| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/09/2000 | EP1026548A2 Optical member for photolithography and photolithography apparatus |
| 08/09/2000 | EP1026547A2 Reflective fly's eye condenser for EUV lithography |
| 08/09/2000 | EP1026546A1 Recording medium and process for forming medium |
| 08/09/2000 | EP1026538A2 Narrow band uv laser with visible light alignment laser |
| 08/09/2000 | EP1026532A1 Assembly comprising an optical element and an optical mount |
| 08/09/2000 | EP1026208A1 Composition for reflection reducing coating |
| 08/09/2000 | EP1026129A1 Li2O-Al2O3-SiO2 TYPE TRANSPARENT CRYSTALLIZED GLASS |
| 08/09/2000 | EP1025992A1 A method for making positive printing plates |
| 08/09/2000 | EP1025991A1 A method for making positive working printing plates |
| 08/09/2000 | EP1025990A1 Heat sensitive material , process for making lithographic printing plates and method of printing using this material |
| 08/09/2000 | EP1025464A1 Composite relief image printing plates |
| 08/09/2000 | EP1025463A1 Lens array photolithography |
| 08/09/2000 | EP1025462A1 Thermosetting polyester anti-reflective coatings for multilayer photoresist processes |
| 08/09/2000 | EP1025281A1 Synthesis of onium hydroxides from onium salts |
| 08/09/2000 | EP1025172A1 Resin reinforced cross-linkable printing inks and coatings |
| 08/09/2000 | EP1025169A1 Use of dimerdiolalcoxylate (meth)acrylic acid esters as constituents for radiation cured coatings |
| 08/09/2000 | EP1024965A1 Process for removing residues from a semiconductor substrate |
| 08/09/2000 | EP1024963A1 Pattern formation |
| 08/09/2000 | EP1024958A1 Manufacture of lithographic printing forms |
| 08/09/2000 | EP0938409A4 Laser imageable tuned optical cavity thin film and printing plate incorporating the same |
| 08/09/2000 | EP0909407B1 Photopolymerizable thermosetting resin composition |
| 08/09/2000 | CN2391222Y Processing mechanism for photopolymer plate platemaking machine |
| 08/09/2000 | CN1262460A Technique for making X-ray mask |
| 08/08/2000 | US6101267 Position detecting method and apparatus, and exposure method and apparatus |
| 08/08/2000 | US6101237 X-ray mask and X-ray exposure method using the same |
| 08/08/2000 | US6101047 Catadioptric optical system for lithography |
| 08/08/2000 | US6100978 Dual-domain point diffraction interferometer |
| 08/08/2000 | US6100961 Projection exposure apparatus and method |
| 08/08/2000 | US6100636 Black matrix with conductive coating |
| 08/08/2000 | US6100582 Circuit substrate, circuit-formed suspension substrate, and production method thereof |
| 08/08/2000 | US6100515 Scanning exposure method and apparatus in which a mask and a substrate are moved at different scan velocities and exposure parameters are varied |
| 08/08/2000 | US6100312 A curable quaternary ammonium addition copolymer with a dispersed fine-grain pigment; storage stability; color filter used in a liquid crystal display element |
| 08/08/2000 | US6100016 Developer contains a copolymer acting as emulsifier containing the units of atleast one hydrophobic vinyl aromatic compound and a hydrophillic, esterified ethylenically unsaturated carboxylic acid; development |
| 08/08/2000 | US6100015 Resist pattern forming method |
| 08/08/2000 | US6100014 Method of forming an opening in a dielectric layer through a photoresist layer with silylated sidewall spacers |
| 08/08/2000 | US6100013 Depositing hybrid resist on the substrate, exposing the resist through a mask, developing the resist, forming gate sidewall spacer in hybrid resist, etching through hybrid resist sidewall spacer, blanket exposure and development |
| 08/08/2000 | US6100012 Coating a chemically amplified resist layer onto the substrate, exposing the amplified resist layer to a first radiation through mask to produce exposed region and unexposed region, irridating both regions, and developing |
| 08/08/2000 | US6100011 Exposing the polymeric material to actinic light, e-beam or x-rays to provide free acid groups, developing the polymer with developing solution containing atleast one amino group and atleast two sulfonate group to remove exposed polymer |
| 08/08/2000 | US6100010 Forming a photoresist film on a layer to be etched, patterning the upper layer by applying light to which upper layer is sensitive, using mask, etching middle layer which has been exposed at patterning step, patterning lower layer |
| 08/08/2000 | US6100008 Positive photoresist with improved contrast ratio and photospeed |
| 08/08/2000 | US6100007 Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures |
| 08/08/2000 | US6100006 Peel-apart photosensitive elements and their process of use |
| 08/08/2000 | US6100004 Radiation-sensitive mixture comprising as an infrared radiation absorbing component a carbon black pigment having a primary particle size smaller than 80 nm, which is predispersed in a polymer containing acidic units |
| 08/08/2000 | US6099994 Useful in making colored images including applications such as color proofs and color filter elements |
| 08/08/2000 | US6099787 Process for making three-dimensional articles by stereolithography |
| 08/08/2000 | US6099122 Reacting an oligomer or polymer cotaining groups coreactive with isocyanate groups with a functional photoinitiator to form macroinitiator, applying the thin layer of macroinitiator to a reactive surface, irridating with uv rad |
| 08/08/2000 | US6098809 Storage container for precision substrates |
| 08/08/2000 | US6098408 System for controlling reflection reticle temperature in microlithography |
| 08/03/2000 | WO2000045519A2 Broad band controlled angle analog diffuser and associated method s |
| 08/03/2000 | WO2000045224A1 Photo-curable electrically conductive composition and plasma display panel having electrode formed by use of the same |
| 08/03/2000 | WO2000045223A1 Positively photosensitive resin composition |
| 08/03/2000 | WO2000045067A1 Method and device for vibration control |
| 08/03/2000 | WO2000044867A1 Acidic composition containing fluoride for removal of photoresists and etch residues |
| 08/03/2000 | WO2000044805A1 Flame-retardant vinyl esters, resins and resin compositions containing the same, and cured products thereof |
| 08/02/2000 | EP1024522A1 Exposure method and aligner |
| 08/02/2000 | EP1024408A2 EUV condenser with non-imaging optics |
| 08/02/2000 | EP1024407A1 Positive photosensitive polyimide composition |
| 08/02/2000 | EP1024406A1 Resist composition |
| 08/02/2000 | EP1024405A1 Photosensitive insulating paste and thick-film multi-layer circuit substrate |
| 08/02/2000 | EP1024403A1 Heating apparatus |
| 08/02/2000 | EP1023994A1 A heat mode sensitive imaging element for making positive working printing plates. |
| 08/02/2000 | EP1023643A1 Volume phase hologram and method for producing the same |
| 08/02/2000 | EP1023638A1 Apparatus for a laser writer for complex microlithographic patterns with a delay circuit |
| 08/02/2000 | EP1023637A1 Fractionated novolak resin copolymer and photoresist composition therefrom |
| 08/02/2000 | EP1023635A1 Multi-level conductive matrix formation method |
| 08/02/2000 | EP1023634A1 Improved thermosetting anti-reflective coatings at deep ultraviolet |
| 08/02/2000 | EP1023622A1 Process and device for the wavelength-selective mixture and/or distribution of polychromatic light |
| 08/02/2000 | EP1023129A1 Improvement in aqueous stripping and cleaning compositions |
| 08/02/2000 | EP0973961A4 Method for manufacturing a stent |
| 08/02/2000 | CN1261908A Pigment dispersion containing C. I. pigment red 222 |
| 08/02/2000 | CN1261725A Method for cleaning polymer after reaction ion eching on aluminium/copper metal connection wire |
| 08/01/2000 | USRE36799 Projection optical apparatus using plural wavelengths of light |
| 08/01/2000 | US6097790 Pressure partition for X-ray exposure apparatus |
| 08/01/2000 | US6097537 Catadioptric optical system |
| 08/01/2000 | US6097536 Optical mount with UV adhesive and protective layer |
| 08/01/2000 | US6097474 Dynamically adjustable high resolution adjustable slit |
| 08/01/2000 | US6097473 Exposure apparatus and positioning method |
| 08/01/2000 | US6097472 Apparatus and method for exposing a pattern on a ball-like device material |
| 08/01/2000 | US6097469 Method of processing resist onto substrate and resist processing apparatus |
| 08/01/2000 | US6097361 Photolithographic exposure system and method employing a liquid crystal display (LCD) panel as a configurable mask |
| 08/01/2000 | US6097114 Compact planar motor having multiple degrees of freedom |
| 08/01/2000 | US6097102 Reticle, semiconductor wafer, and semiconductor chip |
| 08/01/2000 | US6096850 Produced by reacting two kinds of diamine compounds consisting of diaminopolysiloxane and 4,4'-diamino-4''-hydroxytriphenylmethane with a 4,4'-(hexafluoroisopropylidene)diphthalic acid dianhydride |
| 08/01/2000 | US6096796 Composition comprising cycloaliphatic diepoxide, compound having cyclohexene oxide structure, cationic photoinitiator, unsaturated monomer, radical photoinitiator, polyol having three or more hydroxyl groups |
| 08/01/2000 | US6096794 Photoinitiator system for photopolymerization of ethylenically unsaturated polymerizable compounds |
| 08/01/2000 | US6096634 Method of patterning a submicron semiconductor layer |
| 08/01/2000 | US6096598 Method for forming pillar memory cells and device formed thereby |
| 08/01/2000 | US6096484 Pattern forming method using chemically amplified resist and apparatus for treating chemically amplified resist |
| 08/01/2000 | US6096483 Ultraviolet radiation base-generating substance; siloxane polymer having silicon-hydrogen bonds capable of reacting with hydroxy groups under the effect of the base to form silicon-oxygen bonds and hydrogen; and acid; storage stable |
| 08/01/2000 | US6096482 Making insulating layer by heat treating polyamic acid of p-phenylenediamine, 3,3',4,4'-biphenyltetracarboxyacid and 2,2'-bis(trifluoromethyl)-4,4'-diaminobiphenyl on a metal foil substrate; coefficient of thermal expansion same as foil |
| 08/01/2000 | US6096480 Photosensitive polyimidosiloxane compositions and insulating films made thereof |
| 08/01/2000 | US6096479 Image forming material comprises an infrared light absorbing agent having a hydrophobic group which changes to hydrophilic due to heat; can be directly prepared; laser decomposes the infrared light absorbing agent, generating acid |
| 08/01/2000 | US6096478 Resist comprises a resin for forming resist material, and given mixing ratio of first and second photo-acid generators of given molecular weights; the first produces an acid having a smaller diffusion length than the second; fewer defects |
| 08/01/2000 | US6096477 Fractionated novolak resin from cresol-formaldehyde reaction mixture and photoresist composition therefrom |
| 08/01/2000 | US6096475 Hand application to fabric of heat transfers imaged with color copiers/printers |
| 08/01/2000 | US6096474 Method for preparing an imaging element for making an improved printing plate according to the silver salt diffusion transfer process |
| 08/01/2000 | US6096473 Method and apparatus for obtaining lithographic plate |
| 08/01/2000 | US6096462 Coulomb effect induced shifts in focal-point position, and changes in image magnification, projected-image rotation, and astigmatic blur and distortions are corrected by applying electric current supplied to correction lenses and stigmators |
| 08/01/2000 | US6096461 Laser exposure utilizing secondary mask capable of concentrating exposure light onto primary mask |
| 08/01/2000 | US6096458 Utilizing at least two interfering beams of radiation to define a grid of dividing lines corresponding to an interference pattern produced by the interfering beams on a surface of a photolithograpy mask coated with a mask film |