| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/20/2013 | US8512934 Sulphonium salt initiators |
| 08/15/2013 | WO2013120051A1 Preparation, purification and use of high-x diblock copolymers |
| 08/15/2013 | WO2013119832A1 Anhydride copolymer top coats for orientation control of thin film block copolymers |
| 08/15/2013 | WO2013119820A1 Polyactide/silicon-containing block copolymers for nanolithography |
| 08/15/2013 | WO2013119811A1 Using chemical vapor deposited films to control domain orientation in block copolymer thin films |
| 08/15/2013 | WO2013119600A1 Skateboard with engraved grip surface |
| 08/15/2013 | WO2013119546A1 Photocurable composition |
| 08/15/2013 | WO2013119539A1 Curable and patternable inks and method of printing |
| 08/15/2013 | WO2013119134A1 Photoresist with rare-earth sensitizers |
| 08/15/2013 | WO2013118908A1 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom, method of forming pattern, process for manufacturing semiconductor device, semiconductor device and compound |
| 08/15/2013 | WO2013118851A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device |
| 08/15/2013 | WO2013117989A1 Low dielectric photoimageable compositions and electronic devices made therefrom |
| 08/15/2013 | WO2013117518A2 Lithographic apparatus comprising a support for holding an object, and a support for use therein |
| 08/15/2013 | WO2013117448A1 Methods and apparatuses for detecting contaminant particles |
| 08/15/2013 | WO2013117435A1 A lithography apparatus and system, a method of calibrating a lithography apparatus, and device manufacturing methods |
| 08/15/2013 | WO2013117343A1 Projection lens for euv microlithography, film element and method for producing a projection lens comprising a film element |
| 08/15/2013 | WO2013067395A3 Method and apparatus for improving ink deposition |
| 08/15/2013 | US20130210236 Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process |
| 08/15/2013 | US20130209942 Pattern formation method |
| 08/15/2013 | US20130209941 Method of forming pattern |
| 08/15/2013 | US20130209939 Integrated Membrane Lamination and UV Exposure System and Method of Using the Same |
| 08/15/2013 | US20130209938 Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And Resist Composition And Pattern Formation Method Utilizing Same |
| 08/15/2013 | US20130209937 Polymerizable Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin, Resist Composition And Pattern-Forming Method Using Same |
| 08/15/2013 | US20130209936 Patterning process and resist composition |
| 08/15/2013 | US20130209935 Monomer, polymer, resist composition, and patterning process |
| 08/15/2013 | US20130209934 Photosensitive copolymer, photoresist comprising the copolymer, and articles formed therefrom |
| 08/15/2013 | US20130209926 Controllable transmission and phase compensation of transparent material |
| 08/15/2013 | US20130209925 Mask blank, reflective mask blank, photomask, reflective mask, photomask set and method of manufacturing a semiconductor device |
| 08/15/2013 | US20130209923 Mask, pattern disposing method thereof and exposing method thereof |
| 08/15/2013 | US20130209922 Chemically amplified negative resist composition and pattern forming process |
| 08/15/2013 | US20130209921 Photoresist composition |
| 08/15/2013 | US20130209754 Low dielectric photoimageable compositions and electronic devices made therefrom |
| 08/15/2013 | US20130208255 Scanning exposure apparatus using microlens array |
| 08/15/2013 | US20130208254 Nano-photolithographic superlens device and method for fabricating same |
| 08/15/2013 | US20130208253 Reflective photolithography apparatus having control mirror module |
| 08/15/2013 | US20130207238 Block co-polymer photoresist |
| 08/14/2013 | EP2626743A1 Chemically amplified negative resist composition and pattern forming process |
| 08/14/2013 | EP2626672A1 Assembly with multiple sampling units of a position measuring device |
| 08/14/2013 | EP2626393A1 Pigment dispersion, production method thereof, photosensitive colored resin composition, inkjet ink and electrophotographic printing toner containing said pigment dispersion, and color filter |
| 08/14/2013 | EP2625166A1 Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions |
| 08/14/2013 | DE112010004081B4 Rezeptur für die Rotationsbeschichtung und Verfahren zum Ablösen eines ionenimplantierten Fotolacks Formulation for the spin coating method and ion-implanted photoresist to remove a |
| 08/14/2013 | DE112007000997B4 Verfahren zum Verkleinern des minimalen Teilungsmaßes in einer Struktur A method for reducing the minimum pitch of a structure |
| 08/14/2013 | DE102012218105A1 Apparatus for coupling illumination radiation in illumination optical system, for use in projection exposure system, has sensor element to do time-resolved detection of radiation source illumination radiation coupled in optical system |
| 08/14/2013 | DE102012218074A1 Diaphragm device for use in illumination optics of lighting system to light object field in scanner for extreme UV projection lithography application, has obscuration elements for confinement of lighting field and comprising curved boundary |
| 08/14/2013 | DE102012216494A1 Method of operating projection printer for EUV lithography, involves controlling image-side transmission depending on comparison result such that image-side transmission is produced within one or more transmission specifications |
| 08/14/2013 | DE102012214232A1 Bearing device for mirror of mirror arrangement for projection exposure system, has three supports, and support bearing, which is formed such that only force component is transferred in direction opposite to gravitational force |
| 08/14/2013 | DE102012202167A1 Vorrichtung zur magnetfeldkompensierten Positionierung eines Bauelements Apparatus for positioning a magnetic-field-compensated device |
| 08/14/2013 | DE102012202057A1 Projektionsobjektiv für EUV-Mikrolithographie, Folienelement und Verfahren zur Herstellung eines Projektionsobjektivs mit Folienelement Projection objective for EUV microlithography, foil element and process for producing a projection lens with film element |
| 08/14/2013 | DE102012201410B4 Projektionsbelichtungsanlage mit einer Messvorrichtung zum Vermessen eines optischen Elements Projection exposure apparatus having a measurement device for measuring an optical element |
| 08/14/2013 | DE102011077223B4 Messsystem Measuring system |
| 08/14/2013 | DE102011075393B4 Anordnung zur Aktuierung eines Elementes in einer Projektionsbelichtungsanlage Arrangement for actuation of an element in a projection exposure apparatus |
| 08/14/2013 | DE102004021151B4 Verfahren zum Reduzieren von Ungleichförmigkeit und Bildverkürzung in einem auf ein Substrat belichteten Bild unter Verwendung einer photolithographischen Maske, und photolithographische Maske A method for reducing non-uniformity and image shortening in an exposed image on a substrate using a photolithographic mask, and photolithographic mask |
| 08/14/2013 | CN203133477U Plate processor developing liquid circulating system |
| 08/14/2013 | CN203133476U Washing water branching circulating system of developer |
| 08/14/2013 | CN203133475U Novel etching sheet continuous exposure machine |
| 08/14/2013 | CN203133474U Device for online detection of wave aberration of projection objective |
| 08/14/2013 | CN203133473U Online measurement device of projection objective wave aberration of photoetching machine |
| 08/14/2013 | CN1987662B Lithographic apparatus and device manufacturing method |
| 08/14/2013 | CN103250232A Surface inspection device and method therefor |
| 08/14/2013 | CN103250231A Exposure device |
| 08/14/2013 | CN103250101A Method and arrangement for determining the heating condition of a mirror in an optical system |
| 08/14/2013 | CN103250100A Radiation-sensitive resin composition, method for forming pattern using same, polymer, and compound |
| 08/14/2013 | CN103250099A Norbornane-based PAC Ballast and positive-one photosensitive resin composition encompassing the PAC |
| 08/14/2013 | CN103249750A Transparent layer forming polymer |
| 08/14/2013 | CN103249749A Polymer compound comprising dye and curable resin composition comprising same |
| 08/14/2013 | CN103246178A Developing machine |
| 08/14/2013 | CN103246177A Continuous mask-free photoetching method for flexible panel and device for method |
| 08/14/2013 | CN103246176A Isolation chamber for isolating laser produced plasma extreme ultraviolet light source fragments |
| 08/14/2013 | CN103246175A Lens heating aware source mask optimization for advanced lithography |
| 08/14/2013 | CN103246174A Substrate-topography-aware lithography modeling |
| 08/14/2013 | CN103246173A Lithography model for 3D resist profile simulations |
| 08/14/2013 | CN103246172A Assembly with multiple sampling units of a position measuring device |
| 08/14/2013 | CN103246171A Multiple-grid exposure method |
| 08/14/2013 | CN103246170A Exposure device and exposure method |
| 08/14/2013 | CN103246169A Apparatus and method for focal plane change measurement |
| 08/14/2013 | CN103246168A Active driving wire cable table of silicon wafer stage of lithography machine |
| 08/14/2013 | CN103246167A Lithographic micromachining method |
| 08/14/2013 | CN103246166A Silicon wafer prealignment measuring apparatus |
| 08/14/2013 | CN103246165A Photoresist coating device and coating method thereof |
| 08/14/2013 | CN103246164A Photosensitive resin for stereo lithography forming and preparation method thereof |
| 08/14/2013 | CN103246163A Colored curable resin composition |
| 08/14/2013 | CN103246162A Curable resin composition |
| 08/14/2013 | CN103246161A Self-adaption imprinting head for large-area nano imprinting |
| 08/14/2013 | CN103246160A Making method of micro characters and pictures |
| 08/14/2013 | CN103246158A Mask as well as pattern collocation method and exposure method thereof |
| 08/14/2013 | CN103246155A Photolithography mask and exposure method thereof |
| 08/14/2013 | CN103246154A Manufacturing method of mask plate for solidifying and shielding sealing frame glue |
| 08/14/2013 | CN103246103A Color liquid crystal display device |
| 08/14/2013 | CN103246040A High-accuracy repeated positioning structure capable of achieving rapid changing and used in photoetching projection lens |
| 08/14/2013 | CN103245991A Method for doubling grating space frequency |
| 08/14/2013 | CN103241709A Method for adjusting photoelectric property of nanocarbon film by ozone and for graphing nanocarbon film |
| 08/14/2013 | CN102540727B Photo-curing polysiloxane composition and protective film formed from same |
| 08/14/2013 | CN102317862B Photosensitive resin composition which is curable at a low temperature, and dry film produced using same |
| 08/14/2013 | CN102313508B Light path alignment device of laser interferometer and method |
| 08/14/2013 | CN102272679B Method of controlling surface roughness of a flexographic printing plate |
| 08/14/2013 | CN102253606B System and method for carrying out in-situ detection on odd aberration of projection objective for photoetching machines |
| 08/14/2013 | CN102253604B Method for detecting quality of space image |
| 08/14/2013 | CN102200691B Online measuring mark and method of projection objective lens image surface of photo-etching machine |
| 08/14/2013 | CN102122121B Process solutions containing surfactants |
| 08/14/2013 | CN102103333B Method for baking photoresist and device using method |