| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/07/2013 | CN102681335B Method for preparing phase type diffraction optical element according to wet etching |
| 08/07/2013 | CN102478764B Dual graphing method |
| 08/07/2013 | CN102472964B Positive photosensitive resin composition, cured film obtained using same, and optical device |
| 08/07/2013 | CN102341753B Photosensitive resin composition, and photosensitive element, resist pattern formation method and printed circuit board production method each utilizing same |
| 08/07/2013 | CN102314083B Photosensitive composition adopting composite dissolution-resistant agent/dissolution inhibitor and application of same |
| 08/07/2013 | CN102227682B Pattern forming method using developer containing organic solvent and rinsing solution for use in pattern forming method |
| 08/07/2013 | CN102150082B Radiation-sensitive resin composition |
| 08/07/2013 | CN102132216B Mask holding mechanism |
| 08/07/2013 | CN102079961B Ultraviolet curing adhesive |
| 08/07/2013 | CN102066439B Monomer having lactone skeleton, polymer compound and photoresist composition |
| 08/07/2013 | CN101989042B Method of manufacturing multi-gray scale photomask and pattern transfer method |
| 08/07/2013 | CN101910944B Ionic, organic photoacid generators for DUV, MUV and optical lithography based on peraceptor-substituted aromatic anions |
| 08/07/2013 | CN101891845B Application of carbazole oxime ester compound serving as photoinitiator in photopolymerisable acrylate composition |
| 08/07/2013 | CN101866107B Four-gradation photomask, its manufacturing method and photomask blank |
| 08/07/2013 | CN101730866B Composition for forming micropattern and method for forming micropattern using the same |
| 08/07/2013 | CN101641643B Photoactivable nitrogen bases |
| 08/07/2013 | CN101622582B Volume hologram laminate manufacturing method |
| 08/07/2013 | CN101495921B Optical arrangement |
| 08/07/2013 | CN101477308B Negative photoresist composition and method of manufacturing array substrate using the same |
| 08/07/2013 | CN101308333B Operation device of optical element of imaging device in a projection exposure machine for microlithography |
| 08/07/2013 | CN101226341B 衬底支撑件和光刻工艺 A substrate support member and the photolithography process |
| 08/06/2013 | US8502979 Methods and systems for determining a critical dimension and overlay of a specimen |
| 08/06/2013 | US8502962 Computer readable storage medium including effective light source calculation program, and exposure method |
| 08/06/2013 | US8502958 Positioning device, lithographic apparatus using same, and device manufacturing method |
| 08/06/2013 | US8502954 Lithographic apparatus and device manufacturing method |
| 08/06/2013 | US8502112 System and method for cutting using a variable astigmatic focal beam spot |
| 08/06/2013 | US8501395 Line edge roughness reduction and double patterning |
| 08/06/2013 | US8501394 Superfine-patterned mask, method for production thereof, and method employing the same for forming superfine-pattern |
| 08/06/2013 | US8501393 Anti-reflective coating forming composition containing vinyl ether compound |
| 08/06/2013 | US8501392 Photosensitive element, method for formation of resist pattern, and method for production of print circuit board |
| 08/06/2013 | US8501391 Photosensitive resin composition, flexographic printing plate, and method for producing flexographic printing plate |
| 08/06/2013 | US8501390 Laser engravable flexographic printing articles based on millable polyurethanes, and method |
| 08/06/2013 | US8501389 Upper layer-forming composition and resist patterning method |
| 08/06/2013 | US8501388 Method of making laser-ablatable elements |
| 08/06/2013 | US8501387 Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound |
| 08/06/2013 | US8501386 Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process |
| 08/06/2013 | US8501384 Positive resist composition and patterning process |
| 08/06/2013 | US8501383 Coating compositions for use with an overcoated photoresist |
| 08/06/2013 | US8501382 Acid amplifiers |
| 08/06/2013 | US8501375 Positive photosensitive resin composition |
| 08/06/2013 | US8500950 Exposure condition setting method, substrate processing apparatus, and computer program |
| 08/06/2013 | US8499621 Scanning probe microscopy inspection and modification system |
| 08/06/2013 | CA2551071C A method for exposure of flexo printing plates |
| 08/01/2013 | WO2013112587A1 Slurry for planarizing photoresist |
| 08/01/2013 | WO2013111812A1 Fine unevenness structure body, dry etching thermo-reactive resist material, mold fabrication method, and mold |
| 08/01/2013 | WO2013111674A1 Photosensitive composition, pattern, and display device having pattern |
| 08/01/2013 | WO2013111667A1 Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same |
| 08/01/2013 | WO2013111499A1 Exposure optical system, exposure apparatus, and exposure method |
| 08/01/2013 | WO2013110664A1 Overlay model for aligning and exposing semiconductor wafers |
| 08/01/2013 | WO2013110536A1 Arrangement for securing the position of a component within a housing |
| 08/01/2013 | WO2013110518A1 Optical arrangement for euv lithography |
| 08/01/2013 | WO2013110299A1 Method for mowing an object |
| 08/01/2013 | US20130197253 Photo-patternable dielectric materials curable to porous dielectric materials, formulations, precursors and methods of use thereof |
| 08/01/2013 | US20130196517 Drawing method and method of manufacturing article |
| 08/01/2013 | US20130196269 Photonic heating of silver grids |
| 08/01/2013 | US20130196268 Lithographic printing plate precursor |
| 08/01/2013 | US20130196267 Near-infrared sensitive, positive-working, image forming composition and photographic element containing a 1,1-di[(alkylphenoxy)ethoxy]cyclohexane |
| 08/01/2013 | US20130196114 Silicone structure-bearing polymer, resin composition, and photo-curable dry film |
| 08/01/2013 | US20130194562 Lithographic Apparatus and Device Manufacturing Method |
| 08/01/2013 | US20130194561 Optical component for maskless exposure apparatus |
| 08/01/2013 | US20130194560 Projection optical system, exposure apparatus, and exposure method |
| 08/01/2013 | US20130194559 Method for setting an illumination geometry for an illumination optical unit for euv projection lithography |
| 08/01/2013 | US20130194558 Apparatus for forming fine patterns capable of switching direction of polarization interference pattern in laser scanning method and method of forming fine patterns using the same |
| 08/01/2013 | US20130193065 Fabrication of Enclosed Nanochannels Using Silica Nanoparticles |
| 08/01/2013 | DE102012211846A1 Method for measuring angle-resolved intensity distribution in reticle plane of projection exposure system for microlithography with illumination system, involves arranging optical module in beam path of projection exposure system |
| 08/01/2013 | DE102012201410A1 Projektionsbelichtungsanlage mit einer Messvorrichtung zum Vermessen eines optischen Elements Projection exposure apparatus having a measurement device for measuring an optical element |
| 08/01/2013 | DE102012201235A1 Verfahren zum Einstellen einer Beleuchtungsgeometrie für eine Be-leuchtungsoptik für die EUV-Projektionslithographie A method for adjusting a lighting geometry for a Be-illumination optics for EUV projection lithography |
| 08/01/2013 | DE102012200370A1 Method for manufacturing optical element in microlithographic projection exposure system of optical system for manufacturing microstructured components, involves providing substrate that is made from material and has thickness |
| 07/31/2013 | EP2620824A1 Method for moving an object |
| 07/31/2013 | EP2620814A1 Method for forming conductive pattern, conductive pattern substrate, and touch panel sensor |
| 07/31/2013 | EP2620813A1 Lithographic printing plate original |
| 07/31/2013 | EP2620801A2 Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| 07/31/2013 | EP2620800A2 Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| 07/31/2013 | EP2620799A2 Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| 07/31/2013 | EP2620523A2 Method of forming a microstructure |
| 07/31/2013 | EP2619629A1 Lithography system arranged on a foundation, and method for arranging a lithography system on said foundation |
| 07/31/2013 | CN203101813U Exposure machine |
| 07/31/2013 | CN203101812U Novel parallel exposure machine |
| 07/31/2013 | CN203101811U Light resistance bottle changing device |
| 07/31/2013 | CN103229106A Developer and its use to pepare lithographic printing plates |
| 07/31/2013 | CN103229105A Photoimaging |
| 07/31/2013 | CN103229104A Composition for forming resist underlayer film containing hydroxyl group-containing carbazole novolac resin |
| 07/31/2013 | CN103229103A Photosensitive resin composition |
| 07/31/2013 | CN103229102A Negative pattern forming method and resist pattern |
| 07/31/2013 | CN103229101A Photosensitive resin composition for microlenses |
| 07/31/2013 | CN103229100A Polymerizable composition, and photosensitive layer, permanent pattern, wafer-level lens, solid-state imaging device and pattern forming method, each using the composition |
| 07/31/2013 | CN103226296A Rough-fine-movement laminated workbench with laser interferometer measurement |
| 07/31/2013 | CN103226295A Lithography machine silicon wafer bench micro-motion workbench |
| 07/31/2013 | CN103226294A Lithography system and method for improving exposure pattern position accuracy |
| 07/31/2013 | CN103226293A High-precision multichannel data acquisition system used for photoetching machine focus detection system |
| 07/31/2013 | CN103226292A Drawing method and method of manufacturing article |
| 07/31/2013 | CN103226291A An ultraviolet curing transparent resin composition |
| 07/31/2013 | CN103226290A Photosensitive resin composition, method of forming cured film, cured film, organic electroluminescent display device, and liquid crystal display device |
| 07/31/2013 | CN103226289A Colorant, coloring composition, color filter and display device |
| 07/31/2013 | CN103226288A UV-curing micro-nano-structure template-splicing device and template-splicing process |
| 07/31/2013 | CN103226287A Two-in-parallel parallel decoupling flexible microposition mechanism |
| 07/31/2013 | CN103226286A Preparation method of light barrier glass |
| 07/31/2013 | CN103226285A Pattern forming method and semiconductor device manufacturing method |
| 07/31/2013 | CN103226284A Imprint apparatus and method of manufacturing article |
| 07/31/2013 | CN103226265A Method for manufacturing light photo spacers among substrates of LCD (liquid crystal display) |