| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/10/2000 | WO2000006613A1 Photopolymerization process and composition employing a charge transfer complex and cationic photoinitiator |
| 02/10/2000 | DE19929716A1 Verfahren zur Vorbereitung eines Aluminiumsubstrats für eine lithographische Druckplatte sowie für die Herstellung einer vorsensibilisierten lithographischen Druckplatte A method of preparing an aluminum substrate for a lithographic printing plate and for the production of a presensitized lithographic printing plate |
| 02/10/2000 | DE19835476A1 Elektrode für eine Hochdruckentladungslampe mit langer Lebensdauer The electrode for a high pressure discharge lamp with a long service life |
| 02/10/2000 | CA2334255A1 Photopolymerization process and composition employing a charge transfer complex and cationic photoinitiator |
| 02/09/2000 | EP0978870A2 Dry-etching method and apparatus, photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereof |
| 02/09/2000 | EP0978869A2 Method for forming a minute resist pattern and method for forming a gate electrode |
| 02/09/2000 | EP0978764A1 Photosensitive resin derived from saponified poly(vinyl acetate), photosensitive resin composition containing the resin, and pattern formation method making use of the composition |
| 02/09/2000 | EP0978763A1 Lithographic process for device fabrication using electron beam imaging |
| 02/09/2000 | EP0978376A2 Radiation-sensitive mixture comprising IR-absorbing cyanine dyes having a betaine structure or having a betaine structure and containing an anion, and recording material prepared therewith |
| 02/09/2000 | EP0978375A2 Radiation-sensitive mixture comprising IR-absorbing, anionic cyanine dyes and recording material prepared therewith |
| 02/09/2000 | EP0978016A1 Antireflective coating compositions for photoresist compositions and use thereof |
| 02/09/2000 | EP0978015A1 Light absorbing polymers |
| 02/09/2000 | EP0977792A1 Nitrogen-containing epoxy resins for photocurable coating applications |
| 02/09/2000 | EP0977747A1 Photoactive coumarin derivatives |
| 02/09/2000 | EP0830552A4 Method for reducing the level of diluent in diluent-containing resins using microwave energy |
| 02/09/2000 | EP0791189B1 Positioning device with a vibration-free object table |
| 02/09/2000 | CN1244265A Method of contact printing on gold coated films |
| 02/09/2000 | CN1244198A Photoactivatable nitrogen-containing bases based on 'alpha'-amino ketones |
| 02/09/2000 | CN1244190A Non-volatile phenylglyoxalic esters |
| 02/09/2000 | CN1244030A Phase-shift mask and manufacture thereof |
| 02/09/2000 | CN1244029A Method and apparatus for removing corrosion inhibitor |
| 02/09/2000 | CN1243971A Alkoxyl N-hydroxy alkyl acylamine used as corrosion inhibitor remover |
| 02/09/2000 | CN1243823A N-chain alkyl alcohol alkoxyl acylamide compounds, corrosion inhibilor remover, composition for the remover and preparation thereof |
| 02/08/2000 | US6023486 Soldered fan assembly for electric discharge laser |
| 02/08/2000 | US6023338 Overlay alignment measurement of wafers |
| 02/08/2000 | US6023321 Projection exposure apparatus and method |
| 02/08/2000 | US6023320 Scanning exposure apparatus with surface position detecting system |
| 02/08/2000 | US6023068 Semiconductor device manufacturing apparatus |
| 02/08/2000 | US6023067 Blanking system for electron beam projection system |
| 02/08/2000 | US6022906 α-aminoacetophenone photoinitiators |
| 02/08/2000 | US6022672 Method of manufacturing semiconductors having improved temperature control |
| 02/08/2000 | US6022666 Blend of alkali-soluble hydroxy group containing polymer and cyano group-containing oximesulfonate |
| 02/08/2000 | US6022664 Mixture of a polymerizable vinyl monomer and organic borate compound |
| 02/08/2000 | US6022650 Substrate box; photoresist layer; rotation |
| 02/08/2000 | US6022597 Coating polyester cord with perhalophenylazide solution, exposing the coated cord to an energy source and/or heating the polyester cord coated with the perhalophenylazide to a temperature of from about 130-200 degrees c |
| 02/08/2000 | US6022152 Non-abrasive processing of printing plates |
| 02/08/2000 | US6022095 Curable compositions |
| 02/08/2000 | US6021991 Active anti-vibration apparatus |
| 02/03/2000 | WO2000005770A1 Method for double-sided patterning of high temperature superconducting circuits |
| 02/03/2000 | WO2000005282A1 Water soluble positive-working photoresist composition |
| 02/03/2000 | WO1999054786A9 Elastomeric mask and use in fabrication of devices, inlcuding pixelated electroluminescent displays |
| 02/03/2000 | DE19834746A1 Strahlungsempfindliches Gemisch mit IR-absorbierenden, betainischen oder betainisch-anionischen Cyaninfarbstoffen und damit hergestelltes Aufzeichnungsmaterial A radiation-sensitive mixture with IR-absorbing, betaine or betaine-anionic cyanine dyes and thus produced recording material |
| 02/03/2000 | DE19834745A1 Strahlungsempfindliches Gemisch mit IR-absorbierenden, anionischen Cyaninfarbstoffen und damit hergestelltes Aufzeichnungsmaterial A radiation-sensitive mixture with IR-absorbing, anionic cyanine dyes and thus produced recording material |
| 02/03/2000 | DE19833683A1 Selective deposition, e.g. for conductive polymer coating or micro-manipulation, comprises selectively irradiating substrate with light-dependent electrical properties in solution of substance which precipitates in an electric field |
| 02/02/2000 | EP0977244A2 Stage system and stage driving method for use in exposure apparatus |
| 02/02/2000 | EP0977085A1 Photosensitive resin composition and color filter |
| 02/02/2000 | EP0977076A2 Color filter, production process of color filter, liquid crystal display device using the color filter, and production process of black matrix |
| 02/02/2000 | EP0976573A1 Flexibly supported lithographic printing plate having an improved dimensional stability |
| 02/02/2000 | EP0976549A1 Processless thermal printing plate with well defined nanostructure |
| 02/02/2000 | EP0976151A1 Methods and apparatus for removing photoresist mask defects-in a plasma reactor |
| 02/02/2000 | EP0976010A1 Waterborne photoresists made from urethane acrylates |
| 02/02/2000 | EP0976008A1 An apparatus and a method for illuminating a light-sensitive medium |
| 02/02/2000 | EP0975996A1 Device for making grid structures in optical fibers |
| 02/02/2000 | EP0975731A1 Ethylenediaminetetraacetic acid or its ammonium salt semiconductor process residue removal composition and process |
| 02/02/2000 | EP0975577A1 Photocurable halofluorinated acrylates |
| 02/02/2000 | EP0975437A1 Black matrix with conductive coating |
| 02/02/2000 | EP0912223A4 Microfabricated filter and shell constructed with a permeable membrane |
| 02/02/2000 | CN1243270A Positive-negative interoperable chemical amplifying slushing agent and photoetching technology |
| 02/02/2000 | CN1243122A Sulfonium salt and preparation method thereof |
| 02/01/2000 | US6021267 Aspect ratio program for optimizing semiconductor chip shape |
| 02/01/2000 | US6021009 Method and apparatus to improve across field dimensional control in a microlithography tool |
| 02/01/2000 | US6020966 Enhanced optical detection of minimum features using depolarization |
| 02/01/2000 | US6020964 Interferometer system and lithograph apparatus including an interferometer system |
| 02/01/2000 | US6020950 Exposure method and projection exposure apparatus |
| 02/01/2000 | US6020710 Exposure method, and method of making exposure apparatus having dynamically isolated reaction frame |
| 02/01/2000 | US6020676 Lamp with light reflection back into bulb |
| 02/01/2000 | US6020528 Alkylphenylbisacylphosphine oxides and photoinitiator mixtures |
| 02/01/2000 | US6020508 Radiation- or thermally-initiated cationically-curable epoxide compounds and compositions made from those compounds |
| 02/01/2000 | US6020436 Photosensitive resin composition |
| 02/01/2000 | US6020362 Glycoprotein IIB IIIA antagonists |
| 02/01/2000 | US6020292 Aqueous solution containing a quaternary ammonium hydroxide and corrosion inhibitor |
| 02/01/2000 | US6020257 Membrane dielectric isolation IC fabrication |
| 02/01/2000 | US6020215 Process for manufacturing microstructure |
| 02/01/2000 | US6020119 Using a halmethyl ethyl ether in presence of a lewis acid |
| 02/01/2000 | US6020110 Production of electrodes for electrochemical sensing |
| 02/01/2000 | US6020109 Irradiating integrated circuit pattern; transferring onto photoresist |
| 02/01/2000 | US6020108 Preparation of photopolymeric letterpress printing plates |
| 02/01/2000 | US6020107 Exposure photoresist to light; heating |
| 02/01/2000 | US6020104 Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent |
| 02/01/2000 | US6020093 Applying photosensitive resin to substrate; radiation; developing a pattern |
| 02/01/2000 | US6020092 Partial one-shot electron beam exposure mask and method of forming a partial one-shot electron beam exposure pattern |
| 02/01/2000 | US6020047 Polymer films having a printed self-assembling monolayer |
| 02/01/2000 | US6020026 Process for the production of a coating of molecular thickness on a substrate |
| 02/01/2000 | US6019844 Acoustic wave enhanced spin coater |
| 02/01/2000 | US6019843 Apparatus for coating a semiconductor wafer with a photoresist |
| 02/01/2000 | CA2201226C Method and device for regulating the temperature in a laser operated printing plate imaging unit of a printing press, particularly of an offset-printing press |
| 02/01/2000 | CA2078097C Purple membrane preparations having increased holographic diffraction efficiency |
| 02/01/2000 | CA1340890C Stereolithographic curl reduction |
| 01/27/2000 | WO2000004612A1 High pulse rate pulse power system |
| 01/27/2000 | WO2000004571A1 Method for patterning cavities and enhanced cavity shapes for semiconductor devices |
| 01/27/2000 | WO2000004421A1 Photosensitive black matrix composition and process of making it |
| 01/27/2000 | DE19934049A1 Multi-column lithography system using charged particle radiation-like electron rays has control unit for adjusting waiting time for each intensifier connected to main deflectors |
| 01/27/2000 | DE19932938A1 Magnetic device for treating fluid stream, e.g. defoaming alkaline developer for photoresist, has alternating poles so that magnetic flux changes along direction of fluid flow |
| 01/27/2000 | DE19932014A1 Pattern data correction controller for one column of a multi-column electron beam exposure apparatus used for e.g. pattering a semiconductor wafer |
| 01/27/2000 | DE19833315A1 Thin film structure, e.g. a thin film transistor structure for an active matrix LCD, is produced by thermally flowing a photosensitive masking layer over under-etched layer flanks prior to etching an underlying layer |
| 01/26/2000 | EP0975010A1 Prevention of photoresist poisoning from dielectric antireflective coating in semiconductor fabrication |
| 01/26/2000 | EP0974868A2 Exposure apparatus |
| 01/26/2000 | EP0974078A1 Ternary photoinitiator system for curing of epoxy/polyol resin compositions |
| 01/26/2000 | EP0974076A1 Method of producing an optical element and optical element therefrom |
| 01/26/2000 | EP0974075A1 Black-pigmented structured high molecular weight material |