| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/09/2000 | US6060684 Laser beam machine with mode conversion |
| 05/09/2000 | US6060581 Self-photosensitive polyimide having a benzophenone moiety and an active hydrogen moiety, and a liquid crystal display having the alignment layer formed of the optical alignment composition |
| 05/09/2000 | US6060368 Mask pattern correction method |
| 05/09/2000 | US6060224 Replacing the mask used in a conventional scanning projection lithography system with a two-dimensional array of micromirrors that are used to produce a circuit pattern on a semiconductor wafer |
| 05/09/2000 | US6060216 Photosensitive resin composition and photosensitive element using the same |
| 05/09/2000 | US6060215 Photosensitive resin composition and application of its photosensitivity |
| 05/09/2000 | US6060214 Comprising ethylenically unsaturated photopolymerizable liquid plasticizer, a particulate, thermoplastic resin dispersed in the plasticizer, a tertiary amine stabilizer and a photoinitiator |
| 05/09/2000 | US6060213 Positive-working photosensitive composition |
| 05/09/2000 | US6060212 193 nm positive-working photoresist composition |
| 05/09/2000 | US6060211 Image-forming material and its preparation method |
| 05/09/2000 | US6060210 Varnishing film and method of adjusting the surface gloss of prepress color proof using the same |
| 05/09/2000 | US6060209 Process for making lithographic printing plate and processing solution to be used in the same |
| 05/09/2000 | US6060207 Photosensitive material |
| 05/09/2000 | US6060121 Microcontact printing of catalytic colloids |
| 05/09/2000 | US6059981 Fiducial marks for charged-particle-beam exposure apparatus and methods for forming same |
| 05/09/2000 | US6059919 Film-stripping process |
| 05/09/2000 | US6059880 Coating apparatus |
| 05/09/2000 | US6059507 Substrate processing apparatus with small batch load lock |
| 05/09/2000 | US6058841 Planographic printing |
| 05/09/2000 | US6058839 Computerized cutting method and apparatus for use in printing operations |
| 05/09/2000 | US6058621 Apparatus and method for drying photosensitive material using radiant heat and air flow passages |
| 05/09/2000 | CA2050931C Preparation of a flexographic relief printing plate |
| 05/04/2000 | WO2000025352A1 Stage device, exposure system, method of device manufacture, and device |
| 05/04/2000 | WO2000025343A1 Raster scan gaussian beam writing strategy and method for pattern generation |
| 05/04/2000 | WO2000025322A1 Shaped source of soft x-ray, extreme ultraviolet and ultraviolet radiation |
| 05/04/2000 | WO2000025181A1 Method for fabricating semiconductor device and method for forming mask suitable therefor |
| 05/04/2000 | WO2000025180A1 Photosensitive material employing microcapsules containing a hygroscopic polymer in the internal phase |
| 05/04/2000 | WO2000025179A1 Photosensitive material employing microcapsules and superabsorbent polymer |
| 05/04/2000 | WO2000025178A2 Photoresists and processes for microlithography |
| 05/04/2000 | WO2000025153A2 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices |
| 05/04/2000 | DE19945349A1 Preventing droplet dripping from discharge of electric valve for semiconductor wafer coating with liq. |
| 05/04/2000 | DE19936626A1 Resist remover used in composition used for removing resist, e.g. in lithographic process in semiconductor device manufacture, contains alkoxy-N-hydroxyalkylalkanamide |
| 05/04/2000 | DE19840926A1 Verfahren und Anordnung zur Materialbearbeitung mittels Laserstrahlen Method and apparatus for material processing by laser beams |
| 05/04/2000 | CA2316302A1 Raster scan gaussian beam writing strategy and method for pattern generation |
| 05/03/2000 | EP0997994A1 Method for manufacturing diffraction gratings and semiconductor laser |
| 05/03/2000 | EP0997782A1 Reticle having mark for detecting alignment and method for detected alignment |
| 05/03/2000 | EP0997781A1 Exposure method |
| 05/03/2000 | EP0997780A1 Exposure method |
| 05/03/2000 | EP0997779A1 Exposure method and x-ray mask structure for use with the same |
| 05/03/2000 | EP0997778A2 Optical member and projection optical system for photolithography using the same |
| 05/03/2000 | EP0997777A1 Photosensitive polymer composition, method for forming relief patterns, and electronic parts |
| 05/03/2000 | EP0997761A1 Optical device, method of cleaning the same, projection aligner, and method of producing the same |
| 05/03/2000 | EP0997488A1 Polybenzoxazole resin and precursor thereof |
| 05/03/2000 | EP0997272A1 A heat mode sensitive imaging element for making positive working printing plates |
| 05/03/2000 | EP0996968A1 Method and device for treating two-dimensional substrates, especially silicon slices (wafers), for producing microelectronic components |
| 05/03/2000 | EP0996871A1 High efficiency laser pattern generator |
| 05/03/2000 | EP0996870A1 Improved dissolution inhibition resists for microlithography |
| 05/03/2000 | EP0996869A1 Pattern-forming methods and radiation sensitive materials |
| 05/03/2000 | EP0996544A1 Pattern formation |
| 05/03/2000 | EP0902729B1 Process and device for coating disc-shaped data storage media |
| 05/03/2000 | CN1252138A Ternary photoinitiator system for curing of epoxy resins |
| 05/03/2000 | CN1252137A Ternary photoinitiator system for curing of epoxy/polyol resin compositions |
| 05/03/2000 | CN1252136A Photocurable resin composition |
| 05/03/2000 | CN1252135A Highly transparent, color-pigmented high molecular weight material |
| 05/02/2000 | US6058203 Correction method and correction apparatus of mask pattern |
| 05/02/2000 | US6057970 Apparatus for enhancing depth of focus using birefringent material |
| 05/02/2000 | US6057921 Two piece mirror arrangement for interferometrically controlled stage |
| 05/02/2000 | US6057914 Method for detecting and identifying a lens aberration by measurement of sidewall angles by atomic force microscopy |
| 05/02/2000 | US6057908 Exposure condition measurement method |
| 05/02/2000 | US6057907 Method of and system for exposing pattern on object by charged particle beam |
| 05/02/2000 | US6057587 Semiconductor device with anti-reflective structure |
| 05/02/2000 | US6057402 Blend of cycloaliphatic epoxy resins, cyanate esters, lewis acid catalyst and flexibility modifier |
| 05/02/2000 | US6057380 Photogeneration of amines from α-aminoacetophenones |
| 05/02/2000 | US6057084 Controlled amine poisoning for reduced shrinkage of features formed in photoresist |
| 05/02/2000 | US6057083 Polymers and photoresist compositions |
| 05/02/2000 | US6057081 Process for manufacturing semiconductor integrated circuit device |
| 05/02/2000 | US6057080 Top antireflective coating film |
| 05/02/2000 | US6057079 Dry film photoresist construction suitable for rolling up on itself |
| 05/02/2000 | US6057078 Polyborane photoinitiators and borate photoinitiators from polyboranes |
| 05/02/2000 | US6057077 Method for producing a positive or negative color-proof using the same materials |
| 05/02/2000 | US6057065 Lithographic system having diffraction grating and attenuated phase shifters |
| 05/02/2000 | US6056828 Holding by suction; switching to select support; unloading |
| 05/02/2000 | US6056544 Apparatus for baking resists on semiconductor wafers |
| 05/02/2000 | US6055995 Semiconductor manufacture apparatus |
| 05/02/2000 | US6055742 Reticle cleaning apparatus for wafer exposure system |
| 04/27/2000 | WO2000024057A1 Method of manufacturing a semiconductor device in a silicon body, a surface of said silicon body being provided with a grating and an at least partially recessed oxide pattern |
| 04/27/2000 | WO2000024048A1 Method of etching patterned layers useful as masking during subsequent etching or for damascene structures |
| 04/27/2000 | WO2000024029A1 X-ray irradiation apparatus including an x-ray source provided with a capillary optical system |
| 04/27/2000 | WO2000023851A1 A printing stencil and a method for preparation thereof |
| 04/27/2000 | WO2000023850A1 Radiation-sensitive resin composition |
| 04/27/2000 | WO2000023840A1 Near field optical scanning system employing microfabricated solid immersion lens |
| 04/27/2000 | WO1999067097A3 Thermal lithographic printing plate |
| 04/27/2000 | DE19940752A1 Use of an illumination matrix that can be controlled to generate a freely adjustable illumination pattern to produce a microchip |
| 04/26/2000 | EP0996143A2 Technique for reducing pattern placement error in projection electron-beam lithography |
| 04/26/2000 | EP0996037A2 Polyvinyl acetals having imido groups and use thereof in photosensitive compositions |
| 04/26/2000 | EP0995765A1 Process for producing epoxy ester resins and photosensitive resin compositions containing them |
| 04/26/2000 | EP0995243A1 Wavelength reference for excimer laser |
| 04/26/2000 | EP0995148A1 Method for producing active or passive components on a polymer basis for integrated optical devices |
| 04/26/2000 | EP0995144A1 Anamorphic scan lens for laser scanner |
| 04/26/2000 | EP0995143A1 Chevron error correction and autofocus optics for laser scanner |
| 04/26/2000 | EP0784543B1 Lithographic surface or thin layer modification |
| 04/26/2000 | CN1251584A Photoactive coumarin derivatives |
| 04/26/2000 | CN1051869C Improved photoetching glue for cathod ray tube and preparation method |
| 04/25/2000 | US6055107 Diffractive lens and preparation method thereof |
| 04/25/2000 | US6055045 Method for characterizing a photorepeater |
| 04/25/2000 | US6055039 Illumination system and exposure apparatus using the same |
| 04/25/2000 | US6055038 Exposure system and method of forming fluorescent surface using same |
| 04/25/2000 | US6054784 Positioning device having three coil systems mutually enclosing angles of 120° and lithographic device comprising such a positioning device |
| 04/25/2000 | US6054713 Electron beam exposure apparatus |
| 04/25/2000 | US6054710 Method and apparatus for obtaining two- or three-dimensional information from scanning electron microscopy |