| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 11/18/1999 | WO1999059028A1 Process for producing purified solutions of blocked polyhydroxystyrene resins |
| 11/18/1999 | WO1999058986A1 Device for detecting the position of rotating objects |
| 11/18/1999 | WO1999058579A1 Process for producing purified solutions of blocked polyhydroxystyrene resin |
| 11/18/1999 | WO1999058327A1 Directed energy assisted in vacuo micro embossing |
| 11/18/1999 | WO1999058319A1 Method for making optical masters using incoherent light |
| 11/18/1999 | DE4113968C2 Maskenstruktur und Verfahren zur Herstellung von Halbleiterbauelementen unter Verwendung der Maskenstruktur Mask structure and process for producing semiconductor devices by using the mask structure |
| 11/18/1999 | DE19820326A1 Method of acquiring photographic, film and video images of objects and surfaces and printing on surfaces to reproduce a spatial view |
| 11/18/1999 | CA2336481A1 Holographic patterning method and tool employing prism coupling |
| 11/18/1999 | CA2328868A1 Directed energy assisted in vacuo micro embossing |
| 11/17/1999 | EP0957402A2 Lithographic device |
| 11/17/1999 | EP0957401A1 Exposure method, exposure apparatus and device manufacturing method |
| 11/17/1999 | EP0957400A1 Photosensitive resin composition, method for producing pattern therefrom, electronic devices produced by using the same, and method for production thereof |
| 11/17/1999 | EP0957399A2 Radiation-sensitive composition and its use |
| 11/17/1999 | EP0957384A2 Optical image forming method and device, image forming apparatus and aligner for lithography |
| 11/17/1999 | EP0957275A2 Gas bearing and lithographic apparatus including such a bearing |
| 11/17/1999 | EP0957126A1 Photosensitive composition |
| 11/17/1999 | EP0957125A1 Polyimides, process for producing the same and photosensitive composition containing the same |
| 11/17/1999 | EP0957124A1 Polyimides, process for producing the same and photosensitive composition containing the same |
| 11/17/1999 | EP0957116A2 Energy-curable ethylenically unsaturated compositions |
| 11/17/1999 | EP0956948A1 IR and UV radiation -sensitive composition and lithographic plate |
| 11/17/1999 | EP0956518A1 Interferometer system and lithographic apparatus comprising such a system |
| 11/17/1999 | EP0956517A1 Radiation sensitive diazo sulfo-acrylic adducts |
| 11/17/1999 | EP0956516A1 Method and apparatus for the production of a structure by focused laser radiation on a photosensitively coated substrate |
| 11/17/1999 | EP0956280A1 Non-volatile phenylglyoxalic esters |
| 11/17/1999 | EP0852743B1 Process for producing surfactant having a low metal ion level and developer produced therefrom |
| 11/17/1999 | CN1235615A Liquid curable resin composition |
| 11/17/1999 | CN1235282A Photoimageable compositions having improved stripping properties in aqueous alkaline solutions |
| 11/17/1999 | CN1235281A 光刻胶组合物 Photoresist composition |
| 11/17/1999 | CN1235171A Polymer and forming method of micro pattern using the same |
| 11/17/1999 | CN1235094A Character information processing device |
| 11/16/1999 | US5986824 Large NA projection lens system with aplanatic lens element for excimer laser lithography |
| 11/16/1999 | US5986795 Deformable mirror for short wavelength applications |
| 11/16/1999 | US5986765 Apparatus including compensation mask to correct particle beam proximity-effect |
| 11/16/1999 | US5986744 Projection optical system, illumination apparatus, and exposure apparatus |
| 11/16/1999 | US5986743 Scanning exposure apparatus |
| 11/16/1999 | US5986742 Lithographic scanning exposure projection apparatus |
| 11/16/1999 | US5986318 (Ge,Si) Nx anti-reflective compositions and integrated circuit devices comprising the same |
| 11/16/1999 | US5985998 Polymers and crosslinking in solvents |
| 11/16/1999 | US5985996 Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates |
| 11/16/1999 | US5985950 Acid-curable binder systems containing 1,2 disulfones |
| 11/16/1999 | US5985693 High density three-dimensional IC interconnection |
| 11/16/1999 | US5985680 Method and apparatus for transforming a substrate coordinate system into a wafer analysis tool coordinate system |
| 11/16/1999 | US5985525 Developer solution for photoresist composition |
| 11/16/1999 | US5985524 Multilayer images on substrates with coatings of potosnsitive acid generators and olefin polymers |
| 11/16/1999 | US5985522 Photoresist and compounds for composing the photoresist |
| 11/16/1999 | US5985519 Patterns on semiconductors with transparent and semitransparent layers for photoresists and films |
| 11/16/1999 | US5985517 Resist pattern forming method using anti-reflective layer resist |
| 11/16/1999 | US5985516 Forming multilayer element for electronic devices with oxide layer over a substrate, a conducting layer, resist layer and polyaniline |
| 11/16/1999 | US5985514 Image on a support, heat sensitive elements |
| 11/16/1999 | US5985513 Photosensitive composition comprising aryl-substituted polysilane and peroxide-substituted benzophenone |
| 11/16/1999 | US5985512 Base resin, photoacid generator, solvent and nitronenous organic compound |
| 11/16/1999 | US5985511 Positive photoresists, polyvinylphenol resin, sulfonate of n hydroxyimide, amine and electron doners |
| 11/16/1999 | US5985510 Stereolithography, exposure to beams, curing, molding an epoxycyclohexane |
| 11/16/1999 | US5985507 Photoresists with thermal properties |
| 11/16/1999 | US5985498 Detection of patterns on wafers, dividing an exposure site with grids, measuring and generation of error values by calculation |
| 11/16/1999 | US5985497 Method for reducing defects in a semiconductor lithographic process |
| 11/16/1999 | US5985496 Photomasking patterns on photosensitive substrates, radiation, scanning and measurement |
| 11/16/1999 | US5985495 Methods for measuring image-formation characteristics of a projection-optical system |
| 11/16/1999 | US5985494 Integrated circuits with substrates and markings |
| 11/16/1999 | US5985492 Mask for imaging and multilayer |
| 11/16/1999 | US5985491 Radiation transparent substrates with phase shift layer and reflecting layer |
| 11/16/1999 | US5985363 Method of providing uniform photoresist coatings for tight control of image dimensions |
| 11/16/1999 | US5985357 Surface treatment; supplying photoresist or developer to semiconductor wafers |
| 11/16/1999 | US5985328 Micromachined porous membranes with bulk support |
| 11/16/1999 | US5985164 Method for forming a filter |
| 11/16/1999 | US5985031 Spin coating spindle and chuck assembly |
| 11/16/1999 | US5984541 Resist processing system |
| 11/16/1999 | US5983800 Machine for insulating and cooling photopolymer plates for flexographic printing |
| 11/16/1999 | US5983513 Staging apparatus and method, and method for manufacturing the staging apparatus, and exposing apparatus using the staging apparatus |
| 11/12/1999 | CA2271834A1 Ir- and uv-radiation-sensitive composition and lithographic plate |
| 11/11/1999 | WO1999057940A2 Smif pod including independently supported wafer cassette |
| 11/11/1999 | WO1999057807A1 Planar resist structure, especially an encapsulation for electric components and a thermomechanical method for the production thereof |
| 11/11/1999 | WO1999057745A1 Charged particle beam illumination of blanking aperture array |
| 11/11/1999 | WO1999057732A1 Lighting system, especially for extreme ultraviolet lithography |
| 11/11/1999 | WO1999057607A1 Protection of lithographic components from particle contamination |
| 11/11/1999 | WO1999057606A1 Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system |
| 11/11/1999 | WO1999057596A1 Lithographic apparatus comprising a dedicated mirror projection system |
| 11/11/1999 | WO1999057583A1 Broadband diffractive diffuser and associated methods |
| 11/11/1999 | WO1999057508A1 Device for measuring structures on a transparent substrate |
| 11/11/1999 | WO1999057331A1 Microchamber |
| 11/11/1999 | WO1999057163A1 Preparation of co- and terpolymers of p-hydroxystyrene and alkyl acrylates |
| 11/11/1999 | WO1999041007A3 Method and apparatus for chemical and biochemical reactions using photo-generated reagents |
| 11/11/1999 | DE19911671A1 Narrow band module inspection apparatus e.g. for excimer laser |
| 11/11/1999 | DE19903807A1 EUV illumination system especially for microlithography in the production of electronic components with sub-micron structure widths |
| 11/11/1999 | DE19820630A1 Position detection device for rotating object e.g. shaft of electronic copier, recorder, or imagesetter |
| 11/11/1999 | DE19819492A1 Meßgerät zur Vermessung von Strukturen auf einem transparenten Substrat Measuring device for measuring structures on a transparent substrate |
| 11/11/1999 | DE19539039C2 Vorrichtung zur Herstellung von mikromechanischen und mikrooptischen Bauelementen sowie komplexen Mikrosystemen An apparatus for producing micro-mechanical and micro-optical components and complex microsystems |
| 11/11/1999 | CA2331277A1 Planar resist structure, in particular encapsulation for electronic components and thermomechanical production process |
| 11/11/1999 | CA2296583A1 Charged particle beam illumination of blanking aperture array |
| 11/10/1999 | EP0955641A1 Illumination system,particularly for deep ultraviolet lithography |
| 11/10/1999 | EP0955632A1 A method of manufacturing a stamper, a stamper obtained by carrying out such a method as well as an optical disc obtained by using such a stamper |
| 11/10/1999 | EP0955565A2 Mirror for soft x-ray exposure apparatus |
| 11/10/1999 | EP0955563A1 A photoresist composition |
| 11/10/1999 | EP0955562A1 Chemically amplified resist |
| 11/10/1999 | EP0954890A1 Excimer laser with greater spectral bandwidth and beam stability |
| 11/10/1999 | EP0954768A1 Method and apparatus for wafer-focusing |
| 11/10/1999 | EP0954384A1 Method for coating a plurality of fluid layers onto a substrate |
| 11/10/1999 | EP0954383A1 Method for minimizing waste when coating a fluid with a slide coater |
| 11/10/1999 | CN1234602A Method for producing semiconductor device |
| 11/10/1999 | CN1234530A Exposure method of predyed diazo film |