Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2015
03/05/2015WO2015030198A1 Method for forming resist pattern, and composition for forming resist pattern
03/05/2015WO2015030060A1 Pattern forming method using resist underlayer film
03/05/2015WO2015029981A1 Fluorine-containing compound, substrate for patterning, photodegradable coupling agent, patterning method, and compound
03/05/2015WO2015029930A1 Radiation-sensitive resin composition, resin film, and electronic component
03/05/2015WO2015029818A1 Exposure device and exposure method
03/05/2015WO2015029797A1 Radiation sensitive composition, color filter, method for producing color filter, and solid-state imaging element
03/05/2015WO2015029690A1 Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film using same, method for manufacturing electronic device, and electronic device
03/05/2015WO2015029643A1 Coloring photosensitive resin composition, cured film, color filter, method for producing color filter, solid-state imaging element and image display device
03/05/2015WO2015029277A1 Resist remover liquid
03/05/2015WO2015028753A1 Method for the correction of electron proximity effects
03/05/2015WO2015028451A1 Micromirror array
03/05/2015WO2015028371A1 Stable metal compounds as hardmasks and filling materials, their compositions and methods of use
03/05/2015WO2015028211A1 Radiation source and lithographic apparatus
03/05/2015WO2015028202A1 Immersion lithographic apparatus
03/05/2015WO2015027702A1 Cyclopentanedione oxime ester and application thereof
03/05/2015WO2015027577A1 Method for detecting ion-implantation blocking capability of photoresist layer
03/05/2015US20150067619 Advanced correction method
03/05/2015US20150064915 Methods for providing spaced lithography features on a substrate by self-assembly of block copolymers
03/05/2015US20150064630 Methods and compositions for providing spaced lithography features on a substrate by self-assembly of block copolymers
03/05/2015US20150064629 Manufacturing method for microlenses
03/05/2015US20150064628 Methods for making micro- and nano-scale conductive grids for transparent electrodes and polarizers by roll to roll optical lithography
03/05/2015US20150064627 Patterning method using electron beam and exposure system configured to perform the same
03/05/2015US20150064626 Positive resist composition and patterning process
03/05/2015US20150064625 Method for producing resist composition
03/05/2015US20150064624 Oxime ester photoinitiators
03/05/2015US20150064623 Novel compound and photosensitive resin composition
03/05/2015US20150064622 Compound, resin, photoresist composition, and method for producing photoresist pattern
03/05/2015US20150064621 Substrate treatment device and method of applying treatment solution
03/05/2015US20150064620 Photoacid generator, photoresist, coated substrate, and method of forming an electronic device
03/05/2015US20150064613 Negative-working photosensitive siloxane composition
03/05/2015US20150062725 Catadioptric projection objective comprising deflection mirrors and projection exposure method
03/05/2015US20150062596 Optical imaging arrangement with multiple metrology support units
03/05/2015US20150062554 Multi-stage system, a control method therefor, and a lithographic apparatus
03/05/2015US20150062553 Detection apparatus, lithography apparatus and method of manufacturing article
03/05/2015US20150062552 Stage apparatus and its driving method
03/05/2015US20150062551 Optical system, in particular of a microlithographic projection exposure apparatus
03/05/2015US20150062550 Photomask, photomask set, exposure apparatus and exposure method
03/05/2015US20150062549 Assembly for a projection exposure apparatus for euv projection lithography
03/05/2015US20150062548 Lithographic Apparatus, Sensor and Method
03/05/2015US20150062547 Lithography Apparatus, a Device Manufacturing Method, a Method Of Manufacturing an Attenuator
03/05/2015US20150062546 Apparatus with surface protector to inhibit contamination
03/05/2015US20150062545 Pattern forming method, pattern forming apparatus, and computer readable storage medium
03/05/2015US20150062544 Apparatus for and method of temperature compensation in high power focusing system for euv lpp source
03/05/2015US20150059643 Type of fine metal mask (ffm) used in oled production and the method of manufacturing it
03/05/2015DE102014223074A1 Umschmelzen von oberflächenbereichen optischer elemente und dadurch hergestellte optische elemente Remelting of surface areas of optical elements and thus produced optical elements
03/05/2015DE102014203461A1 Kühlbare spiegelanordnung Coolable mirror assembly
03/05/2015DE102013217269A1 Mikrospiegel-Array Micromirror array
03/05/2015DE102013217146A1 Optisches Bauelement Optical component
03/05/2015DE102013108666A1 Verfahren zur Herstellung eines Mehrschichtkörpers sowie Mehrschichtkörper A process for producing a multilayer body as well as multi-layer body
03/05/2015DE102011001785B4 Belichtungseinrichtung zur strukturierten Belichtung einer Fläche Exposure means for structured exposure of a surface
03/04/2015EP2843472A2 Wafer table for immersion lithography
03/04/2015EP2843471A1 Method for producing a resist composition
03/04/2015EP2842744A1 Resin composition for laser engraving, process for producing flexographic printing plate precursor for laser engraving, flexographic printing plate precursor for laser engraving, process for making flexographic printing plate, and flexographic printing plate
03/04/2015EP2841997A1 Dark field diffraction based overlay
03/04/2015EP2841996A1 Optical elements comprising magnetostrictive material
03/04/2015EP2841995A2 Electrostatic clamp, lithographic apparatus and method
03/04/2015EP2841994A1 Photocurable composition
03/04/2015EP2841977A1 Optical component for guiding a radiation beam
03/04/2015EP2841513A1 Photosensitive, developer-soluble bottom anti-reflective coating material
03/03/2015US8972911 Image processing device and computer program for performing image processing
03/03/2015US8972031 Control method and apparatus
03/03/2015US8970964 Projection objective lens system
03/03/2015US8970822 Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method
03/03/2015US8970821 Positioning apparatus, exposure apparatus and device manufacturing method
03/03/2015US8970820 Object exchange method, exposure method, carrier system, exposure apparatus, and device manufacturing method
03/03/2015US8970819 Microlithography projection optical system, tool and method of production
03/03/2015US8970818 Lithographic apparatus and component with repeating structure having increased thermal accommodation coefficient
03/03/2015US8969840 Droplet generator with actuator induced nozzle cleaning
03/03/2015US8969839 Laser produced plasma EUV light source
03/03/2015US8969838 Systems and methods for protecting an EUV light source chamber from high pressure source material leaks
03/03/2015US8969629 Cyclic compound, production process thereof, radiation-sensitive composition and resist pattern formation method
03/03/2015US8969483 (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
03/03/2015US8969275 Aqueous alkaline cleaning compositions and methods of their use
03/03/2015US8969219 UV-curable inorganic-organic hybrid resin and method for preparation thereof
03/03/2015US8969208 Method to form convex structure on surface of semiconductor material
03/03/2015US8968990 Method of forming resist pattern
03/03/2015US8968989 Assist layers for EUV lithography
03/03/2015US8968988 Resist pattern forming method, resist pattern, crosslinkable negative resist composition, nanoimprint mold and photomask
03/03/2015US8968986 Electrochemical cell
03/03/2015US8968985 Method and system for patterning a mask layer
03/03/2015US8968984 Photosensitive resin composition
03/03/2015US8968983 Photoresist composition, method of forming a pattern using the same, and method of manufacturing a display substrate
03/03/2015US8968982 Chemically amplified positive resist composition and patterning process
03/03/2015US8968981 Coating compositions for use with an overcoated photoresist
03/03/2015US8968980 Radiation-sensitive resin composition and compound
03/03/2015US8968979 Positive resist composition and patterning process
03/03/2015US8968862 Polarizer having protection films in two sides and optical device comprising the same
03/03/2015US8968857 High hardness imprint material
03/03/2015US8968673 Method for functionalising fluid lines contained in a micromechanical device, micromechanical device including functionalised lines, and method for manufacturing same
03/03/2015US8968630 Imprint lithography
03/03/2015US8968629 Apparatus and method for producing two-sided patterned web in registration
03/03/2015US8968620 Safe separation for nano imprinting
03/03/2015US8968525 Methods of flash reduction and patterning of graphite oxide and its polymer composites
03/03/2015US8968458 Composition for resist underlayer film and process for producing same
03/03/2015US8967992 Optically absorptive material for alignment marks
03/03/2015US8967991 Imprint lithography template
03/03/2015US8967826 Laser apparatus for generating a line-shaped intensity distribution in a working plane
03/03/2015US8967817 Imaging optical system with at most 11.6% of the illuminated surfaces of the pupil plane being obscured
02/2015
02/26/2015WO2015026482A2 Organometallic solution based high resolution patterning compositions
02/26/2015WO2015025949A1 Laminate body
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