| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/26/2000 | EP0974074A1 Highly transparent, colour-pigmented high molecular weight material |
| 01/26/2000 | EP0973961A1 Method for manufacturing a stent |
| 01/26/2000 | EP0973808A1 Non-toxic initiators, resins with cross-linkable organofunctional groups containing same, and use for preparing stable and non-toxic polymers |
| 01/26/2000 | EP0800511B1 Functionalised photoinitiators, derivatives and macromers therefrom and their use |
| 01/26/2000 | EP0784857B1 Radiation cured radiographic intensifying screen |
| 01/26/2000 | CN1242528A Photoimageable compositions |
| 01/25/2000 | USRE36528 Optical scanning head |
| 01/25/2000 | US6018537 Reliable, modular, production quality narrow-band high rep rate F2 laser |
| 01/25/2000 | US6018384 Projection exposure system |
| 01/25/2000 | US6017973 A photocurable blends comprising at least one urethane di- or triacrylate compounds or an acrylated isocynated polylactones or polyethers; use for optical stereolithography technology |
| 01/25/2000 | US6017971 A thermoplastic resin blends comprising aluminum borate or amorphous silica; use for electrodeposit coating electric or electronic parts such as printed circuit boards, wiring circuit boards, connectors, housing, and insulators |
| 01/25/2000 | US6017683 Pattern forming material and pattern forming method |
| 01/25/2000 | US6017682 Imagewise exposing film comprising mixture of lewis acid monomer/oligomer and protected lewis base to deprotect lewis base which subsequently chain extends oligomer to form high molecular weight polymer, then removing unexposed material |
| 01/25/2000 | US6017680 Patterned irradiation of photosensitive coating to lactonize carboxyl moieties of photoresist, then developing in aqueous alkaline solution without swelling photoresist; fine pattern resolution |
| 01/25/2000 | US6017679 Printing plate comprising low viscosity photopolymer ofacrylonitrile-butadiene-methacrylic acid terpolymer processed in aqueous media; image quality, durability |
| 01/25/2000 | US6017678 Photocurable elastomeric mixture and recording material obtained therefrom for the production of relief printing plates |
| 01/25/2000 | US6017677 Substrate having rcording layer containing photo acid-generating agent and a polymer having sulfonic acid-generating moieties on side chains |
| 01/25/2000 | US6017676 Photoresist composition comprising a copolymer resin |
| 01/25/2000 | US6017675 Polymerization catalyst |
| 01/25/2000 | US6017673 Lithographic printing plate and treating liquids for such plate comprising a hydrophilic amphoretic block copolymer |
| 01/25/2000 | US6017663 Coating, exposing, developing and heat treating photoresist in air conditioned/chemically filtered environment whereby photolithography is temporarily stopped for filter change in response to detected high concentration of alkaline material |
| 01/25/2000 | US6017660 Pigmented ink comprising addition polymer monomer, photoinitator mixture containing a diaryliodonium salt, sensitizer for 2-methyl-4,6-bis(trichloromethyl)-s-triazine, and electron donor compound; photocurable |
| 01/25/2000 | US6017658 Forming mask having increased pattern resolution by providing dielectric layer between electron beam absorber layer and photoresist layer to prevent backscattered electrons from reentering photoresist |
| 01/25/2000 | US6017393 Photoresist supply system with air venting |
| 01/25/2000 | US6016749 Stamp-making apparatus, as well as function changeover mechanism, exposure system and stamp-making object material-detecting device therefor |
| 01/25/2000 | CA2028537C Process for adjusting the sensitivity to radiation of photopolymerizable compositions |
| 01/20/2000 | WO2000003428A1 Substrate transfer device and operating method thereof |
| 01/20/2000 | WO2000003357A1 Identifying and handling device tilt in a three-dimensional machine-vision image |
| 01/20/2000 | WO2000003341A1 A method and system for generating a flat mask onto a three-dimensional surface |
| 01/20/2000 | WO2000003339A1 Two-dimensional to three-dimensional vlsi design |
| 01/20/2000 | WO2000003307A1 Maskless photolithography system |
| 01/20/2000 | WO2000003306A1 Composition for stripping photoresist and organic materials from substrate surfaces |
| 01/20/2000 | WO2000003304A1 Method for decontaminating microlithography projection lighting devices |
| 01/20/2000 | WO2000003303A1 Composition for bottom reflection preventive film and novel polymeric dye for use in the same |
| 01/20/2000 | WO2000003302A1 Low-cost, simple mass production of light-guiding tips |
| 01/20/2000 | WO2000003301A2 Exposure device having a planar motor |
| 01/20/2000 | WO2000003300A1 Stereolithographic composition for preparing polyethylene-like articles |
| 01/20/2000 | WO2000003296A1 A reflection system for imaging on a nonplanar substrate |
| 01/20/2000 | WO2000003284A1 Multiplexer for laser lithography |
| 01/20/2000 | WO2000003198A1 Machine vision and semiconductor handling |
| 01/20/2000 | WO2000003058A1 Cvd photo resist and deposition |
| 01/20/2000 | WO2000002670A1 Apparatus and method for coating a semiconductor device with fluid |
| 01/20/2000 | DE19932429A1 Blanking aperture array (BAA) arrangement for electron beam lithography |
| 01/20/2000 | DE19821174C1 Continuous hot lamination of solid photoresists onto metal-lined, thermoplastic, flexible printed circuit materials |
| 01/19/2000 | EP0973069A2 Monitoring apparatus and method particularly useful in photolithographically processing substrates |
| 01/19/2000 | EP0973068A2 Method and system for controlling the photolithography process |
| 01/19/2000 | EP0973067A2 Positioning device and lithographic projection apparatus comprising such a device |
| 01/19/2000 | EP0973066A1 Film applying apparatus |
| 01/19/2000 | EP0973065A1 Recording material and matting process thereof |
| 01/19/2000 | EP0972228A1 An apparatus and a method for processing photographic material |
| 01/19/2000 | EP0971924A1 PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON $g(a)-AMINO KETONES |
| 01/19/2000 | EP0792530A4 Low cost, high average power, high brightness solid state laser |
| 01/19/2000 | CN1242104A Aligner and method for exposure |
| 01/19/2000 | CN1242084A System for the transfer of digitized images to an image support or vice-versa |
| 01/19/2000 | CN1241732A Photosensitive siloxane resin composition and patterning method using it |
| 01/19/2000 | CN1241731A IR- and UV-radiation-sensitive composition and lithographic plate |
| 01/19/2000 | CN1241562A New O-acyloxime photointiators |
| 01/18/2000 | US6016324 Short pulse laser system |
| 01/18/2000 | US6016189 Portable image forming apparatus using photosensitive recording medium |
| 01/18/2000 | US6016187 Exposure apparatus and method |
| 01/18/2000 | US6016186 Alignment device and method with focus detection system |
| 01/18/2000 | US6016185 Lens array photolithography |
| 01/18/2000 | US6016027 Microdischarge lamp |
| 01/18/2000 | US6015976 Fabrication apparatus employing energy beam |
| 01/18/2000 | US6015975 Method and apparatus for charged particle beam exposure |
| 01/18/2000 | US6015907 Photostable imaging dyes for acid-mediated media, also for photosensitizing onium salts to visible blue radiation |
| 01/18/2000 | US6015651 Solder resist ink composition of a novolak-epoxy resin |
| 01/18/2000 | US6015650 Method for forming micro patterns of semiconductor devices |
| 01/18/2000 | US6015649 Method of manufacturing support for planographic printing plate |
| 01/18/2000 | US6015644 Process for device fabrication using a variable transmission aperture |
| 01/18/2000 | US6015643 Mask used in charged particle beam projecting apparatus |
| 01/18/2000 | US6015641 Bitline mask pattern comprising plurality of bitlines having plurality of equally spaced apart contact pads, each having rectangular shape, but having rectangular corner and side portions removed |
| 01/18/2000 | US6015640 Mask fabrication process |
| 01/18/2000 | US6015599 High vertical aspect ratio thin film structures |
| 01/18/2000 | US6015467 Using solvent mixture containing dipropylene glycol monoalkyl ether to dissolve and remove photoresist film |
| 01/18/2000 | US6015066 Liquid supplying device |
| 01/18/2000 | US6014931 Imaging a lithographic printing plate |
| 01/18/2000 | US6014928 Screen product having an enhanced radiation-absorbing capacity, in particular suitable for use in flat or rotary screen printing, as well as method for manufacturing thereof |
| 01/18/2000 | CA2121608C Device fabrication entailing synchrotron radiation |
| 01/13/2000 | WO2000002424A1 Scanner system |
| 01/13/2000 | WO2000002239A1 Exposure system, method of manufacture thereof, method of wafer transfer, device and method of manufacture device |
| 01/13/2000 | WO2000002238A1 Post etch cleaning composition and process for dual damascene system |
| 01/13/2000 | WO2000002236A2 Radio frequency identification system and method for tracking silicon wafers |
| 01/13/2000 | WO2000002092A1 Lighting system for microlithography, comprising a depolarizer |
| 01/13/2000 | WO2000002091A1 Water-based solder resist composition |
| 01/13/2000 | WO2000002090A2 Periodic porous and relief nanostructured articles |
| 01/13/2000 | WO2000002089A1 Method of making optical replicas by stamping in photoresist and replicas formed thereby |
| 01/13/2000 | WO2000002088A1 Integral thin-film metal resistor with improved tolerance and simplified processing |
| 01/13/2000 | WO2000001747A1 Polycyclic copolymer compositions |
| 01/13/2000 | WO2000001684A1 (meth)acrylate derivatives bearing lactone structure, polymers, photoresist compositions and process of forming patterns with the same |
| 01/13/2000 | WO2000001495A1 Process for coating a solid surface with a liquid composition |
| 01/13/2000 | WO2000001487A2 Trace metal ion reduction by ion exchange pack |
| 01/13/2000 | WO2000001475A1 Fabrication and method of use of coded particles in the field of combinatorial chemistry |
| 01/13/2000 | WO1999041007B1 Method and apparatus for chemical and biochemical reactions using photo-generated reagents |
| 01/13/2000 | DE19925416A1 Apparatus and method for forming a semiconductor device photoresist pattern, especially for a contact hole |
| 01/13/2000 | DE19830438A1 Verfahren zur Dekontamination von Mikrolithographie-Projektionsbelichtungsanlagen A process for the decontamination of microlithography projection exposure apparatuses |
| 01/13/2000 | DE19829674A1 Layer technology utilizing direct writing for lithography of semiconductor chips |
| 01/12/2000 | EP0971391A2 A method for reducing particles from an electrostatic chuck and an equipment for manufacturing a semiconductor |
| 01/12/2000 | EP0971270A1 Process for the removal of resist material |
| 01/12/2000 | EP0971269A1 A method for preparing an imaging element for making an improved printing plate according to the silver salt diffusion transfer process |