| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/18/2000 | US6090533 Condensing formaldehyde with phenolic compounds in presence of acid catalyst; adding water soluble solvent; precepitating novolak resin; dissolving resin in solvent e.g. 2-heptanone to for aqueous alkali soluble film forming resin |
| 07/18/2000 | US6090531 Compostion for anti-reflective coating material |
| 07/18/2000 | US6090530 Heating substrate using thermal energy in pressurized procesing chamber; applying electromagnetic energy to electrode to strike a plasma to plasma-polymerize precursor gas methylsilane to deposit polymer film on substrate |
| 07/18/2000 | US6090528 Generating electron beam; shaping by directing it through square aperture in lamina having serrated edge encircling aperture; projecting electron beam as square or rectangular spot onto potoresist layered on substrate |
| 07/18/2000 | US6090527 Forming latent images on electron beam resist by charged particles obtained by transmitting electron beam through electron beam exposure mask |
| 07/18/2000 | US6090526 Chemically-amplified positive-acting resin binder having phenolic units and acetalester or ketalester units; deprotection; acid-generating photocatalyst; resolution; fineness; etching resistance, especially halogen compounds |
| 07/18/2000 | US6090525 Actinic radiation sensitive polymer composition |
| 07/18/2000 | US6090523 Multi-resin material for an antireflection film to be formed on a workpiece disposed on a semiconductor substrate |
| 07/18/2000 | US6090522 For inhibition of reverse reactions of a protecting group elimination reaction, to thereby increase the dissolution contrast and resolution; for use in a photolithography step in the production of a semiconductor device |
| 07/18/2000 | US6090521 Apparatus for forming a photoresist film in a semiconductor device and method of forming a photoresist film using the same |
| 07/18/2000 | US6090518 Radiation sensitive composition |
| 07/18/2000 | US6090510 Method for scanning exposure |
| 07/18/2000 | US6090474 Flowable compositions and use in filling vias and plated through-holes |
| 07/18/2000 | US6090453 Preparing a thermal ink jet printhead by the curing process; halomethyl group substituents enable crosslinking or chain extension of the polymer |
| 07/18/2000 | US6090236 Photocuring, articles made by photocuring, and compositions for use in photocuring |
| 07/18/2000 | US6090205 Apparatus for processing substrate |
| 07/18/2000 | US6089853 Patterning device for patterning a substrate with patterning cavities fed by service cavities |
| 07/18/2000 | US6089762 Developing apparatus, developing method and substrate processing apparatus |
| 07/18/2000 | US6089525 Six axis active vibration isolation and payload reaction force compensation system |
| 07/15/2000 | CA2294684A1 Dose correction for along scan linewidth variation |
| 07/15/2000 | CA2294677A1 Dynamically adjustable high resolution adjustable slit |
| 07/13/2000 | WO2000041226A1 Projection optical system, method for producing the same, and projection exposure apparatus using the same |
| 07/13/2000 | WO2000041225A1 Method for cleaning optical device, exposure apparatus and exposure method, method for manufacturing device, and device |
| 07/13/2000 | WO2000041213A1 Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
| 07/13/2000 | WO2000041209A1 Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field |
| 07/13/2000 | WO2000041208A1 An apparatus and method for controlling a beam shape |
| 07/13/2000 | WO2000041207A1 A method and apparatus that determines charged particle beam shape codes |
| 07/13/2000 | WO2000041037A1 Method of removing photoresist material with dimethyl sulfoxide |
| 07/13/2000 | WO2000041036A1 Photo-curable polymer composition and flexographic printing plates containing the same |
| 07/13/2000 | WO2000040776A1 In situ chemical generator and method |
| 07/13/2000 | WO2000040636A1 Accelerators useful for energy polymerizable compositions |
| 07/13/2000 | WO2000040635A1 Photo-polymerizable compositions and articles made therefrom |
| 07/13/2000 | WO2000040632A1 Curable resin composition, modified copolymer and resin composition, and alkali development type photocurable glass paste |
| 07/13/2000 | WO2000040347A1 Non-corrosive cleaning composition and method for removing plasma etching residues |
| 07/13/2000 | WO2000040343A1 Apparatus and method for applying flux to a substrate |
| 07/13/2000 | WO2000019247A3 Multilayer optical element |
| 07/13/2000 | DE19962582A1 Lacquering substrates with UV-setting lacquer involves printing lacquer onto substrate with gravure printing technique and hardening coating on substrate by exposing it to UV light |
| 07/13/2000 | DE19950987A1 Semiconductor wafer exposure device for photolithographic process in semiconductor component manufacture uses detection and analysis of light reflected from photoresist layer for controlling shutter in path of exposure beam |
| 07/13/2000 | DE19860671A1 Production of colored photomask for exposure of photographic emulsions for color filter of liquid crystal display involves producing adjacent different color filter areas by applying and structurizing dichroitic layers |
| 07/13/2000 | DE19853093A1 Verfahren und Anordnung zur Belichtung eines Substrates Method and apparatus for exposing a substrate |
| 07/13/2000 | CA2355319A1 Accelerators useful for energy polymerizable compositions |
| 07/13/2000 | CA2322972A1 A method and apparatus that determines charged particle beam shape codes |
| 07/13/2000 | CA2322966A1 Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field |
| 07/13/2000 | CA2322778A1 An apparatus and method for controlling a beam shape |
| 07/12/2000 | EP1018669A2 Projection lithography with servo control |
| 07/12/2000 | EP1018632A2 Non-destructive method and device for measuring the depth of a recessed material |
| 07/12/2000 | EP1018140A1 Electron sources having shielded cathodes |
| 07/12/2000 | EP1017770A1 Aqueous rinsing composition |
| 07/12/2000 | EP0875022A4 Composition for the manufacture of flexographic printing plates |
| 07/12/2000 | EP0852027B1 Black-and-white photothermographic and thermographic elements comprising amine compounds as contrast enhancers |
| 07/12/2000 | EP0847329B1 Process for fabricating three-dimensionally structured polymer films for integrated optics |
| 07/12/2000 | EP0782483B1 Selective removal of material by irradiation |
| 07/12/2000 | EP0663139B1 Electrodeless lamp with bulb rotation |
| 07/12/2000 | CN1259933A Photocurable halofluorinated acrylates |
| 07/12/2000 | CN1259760A Method for mfg. semiconductor crystal plate by making several zone masks having various scatter abilites |
| 07/12/2000 | CN1259759A Improved contaction and deep photolithographic processing |
| 07/11/2000 | US6088505 Holographic patterning method and tool for production environments |
| 07/11/2000 | US6088379 Ultraviolet laser apparatus and semiconductor exposure apparatus |
| 07/11/2000 | US6088377 Optical semiconductor device having a diffraction grating and fabrication process thereof |
| 07/11/2000 | US6088171 Projection optical system |
| 07/11/2000 | US6088113 Focus test mask for projection exposure system, focus monitoring system using the same, and focus monitoring method |
| 07/11/2000 | US6088082 Projection aligner and projection aligning method |
| 07/11/2000 | US6088080 Exposure apparatus and device manufacturing method |
| 07/11/2000 | US6087797 Exposure method, and method of making exposure apparatus having dynamically isolated reaction frame |
| 07/11/2000 | US6087669 Charged-particle-beam projection-microlithography apparatus and transfer methods |
| 07/11/2000 | US6087668 Charged-particle-beam projection method and apparatus |
| 07/11/2000 | US6087667 Charged-particle-beam (CPB) lithography apparatus, evaluation method, and CPB source |
| 07/11/2000 | US6087414 Process for direct substitution of high performance polymers with unsaturated ester groups |
| 07/11/2000 | US6087412 Ophthalmic molding blend of macromolecule containing photoinitiator, hydrophilic vinyl monomer and crosslinker |
| 07/11/2000 | US6087283 Silica glass for photolithography |
| 07/11/2000 | US6087076 Method of manufacturing semiconductor devices by performing coating, heating, exposing and developing in a low-oxygen or oxygen free controlled environment |
| 07/11/2000 | US6087074 Forming semitransparent phase shifting mask having periphery of pattern element area, light shielding portion formed by semitransparent phase shifting portion and transparent portion with optimal size combination |
| 07/11/2000 | US6087073 Production of water-less lithographic plates |
| 07/11/2000 | US6087072 Article having a light-controllable super-water-repellent surface and a printing machine using the article |
| 07/11/2000 | US6087071 Process for increasing thermostability of a resist through electron beam exposure |
| 07/11/2000 | US6087070 As photoinitiators for base-catalyzable reactions |
| 07/11/2000 | US6087068 Undercoating composition for photolithographic resist |
| 07/11/2000 | US6087066 As binder for producing lithographic plates |
| 07/11/2000 | US6087065 Photoresist film for deep ultra violet and method for forming photoresist film pattern using the same |
| 07/11/2000 | US6087064 Useful in a multilayer photolithographic processes and are capable of producing high resolution |
| 07/11/2000 | US6087063 Positive-working photoresist composition |
| 07/11/2000 | US6087062 Polyborate coinitiators for photopolymerization |
| 07/11/2000 | US6087061 Hand application to fabric of heat transfers imaged with color copiers/printers |
| 07/11/2000 | US6087053 Accuracy |
| 07/11/2000 | US6087052 Charged particle beam exposure method utilizing subfield proximity corrections |
| 07/11/2000 | US6087050 Radiation sensitive composition and color filter |
| 07/11/2000 | US6087049 A binary mask curve and a phase shift mask curve in relationship with critical dimensions of the photomask and original pattern; accuracy, resolution |
| 07/11/2000 | US6086773 Method and apparatus for etching-manufacture of cylindrical elements |
| 07/11/2000 | US6086701 Process for the production of stamper |
| 07/11/2000 | US6086269 Method and apparatus for applying a substance to a surface |
| 07/11/2000 | US6085762 Apparatus and method for providing pulsed fluids |
| 07/06/2000 | WO2000039640A1 Flexographic printing plate and original plate therefor |
| 07/06/2000 | WO2000039639A1 Photosensitive resin composition |
| 07/06/2000 | WO2000039623A1 Reflection refraction image-forming optical system and projection exposure apparatus comprising the optical system |
| 07/06/2000 | WO2000039183A1 Coating agents which can be hardened by the addition of isocyanate groups as well as by the radiation-induced addition of activated c-c double covalent bonds |
| 07/06/2000 | WO1999054784A9 Free-form nanofabrication using multi-photon excitation |
| 07/06/2000 | WO1999049346A9 High na system for multiple mode imaging |
| 07/06/2000 | DE19957347A1 Photographic, light-sensitive silver halide material, useful for making plates, color negative or positive, black-and-white, medical x-ray or scanner film or lithographic printing plate, contains self-emulsifiable isocyanate in primer layer |
| 07/06/2000 | DE19940320A1 Nicht reflektierende Beschichtungspolymere und Verfahren zu deren Herstellung Non-reflective coating polymers and methods for their preparation |
| 07/06/2000 | DE19859631A1 Verfahren zur Herstellung von großformatigen Verbund-Reliefdruckformen durch Laserpositionierung und anschließende Bebilderung mittels Laser A process for the production of large-format composite relief printing plates by laser positioning and subsequent imaging by means of laser |