| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/13/2000 | US6075155 Photopolymerizable monomers; solvent-free |
| 06/13/2000 | US6074944 Methods for priming wafers employed in integrated circuit devices using dihydropyrane |
| 06/13/2000 | US6074888 Method for fabricating semiconductor micro epi-optical components |
| 06/13/2000 | US6074804 Multilayer photoresists pattern |
| 06/13/2000 | US6074803 Bonding layers of insulation and subbing layers with resins with free radical photoinitiators |
| 06/13/2000 | US6074801 Negative type photoresist composition used for light beam with short wavelength and method of forming pattern using the same |
| 06/13/2000 | US6074800 Photoresists with photo acid generators and acid sensitive polymers with casting solvents |
| 06/13/2000 | US6074798 Radiation-sensitive material containing a multilayer support material |
| 06/13/2000 | US6074797 Precusor of waterless planographic printing plates |
| 06/13/2000 | US6074786 Reticle for alignment and pitch determination |
| 06/13/2000 | US6074742 Colored articles and compositions and methods for their fabrication |
| 06/13/2000 | US6074708 Photoinitiator photopolymerizable resin composition, polymer and liquid crystal display device |
| 06/13/2000 | US6074569 Stripping method for photoresist used as mask in Ch4 /H2 based reactive ion etching (RIE) of compound semiconductors |
| 06/13/2000 | US6074561 Apparatus and method for recovering photoresist developers and strippers |
| 06/13/2000 | US6074154 Substrate treatment system, substrate transfer system, and substrate transfer method |
| 06/13/2000 | US6074065 Polariser made from brewster plates |
| 06/11/2000 | CA2291547A1 Photoimageable compositions having improved chemical resistance and stripping ability |
| 06/08/2000 | WO2000033432A1 Durable etalon based output coupler |
| 06/08/2000 | WO2000033371A1 Composition for removing sidewall and method of removing sidewall |
| 06/08/2000 | WO2000033140A1 Composition and method for removing probing ink and negative photoresist from silicon wafers |
| 06/08/2000 | WO2000033139A1 Photoresist stripper and method of stripping |
| 06/08/2000 | WO2000033138A1 Large-apertured projection lens with minimal diaphragm error |
| 06/08/2000 | WO2000033137A2 Preparation of fractionated novolak resins by a novel extraction technique |
| 06/08/2000 | WO2000033131A1 Color filters for flat panel displays |
| 06/08/2000 | WO2000033121A1 Microlens structure having two anamorphic surfaces on opposing ends of a single high index substrate and method of fabricating the same |
| 06/08/2000 | WO2000033084A2 Arrays of organic compounds attached to surfaces |
| 06/08/2000 | WO2000033078A1 Porous coatings bearing ligand arrays |
| 06/08/2000 | WO2000032678A1 Solvent resistant photosensitive compositions |
| 06/08/2000 | WO2000032320A1 System and method for coating of substrates |
| 06/08/2000 | WO2000010056A9 Photoacid generators and photoresists comprising same |
| 06/08/2000 | DE19951770A1 Production of lithographic printing plate, by silver complex diffusion transfer process uses alkaline earth metal in developer solution |
| 06/08/2000 | DE19855629A1 Teilchenoptische Anordnung und Verfahren zur teilchenoptischen Erzeugung von Mikrostrukturen A particle-particle arrangement and method for producing microstructures |
| 06/07/2000 | EP1006570A1 Removal of post-rie polymer on Al/Cu metal line |
| 06/07/2000 | EP1006556A1 Particle-optical device and method for producing microstructures |
| 06/07/2000 | EP1006412A1 Development of radiation sensitive compositions |
| 06/07/2000 | EP1006411A2 Illumination system for vuv microlithography |
| 06/07/2000 | EP1006410A1 Aqueous developing solutions for reduced developer residue |
| 06/07/2000 | EP1006409A2 Method for patterning a semiconductor wafer using a mask that has several regions with different scattering ability |
| 06/07/2000 | EP1006389A2 Reduction objective for microlithography, apparatus and method for projection exposure |
| 06/07/2000 | EP1006388A2 Reduction projection objective lens for microlithography |
| 06/07/2000 | EP1006387A2 Projection objective lens for microlithography |
| 06/07/2000 | EP1006373A2 Objective with crystal lenses and projection exposure apparatus for microlithography |
| 06/07/2000 | EP1006119A1 Novel crystalline ion-association substance, process for producing the same, and latent photopolymerization initiator |
| 06/07/2000 | EP1005668A1 Releasable photopolymer printing plate and method of forming same |
| 06/07/2000 | EP1005664A1 Lithographic apparatus comprising a dedicated mirror projection system |
| 06/07/2000 | EP0910816A4 Composite relief image printing plates and methods for preparing same |
| 06/07/2000 | EP0852028B1 Black-and-white photothermographic and thermographic elements comprising hydroxamic acid compounds as contrast enhancers |
| 06/07/2000 | CN1255921A Process for preparing coumarin sulfonates |
| 06/07/2000 | CN1255653A Cross linking agent for photoslushing compound, and photoslushing compound compsns. containing same cross linking agent |
| 06/07/2000 | CN1255652A Cross linking agent for photoslushing compound, and photoslushing compound compsns. containing same cross linking agent |
| 06/07/2000 | CN1255651A High-density compound microarray chip preparing process based on electronic screen plate and silk screen print technology |
| 06/06/2000 | WO2000039221A1 Improved method for producing thermally cleavable, soluble pigment derivatives |
| 06/06/2000 | US6072852 High numerical aperture projection system for extreme ultraviolet projection lithography |
| 06/06/2000 | US6072561 Exposure method and apparatus |
| 06/06/2000 | US6072268 Lamp apparatus and method for re-using waste light |
| 06/06/2000 | US6072251 Magnetically positioned X-Y stage having six degrees of freedom |
| 06/06/2000 | US6072192 Test structure responsive to electrical signals for determining lithographic misalignment of vias relative to electrically active elements |
| 06/06/2000 | US6072185 Charged-particle-beam exposure device and method capable of high-speed data reading |
| 06/06/2000 | US6072184 Charged-particle-beam projection methods |
| 06/06/2000 | US6072183 Stage device for an exposure apparatus and semiconductor device manufacturing method which uses said stage device |
| 06/06/2000 | US6072162 Device and method for heating substrate, and method for treating substrate |
| 06/06/2000 | US6072006 Preparation of partially cross-linked polymers and their use in pattern formation |
| 06/06/2000 | US6071989 Process for preparing fine pigment dispersions |
| 06/06/2000 | US6071979 To generate photoinitiators for polymerizing unsaturated monomers and curing an unsaturated oligomer/monomer mixture |
| 06/06/2000 | US6071868 Photoresist stripping solution consists of alkanolamine, dimethylsulfoxide, n-methylpyrrolidone and glycolether |
| 06/06/2000 | US6071827 Method for manufacturing semiconductor devices |
| 06/06/2000 | US6071824 Method and system for patterning to enhance performance of a metal layer of a semiconductor device |
| 06/06/2000 | US6071676 Integrated circuit formed by exposing to radiation or particle beam through mask an organometallic fluoride compound coated onto substrate, removing residue and unexposed compound to leave submicron patterned deposit |
| 06/06/2000 | US6071675 Dispersing oleophilic solid particles in the oleophilic photosensitive layer of an on-press developable lithographic plate, to improve on-press developability and reduce tackiness |
| 06/06/2000 | US6071674 Anodized metal plate coated with photosensitive layer containing photoacid generator, acid decomposable compound and cyanine dye infrared absorber |
| 06/06/2000 | US6071673 Method for the formation of resist pattern |
| 06/06/2000 | US6071670 Transparent resin, photosensitive composition, and method of forming a pattern |
| 06/06/2000 | US6071669 Lowering peel strength of strippable support and photosensitive layer by using a non-photosensitive, non-tacky organic layer between an isolation layer attached to permanent support and photosensitive layer |
| 06/06/2000 | US6071668 Coating on a grained and anodized aluminum support an image receiving layer containing physical development nuclei, guiding support over rolls having low electrical resistance and coating with water permeable silver halide emulsion layer |
| 06/06/2000 | US6071667 Photosensitive resin composition containing a photosensitive polyamide resin |
| 06/06/2000 | US6071666 Polybenzoxaxole precursor polyamide mixed with a photosensitive quinonediazide compound and a bis- or trisphenolic compound which enhances sensitivity and solubility of exposed portion of photoresist |
| 06/06/2000 | US6071658 Forming a pattern on the mask, dividing the mask into patches and calculating the light intensity then exposure to electron beams |
| 06/06/2000 | US6071657 Forming stripe pattern on interior of panels for phosphors |
| 06/06/2000 | US6071655 Photographic prints with substrates and translucent glaze |
| 06/06/2000 | US6071653 Photomasking a transparent substrate, forming a bar layer covering, forming a opaque layer and removal of bar layer |
| 06/06/2000 | US6071595 Substrate with low secondary emissions |
| 06/06/2000 | US6071369 Method for making an lithographic printing plate with improved ink-uptake |
| 06/06/2000 | US6071315 Two-dimensional to three-dimensional VLSI design |
| 06/06/2000 | US6071094 Photoresist dispense pump |
| 06/06/2000 | US6070601 Jet-cleaning device for developing station |
| 06/06/2000 | CA2087511C Method of fabricating bragg gratings using a silica glass phase grating mask |
| 06/06/2000 | CA2057996C Manufacturing system for a polarizing picture |
| 06/02/2000 | WO2000031804A1 Improved microlens upon a photodetector |
| 06/02/2000 | WO2000031782A1 Silane-based oxide anti-reflective coating for patterning of metal features in semiconductor manufacturing |
| 06/02/2000 | WO2000031781A1 Method for forming resist pattern |
| 06/02/2000 | WO2000031780A1 Optical device, exposure system, and laser beam source, and gas feed method, exposure method, and device manufacturing method |
| 06/02/2000 | WO2000031774A2 Holding device for a substrate |
| 06/02/2000 | WO2000031592A1 Method of detecting aberrations of an optical imaging system |
| 06/02/2000 | WO2000031591A1 Method of forming conductive pattern |
| 06/02/2000 | WO2000030870A1 Method for decorating the surface of a painted substrate |
| 06/02/2000 | WO2000030869A1 Method for decoratively shaping a painted substrate surface |
| 05/31/2000 | EP1005066A2 Resist pattern, process for the information of the same, and process for the formation of wiring pattern |
| 05/31/2000 | EP1005065A2 Method of forming wiring pattern |
| 05/31/2000 | EP1004937A2 Exposure apparatus and optical system therefor |
| 05/31/2000 | EP1004936A1 Resist resin, resist resin composition, and process for patterning therewith |