Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2000
05/31/2000EP1004935A1 An imaging element for making an improved printing plate according to the silver salt diffusion transfer process
05/31/2000EP1004934A1 A method for preparing an imaging element for making an improved printing plate according to the silver salt diffusion transfer process.
05/31/2000EP1004933A1 A method for preparing an imaging element for making an improved printing plate according to the silver salt diffusion
05/31/2000EP1004926A1 Device for oblique light irradiation
05/31/2000EP1004647A1 Radiation curable silicone compositions
05/31/2000EP1004605A1 Radiation curable compositions containing alkenyl ether functional polyisobutylenes
05/31/2000EP1004568A2 Novel ester compounds, polymers, resist compositions and patterning process
05/31/2000EP1004057A1 Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
05/31/2000EP1003645A1 Method of making masks and electronic parts
05/31/2000EP1003561A2 Latent reactive polymers with biologically active moieties
05/31/2000EP0879304B1 Production of bevelled galvanic structures
05/31/2000EP0764346A4 High vertical aspect ratio thin film structures
05/31/2000EP0700534B1 Partially polymerized resins
05/31/2000DE19956532A1 Vernetzer für ein Photoresist und diesen enthaltende Photoresistzusammensetzung Crosslinkers for photoresist and photoresist composition containing it
05/31/2000DE19956531A1 Vernetzer für ein Photoresist und diesen enthaltende Photoresistzusammensetzung Crosslinkers for photoresist and photoresist composition containing it
05/31/2000DE19929701A1 Objektiv mit Kristall-Linsen Lens with crystal lenses
05/31/2000DE19855157A1 Projektionsobjektiv Projection lens
05/31/2000DE19855108A1 Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren Microlithographic reduction objective, projection exposure apparatus and method
05/31/2000DE19855106A1 Beleuchtungssystem für die VUV-Mikrolithographie An illumination system for the VUV microlithography
05/31/2000DE19850181A1 Radiation-sensitive composition for aluminum printing plates comprises polymer binder, compound releasing acid upon heating, radiation absorbing compound and enol ether
05/31/2000CN1255071A Method of making etched golf club parts
05/31/2000CN1254945A Method for forming wiring pattern
05/31/2000CN1254944A Photoresist pattern, technology for forming photoresist pattern and technology for forming wiring pattern
05/31/2000CN1254943A Electronic beam exposure system
05/31/2000CN1254710A Polybenzoxazole resin and precursor thereof
05/30/2000US6069937 Illumination apparatus
05/30/2000US6069931 Mask structure and mask holding mechanism for exposure apparatus
05/30/2000US6069749 Catadioptric reduction optical system
05/30/2000US6069739 Method and lens arrangement to improve imaging performance of microlithography exposure tool
05/30/2000US6069738 Apparatus and methods for extending depth of field in image projection systems
05/30/2000US6069684 Electron beam projection lithography system (EBPS)
05/30/2000US6069683 Scanning exposure method and apparatus
05/30/2000US6069682 Spherical shaped semiconductor integrated circuit
05/30/2000US6069433 Packaged strain actuator
05/30/2000US6069418 Electromagnetic motor
05/30/2000US6069417 Stage having paired E/I core actuator control
05/30/2000US6069363 Magnetic-electrostatic symmetric doublet projection lens
05/30/2000US6069219 Curable composition comprising ethylenically unsaturated monomer, transition metal-containing organometallic compound as initiator
05/30/2000US6069217 Thickener produced by linking polyurethane comprising polyisocyanate, polyether polyol, modifying agent and capping agent with alkali swellable copolymer comprising ethylenically unsaturated carboxylic acid and nonionic vinyl monomers
05/30/2000US6069214 Durable polymeric mixtures comprising polymerized ethylenically unsaturated monomers in combination with polycyanates; vibration damping constrained layer construction
05/30/2000US6069185 Low cure energy, have a high moisture vapor barrier, high damping characteristics, and a high refractive index, and provide a barrier to corrosive vapors and have maintained or enhanced modulus, tensile strength, and toughness
05/30/2000US6068964 Method for patterning an insulator film and installing a grounding pin through electron beam irradiation
05/30/2000US6068963 Negative-type image recording materials
05/30/2000US6068962 Novolak resin as an alkali-soluble component; quinonediazide; acid generator; anthracene derivative
05/30/2000US6068955 Methods of inspecting for mask-defined, feature dimensional conformity between multiple masks
05/30/2000US6068954 Having a set of alignment pattern openings and circuitry openings formed therethrough.
05/30/2000US6068952 Second pattern consists of a plurality of said first patterns so that it receives the same influence of aberration as said first pattern when irradiated with light.
05/30/2000US6068881 For applying a liquid as a coating on a substrate; avoids use of solvent to clean the back surface of the substrate
05/30/2000US6068750 Field emission display
05/30/2000US6068000 Substrate treatment method
05/25/2000WO2000030172A2 System for receiving and retaining a substrate
05/25/2000WO2000030165A1 Method and device for removing photoresist film
05/25/2000WO2000030164A1 Photoresist film removing method and device therefor
05/25/2000WO2000030163A1 Exposure method and device
05/25/2000WO2000030162A1 Novel detergent and cleaning method using it
05/25/2000WO2000030146A1 Method and device for exposing a substrate to light
05/25/2000WO2000029907A1 Priming composition for bonding photoresists on substrates
05/25/2000WO2000029906A2 Antireflective composition for a deep ultraviolet photoresist
05/25/2000WO2000029453A1 Photocurable composition
05/25/2000WO2000029214A1 Positive-working photosensitive lithographic printing plate and method for producing the same
05/25/2000WO2000019272B1 Methods of reducing proximity effects in lithographic processes
05/25/2000WO2000003301A9 Exposure device having a planar motor
05/25/2000WO1999067683A8 Optical system, especially a projection light facility for microlithography
05/25/2000DE19955021A1 Bildaufzeichnungselement mit biaxial orientierter Folie mit einem Fluoropolymeren The imaging element with biaxially oriented film with a fluoropolymer
05/25/2000DE19925175C1 Apparatus for transferring microstructures from a tool onto a substrate comprises a measuring system moving between carriers
05/25/2000DE19920161A1 Verfahren zum Herstellen von Mikrobauteilen mit Strömungskanälen A method of manufacturing micro-components having flow channels
05/25/2000CA2349578A1 Priming composition for bonding photoresists on substrates
05/25/2000CA2349307A1 Positive-working photosensitive lithographic printing plate and method for producing the same
05/25/2000CA2290306A1 Method of forming wiring pattern
05/24/2000EP1003201A2 Electron beam exposure apparatus and exposure method
05/24/2000EP1003079A1 Process for the production of flexible printing plates and device therefor
05/24/2000EP1003078A2 Replicating a nanoscale pattern
05/24/2000EP1002644A2 Production of support for lithographic printing plate.
05/24/2000EP1002643A1 Lithographic printing plate precursor and process for lithography
05/24/2000EP1002264A2 Method and apparatus for providing a bioinformatics database
05/24/2000EP1002258A1 Offset printing plate having a high support stability
05/24/2000EP1002242A2 Stepper or scanner having two energy monitors for a laser
05/24/2000EP0992092A4 Very narrow band laser with unstable resonance cavity
05/24/2000EP0739499B1 Method of forming polyimide patterns on substrates
05/24/2000CN1254338A Process for preparing photoactive coumarin derivatives
05/24/2000CN1254180A Method for correcting photo-adjacency effect in course of production of semiconductor device
05/24/2000CN1253961A Polybenzoxazole resin and its precursor
05/23/2000US6067375 Correction method and correction apparatus of mask pattern
05/23/2000US6067306 Laser-illuminated stepper or scanner with energy sensor feedback
05/23/2000US6067146 Photolithographic apparatus
05/23/2000US6067145 Light exposing device for manufacturing semiconductor device which further removes asymmetrical aberration
05/23/2000US6066853 Electron-optical system exhibiting reduced aberration
05/23/2000US6066578 Method and system for providing inorganic vapor surface treatment for photoresist adhesion promotion
05/23/2000US6066438 Forming photosensitive layer containing diazonaphthoquinone and novolak on substrate, applying amine-containing material, irradiating in pattern with light of appropriate wavelength to form ketene compound which reacts with amine to fix it
05/23/2000US6066436 Aqueous developable photosensitive polyurethane-methacrylate
05/23/2000US6066435 Composition comprising binder based on styrene-maleic anhydride halfester copolymer, photocurable acrylate compound, photoinitiator, propylene glycol halfester or halfether
05/23/2000US6066433 High molecular weight silicone compounds, chemically amplified positive resist compositions, and patterning method
05/23/2000US6066432 Material having hardening layer containing mixture of polymers; improved adhesion
05/23/2000US6066431 Simplified process for forming fluorescent substance pattern for display device which eliminates wet process developing step
05/23/2000US6066419 Monitoring semiconductor integrated circuits at steppers while performing a photolithography process; using an exposure pattern designed on a control wafer having different positions applied with different exposure parameters
05/23/2000US6066361 Method for coating a filament
05/23/2000US6066215 Method of forming a colored image sign using ink jet printing
05/23/2000US6065203 Method of manufacturing very small diameter deep passages
05/23/2000CA2103207C Method of and apparatus for cover sheet removal from laminated boards
05/19/2000CA2288458A1 Resist pattern, process for the information of the same, and process forthe formation of wiring pattern
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