| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/29/2000 | US6030712 Printing plate materials and a method of producing the same |
| 02/29/2000 | US6030707 Display substrate, conductor, and insulator |
| 02/29/2000 | US6030266 Process and apparatus for the formation of patterns in a photoresist by continuous laser irradiation, application to the production of microtips emissive cathode electron sources and flat display screens |
| 02/29/2000 | US6030070 Direct electrostatic printing method and apparatus |
| 02/24/2000 | WO2000010242A1 Compact planar motor having multiple degrees of freedom |
| 02/24/2000 | WO2000010058A1 Reaction force isolation system for a planar motor |
| 02/24/2000 | WO2000010057A1 Single component developer for copolymer resists |
| 02/24/2000 | WO2000010056A1 Photoacid generators and photoresists comprising same |
| 02/24/2000 | WO2000009572A1 Polymerisation and/or crosslinking method under electron beam and/or gamma radiation |
| 02/24/2000 | WO2000009477A1 Unsaturated oligophenol cyanates |
| 02/24/2000 | WO2000002236A3 Radio frequency identification system and method for tracking silicon wafers |
| 02/24/2000 | WO1999057732A9 Lighting system, especially for extreme ultraviolet lithography |
| 02/24/2000 | DE19939088A1 Exposure apparatus, especially in photolithography for producing e.g. semiconductor devices, chips and thin film magnetic heads, has a projection system with refractive optical components of different crystalline fluorides |
| 02/24/2000 | DE19938850A1 (Meth)acryloyl-based photosensitive composition for sandblasting contains alkali-soluble compound |
| 02/24/2000 | DE19938796A1 Light activated composition used to prepare chemically amplified photoresists, etc., includes a photoinitiator which will generate an acid when exposed to light at 240-390 nm |
| 02/24/2000 | CA2339899A1 Polymerisation and/or crosslinking method under electron beam and/or gamma radiation |
| 02/23/2000 | EP0981168A2 Semiconductor micro-optical components and method for producing them |
| 02/23/2000 | EP0980581A1 Blue and ultraviolet photolithography with organic light emitting devices |
| 02/23/2000 | EP0980542A1 Method of patterning sub-0.25 lambda line features with high transmission, "attenuated" phase shift masks |
| 02/23/2000 | EP0980541A1 Method and apparatus for direct writing of semiconductor die using microcolumn array |
| 02/23/2000 | EP0980393A1 Biradical photoinitiators |
| 02/23/2000 | EP0980364A1 Process for preparing coumarin sulfonates |
| 02/23/2000 | CN1245565A Method and apparatus for production of structure by focused laser radiation on photosensitively coated substrate |
| 02/23/2000 | CN1245300A Photosensitive composition for sand milling and photosensitive film laminate containing same |
| 02/23/2000 | CN1245181A Composition for manufacturing circuit element and printed circuit board |
| 02/22/2000 | US6028880 Automatic fluorine control system |
| 02/22/2000 | US6028879 Narrow band laser with etalon based output coupler |
| 02/22/2000 | US6028872 High pulse rate pulse power system with resonant power supply |
| 02/22/2000 | US6028660 Illumination unit for an optical apparatus |
| 02/22/2000 | US6028659 Scanning projection-exposure apparatus and methods |
| 02/22/2000 | US6028376 Positioning apparatus and exposure apparatus using the same |
| 02/22/2000 | US6028288 Laser beam machine and liquid crystal display device fabrication method using the machine |
| 02/22/2000 | US6028154 Terpolymers containing organosilicon side chains |
| 02/22/2000 | US6028153 Copolymer resin of maleimide and alicyclic olefin-based monomers, photoresist containing the copolymer resin and the preparation thereof |
| 02/22/2000 | US6027865 Patterning photoresist layer by selective exposure through mask to light illuminating through a two-third optical aperture stop and/or a quadra pole aperture stop, development |
| 02/22/2000 | US6027860 Method for forming a structure using redeposition of etchable layer |
| 02/22/2000 | US6027859 Semiconductor substrate having extended scribe line test structure and method of fabrication thereof |
| 02/22/2000 | US6027858 Laminating to substrate having plated through holes (pth) a curable epoxy resin dielectric (pid) film supported by a polyester film which is peeled away prior to final baking, developing, patterning, curing of structure |
| 02/22/2000 | US6027857 Negative-acting no-process printing plates |
| 02/22/2000 | US6027856 Film forming mixture comprising alkali-soluble polymer, a photoacid generator and an allyl alcohol which becomes a protecting group for alkali-soluble polymer moieties when photoacid generator decomposes upon exposure to radiation |
| 02/22/2000 | US6027854 Polymers chemically amplified positive resist compositions, and patterning method |
| 02/22/2000 | US6027853 Process for preparing a radiation-sensitive composition |
| 02/22/2000 | US6027852 Article having a light-controllable super-water-repellent surface and a printing machine using the article |
| 02/22/2000 | US6027851 Method for preparing an aluminum foil for use as a support in lithographic printing plates |
| 02/22/2000 | US6027849 Substrate coated with photosensitive layer comprising a radiation absorbing material and polyglycidyl azide capable solvent-free relief image development; printing plates |
| 02/22/2000 | US6027843 Charged-particle-beam microlithography methods including correction of imaging faults |
| 02/22/2000 | US6027842 Process for controlling etching parameters |
| 02/22/2000 | US6027839 Transferring pattern images through a mix-and-match exposure system, which achieves good overlay accuracy; wafer alignment is carried out at each group of narrow image fields corresponding to a wide image field; photolithography |
| 02/22/2000 | US6027760 Photoresist coating process control with solvent vapor sensor |
| 02/22/2000 | US6027682 Forming successive cross-sections of the object from a material which is normally solid but which is made flowable, using data manipulation for converting three-dimentional object representation into cross-sectional representations |
| 02/22/2000 | US6027595 Stamping liquid photoresist; providing the liquid photoresist on a substrate opposite a side of the liquid photoresist contacting the stamp; solidifying; removing the stamp and simultaneously etching photoresist and substrate |
| 02/22/2000 | US6027324 Apparatus for production of three dimensional objects by stereolithography |
| 02/22/2000 | US6027262 Resist process method and system |
| 02/22/2000 | US6026986 Chemical spray system and waste liquid tank used in same |
| 02/18/2000 | CA2280365A1 Sulfonyloximes for i-line photoresists of high sensitivity and high resist thickness |
| 02/17/2000 | WO2000008672A1 Long-life electrode for high pressure discharge lamp |
| 02/17/2000 | WO2000008526A1 Diffractive element in extreme-uv lithography condenser |
| 02/17/2000 | WO2000008525A1 Radiation-sensitive composition of chemical amplification type |
| 02/17/2000 | WO1999060156A3 Method and device for photolithographic production of dna, pna and protein chips |
| 02/17/2000 | WO1999050874A3 Gated photocathode for controlled single and multiple electron beam emission |
| 02/17/2000 | DE19937132A1 Photoconductor used in electrophotography, e.g. copier or printer, comprises metal carboxylate derived from naphth-1-yl-substituted arenecarboxylic acid, optionally with stilbenyl or hydrazonyl group |
| 02/17/2000 | DE19915899A1 Production of a semiconductor device used in the manufacture of LSI semiconductors and liquid crystal displays comprises a multistep process forming a hyperfine pattern on the semiconductor base component |
| 02/17/2000 | DE19836173A1 Vacuum frame for copying film material onto printing plates comprises baseplate with applied elastic, airtight locating and sealed transparent glass plate |
| 02/17/2000 | DE19518185C2 Verfahren zur Agglomeratstrahl-Mikrostrukturierung Process for microstructuring Agglomeratstrahl |
| 02/17/2000 | CA2304210A1 Long-life electrode for high pressure discharge lamp |
| 02/16/2000 | EP0980026A1 Dry image forming material and dry image forming method |
| 02/16/2000 | EP0980025A1 Hologram recording material composition, hologram recording medium, and process for producing the same. |
| 02/16/2000 | EP0979815A1 Unsaturated oligophenolcyanates |
| 02/16/2000 | EP0979525A2 Use of sacrificial masking layer and backside exposure in forming openings that typically receive light-emissive material, and associated light-emitting structure |
| 02/16/2000 | EP0979426A4 Holographic patterning method and tool for production environments |
| 02/16/2000 | EP0979426A1 Holographic patterning method and tool for production environments |
| 02/16/2000 | EP0847545B1 Process for improving the contrast in the structuring of 3-dimensional surfaces |
| 02/16/2000 | EP0654151B1 Process and element for making a relief image using an ir sensitive layer |
| 02/16/2000 | CN1244930A Method for reducing metal in contaminants in photoresist compositions containing an organic polar solvent by ion exchange |
| 02/16/2000 | CN1244877A Fractionated novolak resin and photoresist composition therefrom |
| 02/16/2000 | CN1244876A Isolation of novolak resin without high temperature distillation and photoresist composition therefrom |
| 02/16/2000 | CN1244875A Fractionated novolak resin from cresol-formaldehyde reaction mixture and photo resist composition therefrom |
| 02/16/2000 | CN1244723A Method for producing semiconductor device and semiconductor device |
| 02/15/2000 | US6025955 Optical member for photolithography, method for evaluating optical member, and photolithography apparatus |
| 02/15/2000 | US6025951 Light modulating microdevice and method |
| 02/15/2000 | US6025938 Beam homogenizer |
| 02/15/2000 | US6025867 Method and a device for retaining a thin medium between two bodies |
| 02/15/2000 | US6025688 Alignment apparatus |
| 02/15/2000 | US6025658 Linear motor, and stage apparatus and exposure apparatus using the same |
| 02/15/2000 | US6025461 Photosensitive polyimide |
| 02/15/2000 | US6025406 An iodonium salt; a visible light sensitizer; and an electron donor compound |
| 02/15/2000 | US6025122 Heat-developable photographic materials |
| 02/15/2000 | US6025118 Selectively exposing glass substrate coated with layers of positive photoresist and of alkali material to writing light beam in environment with sufficient humidity that water condenses on said coating, developing and removing it |
| 02/15/2000 | US6025117 Using polysilane copolymer or dendrimer film pattern as mask for etching insulating or conducting layer on substrate |
| 02/15/2000 | US6025115 Selectively irradiating surface of substrate with light in gas atmosphere to form surface-modified layer, annealing to stabilize and make more etch resistant, dry etching non-modified portion |
| 02/15/2000 | US6025114 Liquid photocurable compositions |
| 02/15/2000 | US6025113 Photosensitve polymide precursor and its use for pattern formation |
| 02/15/2000 | US6025112 Photocurable composition and photosensitive capsules |
| 02/15/2000 | US6025099 Exposure of photoresists on substrates to form images |
| 02/15/2000 | US6025098 Photosensitive composition and photosensitive rubber plate |
| 02/15/2000 | US6025097 Method for creating a color filter layer on a field emission display screen structure |
| 02/15/2000 | US6024887 Useful for stripping from semiconductor substrates ion implanted patterned photoresist layers |
| 02/15/2000 | CA2028851C Preparation and reproduction of filters and preparation of filter photographic materials |
| 02/10/2000 | WO2000007220A2 Wet processing methods for the manufacture of electronic components using ozonated process fluids |
| 02/10/2000 | WO2000007071A1 Colour changing composition and colouring polymeric articles made therefrom |