| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/29/1999 | EP0967525A2 Lithographic projection apparatus |
| 12/29/1999 | EP0967524A2 Projection exposure method and apparatus |
| 12/29/1999 | EP0967523A1 Photosensitive resin composition, method for producing photosensitive resin compsition, and printing plate material |
| 12/29/1999 | EP0967522A1 Positive photosensitive resin composition |
| 12/29/1999 | EP0966355A1 Method of imaging lithographic printing plates with high intensity laser |
| 12/29/1999 | EP0966354A1 Lithographic printing plates with a sol-gel layer |
| 12/29/1999 | EP0823070B1 Negative-acting no-process printing plates |
| 12/28/1999 | US6009144 X-ray system and X-ray exposure apparatus |
| 12/28/1999 | US6009143 Mirror for providing selective exposure in X-ray lithography |
| 12/28/1999 | US6008904 Apparatus and methods for detecting and correcting distortion of interference fringes |
| 12/28/1999 | US6008885 Scanning exposure apparatus |
| 12/28/1999 | US6008884 Projection lens system and apparatus |
| 12/28/1999 | US6008883 Apparatus and method for exposure |
| 12/28/1999 | US6008882 Stage device, method of controlling same, and exposure apparatus using said stage device |
| 12/28/1999 | US6008880 Exposure tool and method capable of correcting high (N-TH) order light exposure errors depending upon an interfield coordinate |
| 12/28/1999 | US6008610 Position control apparatus for fine stages carried by a coarse stage on a high-precision scanning positioning system |
| 12/28/1999 | US6008500 Exposure apparatus having dynamically isolated reaction frame |
| 12/28/1999 | US6008498 Charged particle beam apparatus and method of using the same |
| 12/28/1999 | US6008497 Laser appartus |
| 12/28/1999 | US6008495 Electron beam exposure device |
| 12/28/1999 | US6008268 A photoreactor compound comprising a wavelength-specific sensitizer moiety covalently bonded to two reactive species-generating photoinitiator moieties; photopolymerization; photocuring; low-energy lamps |
| 12/28/1999 | US6008267 Polyionic polymeric compounds, process of preparing same and use thereof as photoinitiators |
| 12/28/1999 | US6008266 Includes an epoxy monomer of given formula which is curable using actinic radiation and incorporates a cleavable acetal linkage which renders the cured epoxy formulations soluble in dilute acid, to allow recovery following cure |
| 12/28/1999 | US6008265 Fluorinated ionic sulfonylimides and sulfonylmethylides, process of preparing same and use thereof as photoinitiators |
| 12/28/1999 | US6008126 Membrane dielectric isolation IC fabrication |
| 12/28/1999 | US6008105 Method of planarizing an insulator film using multiple etching steps |
| 12/28/1999 | US6008101 Laser processing method of semiconductor device |
| 12/28/1999 | US6008060 Detecting registration marks with a low energy electron beam |
| 12/28/1999 | US6007970 Polyethylene glycol (propylene glycol) polymer as surfactant |
| 12/28/1999 | US6007969 Ultra-fine microfabrication method using an energy beam |
| 12/28/1999 | US6007968 Method for forming features using frequency doubling hybrid resist and device formed thereby |
| 12/28/1999 | US6007967 Positioning image bearing transparency adjacent to but at afixed distance from photocurable layer to define a gap, exposing to actinic radiation; also including a phosphine oxygen scavenger |
| 12/28/1999 | US6007966 Polymeric binder containing styrene-maleic anhydride copolymer, unsaturated compound containing at least one hydroxyl group and at least three acrylic groups and a saturated alcohol |
| 12/28/1999 | US6007965 Photopolymerizable compositions including squarylium compounds |
| 12/28/1999 | US6007964 Photosensitive layer containing polymer with side chain having sulfonate groupand an acid generating compound |
| 12/28/1999 | US6007963 Method for extreme ultraviolet lithography |
| 12/28/1999 | US6007961 Radiation-sensitive resin composition |
| 12/28/1999 | US6007953 Method of avoiding peeling on wafer edge and mark number |
| 12/28/1999 | US6007888 Directed energy assisted in vacuo micro embossing |
| 12/28/1999 | US6007877 Aqueous developable high performance photosensitive curable aromatic ether polymers |
| 12/28/1999 | US6007874 Preparing first, second, and third fluids such that first solute is incompatible with second and third solutes and such that first fluid minimizes strikethrough of at least one of second and third fluids to a slide surface; flowing, coating |
| 12/28/1999 | US6007671 Having a vacuum chamber where part of an inside wall is silicon oxide; controlling the temperature of the silicon dioxide to prevent hydrogen atoms from deposit and recombining on the internal wall |
| 12/28/1999 | US6007629 Substrate processing apparatus |
| 12/28/1999 | US6007324 Double layer method for fabricating a rim type attenuating phase shifting mask |
| 12/28/1999 | US6006919 Storage container for precision substrates and a positioning mechanism therefor and a method of positioning the storage container for precision substrates |
| 12/28/1999 | US6006764 Method of stripping photoresist from Al bonding pads that prevents corrosion |
| 12/28/1999 | CA2132064C Vinyl ether compounds having additional functional groups other than vinyl ether groups and the use thereof in the formulation of curable compositions |
| 12/28/1999 | CA2070258C Photosensitive compositions |
| 12/28/1999 | CA2018988C Photoresist |
| 12/23/1999 | WO1999066542A1 Exposure method and exposure apparatus |
| 12/23/1999 | WO1999066530A1 Method and device for correcting proximity effects |
| 12/23/1999 | WO1999066370A1 Method for producing mask |
| 12/23/1999 | WO1999066301A1 Method for determining optical aberrations in a photorepeater for photolithography |
| 12/23/1999 | WO1999065839A1 Alkaline water-based solution for cleaning metallized microelectronic workpieces and methods of using same |
| 12/23/1999 | WO1999065837A1 Li2O-Al2O3-SiO2 TYPE TRANSPARENT CRYSTALLIZED GLASS |
| 12/23/1999 | WO1999065803A1 Automated opening and closing of ultra clean storage containers |
| 12/23/1999 | DE19927995A1 Photographic mask material and mask, useful in printed circuit and liquid crystal display manufacture |
| 12/23/1999 | DE19827603A1 Projection light exposure system for microlithography |
| 12/23/1999 | DE19827602A1 Verfahren zur Korrektur nicht-rotationssymmetrischer Bildfehler A method of correcting non-rotationally symmetric aberrations |
| 12/23/1999 | DE19822453A1 Method of absolute testing of aspherical surfaces using computer generated diffractive elements |
| 12/22/1999 | EP0965889A2 Overlay measurement technique using moire patterns |
| 12/22/1999 | EP0965888A2 Lithography apparatus |
| 12/22/1999 | EP0965887A1 Photosensitive lithographic printing plate |
| 12/22/1999 | EP0965886A1 Silver halide light-sensitive material comprising support, hardening layer and light-sensitive layer |
| 12/22/1999 | EP0965885A1 Inorganic-containing photosensitive resin composition and method for forming inorganic pattern |
| 12/22/1999 | EP0965884A2 Phase shift mask and methods of manufacture |
| 12/22/1999 | EP0965871A1 Method for correcting rotationally asymmetric imaging aberrations |
| 12/22/1999 | EP0965865A1 Nanoparticles in color filter arrays |
| 12/22/1999 | EP0965823A2 Method for analyzing light intensity distribution |
| 12/22/1999 | EP0965618A1 Photo-curable composition and photo-cured product |
| 12/22/1999 | EP0965068A1 Photosensitive quinolone compounds and a process of preparation |
| 12/22/1999 | EP0965067A1 Positive photoresists containing novel photoactive compounds |
| 12/22/1999 | EP0868684B1 A mixed solvent system for positive photoresists |
| 12/22/1999 | EP0796172B1 On-press developable printing plates with hydrogen bond forming developability stabilizer |
| 12/22/1999 | CN2355343Y Apparatus for coating photosensitive material onto dual PS plates |
| 12/22/1999 | CN1239557A Antireflection or light-absorbing coating compsn. and polymer therefor |
| 12/22/1999 | CN1239556A Novel process for preparing resists |
| 12/22/1999 | CN1239543A Spherical shaped semiconductor integrated circuit |
| 12/22/1999 | CN1239322A Overlay measurement technique using moive patterns |
| 12/21/1999 | US6005910 Holding mechanism, and exposure apparatus using the mechanism |
| 12/21/1999 | US6005879 Pulse energy control for excimer laser |
| 12/21/1999 | US6005760 Combination current sensor and relay |
| 12/21/1999 | US6005666 Apparatus for and method of optical inspection in total internal reflection holographic imaging system |
| 12/21/1999 | US6005295 Semiconductor device and manufacturing method therefor |
| 12/21/1999 | US6005250 Illumination deflection system for E-beam projection |
| 12/21/1999 | US6004734 Circuit board substrate for use in fabricating a circuit board on which is formed a light sensitive emulsion layer covering and in direct contact with photoresist |
| 12/21/1999 | US6004730 Method of forming an insulating film pattern and photosensitive composition |
| 12/21/1999 | US6004729 Increasing a surface roughness |
| 12/21/1999 | US6004727 Method of making a lithographic printing plate |
| 12/21/1999 | US6004726 Method of forming a lithographic pattern utilizing charged beam particles between 0.1 and 5.0 ev |
| 12/21/1999 | US6004725 Improved adhesion and resolution, negative acting, acrylate functional isocyanate trimer |
| 12/21/1999 | US6004724 Oxime sulfonates and the use thereof as latent sulfonic acids |
| 12/21/1999 | US6004722 Polyorthoaminophenol organic polymer material. |
| 12/21/1999 | US6004721 Positive photoresist composition |
| 12/21/1999 | US6004720 Excimer laser lithography, copolymer of adamantyl methacrylate and tert-butyl acrylate for example |
| 12/21/1999 | US6004719 Imaging medium and process for producing an image |
| 12/21/1999 | US6004706 Focus and exposure parameters controlled in lithographic process for manufacturing microelectronics by creating a complementary tone pattern of shapes and spaces in a resist film on a substrate |
| 12/21/1999 | US6004705 Photosensitive ceramics green sheet |
| 12/21/1999 | US6004703 Metal substrate having periodic transmission area having period for selectively transmitting light and nontransmission area and piezo-electric transducer located on nontransmission area of the metal for changing period |
| 12/21/1999 | US6004396 Spherical shaped semiconductor integrated circuit |