| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/22/2013 | US20130216949 Water mark defect prevention for immersion lithography |
| 08/22/2013 | US20130216948 Radiation-sensitive resin composition and pattern-forming method |
| 08/22/2013 | US20130216947 Chemical coating composition for forming a laser-markable material and a laser-markable material |
| 08/22/2013 | US20130216776 Dual hard mask lithography process |
| 08/22/2013 | US20130215408 Lithographic Apparatus and Device Manufacturing Method |
| 08/22/2013 | US20130215407 Projection exposure apparatus and projection exposure method |
| 08/22/2013 | US20130215406 Lithography method and apparatus |
| 08/22/2013 | US20130215403 Exposure apparatus, and device manufacturing method |
| 08/22/2013 | US20130214379 Photosensitive resin composition, photosensitive resin composition film, and semiconductor device using the photosensitive resin composition or photosensitive resin composition film |
| 08/22/2013 | US20130213932 Pattern formation method and metal structure formation method |
| 08/22/2013 | US20130213931 Method for forming a pattern, method for producing a substrate, and method for producing a mold |
| 08/22/2013 | DE10351963B4 Verfahren zum Belacken von Halbleitersubstraten A method for lacquering of semiconductor substrates |
| 08/22/2013 | DE102013201509A1 Optisches Bauelement Optical component |
| 08/22/2013 | DE102013201506A1 Optisches Bauelement Optical component |
| 08/22/2013 | DE102012213553A1 Optical system i.e. micro-lithographic projection exposure system, for manufacturing e.g. LCD, has lenses arranged relative to each other such that delay distribution is partly compensated by voltage-induced double refraction distribution |
| 08/22/2013 | DE102012212864A1 Optical system for microlithographic projection exposure system for manufacture of e.g. LCD, has polarization manipulator whose two sub-elements are made of respective optical positive and negative uniaxial crystal materials |
| 08/22/2013 | DE102012212662A1 Measuring device for measuring imaging optical system i.e. projection lens, for forming object field in image plane, has detector arranged in front of optical system, and reference mark arranged behind optical system |
| 08/22/2013 | DE102012202553A1 Lithographievorrichtung mit dämpfungsvorrichtung Lithography apparatus with damping device |
| 08/22/2013 | DE102012202536A1 Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie The projection exposure method and projection exposure system for microlithography |
| 08/22/2013 | DE102012003543A1 Device for contact-less and precise movement of component of projection exposure system for microlithography, has air bearing, with which component is lifted by air pressure by upper surface to be moved relative to upper surface |
| 08/22/2013 | DE102011088251B4 Autarker Aktuator Stand-alone actuator |
| 08/21/2013 | EP2629149A2 Colored curable composition, color filter and manufacturing method thereof |
| 08/21/2013 | EP2628745A1 Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process |
| 08/21/2013 | EP2628744A1 Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process |
| 08/21/2013 | EP2628051A1 Method and apparatus for printing periodic patterns |
| 08/21/2013 | EP2628050A1 Photosensitive negative resin composition |
| 08/21/2013 | EP2628049A1 A method of casting |
| 08/21/2013 | CN203149518U Micro-structure conductive pattern forming system |
| 08/21/2013 | CN203149265U Azobenzene polymer surface relief grating lithography machine based on guide die interference |
| 08/21/2013 | CN1839353B Apparatus and method for providing a confined liquid for immersion lithography |
| 08/21/2013 | CN1757622B 2-hydroxy-3-alkoxypropyl sulfides, sulfones, and sulfoxides: new surface active agents |
| 08/21/2013 | CN103262221A Method of manufacturing dielectric device and ashing method |
| 08/21/2013 | CN103261970A Machine for exposing panels |
| 08/21/2013 | CN103261969A Arrangement for the production of structured substrates |
| 08/21/2013 | CN103261968A Photosensitive resin composition, partition wall, color filter, and organic EL element |
| 08/21/2013 | CN103261967A Photosensitive negative resin composition |
| 08/21/2013 | CN103261966A Photosensitive element, method for forming resist pattern, and method for producing printed circuit board |
| 08/21/2013 | CN103261965A Flexographic printing original plate |
| 08/21/2013 | CN103261137A Fluoroalcohol containing molecular photoresist materials and processes of use |
| 08/21/2013 | CN103258795A Technological method capable of preventing shortcomings on photoresist during wet etching |
| 08/21/2013 | CN103258794A Technological method capable of preventing shortcomings on photoresist during wet etching |
| 08/21/2013 | CN103258733A Technological method capable of preventing shortcomings on photoresist during wet etching |
| 08/21/2013 | CN103258720A Photoresist pattern trimming methods |
| 08/21/2013 | CN103257534A Photoetching rework photoresist removing technology |
| 08/21/2013 | CN103257533A Automatic focusing method of photoetching machine |
| 08/21/2013 | CN103257532A Radiation source and lithographic apparatus |
| 08/21/2013 | CN103257531A Cavity liquid tin target generator for laser plasma pole ultraviolet source |
| 08/21/2013 | CN103257530A Proximity exposure apparatus, method of forming exposure light in the proximity exposure apparatus and method of manufacturing a display panel substrate |
| 08/21/2013 | CN103257529A Electron beam writing apparatus and electron beam writing method |
| 08/21/2013 | CN103257528A Electron beam writing apparatus and electron beam writing method |
| 08/21/2013 | CN103257527A Photosensitive adhesive composition, and film adhesive, adhesive sheet, adhesive pattern, semiconductor wafer and semiconductor device |
| 08/21/2013 | CN103257526A UV curing transparent resin composition |
| 08/21/2013 | CN103257525A Colorant, coloring composition for color filter, color filter and display device |
| 08/21/2013 | CN103257524A Impressing apparatus and impressing method |
| 08/21/2013 | CN103257523A Electron beam positive resist exposure method |
| 08/21/2013 | CN103257398A Method of fabrication polymer waveguide |
| 08/21/2013 | CN103257383A Preparation method of blazing-angle-variable blazed grating and double-blazed grating and products |
| 08/21/2013 | CN103257379A Methods for forming sheeting with a composite image that floats |
| 08/21/2013 | CN103254346A Photosensitive copolymer, photoresist comprising the copolymer, and articles formed therefrom |
| 08/21/2013 | CN103254178A Triazine compound, pigment dispersing aid, pigment dispersion and resist composition |
| 08/21/2013 | CN102645730B Experimental immersed projective lithography objective lens |
| 08/21/2013 | CN102436058B Full spherical catadioptric collimating objective lens applied to deep ultraviolet band |
| 08/21/2013 | CN102385243B Method and apparatus for producing light guide plates |
| 08/21/2013 | CN102323722B Method for acquiring mask space image based on Abbe vector imaging model |
| 08/21/2013 | CN102323721B Method for obtaining space image of non-ideal lithography system based on Abbe vector imaging model |
| 08/21/2013 | CN102197489B Underlayer film for image formation |
| 08/21/2013 | CN102193333B Lithographic apparatus, cover for use in a lithographic apparatus and method for designing a cover for use in a lithographic apparatus |
| 08/21/2013 | CN102157350B Manufacturing method for semiconductor device |
| 08/21/2013 | CN102140169B Novel water-soluble polyimide resin as well as preparation method and application thereof |
| 08/21/2013 | CN102084298B Illumination system comprising a fourier optical system |
| 08/21/2013 | CN102076740B Heat-resistant resin precursor and photosensitive resin composition comprising the same |
| 08/21/2013 | CN102057329B Methods for model-based process simulation |
| 08/21/2013 | CN101950129B Lithographic apparatus and a method of measuring flow rate in a two phase flow |
| 08/21/2013 | CN101852984B Method for inspecting photomask blank or intermediate thereof, method for determining dosage of high-energy radiation, and method for manufacturing photomask blank or its intermediate |
| 08/21/2013 | CN101827880B Precursor for heat-resistant resin and photosensitive resin composition containing the same |
| 08/21/2013 | CN101799624B Substrate processing apparatus |
| 08/21/2013 | CN101681125B Illumination optical system, exposure apparatus, and device manufacturing method |
| 08/21/2013 | CN101676799B Method for etching base material |
| 08/21/2013 | CN101627089B Blue phthalocyanine pigment composition and its preparation |
| 08/21/2013 | CN101614969B Developing method for immersion lithography, solvent used for the developing method and electronic device using the developing method |
| 08/21/2013 | CN101529336B Antireflective coating compositions |
| 08/21/2013 | CN101501571B Method of preparing a patterned film with a developing solvent |
| 08/21/2013 | CN101419309B Optical waveguide for touch screen and touch screen using the same |
| 08/21/2013 | CN101377618B Dual-side imprinting lithography system |
| 08/21/2013 | CN101305324B Method of making a lithographic printing plate |
| 08/21/2013 | CN101261410B LCD device including a reflection film having a convex-concave surface |
| 08/21/2013 | CN101086624B Lithography systems and processes |
| 08/20/2013 | US8516405 System and method for lithography simulation |
| 08/20/2013 | US8514373 Movable body system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method |
| 08/20/2013 | US8514371 Imaging device in a projection exposure facility |
| 08/20/2013 | US8514367 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine |
| 08/20/2013 | US8514366 Exposure method and apparatus, maintenance method and device manufacturing method |
| 08/20/2013 | US8513631 Light processing apparatus |
| 08/20/2013 | US8513625 Track-based metrology method and apparatus |
| 08/20/2013 | US8513320 Hydrophilic coating |
| 08/20/2013 | US8512939 Photoresist stripping technique |
| 08/20/2013 | US8512938 Methods of forming a pattern in a material and methods of forming openings in a material to be patterned |
| 08/20/2013 | US8512937 Lithographic dry development using optical absorption |
| 08/20/2013 | US8512936 Optical lithography using graphene contrast enhancement layer |
| 08/20/2013 | US8512935 Functionalized perfluoropolyether material as a hydrophobic coating |