Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2013
06/13/2013US20130146346 Photosensitive composition for transparent conductive film
06/13/2013DE102012212199A1 Method for production of micro-or nano-structured components such as optical element, involves irradiating photons and/or electrons according to the structure to be produced, so that full surface material compaction takes place
06/13/2013DE102012202170A1 Device for adjusting position of e.g. optical device for projection exposure system for extreme UV projection lithography, has holder unit whose dimension is variable by effect of magnetic field in predetermined direction
06/13/2013DE102011088251A1 Actuator for e.g. actuating lens of illuminating optics in housing of projection exposure system for microlithography, has casing completely enclosing medium whose volume is changed based on pressure such that actuator moves component
06/13/2013DE102011088152A1 Extreme UV (EUV) lithography system used for manufacturing miniaturized component, has mirror elements which produce image on picture plane such that spacing between mirror elements and plane, and plane and screen is maximum/minimum
06/12/2013EP2602811A1 Photocurable composition and method for producing molded body having surface that is provided with fine pattern
06/12/2013EP2602662A1 Lighting system with a beam combinator for producing sreenprinting templates
06/12/2013EP2602661A1 Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film
06/12/2013EP2602660A1 Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film
06/12/2013EP2602610A1 Microfluidic chip manufacturing method, microfluidic chip, and device for generating surface plasmon resonance light
06/12/2013EP2602274A1 Epoxy resin composition having monocyclic aliphatic hydrocarbon ring
06/12/2013EP2602121A1 Gravure printing plate and method for producing gravure printing plate
06/12/2013EP2601041A2 Modular racking system
06/12/2013CN202995258U Photoetching developing device
06/12/2013CN202995257U Novel developing spraying mechanism
06/12/2013CN202995256U Synchronization positioning photoetching exposure device
06/12/2013CN202995255U Exposure and light curing all-in-one machine for manufacturing circuit boards
06/12/2013CN202995254U Scanning type UV-LED (Ultraviolet Light-Emitting Diode) exposure machine
06/12/2013CN202995253U Y-type waveguide laser direct-writing device
06/12/2013CN202983294U Antifoam device of membrane stripping developing solution KOH/NaOH
06/12/2013CN1930522B Positive light-sensitive resin composition, relief pattern using the same, and solid imaging element
06/12/2013CN1896871B Alkali development resin composition
06/12/2013CN103155099A Method and system for modifying photoresist using electromagnetic radiation and ion implantion
06/12/2013CN103154820A Plasma mediated ashing processes
06/12/2013CN103154819A Projection exposure tool for microlithography and method for microlithographic imaging
06/12/2013CN103154818A Optical system of a microlithographic projection exposure apparatus and method of reducing image placement errors
06/12/2013CN103154817A Direct drawing-type waterless lithographic printing original plate
06/12/2013CN103154162A Pigment dispersion, production method thereof, photosensitive colored resin composition, inkjet ink and electrophotographic printing toner containing said pigment dispersion, and color filter ?
06/12/2013CN103154053A Photosensitive resin composition and method for producing same
06/12/2013CN103154042A Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions
06/12/2013CN103153979A Polymerisable photoinitiators for led curable compositions
06/12/2013CN103153952A Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions
06/12/2013CN103153948A Difunctional (meth)acrylate writing monomers
06/12/2013CN103151359A Display device, array substrate and manufacturing method thereof
06/12/2013CN103151053A Thermally reactive resist material, laminated body for thermal lithography using the material, and mold manufacturing method using the material and the laminated body
06/12/2013CN103149810A Techniques providing photoresist removal
06/12/2013CN103149809A Off-axis illuminating device for photoetching machine equipment
06/12/2013CN103149808A Immersed ultraviolet optical system
06/12/2013CN103149807A Illumination optical apparatus, exposure apparatus, and device manufacturing method
06/12/2013CN103149806A Illumination optical apparatus, exposure apparatus, and device manufacturing method
06/12/2013CN103149805A Super-diffraction nano-optical probe
06/12/2013CN103149804A Device and method for generating extreme ultraviolet source based on radial polarization laser driving
06/12/2013CN103149803A Exposure device and method of manufacturing device
06/12/2013CN103149802A Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method
06/12/2013CN103149801A Laser direct plate marking device for plane screen print plate and device
06/12/2013CN103149800A Composition used for etching mask and pattern forming method
06/12/2013CN103149799A Colored resin composition, color filter, liquid crystal display and organic el display device
06/12/2013CN103149798A Resist composition and method for producing resist pattern
06/12/2013CN103149797A Nanoimprint machine and pressurizing method thereof
06/12/2013CN103149796A Nano imprint lithography apparatuses and methods
06/12/2013CN103149795A Manufacture methods of resin pattern, pattern substrate, thin film transistor substrate, layer insulation film and display device
06/12/2013CN103149794A Roller-based imprinting system
06/12/2013CN103149791A Light pattern exposure method, halftone phase shift mask, and halftone phase shift mask blank
06/12/2013CN103149745A Spacer manufacturing method on substrate
06/12/2013CN103149618A Light spectrum purification filter device for laser plasma extreme ultraviolet lithography source
06/12/2013CN103149615A Preparation method of multilayer metal grating
06/12/2013CN103149614A Manufacturing and transferring method of high-temperature grating
06/12/2013CN103145988A Polyimide oligomer and liquid photoimagable solder resist ink
06/12/2013CN103145948A Vegetable oil based isocyanate acrylate capable of being photopolymerized and preparation method thereof
06/12/2013CN103145908A Alkali soluble resin as well as preparation method and application thereof
06/12/2013CN103145624A Molecular glass positive photoresist and patterning method thereof
06/12/2013CN103145555A Polymerizable oligomer and photoresist composition
06/12/2013CN102445839B Method for self-aligned photo-etching
06/12/2013CN102419515B Polysiloxane compound, preparation method of polysiloxane compound, solidified film of display element and formation method of solidified film
06/12/2013CN102417792B Preparation method of antifouling material having crossed regular microstructure on surface
06/12/2013CN102402121B Coating compositions for photolithography
06/12/2013CN102393604B Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board
06/12/2013CN102375339B Alkali development-type photosensitive resin composition
06/12/2013CN102360163B 感光性元件 The photosensitive element
06/12/2013CN102298273B Aerial image sensor angle response measurement method based on two-pole illumination
06/12/2013CN102285299B Object surface metallized decoration method
06/12/2013CN102279533B Film-transport bistable horizontal locking device in lithography machine
06/12/2013CN102193341B Method and device for processing photoresist
06/12/2013CN102096346B Silicon wafer photoresist-removing method and device and method for removing photoresist on silicon wafer by using developing bench
06/12/2013CN102089713B Optical element for a lithographic apparatus, lithographic apparatus comprising such optical element and method for making the optical element
06/12/2013CN102084297B Method for producing a multilayer coating, optical element and optical arrangement
06/12/2013CN102053492B Compositions and processes for photolithography
06/12/2013CN102023476B Semiconductor photoetching process method for forming micro-sized structure
06/12/2013CN101978321B Photosensitive resin composition, photosensitive resin laminate, method for forming resist pattern and process for producing printed circuit board, lead frame, semiconductor package and concavoconvex board
06/12/2013CN101900943B Coating compositions suitable for use with an overcoated photoresist
06/12/2013CN101876791B Positive photo-resist resin composition and solidification film forming method using the composition
06/12/2013CN101866117B Part manufacturing method and lithographic apparatus
06/12/2013CN101807007B Liquid crystal exposure apparatus
06/12/2013CN101794078B Ultraviolet ray lamp exposure system, using method and calibrating method
06/12/2013CN101788767B Radiation sensitive linear resin composition and layer insulation film and manufacture method thereof
06/12/2013CN101681123B Illumination optical system, exposure apparatus, and device manufacturing method
06/12/2013CN101625525B Light-sensitive resin composition
06/12/2013CN101614971B Photoresist cleaning agent
06/12/2013CN101592759B Resin composition for optical material, resin film for optical material, and optical waveguide using the same
06/12/2013CN101581887B Fluid handling structure, lithographic apparatus and device manufacturing method
06/12/2013CN101581881B Coloring phototonus resin composition
06/12/2013CN101487974B Nano-scale printing mould structure and its use on luminous element
06/12/2013CN101470350B Photo sensitive resin compositon, optical spacer, protective film, coloring pattern, display device and substrate thereof
06/12/2013CN101458452B X-ray sensitive resin composition, barrier body and protection film of liquid crystal display member and their forming methods
06/12/2013CN101432659B 感光性树脂组合物及感光性薄膜 The photosensitive resin composition and photosensitive film
06/12/2013CN101421674B Microlithographic illumination system, projection exposure apparatus comprising an illumination system of this type
06/12/2013CN101403857B Curing composition for pigmentation pixel, color filtering device and liquid crystal display apparatus
06/12/2013CN101367982B Curing resin composition, sealing material for liquid crystal display device and liquid crystal display device
06/12/2013CN101339365B Radiation linear combination, colorful filter and colorful liquid crystal display unit
06/12/2013CN101164014B Composition for resist underlayer film formation for forming photocrosslinking cured resist underlayer film
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