| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/09/2013 | US8481242 Salt and photoresist composition containing the same |
| 07/09/2013 | US8481241 Compositions and methods for use in three dimensional model printing |
| 07/04/2013 | WO2013100374A1 Composition for forming a photoresist underlayer, method for forming a pattern using same, and semiconductor integrated circuit device comprising the pattern |
| 07/04/2013 | WO2013100298A1 Positive photosensitive resin composition |
| 07/04/2013 | WO2013100276A1 Photosensitive resin composition for color filter and color filter using the same |
| 07/04/2013 | WO2013100205A2 Exposure apparatus, exposure method, device manufacturing method, program, and recording medium |
| 07/04/2013 | WO2013100203A2 Carrier method, exposure method, carrier system and exposure apparatus, and device manufacturing method |
| 07/04/2013 | WO2013100202A1 Exposure apparatus, exposure method, and device manufacturing method |
| 07/04/2013 | WO2013100189A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device |
| 07/04/2013 | WO2013100158A1 Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same |
| 07/04/2013 | WO2013099662A1 Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the composition |
| 07/04/2013 | WO2013098462A1 A method for producing an rfid transponder by etching |
| 07/04/2013 | WO2013098053A1 Lithographic apparatus and device manufacturing method |
| 07/04/2013 | WO2013097917A1 Positioning device and method for positioning supporting means for supporting an article |
| 07/04/2013 | WO2013097897A1 Mask and scanning projection exposure method for microlithography |
| 07/04/2013 | WO2013058506A3 Polyimide light-sensitive resin composition for oled |
| 07/04/2013 | WO2013055150A3 Photosensitive resin composition for color filter and color filter manufactured by using same |
| 07/04/2013 | WO2013044210A3 Stripping compositions comprising mixtures of alkylamides |
| 07/04/2013 | WO2013027220A3 Process for dry-coating of flexogarphic surfaces |
| 07/04/2013 | WO2013003666A3 Holographic recording medium |
| 07/04/2013 | US20130172225 Dynamic multi-purpose compositions for the removal of photoresists and method for its use |
| 07/04/2013 | US20130171828 Processing liquid for suppressing pattern collapse of microstructure, and method for producing microstructure using same |
| 07/04/2013 | US20130171574 Photoresist pattern trimming methods |
| 07/04/2013 | US20130171573 Method for manufacturing a planarised reflective layer for micromirror devices |
| 07/04/2013 | US20130171572 Method for producing thick film photoresist pattern |
| 07/04/2013 | US20130171571 Vapor treatment process for pattern smoothing and inline critical dimension slimming |
| 07/04/2013 | US20130171570 Drawing apparatus, and method of manufacturing article |
| 07/04/2013 | US20130171569 Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition |
| 07/04/2013 | US20130171568 Positive Photosensitive Resin Composition, and Photosensitive Resin Layer and Display Device Using the Same |
| 07/04/2013 | US20130171567 Photoacid generator and photoresist comprising same |
| 07/04/2013 | US20130171566 Alkaline solubie resin and light sensible resin composition comprising same and use thereof |
| 07/04/2013 | US20130171565 Organic anti reflective layer composition |
| 07/04/2013 | US20130171564 Positive Photosensitive Resin Composition, and Display Device and Organic Light Emitting Device Using the Same |
| 07/04/2013 | US20130171563 Photosensitive Novolac Resin, Positive Photosensitive Resin Composition Including Same, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film |
| 07/04/2013 | US20130171562 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition |
| 07/04/2013 | US20130171561 Additive for resist and resist composition comprising same |
| 07/04/2013 | US20130171549 Cycloaliphatic monomer, polymer comprising the same, and photoresist composition comprising the polymer |
| 07/04/2013 | US20130171429 Cycloaliphatic monomer, polymer comprising the same, and photoresist composition comprising the polymer |
| 07/04/2013 | US20130169946 Lithography machine and scanning and exposing method thereof |
| 07/04/2013 | US20130169945 Exposure apparatus and method for producing device |
| 07/04/2013 | US20130169944 Exposure apparatus, exposure method, device manufacturing method, program, and recording medium |
| 07/04/2013 | US20130169917 Exposure device |
| 07/04/2013 | US20130168859 Positive photosensitive resin composition, method of creating resist pattern, and electronic component |
| 07/04/2013 | US20130168829 Phenolic resin composition, and methods for manufacturing cured relief pattern and semiconductor |
| 07/04/2013 | DE112011103052T5 Fotoresist-Zusammensetzung für Negativentwicklung und Strukturierungsverfahren damit Photo resist composition for negative development and patterning processes so |
| 07/04/2013 | DE102012205914A1 Mandrelmodifzierung zum Erreichen einer einzelfinnen-finnähnlichen Feldeffekttransistor-(FINET-)Vorrichtung transistor (finest) device Mandrelmodifzierung to achieve a single finnen-finn similar field effect transistor (FINET-) transistor device (finest) device |
| 07/03/2013 | EP2610673A2 Method for manufacturing lithographic printing plates |
| 07/03/2013 | EP2610593A1 Positioning device and method for positioning supporting means for supporting an article |
| 07/03/2013 | EP2610373A1 Fluorite |
| 07/03/2013 | EP2610067A1 Master planographic printing plate for on-press development, and plate-making method using said master planographic printing plate |
| 07/03/2013 | EP2609468A1 Method of forming pattern and developer for use in the method |
| 07/03/2013 | EP2609467A2 Mask for near-field lithography and fabrication the same |
| 07/03/2013 | CN203037997U Edge bead removal (EBR) baffle plate |
| 07/03/2013 | CN203037996U Novel photoresist membrane-stripping liquid nozzle |
| 07/03/2013 | CN203037995U 显影液喷淋装置 Developer liquid spray device |
| 07/03/2013 | CN203037994U Device for preventing developing solution from reacting with air |
| 07/03/2013 | CN203037993U Micro displacement mechanism for stepping photoetching device |
| 07/03/2013 | CN103189803A Silicate-free developer compositions |
| 07/03/2013 | CN103189801A Film exposure device |
| 07/03/2013 | CN103189800A Projection objective of a microlithographic exposure apparatus |
| 07/03/2013 | CN103189799A Substrate for display panel and substrate exposure method |
| 07/03/2013 | CN103189798A Scanning exposure apparatus using microlens array |
| 07/03/2013 | CN103189797A Photosensitive resin composition, patterned structure, display device, and partition wall |
| 07/03/2013 | CN103189209A Methods of processing using silicate-free developer compositions |
| 07/03/2013 | CN103187366A Thin film transistor (TFT) array substrate formation method |
| 07/03/2013 | CN103187267A In-situ photoresist strip during plasma etching of active hard mask |
| 07/03/2013 | CN103187247A Manufacturing method for hybrid lines |
| 07/03/2013 | CN103187246A Manufacturing method for hybrid lines |
| 07/03/2013 | CN103186060A Photoetching alignment apparatus, use method thereof and photoetching machine |
| 07/03/2013 | CN103186058A Mask platform system with six-degree-of-freedom coarse drive platform |
| 07/03/2013 | CN103186057A Measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method |
| 07/03/2013 | CN103186056A Projection system of immersed photolithography system |
| 07/03/2013 | CN103186055A Photoetching machine and scanning exposure method thereof |
| 07/03/2013 | CN103186054A Carrier device and exposure device |
| 07/03/2013 | CN103186053A Photoetching condition control method |
| 07/03/2013 | CN103186052A Lithography parameter optimization method |
| 07/03/2013 | CN103186051A Method for setting exposure conditions in photoetching |
| 07/03/2013 | CN103186050A Photolithographic method |
| 07/03/2013 | CN103186049A Glue coating and developing machine, and application method thereof |
| 07/03/2013 | CN103186048A Positive photosensitive resin composition, and photosensitive resin layer and display device using the same |
| 07/03/2013 | CN103186047A Positive photosensitive resin composition, and display device and organic light emitting device using the same |
| 07/03/2013 | CN103186046A Photoacid generator and photoresist comprising same |
| 07/03/2013 | CN103186045A Hydrophilic photoacid generator and resist composition comprising same |
| 07/03/2013 | CN103186044A Additive for resist and resist composition comprising same |
| 07/03/2013 | CN103186043A Additive for resist and resist composition comprising same |
| 07/03/2013 | CN103186042A Resist additive and resist composition containing same |
| 07/03/2013 | CN103186041A Resist additive and resist composition containing same |
| 07/03/2013 | CN103186040A Photoresist overcoat compositions and methods of forming electronic devices |
| 07/03/2013 | CN103186039A Photosensitive novolac resin, positive photosensitive resin composition including same |
| 07/03/2013 | CN103186038A Photoresist pattern trimming methods |
| 07/03/2013 | CN103186037A Photoetching process method for manufacturing semiconductor device |
| 07/03/2013 | CN103186035A Mask, manufacturing method of mask and method for exposing photoresist layer |
| 07/03/2013 | CN103185918A Micro-electro-mechanical adjustable nitride resonant grating and preparation method thereof |
| 07/03/2013 | CN103185909A Micro-electro-mechanical adjustable nitride resonant grating and double-sided processing method thereof |
| 07/03/2013 | CN103183823A Photocurable polyimide and preparation method for same |
| 07/03/2013 | CN103183613A Cycloaliphatic monomer, polymer comprising the Same, and photoresist composition comprising the polymer |
| 07/03/2013 | CN103182832A Process for high-precision screen printing by straight screen printing technology |
| 07/03/2013 | CN102591139B Photoetching method of superfine structure |
| 07/03/2013 | CN102540776B Stripping liquid for removing residual photoresist in semiconductor technology |
| 07/03/2013 | CN102368139B High-precision method for detecting wave aberration of system |