| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/25/2000 | US6054545 Modified cellulose compound and photopolymerizable resin composition containing the same |
| 04/25/2000 | US6054501 Curability; glossiness; can be blended with inks, paints |
| 04/25/2000 | US6054255 Surface treatment with silane compound; coating with photoresist; exposure to light; development |
| 04/25/2000 | US6054254 Coating with photoresists, exposure to light, development |
| 04/25/2000 | US6054253 Dip coating; heating; masking; exposure to ultraviolet radiation; dissolving residues in propanol |
| 04/25/2000 | US6054252 Negatives; dry film photoresist |
| 04/25/2000 | US6054251 Photopolymerizable composition |
| 04/25/2000 | US6054250 High temperature performance polymers for stereolithography |
| 04/25/2000 | US6054249 Photosensitive resin laminate, production method thereof and package thereof |
| 04/25/2000 | US6054248 Hydroxy-diisocyanate thermally cured undercoat for 193 nm lithography |
| 04/25/2000 | US6054247 Method for preparing an imaging element for making an improved printing plate according to the silver salt diffusion transfer process |
| 04/25/2000 | US6054034 Acrylic inner surfaces give rise to substantially reduced electroosmotic flow and/or adsorption under conditions of electrophoresis, as compared to native fused silica |
| 04/25/2000 | US6053241 Cooling method and apparatus for charged particle lenses and deflectors |
| 04/20/2000 | WO2000022662A1 Inhibition of titanium corrosion |
| 04/20/2000 | WO2000022656A1 Exposure system |
| 04/20/2000 | WO2000022481A1 A mixed solvent system for positive photoresists |
| 04/20/2000 | WO2000022376A1 Shape measuring method and shape measuring device, position control method, stage device, exposure apparatus and method for producing exposure apparatus, and device and method for manufacturing device |
| 04/20/2000 | WO2000021753A1 Printing mould and method for modifying its wetting characteristics |
| 04/20/2000 | WO2000021689A1 Microscale patterning and articles formed thereby |
| 04/20/2000 | WO1999067683A3 Optical system, especially a projection light facility for microlithography |
| 04/20/2000 | WO1999061653A3 Light-mediated regional analysis of biologic material |
| 04/20/2000 | DE19949478A1 Imaging element, e.g. silver halide photographic material, has electroconductive layer of sulfonated film-forming polyurethane binder and electroconductive polymer |
| 04/20/2000 | DE19946447A1 Particle-optical imaging system for lithographical purposes has lens arrangement with ring pre-electrode facing mask holder to form grid lens having negative refractive index with mask foil |
| 04/20/2000 | DE19942484A1 Inspection procedure for exposure of pattern data, involves computing error corresponding to predicted value of pattern width |
| 04/20/2000 | DE19847616A1 Polyvinylacetale mit Imidogruppen sowie die Verwendung derselben in lichtempfindlichen Zusammensetzungen Polyvinyl acetals with imido groups and the use thereof in photosensitive compositions |
| 04/20/2000 | DE19847305A1 Micromechanical device, especially an oscillating mirror, is produced by electrodepositing a device element onto a quasi-insular attachment region and an adjacent region of a bond layer |
| 04/20/2000 | DE19847033A1 Negativ arbeitendes, strahlungsempfindliches Gemisch zur Herstellung eines mit Wärme oder Infrarotlaser bebilderbaren Aufzeichnungsmaterials A negative-working radiation-sensitive mixture for the preparation of an imageable with heat or infrared laser recording material |
| 04/20/2000 | DE19845041A1 Production of photostructured layers on planar substrates used in the manufacture of sensors comprises using a screen printed layer with an added wet chemical structured binder |
| 04/19/2000 | EP0994393A1 Method and apparatus for producing a photopolymerizing lithographic plate |
| 04/19/2000 | EP0994392A2 Polymer for radiation-sensitive resist and resist composition containing the same |
| 04/19/2000 | EP0994391A1 Process for forming images on permanent substrates |
| 04/19/2000 | EP0994378A2 Proximity exposure method by oblique irradiation with light |
| 04/19/2000 | EP0994125A1 Method of generating a reactive species and applications thereof |
| 04/19/2000 | EP0993966A1 Negativ-working radiation-sensitive mixture for the production of a recording material which is imageable by heat or infrared laser beams |
| 04/19/2000 | EP0993692A1 Excimer laser with magnetic bearings supporting fan |
| 04/19/2000 | EP0993627A2 Device for transferring structures |
| 04/19/2000 | EP0993490A1 Method for producing fine pigment dispersions |
| 04/19/2000 | EP0993489A1 Pigment dispersions containing c.i. pigment red 222 |
| 04/19/2000 | EP0993445A1 New oxime sulfonates and the use thereof as latent sulfonic acids |
| 04/19/2000 | CN1251103A Photoactivatable nitrogen-contg. based on alpha-amino alkenes |
| 04/19/2000 | CN1250778A Novel monomer and its polymer used for anti-photoetching agent, and their compositions |
| 04/18/2000 | US6052626 Parametric analyzing method for calculating light intensity |
| 04/18/2000 | US6052238 Near-field scanning optical microscope having a sub-wavelength aperture array for enhanced light transmission |
| 04/18/2000 | US6052178 Method for aligning optical elements one another on V-groove substrate |
| 04/18/2000 | US6052173 Device for exposing the peripheral area of a wafer |
| 04/18/2000 | US6051844 Scanning system for rapid thermal cycle stress/curvature measurement |
| 04/18/2000 | US6051843 Exposure apparatus and method which synchronously moves the mask and the substrate to measure displacement |
| 04/18/2000 | US6051842 Illumination optical apparatus with optical integrator |
| 04/18/2000 | US6051841 Plasma focus high energy photon source |
| 04/18/2000 | US6051678 Copolymers containing N-vinyllactam derivatives, preparation methods thereof and photoresists therefrom |
| 04/18/2000 | US6051659 Dissolving a polymer having acid labile groups pendent to the polymer backbone in an acid stable solvent, heating with stirring, adding concentrated mineral acid to remove acid labile group from polymer, quenching and precipitating |
| 04/18/2000 | US6051625 Benzoin ethers of given formula which generate free radicals upon ultraviolet exposure, and free radical polymerizable poly(silsesquioxane-silicate-siloxane) containing vinylphenyl groups; storage stable, air or oxygen does not inhibit curing |
| 04/18/2000 | US6051371 Uniformly heating a substrate in a container containing heating plates and heat unifying plates; photolithographic processes on a semiconductor substrate such as a liquid crystal display |
| 04/18/2000 | US6051370 Radiation-sensitive mixture |
| 04/18/2000 | US6051369 Lithography process using one or more anti-reflective coating films and fabrication process using the lithography process |
| 04/18/2000 | US6051368 Radiation sensitive composition containing a dispersed phosphor |
| 04/18/2000 | US6051367 Comprising one or more addition-polymerizable ethylenically unsaturated compounds and a specific oxime ether compound; high sensitive to actinic rays ranging from ultraviolet to visible light, improved film strength |
| 04/18/2000 | US6051366 A photoresist mixture comprising a metallocene photoinitiator and an onium compound as a coinitiator; for use in printing plates |
| 04/18/2000 | US6051364 Polymeric dyes for antireflective coatings |
| 04/18/2000 | US6051362 An addition copolymer comprising an end-group silicon containing compound to be useful in arf excimer laser photolithography |
| 04/18/2000 | US6051361 Light sensitive composition and image forming material |
| 04/18/2000 | US6051360 Dyestuffs and resin compositions |
| 04/18/2000 | US6051358 Unsymetrical photoactive compound having at least 2 diazooxynaphthalenesulfonyloxy groups |
| 04/18/2000 | US6051349 Apparatus for coating resist and developing the coated resist |
| 04/18/2000 | US6051348 Method for detecting malfunction in photolithographic fabrication track |
| 04/18/2000 | US6051347 Application of e-beam proximity over-correction to compensate optical proximity effect in optical lithography process |
| 04/18/2000 | US6051344 Very small size patterns can be created even though a larger pattern starting reticle is used. |
| 04/18/2000 | US6051303 Semiconductor supporting device |
| 04/18/2000 | US6051282 Surface treatment of antireflective layer in chemical vapor deposition process |
| 04/18/2000 | CA2078731C Positional deviation measuring device and method thereof |
| 04/13/2000 | WO2000021123A1 METHOD FOR FORMING AN ANTIREFLECTING SiON FILM, NON-POLLUTING FOR LIGHT-SENSITIVE RESINS FOR FAR-ULTRAVIOLET RADIATION |
| 04/13/2000 | WO2000020927A1 Photosensitive polysilazane composition and method of forming patterned polysilazane film |
| 04/13/2000 | WO2000020926A1 Ionization radiation imageable photopolymer compositions |
| 04/13/2000 | WO2000020925A2 Silicon-containing alcohols and polymers having silicon-containing tertiary ester groups made therefrom |
| 04/13/2000 | WO2000020900A2 Silicon carbide for use as a low dielectric constant anti-reflective coating and its deposition method |
| 04/13/2000 | WO2000020517A2 Radiation-curable compositions comprising maleimide compounds and method for producing a substrate with a cured layer |
| 04/13/2000 | WO2000020222A1 Method for manufacture of electronic parts |
| 04/13/2000 | DE19947174A1 Mask holder with clamps on disc-shaped frame for exposure of semiconductor wafers in ion lithography |
| 04/13/2000 | DE19846529A1 Photopolymerisierbare Druckformen zur Herstellung von Reliefdruckplatten für den Druck mit UV-härtbaren Druckfarben Photopolymerizable printing plates for the production of relief printing plates for printing with UV-curable printing inks |
| 04/13/2000 | DE19841785A1 Verfahren zur Herstellung eines Körpers mit Mikrostrukturen aus thermisch aufgespritzem Material A process for the production of a body with microstructures of thermally aufgespritzem material |
| 04/13/2000 | CA2341978A1 Ionization radiation imageable photopolymer compositions |
| 04/12/2000 | EP0993024A2 Electrostatic chuck |
| 04/12/2000 | EP0992855A1 Apparatus for and method of projecting a mask pattern on a substrate |
| 04/12/2000 | EP0992854A1 Concentrate and aqueous developer for image-wise exposed recording materials |
| 04/12/2000 | EP0992853A2 Projection exposure apparatus, and device manufacturing method |
| 04/12/2000 | EP0992852A2 Pattern formation method and apparatus |
| 04/12/2000 | EP0992850A2 Planographic printing original plate |
| 04/12/2000 | EP0992849A1 Photopolymerizable printing forms for the production of relief printing plates suitable for printing with UV-curable printing inks |
| 04/12/2000 | EP0992848A1 Peel-apart photosensitive elements and their process of use |
| 04/12/2000 | EP0992847A1 Peel-apart photosensitive elements and their process of use |
| 04/12/2000 | EP0992846A1 Use of an ink jet image as prepress intermediate |
| 04/12/2000 | EP0992556A1 Coating liquid for forming silica-based film having low dielectric constant and substrate having film of low dielectric constant coated thereon |
| 04/12/2000 | EP0992342A2 Recording material comprising a carrier and a ceramic layer deposited on the surface of the carrier |
| 04/12/2000 | EP0992093A1 Wavelength system for an excimer laser |
| 04/12/2000 | EP0992092A1 Very narrow band laser with unstable resonance cavity |
| 04/12/2000 | EP0992053A2 Gated photocathode for controlled single and multiple electron beam emission |
| 04/12/2000 | EP0991983A1 Photoresist developer and method of development |
| 04/12/2000 | EP0991982A1 Transferring a programmable pattern by photon lithography |
| 04/12/2000 | EP0991981A1 Method of preparing a water-less lithographic printing form |
| 04/12/2000 | EP0991960A2 Optical system with anti-reflection coating |