Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2000
08/30/2000EP1032026A2 Method of photoresist ash residue removal
08/30/2000EP1031884A2 Resist stripping agent and process of producing semiconductor devices using the same
08/30/2000EP1031883A1 Method and device for displacement of a mobile on a base elastically fixed to ground
08/30/2000EP1031882A2 Illumination system with field mirrors for producing uniform scanning energy
08/30/2000EP1031881A1 Pigmented and back side coated recording material for producing offset printing plates
08/30/2000EP1031880A1 Positive radiation-sensitive composition
08/30/2000EP1031879A1 Novel ester compounds, polymers, resist compositions and patterning process
08/30/2000EP1031878A1 Novel polymers and photoresist compositions comprising same
08/30/2000EP1031877A1 Photomask, aberration correcting plate, exposure device and method of producing microdevice
08/30/2000EP1031579A2 Photopolymerization initiator for color filter, photosensitive coloring composition, and color filter
08/30/2000EP1031414A1 Lithographic printing plate precursor
08/30/2000EP1031413A2 Radiation-sensitive recording material for the production of waterless offset printing plates
08/30/2000EP1031066A1 Photoresist composition containing a condensation polymer
08/30/2000EP1031049A1 Passivating overcoat bilayer for multilayer reflective coatings for extreme ultraviolet lithography
08/30/2000EP1030784A1 Lithographic printing plates for use with laser imaging apparatus
08/30/2000EP0602252B1 Ceramic green sheet
08/30/2000CN2394246Y Two stage quick vacuum sucker with two chambers of platemaking equipment
08/30/2000CN1264851A Energy requirement reduced plane plate imaging
08/30/2000CN1264850A Electron beam exposuring system and method thereof
08/30/2000CN1055945C Method for light-assisted curing of coatings
08/29/2000US6111646 Null test fourier domain alignment technique for phase-shifting point diffraction interferometer
08/29/2000US6111143 By one-step reaction between sulfoxide compound and aromatic compound in presence of perfluoroalkanesulfonic anhydride; use as polymerization photoinitiator, or photoacid generator leaving the protection groups of organic compounds
08/29/2000US6110987 Photocurable composition and curing process therefor
08/29/2000US6110881 That remove etching residue from substrates; nucleophilic amine compound of given formula having oxidation and reduction potentials, alkanolamine(s), water, and stabilizing chelating agent that prevents resettling of residue
08/29/2000US6110752 Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment
08/29/2000US6110653 Acid sensitive ARC and method of use
08/29/2000US6110652 Method of producing printing or embossing cylinders having a three-dimensional patterned surface
08/29/2000US6110651 Method for preparing polysilane pattern-bearing substrate
08/29/2000US6110647 Method of manufacturing semiconductor device
08/29/2000US6110646 Positive photosensitive composition, photosensitive lithographic printing plate and method for forming a positive image
08/29/2000US6110643 Method of forming a multilayer printed circuit board and product thereof
08/29/2000US6110642 Photosensitive lithographic plate and process for producing same
08/29/2000US6110641 Radiation sensitive composition containing novel dye
08/29/2000US6110640 Photosensitive composition
08/29/2000US6110639 Radiation-sensitive composition and recording medium using the same
08/29/2000US6110638 Process and composition for generation of acid
08/29/2000US6110637 Photoresists which are suitable for producing sub-micron size structures
08/29/2000US6110627 Microlithography methods, especially such methods for projection-transferring, onto the surface of a semiconductor wafer.
08/29/2000US6110626 Microlithography using an energy beam such as a charged particle beam.
08/29/2000US6110624 Forming masks, such as chrome masks on quartz, with a reduced defect rate.
08/29/2000US6110607 High reflectance-low stress Mo-Si multilayer reflective coatings
08/29/2000US6110320 Process for coating a solution onto a substrate
08/29/2000US6110282 Coating apparatus for semiconductor process
08/29/2000US6110280 Temperature controlled chemical dispenser
08/29/2000US6109756 Catoptric reduction projection optical system
08/24/2000WO2000049464A2 Photolithography method and apparatus configuration for performing photolithography
08/24/2000WO2000049463A1 Flat bed platesetter system
08/24/2000WO2000049462A1 Stable photosensitive resin composition
08/24/2000WO2000049449A1 Lens system for photodetectors
08/24/2000WO2000049437A1 Methods of photosensitizing glasses with hydrogen or deuterium and waveguides resulting therefrom
08/24/2000WO2000049303A1 Static pressure air bearing
08/24/2000WO2000049142A1 Method for producing polymers
08/24/2000WO2000049080A1 Photo curable liquid resin composition and photofabricated cured product
08/24/2000WO2000048953A1 Synthetic quartz glass optical member for ultraviolet light and reduction projection exposure system using the same
08/24/2000WO2000048836A1 Ir-sensitive composition and use thereof for the preparation of printing plate precursors
08/24/2000WO2000048744A1 Method and device for treating substrates
08/24/2000WO2000020517A3 Radiation-curable compositions comprising maleimide compounds and method for producing a substrate with a cured layer
08/24/2000WO2000013017A9 Method and device for producing and/or analyzing biochemical reaction supporting materials
08/24/2000DE19948240A1 Microlithography reduction objective lens with projection illumination installation, including its use in chip manufacture
08/24/2000DE19859623A1 Photopolymerisierbare Druckformen mit Oberschicht zur Herstellung von Reliefdruckformen Photopolymerizable printing plates with topsheet for the preparation of relief printing plates
08/24/2000CA2362901A1 Methods of photosensitizing glasses with hydrogen or deuterium and waveguides resulting therefrom
08/24/2000CA2362170A1 Flat bed platesetter system
08/23/2000EP1030351A1 Exposure apparatus, apparatus for manufacturing devices, and method of manufacturing exposure apparatuses
08/23/2000EP1030347A1 Device for treatment of a substrate
08/23/2000EP1030222A2 Lithographic projection apparatus
08/23/2000EP1030221A1 Photoresist compositions comprising blends of photoacid generators
08/23/2000EP1029829A1 Photosensitive insulating paste and thick film multi-layer circuit substrate
08/23/2000EP1029667A1 Positive planographic printing material
08/23/2000EP1029666A1 Waterless planographic printing plate precursor and production method thereof
08/23/2000EP1029651A1 Method to produce three dimensional objects by stereolithography
08/23/2000EP1029258A1 Holographic medium and process
08/23/2000EP1029257A1 Method of molecular-scale pattern imprinting at surfaces
08/23/2000EP1028818A1 Deposition of substances on a surface
08/23/2000EP0819266B1 Photodefineable compositions
08/23/2000EP0767803B1 Method of generating a reactive species and applications therefor
08/23/2000CN2393123Y Large-area step-by-step scanning type exposure machine
08/23/2000CN1264131A Photosensitive insulation paste and thick film multilayer circuit substrate
08/23/2000CN1264130A Photosensitive insulation paste and thick film multilayer circuit substrate
08/23/2000CN1264061A Method for improving photoetching rubber elching resistant
08/23/2000CN1264060A Photoresist composition with excellent anti-back-exposure delayeed effect
08/23/2000CN1263896A Resin for chemical reinforced slushing compound
08/23/2000CN1055787C Overlay measurement mark and method of measuring overlay error between multi-pattern
08/22/2000US6108397 Collimator for x-ray proximity lithography
08/22/2000US6108140 Catadioptric reduction projection optical system and method
08/22/2000US6108126 Illuminating apparatus
08/22/2000US6107741 Cathode structure for short arc type discharge lamp
08/22/2000US6107703 Linear motor mechanism for exposure apparatus, and device manufacturing method using the same
08/22/2000US6107622 Chevron correction and autofocus optics for laser scanner
08/22/2000US6107361 Solvent-free, radiation-curable, optical glass fiber coating composition and solvent-free method for making a solvent-free, radiation-curable, optical glass fiber coating composition
08/22/2000US6107207 Procedure for generating information for producing a pattern defined by design information
08/22/2000US6107013 Exposure method and exposure apparatus using it
08/22/2000US6107011 Inserting secondary mask between light source and primary mask, secondary mask comprising optical elements; exposing substantially all of principal image on image receiving surface by creating relative motion between masks
08/22/2000US6107009 For developing electron beam exposed positive photoresists
08/22/2000US6107008 Ionizing radiation post-curing of objects produced by stereolithography and other methods
08/22/2000US6107007 Exposing resist to predetermined light pattern; developing by lithography-developing solution containing surfactant to dissovle and remove reion of resist; removing surfactant from surface of resist employing ultra pure water containing ozone
08/22/2000US6107006 Forming first resist film by coating substrate with chemically amplified resist; forming a second resist film over first resist film by coating substrate with resist other than chemically amplified resist; exposing; developing
08/22/2000US6107005 Applying negative photoresist layer on lower magnetic layer; irradiating light; heat treating; forming coil on hard-baked negative photoresist; applying photoresist layer on coil; setting insulation; irradiating, heat treating
08/22/2000US6107002 Reducing resist shrinkage during device fabrication
08/22/2000US6106999 Photosensitizer, visible light curable resin composition using the same, and use of the composition
08/22/2000US6106998 Photoresists suitable for use in photolithography that employs an arf excimer laser; high transparency to exposure light having a wavelength of 220 nm or less and dry-etch resistance
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