| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/22/2000 | US6106997 Printing durability, image reproducibility and storage stability |
| 08/22/2000 | US6106995 Antireflective coating material for photoresists |
| 08/22/2000 | US6106994 Esterifying a polyphenol compound and naphthoquinone-1,2-diazidesulfonyl halide in the presence of for example monomethyldicyclohexylamine, and positive photosensitive composition contains resultant ester |
| 08/22/2000 | US6106993 Chemically amplified positive resist composition |
| 08/22/2000 | US6106992 Photoresist film comprising base film, photosensitive resin composition layer comprising a fluorescent substance, a photosensitive resin, and a volatile organic material; useful for producing fluorescent substance display |
| 08/22/2000 | US6106981 Forming resist film over surface of mask substrate having light shielding film; exposing to electron beam for forming integrated circuit pattern and alignment mask; removing resist film; repeating procedure with aligned second resist film |
| 08/22/2000 | US6106980 Having test pattern which is used to calibrate the coordinate system of each processing machine on which the photomask is mounted and is also used as a reference for other metrology measurements |
| 08/22/2000 | US6106618 Photoresist application for a circlet wafer |
| 08/22/2000 | US6106167 Apparatus for photolithography process with gas-phase pretreatment |
| 08/22/2000 | US6106139 Illumination optical apparatus and semiconductor device manufacturing method |
| 08/22/2000 | US6105885 Fluid nozzle system and method in an emitted energy system for photolithography |
| 08/22/2000 | US6105588 Exposing the photoresist on the wafer surface to a first plasma with a reducing agent to reduction and then exposing the photoresist on the surface to a second plasma with an oxidizing agent to oxidation |
| 08/17/2000 | WO2000048237A1 Exposure method and apparatus |
| 08/17/2000 | WO2000048236A1 Methods of fabricating etched structures |
| 08/17/2000 | WO2000048225A1 Charged particle ray exposure device and method of manufacturing semiconductor device |
| 08/17/2000 | WO2000048046A1 Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
| 08/17/2000 | WO2000048045A1 Mounting for mask plate and method of developing mask plate |
| 08/17/2000 | WO2000048044A1 Photosensitive resin composition |
| 08/17/2000 | WO2000048043A1 Extreme-uv lithography condenser |
| 08/17/2000 | WO2000047953A1 A non-invasive system and method for diagnosing potential malfunctions of semiconductor equipment components |
| 08/17/2000 | WO2000047501A1 Reticle transfer system |
| 08/17/2000 | WO2000047361A1 Laser processing power output stabilization |
| 08/17/2000 | WO2000017605A9 Dynamic beam steering interferometer |
| 08/17/2000 | DE19950601A1 Pre-ionization device for gas laser |
| 08/17/2000 | DE10004629A1 Process for removing particles from a table holding a semiconductor wafer during semiconductor device processing comprises placing a resin film on the table and removing the film from the table |
| 08/17/2000 | CA2367064A1 Methods of fabricating etched structures |
| 08/16/2000 | EP1028502A2 Smart laser with automated beam quality control |
| 08/16/2000 | EP1028456A1 Stage device, a scanning aligner and a scanning exposure method, and a device manufactured thereby |
| 08/16/2000 | EP1028354A1 Positive photosensitive resin composition, method of forming relief pattern, and electronic part |
| 08/16/2000 | EP1028353A1 Pattern forming method |
| 08/16/2000 | EP1028327A2 Grating assembly with bi-directional bandwidth control |
| 08/16/2000 | EP1028001A1 Organic electroluminescent display panel and method for fabricating the same by thermal transfer |
| 08/16/2000 | EP1027993A1 A mandrel for forming a nozzle plate having a non-wetting surface of uniform thickness and an orifice wall of tapered contour, and method of making the mandrel |
| 08/16/2000 | EP1027703A1 A method for manufacturing an optical memory device |
| 08/16/2000 | EP1027702A1 A method of manufacturing a stamper for producing optical discs, a stamper thus obtained and an optical disc obtained by using such a stamper |
| 08/16/2000 | EP1027630A1 An illumination unit and a method for point illumination of a medium |
| 08/16/2000 | EP1027172A1 Protective overcoat for replicated diffraction gratings |
| 08/16/2000 | EP0946899B1 System for the transfer of digitized images to an image support or vice-versa |
| 08/16/2000 | EP0914628B1 Black-and-white photothermographic and thermographic elements containing substituted propenenitrile compounds as antifoggants |
| 08/16/2000 | EP0864118B1 Donor elements and processes for thermal dye transfer by laser |
| 08/16/2000 | EP0859797B1 Photoinitiator |
| 08/16/2000 | EP0852742B1 Projection aligner for integrated circuit fabrication |
| 08/16/2000 | EP0852029B1 Avoidance of pattern shortening by using an off axis illumination with twisting dipole and polarizing apertures |
| 08/16/2000 | EP0800665B1 Method for producing positive photoresist compositions with low metal ions p-cresol oligomers |
| 08/16/2000 | EP0678124B1 Phosphating processes, particularly for use in fabrication of printed circuits utilizing organic resists |
| 08/16/2000 | CN2392198Y Photosensitive film for map recording use |
| 08/16/2000 | CN1263612A Chemically amplified resist composition |
| 08/16/2000 | CN1263611A Pattern forming method |
| 08/16/2000 | CN1263524A Aromatic maleimides and their use as photoinitiators |
| 08/16/2000 | CN1263135A Photo-assisted solidification method for coating material |
| 08/15/2000 | US6104735 Gas discharge laser with magnetic bearings and magnetic reluctance centering for fan drive assembly |
| 08/15/2000 | US6104544 Exposure apparatus |
| 08/15/2000 | US6104475 Platesetter |
| 08/15/2000 | US6104474 Apparatus and method for controlling scanning exposure of photosensitive substrate |
| 08/15/2000 | US6104472 Projection exposure apparatus and device manufacturing method |
| 08/15/2000 | US6104471 Exposure apparatus and method wherein the magnification of the projection optical system compensates for physical changes in the substrate |
| 08/15/2000 | US6104108 Wedge magnet array for linear motor |
| 08/15/2000 | US6104002 Heat treating apparatus |
| 08/15/2000 | US6103866 X-ray sensitive poly(1,3-hexadiene sulfone) having higher glass transition temperature |
| 08/15/2000 | US6103845 Norbornane-containing acrylic terpolymers |
| 08/15/2000 | US6103680 Non-corrosive cleaning composition and method for removing photoresist and/or plasma etching residues |
| 08/15/2000 | US6103596 Process for etching a silicon nitride hardmask mask with zero etch bias |
| 08/15/2000 | US6103457 Method for reducing faceting on a photoresist layer during an etch process |
| 08/15/2000 | US6103456 Prevention of photoresist poisoning from dielectric antireflective coating in semiconductor fabrication |
| 08/15/2000 | US6103454 Three-dimensional crosslinked polymer matrix formed by mercaptan-epoxy step polymerization; and photoactive monomer(s) having moiety(s) not present in matrix but resulting polymers are compatible with matrix; holography |
| 08/15/2000 | US6103453 Of monoacylphosphine oxide(s) and diacylphosphine oxide(s) such as 2,4,6-trimethylbenzoylethoxyphenylphosphine oxide; radiation curable unsaturated compound and photoinitator; storage stable, miscible, low yellowing |
| 08/15/2000 | US6103452 Photosensitive composition and calcined pattern obtained by use thereof |
| 08/15/2000 | US6103451 Multilayer element for producing printing or relief plates |
| 08/15/2000 | US6103450 Photosensitive copolymers of 5-norbornene-2-methanol having a c1 to c20 aliphatic hydrocarbon as side chain, and maleic anhydride; tricyclodecane- or sarsasapogenin-derivatives, each having an acid-labile group as dissolution inhibitor |
| 08/15/2000 | US6103449 Negative working photoresist composition |
| 08/15/2000 | US6103448 Organometal-containing acrylate or methacrylate derivatives and photoresists containing the polymers thereof |
| 08/15/2000 | US6103447 Approach to formulating irradiation sensitive positive resists |
| 08/15/2000 | US6103445 Photoresist compositions comprising norbornene derivative polymers with acid labile groups |
| 08/15/2000 | US6103444 Method for preparing an imaging element for making an improved printing plate according to the silver salt diffusion transfer process |
| 08/15/2000 | US6103443 Photoresist composition containing a novel polymer |
| 08/15/2000 | US6103434 Data processing of converting drawing data on a semiconductor device pattern on a chip into a predetermined size and shape; dividing the converted drawing data into multiple fields |
| 08/15/2000 | US6103433 Exposure method using reticle remount for temperature influence correction |
| 08/15/2000 | US6103432 Method for forming black matrix |
| 08/15/2000 | US6103428 Photomask utilizing auxiliary pattern that is not transferred with the resist pattern |
| 08/15/2000 | US6103427 Pressure relieving pellicle |
| 08/15/2000 | US6103177 Positioning a driving mechanism of an optical system such as an objective lens used for converging a laser beam onto a glass master. |
| 08/15/2000 | US6103145 Crosslinked water-soluble electrically conducting polymers |
| 08/15/2000 | US6103087 Graining and electrolytic surface roughening aluminum or alloy; anodizing; providing light sensitive layer |
| 08/15/2000 | CA2219396C Printing plate exposure apparatus |
| 08/10/2000 | WO2000046911A1 Flat motor device and its driving method, stage device and its driving method, exposure apparatus and exposure method, and device and its manufacturing method |
| 08/10/2000 | WO2000046846A1 Charged particle beam exposure apparatus and exposure method |
| 08/10/2000 | WO2000046845A1 Method for detecting alignment mark in charged particle beam exposure apparatus |
| 08/10/2000 | WO2000046830A1 Diaphragm plate and its processing method |
| 08/10/2000 | WO2000046643A1 Masks for use in optical lithography below 180 nm |
| 08/10/2000 | WO2000046641A1 Cylindrical photolithography exposure process and apparatus |
| 08/10/2000 | WO2000046640A1 Positive resist composition of chemical amplification type |
| 08/10/2000 | WO2000046637A1 Projector and display both comprising optical element for diffraction and scattering |
| 08/10/2000 | WO2000033084A3 Arrays of organic compounds attached to surfaces |
| 08/10/2000 | WO2000019247B1 Multilayer optical element |
| 08/10/2000 | DE19905203A1 Refractive reduction projection objective, used in a projection exposure unit for microlithography, includes quartz glass lenses with a negative sum of refractive indices |
| 08/10/2000 | DE19904152A1 Baugruppe aus einem optischen Element und einer Fassung Assembly of an optical element and a socket |
| 08/09/2000 | EP1026796A2 Laser oscillating apparatus, exposure apparatus using the same, and device fabrication method |
| 08/09/2000 | EP1026564A2 Stereolithographic method and apparatus with control of prescribed stimulation |
| 08/09/2000 | EP1026550A2 Lithographic projection apparatus |
| 08/09/2000 | EP1026549A2 Processing system |