| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/18/2000 | WO2000028798A1 Method of manufacturing an interlayer via and a laminate precursor useful for same |
| 05/18/2000 | WO2000028604A1 Indirect laser patterning of resist |
| 05/18/2000 | WO2000028572A1 Apparatus for producing charged particle beam |
| 05/18/2000 | WO2000028385A2 Method and device for aligning two photo masks with each other and optionally, an unexposed printed circuit board blank, and for subsequent simultaneous exposure in the production of double-sided printed circuit boards |
| 05/18/2000 | WO2000028384A1 Wafer chamber having a gas curtain for extreme-uv lithography |
| 05/18/2000 | WO2000028383A1 Radiation-sensitive resin composition |
| 05/18/2000 | WO2000028382A1 Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions |
| 05/18/2000 | WO2000028381A1 Method for producing microcomponents having flow channels |
| 05/18/2000 | WO2000028380A1 Exposure method and exposure apparatus |
| 05/18/2000 | WO2000027891A1 Preparation of partially cross-linked polymers and their use in pattern formation |
| 05/18/2000 | WO2000027644A1 Computerized cutting method and apparatus for use in printing operations |
| 05/18/2000 | WO1999049346A8 High na system for multiple mode imaging |
| 05/18/2000 | DE19940749A1 Integrated synthesis and analysis method e.g. for polymers, comprises a carrier body provided with immobilized receptors to provide respective channels before contact with sample and subsequent analysis |
| 05/18/2000 | DE19852258A1 Strahlungsempfindliches Aufzeichnungsmaterial zur Herstellung von Wasserlos-Offsetdruckplatten A radiation-sensitive recording material for the production of waterless offset printing plates |
| 05/18/2000 | CA2350075A1 Method of manufacturing an interlayer via and a laminate precursor useful for same |
| 05/17/2000 | EP1001512A2 Actuator and transducer |
| 05/17/2000 | EP1001315A2 Method and device for exposing both sides of a sheet |
| 05/17/2000 | EP1001314A2 Durable optical system for projection exposure apparatus and method of manufacturing the same |
| 05/17/2000 | EP1001313A1 Scan type projection exposure apparatus and device manufacturing method using the same |
| 05/17/2000 | EP1001312A1 Radiation sensitive recording material for the production of dry offset printing plates |
| 05/17/2000 | EP1001311A1 Patterning device |
| 05/17/2000 | EP1001295A1 Objective with polarisation effects compensation |
| 05/17/2000 | EP1000924A1 Acid-sensitive compound and resin composition for photoresist |
| 05/17/2000 | EP1000768A2 Production of lithographic printing plate support |
| 05/17/2000 | EP1000434A1 Method for obtaining self-aligned openings, in particular for microtip flat display focusing electrode |
| 05/17/2000 | EP1000387A1 Overcoat for light-sensitive materials comprising a (1-vinylimidazole) polymer or copolymer |
| 05/17/2000 | EP1000386A1 Rubber-based aqueous developable photopolymers and photocurable elements comprising same |
| 05/17/2000 | EP1000385A1 Method and composition for producing activating light absorbing lenses |
| 05/17/2000 | EP1000384A1 Latex-based, aqueous developable photopolymers and use thereof in printing plates |
| 05/17/2000 | EP1000371A2 Ultra-broadband uv microscope imaging system with wide range zoom capability |
| 05/17/2000 | EP1000090A1 Novel photoinitiators and applications therefor |
| 05/17/2000 | EP0808477B1 Fabrication and use of a sub-micron dimensional standard |
| 05/17/2000 | CN1253639A Antireflective coating compositions for photoresist compositions and use thereof |
| 05/17/2000 | CN1253638A Light absorbing polymers |
| 05/17/2000 | CN1253311A Printing sub photo etching image by using shadow arbor and eccentric shaft exposure |
| 05/16/2000 | US6064517 High NA system for multiple mode imaging |
| 05/16/2000 | US6064485 Method of optical proximity correction |
| 05/16/2000 | US6064475 Real time local defocus monitor system using maximum and mean angles of focus correction |
| 05/16/2000 | US6064467 Alignment apparatus, and exposure apparatus with the alignment apparatus |
| 05/16/2000 | US6064466 Planarization method and system using variable exposure |
| 05/16/2000 | US6064072 Plasma focus high energy photon source |
| 05/16/2000 | US6063953 Chemical-sensitization photoresist composition |
| 05/16/2000 | US6063896 Acrylic acid/ester-maleimide derivative copolymer having improved etch and heat resistance; high resolution submicrolithography |
| 05/16/2000 | US6063888 Polydimethylsiloxane compound which has at least two urethane bonds in one molecule, an unreactive organic group on at least end, and a radical curable ethylenically unsaturated group at other end; shelf life; optical fiber coatings bundles |
| 05/16/2000 | US6063653 Method of fabricating a TFT-LCD |
| 05/16/2000 | US6063554 Decoating of a silver halide diffusion transfer printing plate by treating with aqueous solution containing at least one nonionic surfactant |
| 05/16/2000 | US6063550 Using an anionic surfactant in the alkaline aqueous developer as an antideposit agent to prevent scum build-up, the surfactant comprising a polyoxyethylene glycol having a phosphate end group and a hydrophobic hydrocarbon end group |
| 05/16/2000 | US6063549 Comprising an acid-generating compound, a film-forming binder having groups cleavable by acid catalysis, a compound with latent aromatic groups and a film-forming binder with latent aromatic groups |
| 05/16/2000 | US6063547 Allows easier bottom antireflective coating photoresist removal and better planarization and line width control over topography; heating the polymer in a vacuum to vaporize and deposit as a thin film of uniform thickness |
| 05/16/2000 | US6063545 Comprising a sulfonated polyhydroxy-substited benzene to generate a strong acid using actinic radiation, a compound having two groups crosslinkable by means of acid and a binder insoluble in water or soluble/swellable in aqueous alkaline |
| 05/16/2000 | US6063543 Radiation-sensitive mixture and its use |
| 05/16/2000 | US6063542 Polymer for positive photoresist and chemical amplification positive photoresist composition comprising the same |
| 05/16/2000 | US6063540 Method for making lithographic printing plate |
| 05/16/2000 | US6063531 The test focus monitor structure includes densely packed parallel lines, an isolated line, an orthogonal line and rectangular islands and are approximately the critical dimension and is placed on a reticle or mask |
| 05/16/2000 | US6063530 Control of critical dimensions through measurement of absorbed radiation |
| 05/16/2000 | US6063529 Overlay accuracy measurement mark |
| 05/16/2000 | US6063439 Casing, rotary table, supply mechanism |
| 05/16/2000 | US6063200 Three-dimensional micro fabrication device for filamentary substrates |
| 05/16/2000 | US6063190 Method of forming coating film and apparatus therefor |
| 05/16/2000 | US6062551 Active vibration-isolating device |
| 05/16/2000 | US6062240 Treatment device |
| 05/16/2000 | US6062239 Fan blades on the rotor blow air over the wafers, to move any remaining fluid droplets away from the wafer centers, to allow centrifugal force to fling the fluid droplets off of the wafers. |
| 05/16/2000 | CA2028541C Photosensitive mixture |
| 05/11/2000 | WO2000026954A1 Method of reducing stop layer loss in a photoresist stripping process using hydrogen as a fluorine scavenger |
| 05/11/2000 | WO2000026726A1 Method of forming pattern |
| 05/11/2000 | WO2000026725A1 Photocurable and photopatternable hydrogel matrix based on azlactone copolymers |
| 05/11/2000 | WO2000026724A1 Organic-solvent-based photosensitive resist composition and method of forming resist pattern |
| 05/11/2000 | WO2000026703A1 Wavelength tuning of photo-induced gratings |
| 05/11/2000 | WO2000026222A1 Substituted benzoylferrocene anionic photoinitiators |
| 05/11/2000 | WO2000026219A1 Oxime derivatives and the use thereof as latent acids |
| 05/11/2000 | DE19940810A1 Biochemical analysis instrument uses mixture of sample and smart reagent beads viewed by color CCD camera to perform chemical analysis of medical samples. |
| 05/11/2000 | DE19851749A1 Polarisationsoptisch kompensiertes Objektiv Optical polarization compensated lens |
| 05/11/2000 | DE19851575A1 Verfahren und Vorrichtung zum Ausrichten zweier Fotomasken zueinander und gegebenenfalls eines unbelichteten Leiterplatten-Rohlings und zum anschließenden simultanen Belichten bei der Herstellung von doppelseitigen Leiterplatten Method and apparatus for aligning two photomasks with each other and optionally an unexposed PCB blank and subsequent to simultaneous exposure in the production of double-sided printed circuit boards |
| 05/11/2000 | CA2346475A1 Wavelength tuning of photo-induced gratings |
| 05/10/2000 | EP0999475A2 Position detecting system and exposure apparatus using the same |
| 05/10/2000 | EP0999474A1 Compounds for photoresist and resin composition for photoresist |
| 05/10/2000 | EP0999473A1 Photosensitive resin composition and photosensitive element using the same |
| 05/10/2000 | EP0999208A1 Nitrogenous heterocyclic compounds and hyperlipemia remedy containing the same |
| 05/10/2000 | EP0999073A1 Lithographic plate |
| 05/10/2000 | EP0998774A1 Wavelength shift correction technique for a laser |
| 05/10/2000 | EP0998697A1 Method and system for providing a probe array chip design database |
| 05/10/2000 | EP0998696A2 Viscosity stabilization of radiation-curable filled compositions |
| 05/10/2000 | EP0998695A1 Sedimentation stabilized radiation-curable filled compositions |
| 05/10/2000 | EP0821812B1 Method of determining the radiation dose in a lithographic apparatus, and test mask and apparatus for performing the method |
| 05/10/2000 | EP0820384B1 Method and arrangement for the production of a stencil |
| 05/10/2000 | EP0772800B1 Lithographic device with a three-dimensionally positionable mask holder |
| 05/10/2000 | EP0678785B1 Dry lithographic plate |
| 05/10/2000 | CN1252874A An illumination unit and a method for point illumination of a medium |
| 05/10/2000 | CN1252873A An apparatus and a method for illuminating a light-sensitive medium |
| 05/10/2000 | CN1052245C Epoxy acrylates containing carboxy and its preparing method and use |
| 05/09/2000 | US6061606 Geometric phase analysis for mask alignment |
| 05/09/2000 | US6061605 Methods of treating a semiconductor wafer |
| 05/09/2000 | US6061376 Tangential fan for excimer laser |
| 05/09/2000 | US6061188 Projecting printing apparatus, projection printing method, mask pattern for estimating amplitude aberrations, method of estimating the quantity of amplitude aberration, and amplitude-aberration estimating filter |
| 05/09/2000 | US6061174 Image-focusing optical system for ultraviolet laser |
| 05/09/2000 | US6061119 Method of measuring image-forming error of projection optical system, method of manufacturing exposure apparatus, and method of manufacturing semiconductor device |
| 05/09/2000 | US6061118 Reflection system for imaging on a nonplanar substrate |
| 05/09/2000 | US6061075 Non-systolic time delay and integration printing |
| 05/09/2000 | US6060717 Charged particle beam exposure method and charged particle beam exposure apparatus therefor |
| 05/09/2000 | US6060716 Electron beam lithography method |