| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/05/2000 | EP1017155A1 Positioning device, driving unit, and aligner equipped with the device |
| 07/05/2000 | EP1017086A1 Projection aligner, method of manufacturing the aligner, method of exposure using the aligner, and method of manufacturing circuit devices by using the aligner |
| 07/05/2000 | EP1016931A1 Exposure method and apparatus and alignment discrimination method and apparatus |
| 07/05/2000 | EP1016930A1 Bottom antireflective layer operating in destructive interference and absorption modes |
| 07/05/2000 | EP1016929A1 Method and apparatusfor stacking and drying cut imaged media |
| 07/05/2000 | EP1016699A1 Use of a solvent composition comprising an oxyisobutyric acid ester as a cleaning agent |
| 07/05/2000 | EP1016698A1 Use of a solvent composition containing an oxyisobutyric acid ester as a solvent in coatings, adhesives and printing inks |
| 07/05/2000 | EP1016519A2 Printing plate with reversible electrical charge-controlled wettability |
| 07/05/2000 | EP1016465A1 Spin coating method and coating apparatus |
| 07/05/2000 | EP1016182A2 Magnetically-positioned x-y stage having six-degrees of freedom |
| 07/05/2000 | EP1016092A1 Method and apparatus for producing extreme ultra-violet light for use in photolithography |
| 07/05/2000 | EP1015931A2 Optical system, especially a projection light facility for microlithography |
| 07/05/2000 | EP1015878A1 Methods for fabricating enclosed microchannel structures |
| 07/05/2000 | EP1015518A1 Isoxindigos useful as colorants and preparation thereof |
| 07/05/2000 | EP1015136A1 Method and apparatus for spin-coating chemicals |
| 07/05/2000 | EP0992093A4 Wavelength system for an excimer laser |
| 07/05/2000 | EP0767932B1 Low-volatility, substituted 2-phenyl-4,6-bis (halomethyl)-1,3,5-triazine for lithographic printing plates |
| 07/05/2000 | EP0762210B1 Photosensitive resin composition |
| 07/05/2000 | EP0710369B1 Very wide aperture catadioptric reducing object lens for microlithography |
| 07/05/2000 | CN2385888Y Printing copyboard |
| 07/05/2000 | CN1259174A Synthesis of onium hydroxides from onium salts |
| 07/05/2000 | CN1258730A Photoresist scavenger composition |
| 07/05/2000 | CN1258670A Cross-linking monomer using for photoresist and process for producing photoresist polymer using the same |
| 07/04/2000 | US6084938 X-ray projection exposure apparatus and a device manufacturing method |
| 07/04/2000 | US6084897 Laser processing device and laser device |
| 07/04/2000 | US6084723 Exposure apparatus |
| 07/04/2000 | US6084716 Optical substrate inspection apparatus |
| 07/04/2000 | US6084708 Double-refracting planar plate arrangement and deep ultraviolet λ/4-plate |
| 07/04/2000 | US6084706 High efficiency laser pattern generator |
| 07/04/2000 | US6084679 Universal alignment marks for semiconductor defect capture and analysis |
| 07/04/2000 | US6084673 Lithographic apparatus for step-and-scan imaging of mask pattern with interferometer mirrors on the mask and wafer holders |
| 07/04/2000 | US6084656 Programmable mask for exposure apparatus |
| 07/04/2000 | US6084655 Imaging method for manufacture of microdevices |
| 07/04/2000 | US6084602 Imaging system with high efficiency media loading |
| 07/04/2000 | US6084319 Linear motor, and stage device and exposure apparatus provided with the same |
| 07/04/2000 | US6084244 Scanning exposure apparatus that compensates for positional deviation caused by substrate inclination |
| 07/04/2000 | US6084004 Compositions which undergo light-induced cationic curing and their use |
| 07/04/2000 | US6083807 Overlay measuring mark and its method |
| 07/04/2000 | US6083803 Semiconductor processing methods of forming a conductive projection and methods of increasing alignment tolerances |
| 07/04/2000 | US6083670 Process and equipment for rejuvenation treatment of photoresist development waste |
| 07/04/2000 | US6083665 Without the troubles due to reflection of the exposure light on the substrate surface, oximesulfonate compound as an acid-generating agent; |
| 07/04/2000 | US6083664 By way of heat mode recording such as by laser light or the like. |
| 07/04/2000 | US6083662 Methods of imaging and printing with a positive-working infrared radiation sensitive printing plate |
| 07/04/2000 | US6083661 Photocurable divinyltetramethyldisiloxane bisbenzocyclobutane; multichip modules, printed circuits, coatings |
| 07/04/2000 | US6083660 Photopolymerizable, coatable organosol and method |
| 07/04/2000 | US6083659 Polymer mixture for photoresist and photoresist composition containing the same |
| 07/04/2000 | US6083658 Alkoxymethyl-substituted phenol crosslinking agent, binder polymer, acid generator, and infrared radiation absorber; lithographic printing plates |
| 07/04/2000 | US6083657 Positive photoresist compositions and a process for producing the same |
| 07/04/2000 | US6083656 Hand application to fabric of heat transfers imaged with color copiers/printers |
| 07/04/2000 | US6083650 Device manufacturing method utilizing concentric fan-shaped pattern mask |
| 07/04/2000 | US6083608 Monochrome and polychrome color proofs with low optical dot growth and a process and means for their preparation |
| 06/29/2000 | WO2000038487A1 Production of photoresist coatings |
| 06/29/2000 | WO2000038286A1 ArF LASER WITH LOW PULSE ENERGY AND HIGH REP RATE |
| 06/29/2000 | WO2000038281A1 Line narrowed f2 laser with etalon based output coupler |
| 06/29/2000 | WO2000038017A1 Projection optics box or assembly |
| 06/29/2000 | WO2000038016A1 Novolac polymer planarization films with high temperature stability |
| 06/29/2000 | WO2000038015A1 Method of imaging a mask pattern on a substrate by means of euv radiation, and apparatus and mask for performing the method |
| 06/29/2000 | WO2000038014A1 Photo mask production method and device thereof |
| 06/29/2000 | WO2000037972A1 Color filter and method of manufacture thereof |
| 06/29/2000 | WO2000002236A8 Radio frequency identification system and method for tracking silicon wafers |
| 06/29/2000 | DE19860041A1 Durch Addition an Isocyanatgruppen als auch durch strahlungsinduzierte Addition an aktivierte CC-Doppelbindungen härtbare Beschichtungsmittel By addition of isocyanate groups and by radiation-induced addition of activated carbon-carbon double bonds curable coating compositions |
| 06/29/2000 | DE19859634A1 Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie Optical system, in particular projection exposure system for microlithography |
| 06/28/2000 | EP1014429A1 Method and device for exposure control, method and device for exposure, and method of manufacture of device |
| 06/28/2000 | EP1014424A1 Mercury lamp of the short arc type and UV emission device |
| 06/28/2000 | EP1014201A2 Process for making large-size composite relief printing elements using laser-based positioning followed by image-wise exposure using a laser |
| 06/28/2000 | EP1014200A1 Method of developing photosensitive lithographic printing plate precursor |
| 06/28/2000 | EP1014199A2 Stage control apparatus and exposure apparatus |
| 06/28/2000 | EP1014198A2 Projection lithography using a servo control |
| 06/28/2000 | EP1014197A2 Lithographic projection apparatus |
| 06/28/2000 | EP1014196A2 Method and system of illumination for a projection optical apparatus |
| 06/28/2000 | EP1014195A1 Method of drying resinous composition layer, method of manufacturing color filter substrate using the same drying method, and liquid crystal display device |
| 06/28/2000 | EP1014194A1 Photopolymerisable printing plates with top layer for the production of relief printing plates |
| 06/28/2000 | EP1014193A1 Photoresist compositions suitable for deep-UV wavelength imaging |
| 06/28/2000 | EP1014139A2 Optical system, especially for a projection exposure system for microlithography, having a optical mount comprising actuators |
| 06/28/2000 | EP1014113A2 Photo curable resin composition and optical parts |
| 06/28/2000 | EP1013650A2 Tetracarboxylic dianhydride, derivative and production thereof, polyimide precursor, polyimide, resin composition, photosensitive resin composition, method of forming relief pattern, and electronic part |
| 06/28/2000 | EP1013469A1 Process for the preparation of photosensitive lithographic printing plate |
| 06/28/2000 | EP1012929A2 Laser with line narrowing output coupler |
| 06/28/2000 | EP1012837A1 Archival imaging and method therefor |
| 06/28/2000 | EP1012783A2 Data-conversion method for a multibeam laser writer for very complex microlithographic patterns |
| 06/28/2000 | EP1012672A1 A negatively acting photoresist composition based on polyimide precursors |
| 06/28/2000 | EP1012671A1 Photosensitive black matrix composition and process of making it |
| 06/28/2000 | EP1012670A1 Low-cost, simple mass production of light-guiding tips |
| 06/28/2000 | EP1012584A2 Object inspection and/or modification system and method |
| 06/28/2000 | EP1011984A1 Thermal waterless lithographic printing plate |
| 06/28/2000 | EP1011970A2 Thermal lithographic printing plate |
| 06/28/2000 | EP0900409A4 Processless diacetylenic salt films capable of developing a black image |
| 06/28/2000 | EP0851880B1 Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom |
| 06/28/2000 | CN1258302A Light-absorbing polymers and application thereof to antireflection film |
| 06/28/2000 | CN1257866A Epoxy acrylate, preparing process and use thereof |
| 06/28/2000 | CN1053993C Anti-reflective layer and method for mfg. same |
| 06/27/2000 | US6081658 Proximity correction system for wafer lithography |
| 06/27/2000 | US6081614 Surface position detecting method and scanning exposure method using the same |
| 06/27/2000 | US6081581 X-ray illumination system and X-ray exposure apparatus |
| 06/27/2000 | US6081578 Three-mirror system for lithographic projection, and projection apparatus comprising such a mirror system |
| 06/27/2000 | US6081382 Catadioptric reduction projection optical system |
| 06/27/2000 | US6081366 Optical fiber communication system with a distributed Raman amplifier and a remotely pumped er-doped fiber amplifier |
| 06/27/2000 | US6081320 Illumination apparatus and exposure apparatus |
| 06/27/2000 | US6081319 Illumination system and scan type exposure apparatus |
| 06/27/2000 | US6081318 Installation for fabricating double-sided photomask |