| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/22/2000 | EP0986484A1 Method of preparing a printing plate |
| 03/22/2000 | EP0986476A1 Method of preparing a lithographic printing plate |
| 03/22/2000 | EP0986474A1 Heat sensitive printing plate precursors |
| 03/22/2000 | EP0986473A1 Heat sensitive plate precursor |
| 03/22/2000 | EP0986472A1 Heat sensitive plate precursors |
| 03/22/2000 | EP0723677B1 Top anti-reflective coating films |
| 03/22/2000 | CN2370442Y Laser double light beam holographic plate making instrument |
| 03/22/2000 | CN1248058A Method for coating corrosion inhibitor film and coater for corrosion inhibitor |
| 03/22/2000 | CN1247858A Photoresist monomer, its copolymer and composition using the same |
| 03/21/2000 | US6041270 Automatic recipe adjust and download based on process control window |
| 03/21/2000 | US6040909 Surface position detecting system and device manufacturing method using the same |
| 03/21/2000 | US6040894 Projection exposure apparatus and device manufacturing method |
| 03/21/2000 | US6040893 Scanning exposure method and apparatus for controlling acceleration and deceleration of a masking device |
| 03/21/2000 | US6040892 Multiple image reticle for forming layers |
| 03/21/2000 | US6040675 Supporting apparatus using magnetic power |
| 03/21/2000 | US6040583 Electron beam exposure method using a moving stage |
| 03/21/2000 | US6040353 Radiation curable silicone compositions |
| 03/21/2000 | US6040124 Imaging element with biaxially oriented sheet with fluoropolymer |
| 03/21/2000 | US6040120 Thermal processing apparatus |
| 03/21/2000 | US6040119 Exposing through a mask a dried photoresist coated onto substrate to actinic radiation, then baking for a time at a low temperature prior to final development of photoresist to provide accurate image |
| 03/21/2000 | US6040118 Performing a first exposure of radiation-bleachable film through a mask to forming at least two features having nonuniform critical dimensions, performing a second exposure without the mask to increase uniformity of dimensions |
| 03/21/2000 | US6040117 Negative photoresist stripping liquid composition |
| 03/21/2000 | US6040116 Imagewise exposing to actinic radiation photopolymerizable recording layer through water soluble optically clear top layer to decrease water solubility of recording layer in exposed areas, development using water-in-oil emulsion |
| 03/21/2000 | US6040115 Thermally imaging a thermosensitive element substrate coated with ink repellent polymer comprising silicone segments and hard segments to form lithographic printing plate developable without wiping |
| 03/21/2000 | US6040114 Exposing photosensitive film coated on substrate with a radiation beam to form a pattern of successive butting unit regions and resulting butting portions therebetween overlying isolation regions of integrated circuit, developing, etching |
| 03/21/2000 | US6040113 Hydrophilic lithographic base surface coated with radiation resistant alkali soluble polymer and overcoated with an infrared-sensitive polymer having alkali solubility which varies upon imagewise exposure |
| 03/21/2000 | US6040112 Photoresist composition |
| 03/21/2000 | US6040111 Aromatic hydroxycarboxylic acid resins and their use |
| 03/21/2000 | US6040110 Process and apparatus for the removal of resist |
| 03/21/2000 | US6040109 Guiding grained and anodized aluminum support over a heated roller, when foil is being coated with a photosensitive layer |
| 03/21/2000 | US6040108 Forming resin layer containing dissolved organic pigment precursor, imagewise precipitating colored nano-sized pigment particles upon exposure to chemical, thermal, photolytic or laser irradiation means |
| 03/21/2000 | US6040107 Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures |
| 03/21/2000 | US6040096 Measuring thermal expansion of mask substrate loosely supported to allow free thermal expansion, adjusting alignment of the mask substrate and the photosensitive substrate in response to the expansion amount |
| 03/21/2000 | US6040094 Quickly produced mask having radiation resistant layer to reinforce the bed sheet layer |
| 03/21/2000 | US6039897 Injection molding with microstructure from reservoirs |
| 03/21/2000 | US6039888 Multilayer element with etch layer on semiconductor, patterns, photoresists with exposure and development, selective removal of organic antireflective coating |
| 03/16/2000 | WO2000014781A1 Semiconductor processing methods of forming and utilizing antireflective material layers, and methods of forming transistor gate stacks |
| 03/16/2000 | WO2000014779A1 Exposure apparatus and exposure method, and device and method for producing the same |
| 03/16/2000 | WO2000014767A1 Quadrupole device for projection lithography by means of charged particles |
| 03/16/2000 | WO2000014766A1 Projection lithography device utilizing charged particles |
| 03/16/2000 | WO2000014750A1 Apparatus for generating focused electromagnetic radiation |
| 03/16/2000 | WO2000014605A1 Solid-capped liquid photopolymer printing elements |
| 03/16/2000 | WO2000014604A1 Positive photosensitive resin precursor composition and process for producing the same |
| 03/16/2000 | WO2000014603A1 Process for preparing a color filter or overlay |
| 03/16/2000 | WO2000014602A1 Process for forming a color filter |
| 03/16/2000 | WO2000013916A1 Three-dimensional microstructure |
| 03/16/2000 | WO2000013839A1 Laser radiation source |
| 03/16/2000 | WO2000003301A3 Exposure device having a planar motor |
| 03/16/2000 | DE19938072A1 Self-aligned structure, especially for semiconductor, micro-optical or micromechanical devices, is produced using an existing substrate structure as mask for back face resist layer exposure |
| 03/15/2000 | EP0986094A2 Exposure method and device manufacturing method using the same |
| 03/15/2000 | EP0986072A2 Process for treatment of a resist |
| 03/15/2000 | EP0985977A1 Integrated circuit device fabrication utilizing latent imagery |
| 03/15/2000 | EP0985976A2 Illumination apparatus, projection exposure apparatus and projection exposure method |
| 03/15/2000 | EP0985975A1 Positive-working chemical-amplification photoresist composition |
| 03/15/2000 | EP0985974A1 Photoresist compositions comprising blends of ionic and non-ionic photoacid generators |
| 03/15/2000 | EP0985683A1 Photosensitive composition and method for manufacturing lithographic printing plate |
| 03/15/2000 | EP0985528A1 Improvements in and relating to the manufacture of printing plates |
| 03/15/2000 | EP0985267A1 Method of making surface wave devices |
| 03/15/2000 | EP0985167A1 Alkaline developing composition and method of use to process lithographic printing plates |
| 03/15/2000 | EP0985166A1 Methods of imaging and printing with a positive-working infrared radiation sensitive printing plate |
| 03/15/2000 | EP0985165A1 Ionic halomethyl-1,3,5-triazine photoinitiators |
| 03/15/2000 | EP0985021A1 Non-corrosive stripping and cleaning composition |
| 03/15/2000 | EP0984931A1 Aromatic maleimides and their use as photoinitiators |
| 03/15/2000 | EP0850397A4 Methods for detecting striae |
| 03/15/2000 | EP0721606B1 Photopolymerisable composition |
| 03/14/2000 | US6038279 X-ray generating device, and exposure apparatus and semiconductor device production method using the X-ray generating device |
| 03/14/2000 | US6038080 Variable focus lens by small changes of the equatorial lens diameter |
| 03/14/2000 | US6038019 Method for monitoring defects of semiconductor device |
| 03/14/2000 | US6038015 Electron-beam-projection-exposure apparatus with integrated mask inspection and cleaning portions |
| 03/14/2000 | US6038013 Vibration isolator and exposure apparatus |
| 03/14/2000 | US6037967 Short wavelength pulsed laser scanner |
| 03/14/2000 | US6037680 Stage apparatus and linear motor, and exposure apparatus and device production method using the stage apparatus |
| 03/14/2000 | US6037601 Electron beam illumination device, and exposure apparatus with electron beam illumination device |
| 03/14/2000 | US6037107 Exposing to activation radiation a positive working photoresist comprising an alkali soluble resin substituted with an acid labile blocking group to generate halogenated sulfonic acid by photolysis |
| 03/14/2000 | US6037105 Optical waveguide device fabricating method |
| 03/14/2000 | US6037102 Masking layer containing a developer-soluble film-forming binder and a compound having a high absorbance to structure imagewise the underlying photosensitive layer by means of an infrared-laser from a digital data set; no oxygen penetration |
| 03/14/2000 | US6037101 Flexographic relief printing plates using an elastomeric block polymer as binder having blocks of polymerized styrene, ethylene, butylene and diene units; antiswelling when using printing inks containing ester solvents/uv-curable solvents |
| 03/14/2000 | US6037100 Dry film photoresist |
| 03/14/2000 | US6037098 Positive photosensitive composition |
| 03/14/2000 | US6037097 E-beam application to mask making using new improved KRS resist system |
| 03/14/2000 | US6037094 Photosensitive material employing microcapsules and superabsorbent polymer |
| 03/14/2000 | US6037093 Photosensitive recording medium |
| 03/14/2000 | US6037087 Writing a test pattern containing a first reference point on a non-productive area of a photomask, mounting the photomask on the first machine, initializing the coordinate system to the first reference point; determining the defects location |
| 03/14/2000 | US6037085 Photoresists and method for making printing plates |
| 03/14/2000 | US6037043 UV-hardenable and thermally hardenable epoxy resins for underfilling electrical and electronic components |
| 03/14/2000 | US6037007 Method of forming a uniform photoresist film using gas flow |
| 03/14/2000 | US6036911 Method of making a three-dimensional object by stereolithography |
| 03/14/2000 | US6036910 Irradiating mold to cure in situ a resin comprising photopolymerizable composition comprising liquid resin, photoinitiator, and small amount of carbon black pigment |
| 03/14/2000 | US6036162 Vibration isolator and method of isolating vibration |
| 03/09/2000 | WO2000013271A1 Tangential fan with cutoff assembly and vibration control for electric discharge laser |
| 03/09/2000 | WO2000013198A1 Plasma display panel and method for producing the same |
| 03/09/2000 | WO2000013062A1 Method for producing micro-openings |
| 03/09/2000 | WO2000013018A2 Support for a method for determining analytes and a method for producing the support |
| 03/09/2000 | WO2000013017A2 Method and device for producing and/or analyzing biochemical reaction supporting materials |
| 03/09/2000 | WO2000012958A1 Methods and apparatus for measuring the thickness of a film, particularly of a photoresist film on a semiconductor substrate |
| 03/09/2000 | WO2000012585A1 Photocurable composition, process for producing photocurable composition, photocurable pressure-sensitive adhesive sheet, and process for producing photocurable pressure-sensitive adhesive sheet |
| 03/09/2000 | WO2000012584A1 Cationic photocatalyst composition and photocurable composition |
| 03/09/2000 | WO2000012231A1 Method of removing organic materials from substrates |
| 03/09/2000 | WO2000012123A2 Method and measuring device for determining a plurality of analytes in a sample |
| 03/09/2000 | WO1999063536A3 Very-high-density memory device utilizing a scintillating data-storage medium |