| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/29/2013 | WO2013124052A2 Lithography device with eddy-current brake |
| 08/29/2013 | WO2013123973A1 Method and apparatus for compensating at least one defect of an optical system |
| 08/29/2013 | WO2013037486A3 Assembly for providing an aligned stack of two or more modules and a lithography system or a microscopy system comprising such an assembly |
| 08/29/2013 | US20130224957 Silicon-containing resist underlayer film forming composition having fluorine-based additive |
| 08/29/2013 | US20130224666 Resist pattern-forming method, and radiation-sensitive resin composition |
| 08/29/2013 | US20130224665 Atomic layer deposition lithography |
| 08/29/2013 | US20130224664 Method of manufacturing solid-state image sensor |
| 08/29/2013 | US20130224663 Method of providing lithographic printing plates |
| 08/29/2013 | US20130224662 Charged particle beam apparatus, drawing apparatus, and method of manufacturing article |
| 08/29/2013 | US20130224661 Pattern-forming method, and radiation-sensitive resin composition |
| 08/29/2013 | US20130224660 Preparation of polymer, resulting polymer, resist composition, and patterning process |
| 08/29/2013 | US20130224659 Polymer, making method, resist composition, and patterning process |
| 08/29/2013 | US20130224658 Resist composition and method of forming resist pattern |
| 08/29/2013 | US20130224657 Acid generator, chemically amplified resist composition, and patterning process |
| 08/29/2013 | US20130224656 Resist composition and method of forming resist pattern |
| 08/29/2013 | US20130224655 Positive-type photoresist composition |
| 08/29/2013 | US20130224654 Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions |
| 08/29/2013 | US20130224653 Crosslinked polyimide, composition comprising the same and method for producing the same |
| 08/29/2013 | US20130224652 Metal peroxo compounds with organic co-ligands for electron beam, deep uv and extreme uv photoresist applications |
| 08/29/2013 | US20130224639 Peripheral exposure method and apparatus therefor |
| 08/29/2013 | US20130224637 Photomask and semiconductor apparatus manufacturing method |
| 08/29/2013 | US20130224635 Mask pattern creation method, recording medium, and semiconductor device manufacturing method |
| 08/29/2013 | US20130222936 Color filter substrate and method for producing same |
| 08/29/2013 | US20130222780 EUV microlithography projection exposure apparatus with a heat light source |
| 08/29/2013 | US20130222779 Lithographic apparatus and device manufacturing method |
| 08/29/2013 | US20130222778 Illumination apparatus for microlithography projection system including polarization-modulating optical element |
| 08/29/2013 | US20130221515 Semiconductor device and method of manufacturing the same |
| 08/29/2013 | US20130220672 Single Layer Touch-Control Sensor Structure With Reduced Coupling To Proximate Ground Structures |
| 08/29/2013 | DE10355319B4 Photoresist-Entfernerzusammensetzungen Photoresist Entfernerzusammensetzungen |
| 08/29/2013 | DE102012218558A1 Imaging optics used in optical system of projection exposure apparatus, has object plane arranged parallel to image plane, having aspherical, rotationally symmetrical mirror whose axis of symmetry is not perpendicular to object plane |
| 08/29/2013 | DE102012215698A1 Control device for spectral filter of extreme UV projection exposure system, has condenser lenses forming light of light source into monitoring light beam to condition filter transmitted light and/or reflected light for detector |
| 08/29/2013 | DE102012205096B3 Projektionsbelichtungsanlage mit mindestens einem Manipulator Projection exposure apparatus having at least one manipulator |
| 08/29/2013 | DE102012201235B4 Verfahren zum Einstellen einer Beleuchtungsgeometrie für eine Be-leuchtungsoptik für die EUV-Projektionslithographie A method for adjusting a lighting geometry for a Be-illumination optics for EUV projection lithography |
| 08/29/2013 | DE102012016178B3 Verfahren zur optischen Übertragung einer Struktur in ein Aufnahmemedium A method for optical transmission of a structure in a recording medium |
| 08/29/2013 | DE102007022895B4 Vorrichtung zum Übertragen von in einer Maske vorgesehenen Strukturen auf ein Substrat An apparatus for transmitting provided in a mask structures onto a substrate |
| 08/28/2013 | EP2631699A1 Illumination optical system, configuration and illumination methods |
| 08/28/2013 | EP2631253A2 Preparation of polymer, resulting polymer, resist composition, and patterning process |
| 08/28/2013 | CN203164594U PCB (printed circuit board) exposure machine and rectification mechanism thereof |
| 08/28/2013 | CN203164593U Positioning structure of precision positioning ball |
| 08/28/2013 | CN103270454A Film exposure device and film exposure method |
| 08/28/2013 | CN103270453A Criss-cross writing strategy |
| 08/28/2013 | CN103270452A Photosensitive resin composition for color filter and color filter using same |
| 08/28/2013 | CN103270451A Positive-type photoresist composition |
| 08/28/2013 | CN103270435A Photosensitive transparent composition for color filter of solid-tate imaging device, and production method of color filter of solid-<wbr/>state imaging device, color filter of solid-<wbr/>state imaging device, and solid-<wbr/>state imaging device, each using the sam |
| 08/28/2013 | CN103268867A Method for manufacturing TFT array substrate |
| 08/28/2013 | CN103268866A Through-hole-priority dual damascene copper interconnection method for reducing coupling capacitance of redundant metal |
| 08/28/2013 | CN103268865A Groove-priority dual damascene copper interconnection method for reducing coupling capacitance of redundant metal |
| 08/28/2013 | CN103268864A Through-hole-priority dual damascene copper interconnection method for reducing coupling capacitance of redundant metal |
| 08/28/2013 | CN103268059A Multi-stage negative pressure recovery seal and gas seal device for immersed lithography machine |
| 08/28/2013 | CN103268058A Electronic device applied in EUV (Extreme Ultraviolet) vacuum environment |
| 08/28/2013 | CN103268057A Masking system, masking method, exposure system and exposure method |
| 08/28/2013 | CN103268056A Flexible mask plate and making method thereof |
| 08/28/2013 | CN103263872A Dispersing agent, color pigment liquid and photoresist |
| 08/28/2013 | CN102334068B Block copolymer composition for flexographic printing plates |
| 08/28/2013 | CN102269834B Color optical filter and manufacturing method thereof |
| 08/28/2013 | CN102231046B Grating moire fringe focal plane measuring method |
| 08/28/2013 | CN102226869B Device manufacturing method and immersion lithographic apparatus |
| 08/28/2013 | CN102216851B Imprint lithography apparatus and method |
| 08/28/2013 | CN102193314B Photosensitive colourized composition and colour filter |
| 08/28/2013 | CN102171616B Field facet mirror for use in an illumination optics of a projection exposure apparatus for EUV microlithography |
| 08/28/2013 | CN102132212B Positive-type photosensitive resin composition, method for producing resist pattern, and electronic component |
| 08/28/2013 | CN102122117B Lithographic apparatus and method |
| 08/28/2013 | CN102096316B Method for improving super-diffraction lithographic resolution and lithographic quality by utilizing island-type structure mask |
| 08/28/2013 | CN102084301B Coating composition and pattern-forming method |
| 08/28/2013 | CN102023490B Shutter member, a lithographic apparatus and device manufacturing method |
| 08/28/2013 | CN101907835B Detergent composition for photoresists |
| 08/28/2013 | CN101866093B Preparation method of shutter baffle |
| 08/28/2013 | CN101833250B Developing device and developing method |
| 08/28/2013 | CN101750898B Substrate coating method and substrate coating apparatus |
| 08/27/2013 | US8520190 Evaluation method, control method, exposure apparatus, and memory medium |
| 08/27/2013 | US8520187 Apparatus and method for providing fluid for immersion lithography |
| 08/27/2013 | US8520184 Immersion exposure apparatus and device manufacturing method with measuring device |
| 08/27/2013 | US8518634 Cleaning process for semiconductor device fabrication |
| 08/27/2013 | US8518632 Method of manufacturing electroforming mold, electroforming mold, and method of manufacturing electroformed component |
| 08/27/2013 | US8518631 Optical recording material, optical recording method, photosensitive material and method |
| 08/27/2013 | US8518630 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same |
| 08/27/2013 | US8518629 Resist composition for immersion exposure and method of forming resist pattern using the same |
| 08/27/2013 | US8518628 Photo-sensitive polymer turning soluble to a base solution in response to reaction with an acid; base soluble polymer turning soluble to water in response to a reaction with a base developer solution; acid soluble polymer turning soluble to water in response to reaction with an acid developer solution |
| 08/27/2013 | US8518278 Method of drying substrate, and method of manufacturing image display apparatus using the same |
| 08/26/2013 | DE202013103446U1 Kompakte Vorrichtung zur Herstellung eines dreidimensionalen Objekts durch Verfestigen eines fotohärtenden Materials A compact apparatus for producing a three-dimensional object by solidification of a photo-curing material |
| 08/22/2013 | WO2013123234A1 Image based overlay measurement with finite gratings |
| 08/22/2013 | WO2013122264A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device |
| 08/22/2013 | WO2013121797A1 Pattern-forming method |
| 08/22/2013 | WO2013120927A2 Optical component |
| 08/22/2013 | WO2013120926A1 Optical component |
| 08/22/2013 | WO2013120839A2 Device for the magnetic-field-compensated positioning of a component |
| 08/22/2013 | WO2013087431A3 Device manufacturing method and associated lithographic apparatus, inspection apparatus, and lithographic processing cell |
| 08/22/2013 | WO2013072377A3 Arrangement of a mirror |
| 08/22/2013 | WO2013064248A3 Metering device for the manually-controlled metering of a light-curing material, kit, and method |
| 08/22/2013 | US20130216996 Electrically conductive polymer nanowires with incorporated viruses |
| 08/22/2013 | US20130216973 Coating for a dental matrix band |
| 08/22/2013 | US20130216961 Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern |
| 08/22/2013 | US20130216960 Water Repellent Additive for Immersion Resist |
| 08/22/2013 | US20130216958 Liquid-repellent film and production method therefor, and fine structure using the liquid-repellent film and production method therefor |
| 08/22/2013 | US20130216956 Monolayer or multilayer forming composition |
| 08/22/2013 | US20130216955 Method for preparing a relief printing form |
| 08/22/2013 | US20130216954 Drawing apparatus, and method of manufacturing article |
| 08/22/2013 | US20130216952 Positive photosensitive siloxane composition |
| 08/22/2013 | US20130216951 Radiation-sensitive resin composition, polymer and compound |
| 08/22/2013 | US20130216950 Lithographic printing plate precursor and plate making method using the same |