| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/28/1999 | US5958652 Treating liquid for making a waterless planographic printing plate |
| 09/28/1999 | US5958651 Methods for providing artwork on plastic information discs |
| 09/28/1999 | US5958648 Radiation sensitive resin composition |
| 09/28/1999 | US5958646 Positive-working photosensitive composition and process for image formation |
| 09/28/1999 | US5958645 Radiation-sensitive resin composition |
| 09/28/1999 | US5958636 Pattern drawing method using charged particle beams |
| 09/28/1999 | US5958635 Masking for integrated circuits |
| 09/28/1999 | US5958632 Method of making mask pattern utilizing sizing dependent on mask material and mask formed through the method |
| 09/28/1999 | US5958626 Dividing pattern to be projected into plurality of blocks by parting lines including segments connected end-to-end so as to be non-linear |
| 09/28/1999 | US5958605 Passivating overcoat bilayer for multilayer reflective coatings for extreme ultraviolet lithography |
| 09/28/1999 | US5958579 Ink jet recording sheet |
| 09/28/1999 | US5958268 Removal of material by polarized radiation |
| 09/23/1999 | WO1999048192A1 Flat motor, stage, exposure apparatus and method of producing the same, and device and method for manufacturing the same |
| 09/23/1999 | WO1999048149A1 Stepper alignment mark formation with dual field oxide process |
| 09/23/1999 | WO1999048129A1 Tandem optical scanner/stepper and photoemission converter for electron beam lithography |
| 09/23/1999 | WO1999047981A1 METHOD OF PATTERNING SUB-0.25μ LINE FEATURES WITH HIGH TRANSMISSION, 'ATTENUATED' PHASE SHIFT MASKS |
| 09/23/1999 | WO1999047980A1 Method for manufacturing low work function surfaces |
| 09/23/1999 | WO1999047979A1 Developer and process for preparing flexographic printing forms |
| 09/23/1999 | WO1999047978A1 Method and apparatus for direct writing of semiconductor die using microcolumn array |
| 09/23/1999 | WO1999047977A1 Retaining device for photo blanks |
| 09/23/1999 | WO1999047976A1 Negative-working, dry planographic printing plate |
| 09/23/1999 | WO1999047975A1 Developer and process for preparing flexographic printing forms |
| 09/23/1999 | WO1999047571A1 Light-absorbing polymers and application thereof to antireflection film |
| 09/23/1999 | DE19912464A1 Exposure optics for illuminator with rod-shaped integrator |
| 09/23/1999 | DE19857094A1 Semiconductor device production process especially for forming fine resist pattern e.g. in LSI or LCD panel production |
| 09/23/1999 | DE19811331A1 Entwickler und Verfahren zur Herstellung von flexographischen Druckformen Developer and process for preparing flexographic printing forms |
| 09/23/1999 | DE19811330A1 Entwickler und Verfahren zur Herstellung von flexographischen Druckformen Developer and process for preparing flexographic printing forms |
| 09/23/1999 | DE19810055A1 Method for exposing an object, e.g. a photoresist layer to a substantially parallel light |
| 09/23/1999 | CA2288021A1 Method and apparatus for direct writing of semiconductor die using microcolumn array |
| 09/22/1999 | EP0943967A2 Surface protecting agent for lithographic printing plate |
| 09/22/1999 | EP0943966A1 Spot gloss film for color images |
| 09/22/1999 | EP0943965A1 Developer and method of producing flexographic printing forms |
| 09/22/1999 | EP0943964A1 Developer and method of producing flexographic printing forms |
| 09/22/1999 | EP0943963A2 Photoimageable compositions having improved stripping properties in aqueous alkaline solutions |
| 09/22/1999 | EP0943960A1 Thermographic imaging element |
| 09/22/1999 | EP0943959A1 Thermographic imaging element |
| 09/22/1999 | EP0943958A1 Thermographic imaging element |
| 09/22/1999 | EP0943957A1 Thermographic imaging element |
| 09/22/1999 | EP0943952A2 Display having viewable and conductive images |
| 09/22/1999 | EP0943586A2 Synthetic silica glass and its manufacturing method |
| 09/22/1999 | EP0943390A2 Multi-laser combustion surface treatment |
| 09/22/1999 | EP0943119A1 Reticle that compensates for lens error in a photolithographic system |
| 09/22/1999 | EP0942937A1 Photoinitiator mixtures containing acylphosphinoxides and benzophenone derivatives |
| 09/22/1999 | EP0907905A4 Process for modulating interferometric lithography patterns to record selected discrete patterns in photoresist |
| 09/22/1999 | EP0824720B1 Acid bleachable dye containing lithographic printing plate composition |
| 09/22/1999 | EP0793541B1 Nco-terminated vinyl telomers |
| 09/22/1999 | EP0536272B1 Image-forming process |
| 09/22/1999 | CN1229522A Detergent for lithography |
| 09/22/1999 | CN1229480A Radiation-sensitive resist composition with high heat resistance |
| 09/21/1999 | US5956192 Four mirror EUV projection optics |
| 09/21/1999 | US5956182 Projection optical system |
| 09/21/1999 | US5956174 Broad spectrum ultraviolet catadioptric imaging system |
| 09/21/1999 | US5956106 Illuminated display with light source destructuring and shaping device |
| 09/21/1999 | US5955776 Spherical shaped semiconductor integrated circuit |
| 09/21/1999 | US5955739 Surface position detection device |
| 09/21/1999 | US5955606 Photoresists of polyvinyllactams |
| 09/21/1999 | US5955570 Producing photoresist composition having a very low level of metal ions from novolak resins purified in a process using such an ion exchange pack. |
| 09/21/1999 | US5955245 Amidation to polyamic acid; imidation; evaporating solvent; coating; exposure to light |
| 09/21/1999 | US5955244 Method for forming photoresist features having reentrant profiles using a basic agent |
| 09/21/1999 | US5955243 Illumination optical system and method of manufacturing semiconductor devices |
| 09/21/1999 | US5955242 Providing on substrate coating consisting of polymer having pendant beta-hydroxy ester groups, exposing to radiation, developing positive lithographic pattern with aqueous base |
| 09/21/1999 | US5955241 Chemical-amplification-type negative resist composition and method for forming negative resist pattern |
| 09/21/1999 | US5955240 Positive resist composition |
| 09/21/1999 | US5955238 Waterless planographic printing plate and method of plate making using the same |
| 09/21/1999 | US5955237 Cationic cyanine dye sensitizer; cathode ray tubes; light emitting devices |
| 09/21/1999 | US5955227 Calculating intensity distribution of exposure light; processing qualification/disqualification data of optical image formation in semiconductors |
| 09/21/1999 | US5955221 Method and apparatus for fabrication of high gradient insulators with parallel surface conductors spaced less than one millimeter apart |
| 09/21/1999 | US5954982 Method and apparatus for efficiently heating semiconductor wafers or reticles |
| 09/21/1999 | US5954878 Apparatus for uniformly coating a substrate |
| 09/21/1999 | CA2140873C Process and element for making a relief image using an ir sensitive layer |
| 09/21/1999 | CA2140872C A flexographic printing element having an ir ablatable layer and process for making a flexographic printing plate |
| 09/19/1999 | CA2266150A1 Spot gloss film for color images |
| 09/18/1999 | CA2262257A1 Photoimageable compositions having improved stripping properties in aqueous alkaline solutions |
| 09/16/1999 | WO1999046848A1 Method of manufacturing linear motor, linear motor, stage provided with the linear motor, and exposure system |
| 09/16/1999 | WO1999046836A1 Wavelength system for an excimer laser |
| 09/16/1999 | WO1999046835A1 Ultraviolet laser apparatus and exposure apparatus comprising the ultraviolet laser apparatus |
| 09/16/1999 | WO1999046807A1 Scanning exposure method, scanning exposure apparatus and its manufacturing method, and device and its manufacturing method |
| 09/16/1999 | WO1999046644A1 Process for the continuous liquid processing of photosensitive compositions having reduced levels of residues |
| 09/16/1999 | WO1999046643A1 Method for exposure to a substantially parallel light |
| 09/16/1999 | WO1999046642A1 Two-sided imaging material |
| 09/16/1999 | DE19909722A1 Negative light-sensitive resin composition giving printing plate with deep nonprinting depth |
| 09/16/1999 | DE19810089A1 Doppelbrechende Plattenanordnung mit Spannungsdoppelbrechung Birefringent plate arrangement with stress birefringence |
| 09/16/1999 | DE19809055A1 Two-beam interferometer with phase mask of constant grating period used as beam splitter |
| 09/15/1999 | EP0942463A2 Method for stripping ion implanted photoresist layer |
| 09/15/1999 | EP0942457A2 Electrodeless lamp |
| 09/15/1999 | EP0942332A1 Exposure method and apparatus |
| 09/15/1999 | EP0942331A1 Antireflection or light-absorbing coating composition and polymer therefor |
| 09/15/1999 | EP0942330A1 Process for depositing and developing a plasma polymerized organosilicon photoresist film |
| 09/15/1999 | EP0942329A1 Novel process for preparing resists |
| 09/15/1999 | EP0942328A1 Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
| 09/15/1999 | EP0942327A1 Color filter |
| 09/15/1999 | EP0942326A1 Method for manufacturing a color filter and a liquid crystal panel |
| 09/15/1999 | EP0942325A2 Method and apparatus for removing a pellicle frame from a photomask plate |
| 09/15/1999 | EP0942300A2 Birefringent plate with stress-induced birefringence |
| 09/15/1999 | EP0941841A2 Method of lithographic imaging with reduced debris-generated performance degradation and related constructions |
| 09/15/1999 | EP0941502A1 Optical structures for diffusing light |
| 09/15/1999 | CN1228851A Alkysulfonyloximes for high-resolution I-line photoresists of high sensitivity |
| 09/15/1999 | CN1228546A Normal position synchronous photopolymerization photo-generating color imaging material composition and its preparing method and use |
| 09/15/1999 | CN1228410A Copolymer resin, preparation thereof, and photo resist using the same |
| 09/15/1999 | CN1045150C Method for manufacturing multilayer circuit board and manufactured multiplayer circuit board |