopolymerization |
| 03/08/2000 | EP0983151A1 Planographic printing |
| 03/08/2000 | EP0873368B1 Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefrom |
| 03/08/2000 | EP0677182B1 Method for forming a novolak resin for photoresist applications |
| 03/08/2000 | CN1246657A Photoconductor for electronic photograph |
| 03/08/2000 | CN1246655A Sulfonic acid oxime kind for high light sensitivity high elch-resistant thick coating i-line photoetching rubber |
| 03/08/2000 | CN1246654A Water-soluble photosensitive flexible solid plate |
| 03/08/2000 | CN1050253C Method for detecting state of focusing |
| 03/08/2000 | CN1050204C Lifting system for working table of micron and submicron electron-beam exposure machine |
| 03/08/2000 | CA2281996A1 System for making printing plates for newspaper printing |
| 03/07/2000 | US6035015 Compton backscattered collmated X-ray source |
| 03/07/2000 | US6034984 Tangential fan with cutoff assembly and vibration control for electric discharge laser |
| 03/07/2000 | US6034978 Gas discharge laser with gas temperature control |
| 03/07/2000 | US6034771 System for uniformly heating photoresist |
| 03/07/2000 | US6034376 Electron-beam exposure system and a method applied therein |
| 03/07/2000 | US6034375 Method of aligning a semiconductor substrate with a base stage and apparatus for doing the same |
| 03/07/2000 | US6033993 Process for removing residues from a semiconductor substrate |
| 03/07/2000 | US6033949 Method and structure to reduce latch-up using edge implants |
| 03/07/2000 | US6033830 Acrylate copolymers with pendant phenanthrenyl, anthracenyl, quinoline, quinoxaline, benzoxazine or benzothiazine groups; crosslinking; effectively absorb reflected deep uv exposure radiation. |
| 03/07/2000 | US6033829 Thermoplastic copolymer of an alpha, beta-unsaturated carboxyl group-containing monomers and another monomer; a crosslinking monomer; and a polymerization initiator comprising a quaternary boron salt and a sensitizing dye |
| 03/07/2000 | US6033828 Polyvinylphenol derivatives |
| 03/07/2000 | US6033827 Alicyclic acrylic polymer and a photoacid generator, wherein resin having an aromatic ring and a molecular weight between 8,000 and 30,000 is added. |
| 03/07/2000 | US6033826 Polymer and resist material |
| 03/07/2000 | US6033814 Method for multiple process parameter matching |
| 03/07/2000 | US6033813 Method of manufacturing color filter |
| 03/07/2000 | US6033811 Optical proximity correction mask for semiconductor device fabrication |
| 03/07/2000 | US6033766 Coated with a thin layer of silver |
| 03/07/2000 | US6033728 Apparatus for spin coating, a method for spin coating and a method for manufacturing semiconductor device |
| 03/07/2000 | US6033475 Resist processing apparatus |
| 03/07/2000 | US6033474 Apparatus for baking photoresist applied on substrate |
| 03/07/2000 | US6033135 Development system for manufacturing semiconductor devices, including a container equipped with cleaning and ventillation apparatus, and controlling method thereof |
| 03/07/2000 | US6033134 Resist developing apparatus used in process for production of semiconductor device |
| 03/07/2000 | US6033079 High numerical aperture ring field projection system for extreme ultraviolet lithography |
| 03/07/2000 | US6032997 Vacuum chuck |
| 03/07/2000 | US6032683 System for cleaning residual paste from a mask |
| 03/07/2000 | US6032682 Method for sulfuric acid resist stripping |
| 03/07/2000 | CA2112010C (cyclo)aliphatic epoxy compounds |
| 03/02/2000 | WO2000011766A1 Laser repetition rate multiplier |
| 03/02/2000 | WO2000011707A1 Method and apparatus for scanning exposure, and micro device |
| 03/02/2000 | WO2000011706A1 Illuminator and projection exposure apparatus |
| 03/02/2000 | WO2000011520A1 Polymers having silicon-containing acetal or ketal functional groups |
| 03/02/2000 | WO2000011519A1 Low thermal distortion extreme-uv lithography reticle |
| 03/02/2000 | WO2000011091A1 Non-corrosive stripping and cleaning composition |
| 03/02/2000 | WO2000011068A1 Screen coating composition and method for applying same |
| 03/02/2000 | WO2000011041A1 Thermal- and photoinitiated radical polymerization in the presence of an addition fragmentation agent |
| 03/02/2000 | WO2000010972A1 New unsaturated oxime derivatives and the use thereof as latent acids |
| 03/02/2000 | WO2000010964A1 Photoactivatable bases containing nitrogen |
| 03/02/2000 | WO1999044232A8 Method of increasing alignment tolerances for interconnect structures |
| 03/02/2000 | DE19940751A1 Apparatus for detecting light emissions comprises light-emitting matrix facing light-detection matrix, which together sandwich test substance |
| 03/02/2000 | DE19839454A1 Recording material for production of lithographic printing plates comprises a base, a ceramic coating containing aluminum oxide with a silicate compound as binder, and a light-sensitive layer |
| 03/02/2000 | DE19838315A1 Material für die Gravur-Aufzeichnung mittels kohärenter elektromagnetischer Strahlung und Druckplatte damit Material for engraving recording by means of coherent electromagnetic radiation and pressure plate so |
| 03/02/2000 | CA2338523A1 Polymers having silicon-containing acetal or ketal functional groups |
| 03/02/2000 | CA2337428A1 Thermal- and photoinitiated radical polymerization in the presence of an addition fragmentation agent |
| 03/01/2000 | EP0982769A2 Microdevice and structural components of the same |
| 03/01/2000 | EP0982716A1 Optical recording medium and master to produce it and optical recording and/or reproducing apparatus |
| 03/01/2000 | EP0982630A2 Semiconductor-device manufacturing method having resist-film developing process according to wet treatment |
| 03/01/2000 | EP0982629A1 Photosensitive resin composition useful in fabricating printing plates |
| 03/01/2000 | EP0982628A2 A chemical amplifying type positive resist composition |
| 03/01/2000 | EP0982627A2 Heating unit |
| 03/01/2000 | EP0982320A1 Light-absorbing polymers and application thereof to antireflection film |
| 03/01/2000 | EP0982124A2 Material for recording by engraving using coherent electromagnetic radiation, and printing plate prepared therewith |
| 03/01/2000 | EP0981936A1 Plasma focus high energy photon source |
| 03/01/2000 | EP0981830A1 Charged particle beam illumination of blanking aperture array |
| 03/01/2000 | EP0981779A1 Composition and method for removing resist and etching residues using hydroxylammonium carboxylates |
| 03/01/2000 | EP0873573A4 Electron sources utilizing negative electron affinity photocathodes with ultra-small emission areas |
| 03/01/2000 | EP0852026B1 Black-and-white photothermographic and thermographic elements comprising acrylonitrile compounds as co-developers |
| 03/01/2000 | EP0799438B1 Production of water-less lithographic plates |
| 03/01/2000 | EP0772655B1 Acrylic syrup curable to a crosslinked viscoelastomeric material |
| 03/01/2000 | CN1245973A Improved critical dimension control |
| 03/01/2000 | CN1245910A Chemical intensified positive photoresist composite |
| 03/01/2000 | CN1245909A Optical imageable composite with improved flexibility |
| 03/01/2000 | CN1245908A Optical imageadable composite with improved flexibility |
| 02/29/2000 | US6031756 Molecule, layered medium and method for creating a pattern |
| 02/29/2000 | US6031598 Extreme ultraviolet lithography machine |
| 02/29/2000 | US6031597 Method and apparatus for transfer of a reticle pattern onto a substrate by scanning |
| 02/29/2000 | US6031241 Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications |
| 02/29/2000 | US6031238 Projection aligner for integrated circuit fabrication |
| 02/29/2000 | US6030932 Cleaning composition and method for removing residues |
| 02/29/2000 | US6030754 Rinsing the semiconductor wafer in an organic solvent to dissolve the photoresist, rinsing the wafer in a light alcohol miscible with organic solvent, vapor drying the wafer in light alcohol, oxidizing organic matters, rising, drying |
| 02/29/2000 | US6030752 Forming first and second image patterns over the substrate that defines first and second segment with first and second linewidth and contact regions, removing a portion of both patterns to form segments stitched by portion of contact part |
| 02/29/2000 | US6030749 Photosensitive resin composition and a photosensitive element structure |
| 02/29/2000 | US6030748 Photosensitive layer of a hydrolyzed and polycondensed polymer of organosilicone or organometallic compound monomer in a solvent having dissolved therein a phenol compound or an organic phosphoric acid |
| 02/29/2000 | US6030747 Chemically amplified resist consists of a photoacid generator, a crosslinking agent activated in presence of acid and a copolymer of acrylic or methacrylic ester containing an acid, hydroxy or ester polar group and a compound |
| 02/29/2000 | US6030746 Chemically amplified positive resist comprises a organic solvent, an alkali soluble resin, a photoacid generator and a dissolution rate regulator |
| 02/29/2000 | US6030741 Positive resist composition |
| 02/29/2000 | US6030740 Two-sided imaging material |
| 02/29/2000 | US6030732 In-situ etch process control monitor |