| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/01/2000 | US6096267 System for detecting base contaminants in air |
| 08/01/2000 | US6095667 Illuminating optical system for use in projecting exposure device |
| 08/01/2000 | US6094965 Semiconductor calibration structures and calibration wafers for ascertaining layer alignment during processing and calibrating multiple semiconductor wafer coating systems |
| 07/27/2000 | WO2000044161A2 Multiple-beam, diode-pumped imaging system |
| 07/27/2000 | WO2000043839A1 Hybrid aerial image simulation |
| 07/27/2000 | WO2000043838A1 Laser writer |
| 07/27/2000 | WO2000043837A1 Method for producing printing plate |
| 07/27/2000 | WO2000043731A1 Multiple alignment mechanisms near shared processing device |
| 07/27/2000 | WO2000043130A1 Flow controller |
| 07/27/2000 | WO2000010058A9 Reaction force isolation system for a planar motor |
| 07/27/2000 | DE19902527A1 Druckplattenträger und Verfahren zur Herstellung eines Druckplattenträgers oder einer Offsetdruckplatte Printing plate support and method for manufacturing a printing plate support or an offset printing plate |
| 07/27/2000 | CA2296899A1 Reflective fly's eye condenser for euv lithography |
| 07/26/2000 | EP1022771A2 Improved contact and deep trench patterning |
| 07/26/2000 | EP1022617A2 Optical correction plate, and its application in a lithographic projection apparatus |
| 07/26/2000 | EP1022616A2 Exposure device for a strip-shaped workpiece |
| 07/26/2000 | EP1022615A1 Photomask case, conveying device, and conveying method |
| 07/26/2000 | EP1022589A1 Diffractive optical element |
| 07/26/2000 | EP1022561A2 Manufacturing method for integrated sensor arrays |
| 07/26/2000 | EP1022269A2 Sulfonium salts and method of synthesis |
| 07/26/2000 | EP1022133A1 Lithographic printing plate and method for its' manufacture using laser irradiation |
| 07/26/2000 | EP1021856A1 Narrow band excimer laser |
| 07/26/2000 | EP1021821A1 Method and apparatus for automatically generating schedules for wafer processing within a multichamber semiconductor wafer processing tool |
| 07/26/2000 | EP1021750A1 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
| 07/26/2000 | EP1021749A1 Techniques for fabricating and packaging multi-wavelength semiconductor laser array devices (chips) and their applications in system architectures |
| 07/26/2000 | EP1021748A1 Multiple image reticle for forming layers |
| 07/26/2000 | EP1021747A1 Optical lithography beyond conventional resolution limits |
| 07/26/2000 | EP1021477A1 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
| 07/26/2000 | EP1021301A1 Planographic printing |
| 07/26/2000 | EP0858615B1 Thermosetting anti-reflective coatings and method for making same |
| 07/26/2000 | EP0824721B1 Imaging system and apparatus for ultraviolet lithography |
| 07/26/2000 | EP0349532B2 Thermal imaging medium |
| 07/26/2000 | CN1261171A Chemically enhanced possitive photoetching compositions |
| 07/26/2000 | CN1261071A Matte salts and production thereof |
| 07/26/2000 | CA2296926A1 Euv condenser with non-imaging optics |
| 07/25/2000 | US6094448 Grating assembly with bi-directional bandwidth control |
| 07/25/2000 | US6094305 Exposure method and apparatus therefor |
| 07/25/2000 | US6094268 Projection exposure apparatus and projection exposure method |
| 07/25/2000 | US6094256 Method for forming a critical dimension test structure and its use |
| 07/25/2000 | US6094255 Projection exposure apparatus and method that floats a plate |
| 07/25/2000 | US6093973 Hard mask for metal patterning |
| 07/25/2000 | US6093932 Method of writing any patterns on a resist by an electron beam exposure and electron beam exposure system |
| 07/25/2000 | US6093931 Pattern-forming method and lithographic system |
| 07/25/2000 | US6093753 Sulfonium salt compounds, polymerization initiator, curable composition and curing method |
| 07/25/2000 | US6093653 Etching electrode layer in plasma etching chamber using mixture of chlorine and nitrogen gases |
| 07/25/2000 | US6093598 Process for exactly transferring latent images in photo-resist layer nonuniform in thickness in fabrication of semiconductor integrated circuit device |
| 07/25/2000 | US6093522 Processing of lithographic printing plate precursors |
| 07/25/2000 | US6093520 High aspect ratio microstructures and methods for manufacturing microstructures |
| 07/25/2000 | US6093518 Visible laser-curable composition |
| 07/25/2000 | US6093517 Consists of a radiation sensitive acid generator, a polymeric binder and a dissolution inhibitor consists of a calix(4)resorcinarene partially or wholly protected with acid-labile protecting groups |
| 07/25/2000 | US6093511 Method of manufacturing semiconductor device |
| 07/25/2000 | US6093509 Lithographic printing plate |
| 07/25/2000 | US6093508 Dual damascene structure formed in a single photoresist film |
| 07/25/2000 | US6093507 Forming phase shifting masks which require only one resist application which can be exposed by a single electron beam using different exposure doses |
| 07/25/2000 | US6093296 Electrophoresis using nonconductive polymeric support cards having branched surface trenches, for sequencing or synthesis of proteins or dna, efficiency, accuracy |
| 07/25/2000 | US6093246 Photonic crystal devices formed by a charged-particle beam |
| 07/25/2000 | US6092937 Linear developer |
| 07/20/2000 | WO2000042640A1 Pattern matching method and device, position determining method and device, position aligning method and device, exposing method and device, and device and its production method |
| 07/20/2000 | WO2000042639A1 Method and apparatus for projection exposure |
| 07/20/2000 | WO2000042630A1 System for production of large area display panels with improved precision |
| 07/20/2000 | WO2000042618A1 Maskless, microlens euv lithography system |
| 07/20/2000 | WO2000042475A1 Chemical filtering for optimising the light transmittance of a gas |
| 07/20/2000 | WO2000042474A1 Method for depositing photoresist onto a substrate |
| 07/20/2000 | WO2000042472A1 Method for patterning thin films |
| 07/20/2000 | WO2000042471A1 Ceramic paste composition and prototyping method |
| 07/20/2000 | WO2000042080A1 Photopolymerizable vinyl ether based monomeric formulations and polymerizable compositions which may include certain novel spiroorthocarbonates |
| 07/20/2000 | WO2000041990A1 Benzophenones and the use thereof as photoinitiators |
| 07/20/2000 | WO2000041893A1 Thermal transfer element and process for forming organic electroluminescent devices |
| 07/20/2000 | WO2000041892A1 Thermal transfer element for forming multilayer devices |
| 07/20/2000 | WO2000041875A1 Extreme-uv lithography vacuum chamber zone seal |
| 07/20/2000 | WO2000041740A2 Particles for oral delivery of peptides and proteins |
| 07/20/2000 | WO2000025153A3 Simultaneously achieving circular symmetry and diminishing effects of optical defects and deviations during real time use of optical devices |
| 07/20/2000 | WO2000014605A8 Solid-capped liquid photopolymer printing elements |
| 07/20/2000 | WO2000013017A3 Method and device for producing and/or analyzing biochemical reaction supporting materials |
| 07/20/2000 | WO2000003341A9 A method and system for generating a flat mask onto a three-dimensional surface |
| 07/20/2000 | CA2359474A1 Particles for oral delivery of peptides and proteins |
| 07/20/2000 | CA2355326A1 Photopolymerizable vinyl ether based monomeric formulations and polymerizable compositions which may include certain novel spiroorthocarbonates |
| 07/19/2000 | EP1021030A2 Internal drum imaging system |
| 07/19/2000 | EP1020897A1 Aligner, exposure method, method of pressure adjustment of projection optical system, and method of assembling aligner |
| 07/19/2000 | EP1020770A2 Dose control for correcting line width variation in the scan direction |
| 07/19/2000 | EP1020769A2 Dynamically adjustable slit |
| 07/19/2000 | EP1020768A1 Hydroxystyrene copolymers and photoresists comprising same |
| 07/19/2000 | EP1020767A1 Chemical amplification type positive resist composition |
| 07/19/2000 | EP1020766A1 Photosensitive resin composition for flexographic printing plates |
| 07/19/2000 | EP1020765A1 Process for obtaining a decorative design on a glass surface |
| 07/19/2000 | EP1020479A2 Photoinitiators for cationic curing |
| 07/19/2000 | EP1019994A1 Narrow band excimer laser with gas additive |
| 07/19/2000 | EP1019992A1 Pulse energy control for excimer laser |
| 07/19/2000 | EP1019951A1 Processes of isolation in integrated circuit fabrication, using an antireflective coating |
| 07/19/2000 | EP1019948A1 Long-life electrode for high pressure discharge lamp |
| 07/19/2000 | EP1019776A1 Method and device for producing an image which can be represented in 3-d |
| 07/19/2000 | EP1019254A1 Presensitised printing plates |
| 07/19/2000 | EP0894287B1 Two-dimensionally balanced positioning device, and lithographic device provided with such a positioning device |
| 07/19/2000 | CN2388622Y Platform device of plate-making machine |
| 07/19/2000 | CN1260817A Matting paste for cationic system |
| 07/19/2000 | CN1260355A Anti-reflection coating polymer and preparing method thereof |
| 07/18/2000 | US6091845 Inspection technique of photomask |
| 07/18/2000 | US6091486 Blazed grating measurements of lithographic lens aberrations |
| 07/18/2000 | US6091202 Electron beam exposure apparatus with non-orthogonal electron emitting element matrix |
| 07/18/2000 | US6090865 Polymerizable composition |
| 07/18/2000 | US6090534 Positioning a semiconductor wafer in a track developer, applying a photoresist developer to a first side of semiconductor at predetermined speed, increasing speed; rinsing; applying back spray; subjecting water to flow of ions |