Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/1999
10/12/1999US5964156 Optimizing workflow in a prepress printing system
10/07/1999WO1999050898A1 Organic removal process
10/07/1999WO1999050894A1 Thin oxide film for augmenting anti-reflectivity and eliminating resist footing
10/07/1999WO1999050892A1 Optical device and exposure system equipped with optical device
10/07/1999WO1999050874A2 Gated photocathode for controlled single and multiple electron beam emission
10/07/1999WO1999050712A1 Exposure method and system, photomask, method of manufacturing photomask, micro-device and method of manufacturing micro-device
10/07/1999WO1999050711A1 Liquid, radiation-curable composition, especially for producing flexible cured articles by stereolithography
10/07/1999WO1999050322A1 Copolymer, process for producing the same, and resist composition
10/07/1999WO1999050069A1 Waterless lithographic plate
10/07/1999WO1999050067A1 Improved photopolymer film and method for producing same
10/07/1999WO1999049998A1 Composition and method for removing photoresist materials from electronic components
10/07/1999WO1999049996A1 Apparatus and method for providing pulsed fluids
10/07/1999WO1999036831A9 Process for preparing a radiation-sensitive composition
10/07/1999WO1999024971A3 Magnetic recording/reproduction device
10/07/1999DE19913560A1 Flexographic imaging element having an integral mask to give continuous tone image
10/07/1999DE19913542A1 Development of lithographic printing plate to unpitted plate with stable, long-lasting printing capacity
10/07/1999CA2326986A1 Improved photopolymer film and method for producing same
10/07/1999CA2326810A1 Apparatus and method for providing pulsed fluids
10/07/1999CA2289131A1 Gated photocathode for controlled single and multiple electron beam emission
10/06/1999EP0947885A1 Photosensitive material processing apparatus and sealing structure for processing section of the apparatus
10/06/1999EP0947884A2 Lithographic projection apparatus with substrate holder
10/06/1999EP0947883A2 Exposure apparatus and method, device manufacturing method, and discharge lamp
10/06/1999EP0947882A2 X-ray reduction projection exposure system of reflection type
10/06/1999EP0947881A2 Control of critical dimensions
10/06/1999EP0947828A2 Method and apparatus for improved inspection measurements
10/06/1999EP0947353A1 A method for preparing an aluminum foil for use as a support in lithographic printing plates
10/06/1999EP0946900A1 Lithographic pneumatic support device with controlled gas supply
10/06/1999EP0946899A1 System for the transfer of digitized images to an image support or vice-versa
10/06/1999EP0946894A1 Beam homogenizer
10/06/1999EP0750229B1 Liquid photosensitive resin composition for forming relief structures
10/06/1999CN1230704A Photoresist compositions
10/06/1999CN1230703A Aqueous developable photosensitive polyurethane-(meth) acrylate
10/06/1999CN1230568A Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
10/05/1999US5963788 Method for integrating microelectromechanical devices with electronic circuitry
10/05/1999US5963753 Substrate processing apparatus
10/05/1999US5963616 Configurations, materials and wavelengths for EUV lithium plasma discharge lamps
10/05/1999US5963365 Optical element
10/05/1999US5963329 Method and apparatus for measuring the profile of small repeating lines
10/05/1999US5963324 Exposure apparatus and method responsive to light beam wavelength variation
10/05/1999US5963306 Exposure apparatus and methods for using the same
10/05/1999US5963305 Illumination system and exposure apparatus
10/05/1999US5962385 Cleaning liquid for semiconductor devices
10/05/1999US5962197 30-80% by weight of a propylene glycol ether; 10-60% by weight of a pyrrolidone; 0.1-5% by weight of potassium hydroxide; 0.1-10% by weight of a surfactant; water content of less than one percent.
10/05/1999US5962196 Deep ultraviolet light photoresist processing
10/05/1999US5962194 Selectively irradiating a selected region of the deposited first film to be etched with light to modify a portion of the thickness of the first film to be etched to thereby form a first protective film; photoetching
10/05/1999US5962193 Method and apparatus for controlling air flow in a liquid coater
10/05/1999US5962192 Film forming polymer, an organo azide and a photosensitive dye that absorbs light at the frequency of the patterning laser and converts it to heat energy. the heat energy in turn elevates the temperature of the organo azide above its
10/05/1999US5962191 Curable tetrapolymer containing units of (meth)acrylic acid, (meth)acrylamide, adamantyl (meth)acrylate, and a vinyl monomer containing an unsaturated group available for crosslinking.
10/05/1999US5962190 Photopolymerizable compositions having improved sidewall geometry and development latitude
10/05/1999US5962189 Photosensitive composition containing photosensitive polyamide and thiazoline photoinitiator and negative working photosensitive element
10/05/1999US5962187 Radiation sensitive composition
10/05/1999US5962186 Polymer for chemical amplified positive photoresist composition containing the same
10/05/1999US5962185 (meth)acrylic acid-methyl (meth)acrylate polymer containing units of an acid-labile protected carboxyalkyloxy- or oxycarbonyloxy-phenylalkyl (meth)acrylate
10/05/1999US5962184 Photoresist composition comprising a copolymer of a hydroxystyrene and a (meth)acrylate substituted with an alicyclic ester substituent
10/05/1999US5962183 Metal ion reduction in photoresist compositions by chelating ion exchange resin
10/05/1999US5962180 Radiation sensitive composition
10/05/1999US5962173 Method for measuring the effectiveness of optical proximity corrections
10/05/1999US5962172 Method and apparatus for manufacturing photomask and method of manufacturing a semiconductor device
10/05/1999US5962148 Electrically conductive paint composition
10/05/1999US5962111 Compressible printing plates and manufacturing process therefor
10/05/1999US5962070 The present invention relates to methods and apparatus for developing or otherwise treating substrates such as semiconductor wafers, glass substrates for liquid crystal displays, glass substrates for photomasks, and substrates for
10/05/1999US5961775 Ashing
09/1999
09/30/1999WO1999049505A1 Illuminator, exposing method and apparatus, and device manufacturing method
09/30/1999WO1999049504A1 Projection exposure method and system
09/30/1999WO1999049366A1 Photomask and projection exposure system
09/30/1999WO1999049346A1 High na system for multiple mode imaging
09/30/1999WO1999048945A1 Photocurable composition containing iodonium salt compound
09/30/1999DE19813235A1 Removal of an organic material from a metallic surface
09/30/1999DE19812859A1 Photoinitiatorgemische Photoinitiator mixtures
09/29/1999EP0945895A1 Mercury lamp of the short arc type and UV emission device
09/29/1999EP0945764A2 Photoresist composition
09/29/1999EP0945763A1 Printing apparatus of photosensitive microcapsule type and image processing system using the same
09/29/1999EP0945762A1 Optical article and process for forming article
09/29/1999EP0945756A1 A method for preparing an imaging element for making an improved printing plate according to the silver salt diffusion transfer process
09/29/1999EP0945468A2 Mixture of photoinitiators
09/29/1999EP0945281A2 Heat sensitive composition, lithographic printing plate using the same, and process for preparing a lithographic printing plate
09/29/1999EP0945276A1 Imaging device, imaging method, and printing device
09/29/1999EP0944851A1 Assembly of optical components optically aligned and method for making this assembly
09/29/1999EP0944708A1 Non-corrosive cleaning composition for removing plasma etching residues
09/29/1999EP0944482A1 Apparatus and method for recovering photoresist developers and strippers
09/29/1999EP0871607A4 Photosensitive intramolecular electron transfer compounds
09/29/1999EP0601203B1 Photosensitive resin composition
09/29/1999CN2341175Y Filter mounting device for color kinescope or color kinescope exposuring apparatus
09/29/1999CN1230263A Process for producing screen printing form and screen printing fabric of coated screen web
09/29/1999CN1230012A Method for generating direct drawing data for charged particle beam direct drawing, and method and apparatus for direct drawing
09/29/1999CN1229935A Superthin photo sensitive coating type sensitive plate, its making method and use
09/28/1999US5960225 Substrate treatment apparatus
09/28/1999US5959784 Optical projection systems and projection-exposure apparatus comprising same
09/28/1999US5959779 Laser irradiation apparatus
09/28/1999US5959732 Stage apparatus and a stage control method
09/28/1999US5959725 Large area energy beam intensity profiler
09/28/1999US5959721 Projection exposure apparatus and projection exposure method
09/28/1999US5959427 Method and apparatus for compensating for reaction forces in a stage assembly
09/28/1999US5959304 Semiconductor exposure apparatus
09/28/1999US5959011 Resist removing method, and curable pressure-sensitive adhesive, adhesive sheets and apparatus used for the method
09/28/1999US5958995 Blends containing photosensitive high performance aromatic ether curable polymers
09/28/1999US5958809 Fluorine-containing silica glass
09/28/1999US5958656 Pattern forming method using phase shift mask
09/28/1999US5958655 Mixture of alkali metal silicate, glycerin and nonionicfluorosurfactant
09/28/1999US5958654 Lithographic process and energy-sensitive material for use therein
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