Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2000
06/27/2000US6081316 Apparatus for exposure of printing plates using image modification
06/27/2000US6080680 Method and composition for dry etching in semiconductor fabrication
06/27/2000US6080678 Aromatic polysulfone film; o2 gas etching the arc film, and so2 gas preventing erosion of the photoresist pattern by forming cs2 on sides of the photoresist pattern
06/27/2000US6080533 Method of patterning photoresist using precision and non-precision techniques
06/27/2000US6080531 Using mixture of carrier solvent, ozone, and (bi) carbonate compounds
06/27/2000US6080530 Lithography process
06/27/2000US6080526 Integration of low-k polymers into interlevel dielectrics using controlled electron-beam radiation
06/27/2000US6080525 Photosensitive layer with imagewise toned and untoned areas
06/27/2000US6080524 Amplified photoresist
06/27/2000US6080522 Containing photoresist and polymer
06/27/2000US6080521 Reproduction; paper substrate with acidic overcoatings
06/27/2000US6080520 Imaging system having opaque support
06/27/2000US6080517 Method of projection exposure
06/27/2000US6080515 Forming colored photoresist on substrate; exposure; devlopment
06/27/2000US6080512 Semiconductor exposure method and apparatus, and a reticle therefor
06/27/2000US6080450 Comprising a free radical-polymerizable liquid composition, about 0.02 to 1.0 percent of a fluorescing agent, said fluorescing agent fluorescing at wavelengths above 350 nm and including a phosphine oxide photoinitiator
06/27/2000US6079428 Apparatus for removing coated film from peripheral portion of substrate
06/27/2000US6079352 Apparatus for coating a solution onto a sheet substrate
06/27/2000US6079256 Overlay alignment measurement of wafers
06/22/2000WO2000036471A1 Euv illumination system
06/22/2000WO2000036470A1 An exposure device
06/22/2000WO2000036469A1 Electron beam resist
06/22/2000WO2000036467A1 Photomask provided with an esd-precluding envelope
06/22/2000WO2000036210A1 Pigmented porous material
06/21/2000EP1011128A1 Projection exposure method, projection aligner, and methods of manufacturing and optically cleaning the aligner
06/21/2000EP1011030A1 Photosensitive lithographic printing plate
06/21/2000EP1011029A2 Radiation-sensitive resin composition
06/21/2000EP1011028A2 A method for fabrication of multi-step structures using embedded etch stop layers
06/21/2000EP1011019A1 Imaging elements comprising transparent electrically conductive layers
06/21/2000EP1010040A1 Laser-illuminated stepper or scanner with energy sensor feedback
06/21/2000EP1010031A1 Illumination design for scanning microlithography systems
06/21/2000EP1009861A1 Gene expression and evaluation system
06/21/2000EP0902914A4 Continuous production of cross-linked resin relief images for printing plates
06/21/2000DE19960368A1 Microlithographic method e.g. for manufacture of photomask for semiconductors, display panel, integrated optical device or electronic connection structure, uses feedback position correction for incident light fleck
06/21/2000DE19959952A1 Photolithographic printing plate includes a physical developer layer containing an alkoxylated phosphate ester and/or a water-soluble vinyl polymer containing a carboxylate ester group
06/21/2000DE19945847A1 Changing the wetting characteristics of a printing mold used in offset printing comprises putting the surface of a semiconductor in one chemical state, and putting parts of all regions of the semiconductor surface in a second chemical state
06/21/2000DE19940750A1 Substrate for analysis includes microchannels with predetermined pattern of receptors deposited and immobilized under computer control by light- or liquid-induced polymerization
06/21/2000DE19853588A1 Halteeinrichtung für ein Substrat Holding means for a substrate
06/21/2000CN1257610A Integration of low-K polymers into interlevel dielectrics using controlled electron-beam radiation
06/21/2000CN1257518A Nitrogen-containing epoxy resins for photocurable coating applications
06/21/2000CN1257224A Optical imaging compositions with improved flexibility and stripping ability
06/21/2000CN1257223A Optical imaging compositions with improved stripping ability and resolution
06/20/2000USRE36740 Cata-dioptric reduction projection optical system
06/20/2000US6078641 X-ray lithography system and x-ray lithography method
06/20/2000US6078640 X-ray exposure apparatus
06/20/2000US6078599 Wavelength shift correction technique for a laser
06/20/2000US6078382 Charged-particle-beam projection-optical system
06/20/2000US6078381 Exposure method and apparatus
06/20/2000US6078380 Projection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposure
06/20/2000US6078055 Proximity lithography device
06/20/2000US6078054 Charged particle beam optical system
06/20/2000US6077942 Precipitation from an organic polar solvent bath that is maintained at a temperature of from about 0-30 degrees c.; and filtering the resulting naphthoquinone diazide ester.
06/20/2000US6077932 Polymers of 2,7-dioxabicyclo[3.2.1]octane derivatives
06/20/2000US6077924 From a diaminopolysiloxane and a hydroxyl group-containing diamine and a dicarboxylic acid anhydride having a 2,5-dioxotetrahydrofuryl group
06/20/2000US6077879 Curable resin and resin composition
06/20/2000US6077647 Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same, and phosphor subjected to surface treatment and process for preparing the same
06/20/2000US6077645 Production of water-less lithographic plates
06/20/2000US6077644 Uniform solution of a film-forming acrylic resin and an acid generator
06/20/2000US6077643 Polymers and photoresist compositions
06/20/2000US6077632 Mask and device for managing the same
06/20/2000US6077631 Photomask and scanning exposure apparatus and device manufacturing method using same
06/20/2000US6077630 Subresolution grating for attenuated phase shifting mask fabrication
06/20/2000US6077629 Synthesis of photosensitive material; saturation porous aerogel; sealing
06/20/2000US6077560 Method for continuous and maskless patterning of structured substrates
06/20/2000US6077452 Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment
06/20/2000US6077449 Method of checking the accuracy of the result of a multistep etching process
06/20/2000US6077359 With high precision and velocity by means of a treatment liquid
06/20/2000US6077350 System and method for curing polymeric/photoresist coatings
06/20/2000US6077310 Optical proximity correction system
06/20/2000US6076464 System for making printing plates for newspaper printing
06/20/2000US6076459 Method and apparatus for the production of a printing stencil
06/15/2000WO2000035002A1 Method and device for optically monitoring processes for manufacturing microstructured surfaces in the production of semiconductors
06/15/2000WO2000034996A1 Stripping agent against resist residues
06/15/2000WO2000034830A1 Photocurable anisotropically conductive composition and anisotropically conductive pattern formed by using the same
06/15/2000WO2000034829A1 Positively photosensitive resin composition
06/15/2000WO2000034400A1 Radiation curable water based cationic inks and coatings
06/15/2000WO1999015609A8 Aqueous rinsing composition
06/15/2000DE19922614A1 Method to control manufacturing processes of fine structure surfaces in semiconductor manufacturing; involves comparing signatures obtained from diffraction image with references for reference surfaces
06/15/2000DE19853092A1 Übernahme- und Haltesystem für ein Substrat Acquisition and retention system for a substrate
06/14/2000EP1009020A1 Projection aligner, projection exposure method, optical cleaning method and method of fabricating semiconductor device
06/14/2000EP1009018A2 Apparatus and method for spin-coating semiconductor substrate
06/14/2000EP1008914A2 Microlithographic projection apparatus
06/14/2000EP1008913A1 Photoresist compositions comprising itaconic anhydride polymers
06/14/2000EP1008912A1 Photoimageable compositions having improved chemical resistance and stripping ability
06/14/2000EP1008911A1 Photoimageable compositions having improved flexibility and stripping ability
06/14/2000EP1008910A1 Photoimageable compositions having improved stripping ability and resolution
06/14/2000EP1008909A1 Composition for a photosensitive silver conductor tape and tape comprising the same
06/14/2000EP1008873A1 Color filter and process for producing the same
06/14/2000EP1008007A1 Monolithic multi-faceted mirror for combining multiple beams from different light sources by reflection
06/14/2000EP1007969A1 Lithographic mask design and synthesis of diverse probes on a substrate
06/14/2000EP1007737A1 System for providing a polymorphism database
06/14/2000EP1007349A4 Patterned conducting polymer surfaces and process for preparing the same and devices containing the same
06/14/2000EP1007349A1 Patterned conducting polymer surfaces and process for preparing the same and devices containing the same
06/14/2000EP1007333A1 Fabrication method and apparatus for fabricating an object as a plurality of successive laminae
06/14/2000EP0813565B1 Energy-polymerizable compositions comprising a cyanate ester monomer or oligomer and a polyol
06/14/2000CN1256439A Developing aqueous solution capable of reducing developer residue
06/14/2000CN1256438A Prevention of photoresist poisoning caused by antireflection coating of medium in manufacture of semiconductor
06/13/2000USRE36731 Method of forming pattern and projection aligner for carrying out the same
06/13/2000US6075652 Convex-microgranular surface structure
06/13/2000US6075585 Vibrating probe for a scanning probe microscope
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