Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/1999
10/21/1999CA2292572A1 Photoresist developer and method of development
10/21/1999CA2291697A1 Shaped shadow projection for an electron beam column
10/20/1999EP0951054A1 Aligner and method for exposure
10/20/1999EP0951051A2 A resist processing apparatus and a resist processing method
10/20/1999EP0951015A2 An optical or magneto-optic head and method of making the same
10/20/1999EP0950925A2 Plate making apparatus, printing method and printing apparatus, packing sheet material for printing plate material, and plate material placement method and apparatus
10/20/1999EP0950924A2 Lithographic projection apparatus
10/20/1999EP0950923A1 Photosensitive resin composition and flexographic resin plate
10/20/1999EP0950515A2 Heat-hardenable composition and planographic form plate using the composition
10/20/1999EP0950514A1 A heat mode sensitive imaging element for making positive working printing plates
10/20/1999EP0950513A1 A heat mode sensitive imaging element for making positive working printing plates
10/20/1999EP0950502A2 Three-dimensional object including an integral structural member, resin mold and manufacturing process
10/20/1999EP0950501A1 Process for manufacturing a welding rod for floor coverings and welding rod obtained
10/20/1999EP0950212A1 Method for controlling an exposure device
10/20/1999EP0949997A1 Wet lithographic printing constructions incorporating metallic inorganic layers
10/20/1999EP0949985A1 Powder blasting method using a non-metal blasting mask
10/20/1999CN1232552A Antireflective coating for photoresist compositions
10/20/1999CN1232551A Light sensitive composition contg. arylhydrazo dye
10/20/1999CN1232550A Bottom antireflective coatings contg. arylhydrazo dye
10/20/1999CN1232549A Photosensitive composition and use thereof
10/20/1999CN1232283A Method for forming red filter film in cathod ray tube
10/19/1999US5970317 Method of forming a filter for a solid-state image sensing device
10/19/1999US5970310 Method for manufacturing multilayer wiring board and wiring pattern forming apparatus
10/19/1999US5970082 Very narrow band laser
10/19/1999US5969882 Catadioptric optical system
10/19/1999US5969807 Method for measuring lens imaging uniformity
10/19/1999US5969803 Large NA projection lens for excimer laser lithographic systems
10/19/1999US5969802 Exposure apparatus
10/19/1999US5969801 Correction method and correction apparatus of mask pattern
10/19/1999US5969800 Scanning exposure apparatus and method
10/19/1999US5969799 Exposure apparatus with a pulsed laser
10/19/1999US5969441 Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
10/19/1999US5969051 Hydrophilic nitrile rubber
10/19/1999US5968871 Coating for heat exchanging
10/19/1999US5968848 Process for treating a lithographic substrate and a rinse solution for the treatment
10/19/1999US5968713 Alkali developed resists and film forming compounds with alkali soluble groups and generation
10/19/1999US5968712 Aliphatic amine complexes with photogenerated acid; enhanced resolution for relief images
10/19/1999US5968710 Silicon wafers with cresol-formaldehyde phenolic resin coatings
10/19/1999US5968693 Lens system with photoresists for latent images, interrogation and adjustment
10/19/1999US5968691 Method and apparatus for coating resist and developing the coated resist
10/19/1999US5968690 Thin film thickness and optimal focus measuring using reflectivity
10/19/1999US5968688 Resins and dyes for color filters
10/19/1999US5968686 Charged-beam exposure mask and charged-beam exposure method
10/19/1999US5968592 Depositing a resist coating on semiconductor wafers, spinning at speeds
10/19/1999US5968324 Stabilization of plasma enhanced vapor deposition process by adding a flow of inert gas to deposition gases to form thin antireflective film on semiconductor wafer
10/19/1999US5968272 Liquid applying apparatus and an image forming substance removing apparatus
10/19/1999US5968268 Coating apparatus and coating method
10/19/1999US5967159 Substrate conveying device and substrate conveying method
10/19/1999US5967048 Method and apparatus for the multiple imaging of a continuous web
10/14/1999WO1999052141A1 Method and apparatus for wafer processing, and method and apparatus for exposure
10/14/1999WO1999052134A1 Cold processes for cleaning and stripping photoresist from surfaces of semiconductor wafers
10/14/1999WO1999052130A1 Exposure method, exposure apparatus, method of producing the same, device, and method of fabricating the same
10/14/1999WO1999052018A1 Thin layer imaging process for microlithography using radiation at strongly attenuated wavelengths
10/14/1999WO1999052017A1 Liquid, radiation-curable composition, especially for stereolithography
10/14/1999WO1999052004A1 Projection exposure apparatus and method, and reflection refraction optical system
10/14/1999WO1999051796A1 Method for removing photoresist and plasma etch residues
10/14/1999WO1999051662A1 Polyimide compositions
10/14/1999WO1999051357A1 Energy emission system for photolithography
10/14/1999WO1999051356A1 Fluid nozzle system, energy emission system for photolithography and its method of manufacture
10/14/1999WO1999051355A1 Diffuser system and energy emission system for photolithography
10/14/1999WO1999042902A3 Reflective optical imaging systems with balanced distortion
10/14/1999DE19915572A1 Immersion lens for electron beam projection system
10/14/1999DE19913643A1 Production of lithographic printing plate with high resolution in room light, without waste liquor
10/14/1999DE19815978A1 Verfahren zur Herstellung von Klein- und Mikroteilen aus Keramik Process for the production of small and micro parts made of ceramic
10/14/1999DE19815130A1 Electroformed metal stamp, for defining nanostructures, is produced
10/13/1999EP0949730A2 Short pulse laser system
10/13/1999EP0949541A2 Lithography apparatus
10/13/1999EP0949540A1 Method for producing lithographic printing plate suitable for laser scan exposure, and photopolymerizable composition
10/13/1999EP0949539A2 Photosensitive resin composition
10/13/1999EP0948757A1 Method of contact printing on gold coated films
10/13/1999EP0948756A1 A method for reducing metal ion contaminants in photoresist compositions containing an organic polar solvent by ion exchange
10/13/1999EP0948553A1 Fractionated novolak resin from cresol-formaldehyde reaction mixture and photoresist composition therefrom
10/13/1999EP0948552A1 Isolation of novolak resin without high temperature distillation and photoresist composition therefrom
10/13/1999EP0948551A1 Fractionated novolak resin and photoresist composition therefrom
10/13/1999EP0916175A4 Electrostatic precipitator for a gas discharge laser
10/13/1999EP0840907B1 Screen for flat or rotary screen printing and method for its manufacturing
10/13/1999CN1045665C Light exposure mask for semiconductor device
10/12/1999US5966216 For use in aligning a mask and wafer in lithography
10/12/1999US5966215 Photolithographic alignment system
10/12/1999US5966202 Adjustable slit
10/12/1999US5966200 Charged particle beam exposure apparatus
10/12/1999US5965776 Photoinitiators for the photopolymerization of ethylenically unsaturated compounds
10/12/1999US5965330 Methods for fabricating annular mask lens having diffraction-reducing edges
10/12/1999US5965329 Method of manufacturing a developing agent bearing member
10/12/1999US5965328 Irradiating coating film with radiation through a mask, developing said coating film with an alkali developer solution, electroplating, peeling
10/12/1999US5965327 Method for manufacturing a master die for a diffusion plate and diffusion manufactured by said method
10/12/1999US5965325 Photoresist comprising an acid-generating copolymer of a vinylamine and iminosulfo-substituted styrene; positive images; semiconductors; integrated circuits
10/12/1999US5965324 Consists of pyrazoloazole methine or dimethine dyes with radical generating agent
10/12/1999US5965321 Having a photopolymerizable layer adjacent a second strippable substrate wherein the photosensitive layer has improved adhesion to the substrate following imagewise exposure to actinic radiation
10/12/1999US5965320 Forming a positive photoresist layer on a substrate using a mixture of alkali-soluble resin and a phenol ester of 1,2-naphthoquinone(2)-diazide-6-sulfonic acid as aphotosensitive agent, patterning and developing
10/12/1999US5965319 Comprises a an onium salt compound e.g. diazonium sulfonate, a crosslinking agent crosslinkable by an acid, a polymer compound having an alkaline-soluble group, and an infrared ray absorbing agent; lithography; form plates; storage stability;
10/12/1999US5965310 Process of patterning photo resist layer extending over step of underlying layer without deformation of pattern
10/12/1999US5965309 Focus or exposure dose parameter control system using tone reversing patterns
10/12/1999US5965308 Method of controlling exposure
10/12/1999US5965306 Analyzing process conditions causing features close to the defects to be printed fall within a critical dimension tolerance, assigning a critical dimension error to defects, comparing two values to determine if repair will be necessary
10/12/1999US5965305 Method for surface modification to create regions resistant to adsorption of biomolecules
10/12/1999US5965209 Liquid application method and application apparatus
10/12/1999US5965200 Processing apparatus and processing method
10/12/1999US5965079 Method and apparatus for making a three-dimensional object by stereolithography
10/12/1999US5964951 Rinsing solution
1 ... 997 998 999 1000 1001 1002 1003 1004 1005 1006 1007 1008 1009 1010 1011 1012 1013 1014 1015 1016 1017 ... 1272