| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/12/2013 | CN101126907B Projection objective of a microlithographic projection exposure apparatus |
| 06/11/2013 | US8462314 Lithographic apparatus and device manufacturing method |
| 06/11/2013 | US8461678 Structure with self aligned resist layer on an interconnect surface and method of making same |
| 06/11/2013 | US8461555 Charged particle beam writing method and charged particle beam writing apparatus |
| 06/11/2013 | US8460857 Manufacturing method for wiring |
| 06/11/2013 | US8460856 Material and method for photolithography |
| 06/11/2013 | US8460855 Composition for forming underlayer coating for litography containing epoxy compound and carboxylic acid compound |
| 06/11/2013 | US8460854 Multiple step printing methods for microbarcodes |
| 06/11/2013 | US8460853 Photosensitive resin composition, photosensitive element, resist pattern manufacturing method, and printed circuit board manufacturing method |
| 06/11/2013 | US8460852 Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for manufacturing printed wiring board |
| 06/11/2013 | US8460851 Salt and photoresist composition containing the same |
| 06/11/2013 | US8460850 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same |
| 06/11/2013 | US8460476 Apparatus for and method of processing substrate subjected to exposure process |
| 06/06/2013 | WO2013082262A1 Photoactive resins, radiation curable compositions and radiation curable inks |
| 06/06/2013 | WO2013081951A1 Method for making flexographic printing forms by welding edges of photosensitive elements with microwave energy |
| 06/06/2013 | WO2013081184A1 Actinic ray-sensitive or radiation-sensitive composition, actinic ray-sensitive or radiation-sensitive film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin |
| 06/06/2013 | WO2013081168A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device |
| 06/06/2013 | WO2013081155A1 Photosensitive azobenzene derivative |
| 06/06/2013 | WO2013081072A1 Measurement device, measurement method, and method for manufacturing semiconductor device |
| 06/06/2013 | WO2013080996A1 Catadioptric projection optical system and projection exposure device equipped with same |
| 06/06/2013 | WO2013080964A1 Colored composition for color filter, and color filter |
| 06/06/2013 | WO2013080958A1 Plate-film forming member |
| 06/06/2013 | WO2013080929A1 Resist-underlayer-film-forming composition used in multilayer resist process, resist underlayer film, method for forming same, and pattern-formation method |
| 06/06/2013 | WO2013080884A1 Negative-type photosensitive siloxane composition |
| 06/06/2013 | WO2013079316A2 Apparatus and method for converting a vector-based representation of a desired device pattern for a lithography apparatus, apparatus and method for providing data to a programmable patterning device, a lithography apparatus and a device manufacturing method |
| 06/06/2013 | WO2013079285A1 Lithographic apparatus, device manufacturing method and computer program |
| 06/06/2013 | WO2013079270A1 Inspection method and apparatus, and corresponding lithographic apparatus |
| 06/06/2013 | WO2013078695A1 Method for manufacturing shading plate |
| 06/06/2013 | WO2013078638A1 Device and method for detecting wave aberration of projection lens system of lithography machine |
| 06/06/2013 | WO2012146709A3 High-resolution positioning device |
| 06/06/2013 | US20130143163 Resist-protective film-forming composition and patterning process |
| 06/06/2013 | US20130143162 Resist-protective film-forming composition and patterning process |
| 06/06/2013 | US20130143160 Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound |
| 06/06/2013 | US20130143159 Resist composition for euv or eb, and method of forming resist pattern |
| 06/06/2013 | US20130143158 Photosensitive Resin Composition for Color Filter and Color Filter Including the Same |
| 06/06/2013 | US20130143157 Homoadamantane derivatives, process for preparing same, and photoresist compositions |
| 06/06/2013 | US20130143149 Mask for use in photolithography, manufacturing method thereof and manufacturing method of devices by using the mask |
| 06/06/2013 | US20130143011 Photosensitive resin composition |
| 06/06/2013 | US20130143007 Mask |
| 06/06/2013 | US20130141810 Photosensitive Resin Composition for Color Filter and Color Filter Using the Same |
| 06/06/2013 | US20130141730 Illumination Source for use in Inspection Methods and/or Lithography; Inspection and Lithographic Apparatus and Inspection Method |
| 06/06/2013 | US20130141709 Lithographic apparatus, euv radiation generation apparatus and device manufacturing method |
| 06/06/2013 | US20130141708 Substrate processing method, manufacturing method of euv mask, and euv mask |
| 06/06/2013 | US20130141706 Lithographic method and apparatus |
| 06/06/2013 | US20130141704 Microlens exposure system |
| 06/06/2013 | US20130141703 Exposure method, substrate stage, exposure apparatus, and device manufacturing method |
| 06/06/2013 | US20130141702 Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine |
| 06/06/2013 | US20130141701 Exposure method, substrate stage, exposure apparatus, and device manufacturing method |
| 06/06/2013 | US20130139713 Nano imprint lithography apparatuses and methods |
| 06/06/2013 | DE102012213927A1 Device for generating gas curtain for deflecting contaminating substances in extreme UV-mask metrological system, has nozzle with nozzle section, where pressure of supersonic-gas flow is not larger than specific percent of ambient pressure |
| 06/06/2013 | DE102012212953A1 Mirror assembly for extreme UV lithography system used during manufacture of integrated circuits, has actuation device which introduces fluid into cavity by exerting pressure over contact element on inner surface of mirror substrate |
| 06/06/2013 | DE102012210961A1 Micro or nano structured component e.g. semiconductor chip for use in projection exposure system, sets angle between mirror symmetric axes viewed in projection on object plane and displacement direction of holder to specific range |
| 06/06/2013 | DE102012210256A1 Mirror element for extreme UV projection exposure system, has mirror surfaces comprising smooth surface with quadratic roughness of specific value and micro-structure with specific period length and specific amplitude |
| 06/06/2013 | DE102012210174A1 Optical component for use in illumination optics of illumination system of projection exposure system for guiding light radiation to object field, has individual mirrors with front side that forms individual mirror reflecting surface |
| 06/06/2013 | DE102012206154A1 Optical system for microlithographic projection exposure system utilized for manufacturing e.g. LCD, has mirror elements adjusted independent of each other, and retarding layer arranged on reflection surface of one of mirror elements |
| 06/06/2013 | DE102007008163B4 Reliefdruckplatte sowie Verfahren zu ihrer Herstellung Relief printing plate and process for their preparation |
| 06/05/2013 | EP2600383A1 Stage apparatus |
| 06/05/2013 | EP2600194A2 Optical filter and analytical instrument |
| 06/05/2013 | EP2600193A2 Optical filter and analytical instrument |
| 06/05/2013 | EP2600192A2 Optical filter and analytical instrument |
| 06/05/2013 | EP2600191A2 Optical filter and analytical instrument |
| 06/05/2013 | EP2599814A1 Compound, radiation-sensitive composition, and method for forming resist pattern |
| 06/05/2013 | EP2598947A1 Euv exposure apparatus |
| 06/05/2013 | EP2598946A1 Polymerizable composition |
| 06/05/2013 | EP2598931A1 Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type |
| 06/05/2013 | EP2598589A1 A composition for coating over a photoresist pattern |
| 06/05/2013 | CN202975593U Reel-to-reel type automatic integrated circuit (IC) card strip exposure device |
| 06/05/2013 | CN202975592U Simply-operated air channel of imprinting cylinder exposure machine |
| 06/05/2013 | CN202975591U Novel tilt cylinder shutter control device of UV (ultraviolet) lamp |
| 06/05/2013 | CN202975590U Working structure for providing scanning path of immersion lithography machine |
| 06/05/2013 | CN202974226U EPC monitoring alarm device applied to coating membrane surface oven |
| 06/05/2013 | CN103140805A Projection exposure tool for microlithography and method for microlithographic exposure |
| 06/05/2013 | CN103140804A Scanning exposure apparatus using microlens array |
| 06/05/2013 | CN103140803A Imaging optical system for microlithography |
| 06/05/2013 | CN103140802A Mirror, optical system for EUV projection exposure system and method of producing a component |
| 06/05/2013 | CN103140801A Substrate for mirrors for EUV lithography |
| 06/05/2013 | CN103140800A Novel photosensitive resin composition production kit, and use thereof |
| 06/05/2013 | CN103140782A Facet mirror device |
| 06/05/2013 | CN103140551A Radiation-sensitive resin composition, polymer, and compound |
| 06/05/2013 | CN103140520A Black polymerizable composition and method for producing a black layer |
| 06/05/2013 | CN103140357A Lithographic printing plate master and plate making method using the same |
| 06/05/2013 | CN103137405A Tungsten foil mesh for transmission microscope and scanning microscope and production method of tungsten foil mesh |
| 06/05/2013 | CN103135371A Small light spot off-axis aligning system based on beam splitting deflection structure |
| 06/05/2013 | CN103135370A Photoresist stripping method |
| 06/05/2013 | CN103135369A Photoetching lighting mode generator |
| 06/05/2013 | CN103135368A Method and system for measuring stray light |
| 06/05/2013 | CN103135367A Electron beam exposure method |
| 06/05/2013 | CN103135366A Bifocal oblique incidence interference microscopic device for detecting extreme ultraviolet photolithographic mask defect |
| 06/05/2013 | CN103135365A Liquid immersion member, method for manufacturing liquid immersion member, exposure apparatus, and device manufacturing method |
| 06/05/2013 | CN103135364A Photolithographic process parameter determination method and device |
| 06/05/2013 | CN103135363A Device for producing projection photo-etching illumination mode |
| 06/05/2013 | CN103135362A Light pattern exposure method, photomask, and photomask blank |
| 06/05/2013 | CN103135361A Support, lithographic apparatus and device manufacturing method |
| 06/05/2013 | CN103135360A Reticle assembly, a lithographic apparatus, the use in a lithographic process, and a method to project two or more image fields |
| 06/05/2013 | CN103135359A Centering device and centering method of optical-mechanical system |
| 06/05/2013 | CN103135358A Multi-light-source interference exposure device |
| 06/05/2013 | CN103135357A Synchronization control method of wafer stage and reticle stage and system of wafer stage and reticle stage |
| 06/05/2013 | CN103135356A Reflection-type photoetching projection objective |
| 06/05/2013 | CN103135355A Photo-curing polysiloxane composition and application thereof |
| 06/05/2013 | CN103135354A Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film |