| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/03/2013 | CN102236252B Apparatus and method of fabricating thin film pattern |
| 07/03/2013 | CN102182954B Light source device, and backlight, exposure apparatus and exposure method using the same |
| 07/03/2013 | CN102152536B Process for manufacturing metal label with multi-level colorful patterns |
| 07/03/2013 | CN102129097B Backlight module, light guide device and light guide plate manufacturing method |
| 07/03/2013 | CN102089714B Method and apparatus for thermal processing of photosensitive printing elements |
| 07/03/2013 | CN102056954B Antirelective coating compositions |
| 07/03/2013 | CN102053507B Cleaning system and cleaning method of developing solution circulation process equipment |
| 07/03/2013 | CN101986207B 曝光装置以及曝光方法 Exposure apparatus and exposure method |
| 07/03/2013 | CN101925861B Layered product of photosensitive resin |
| 07/03/2013 | CN101910947B Silicon-based hardmask composition (Si-SOH; Si-base spin-coating hardmask) and process of producing semiconductor integrated circuit device using the same |
| 07/03/2013 | CN101794726B Workpiece stage and exposure apparatus using the same |
| 07/03/2013 | CN101681098B Photosensitive paste composition for fabricating the plasma display panel electrode, plasma display panel electrode and plasma display panel thereby |
| 07/03/2013 | CN101663620B Low etch cleaning composition for removing resist |
| 07/03/2013 | CN101598843B Mold insert and manufacturing method thereof |
| 07/03/2013 | CN101493620B Active matrix type liquid crystal display device and manufacturing process for the same |
| 07/03/2013 | CN101174089B Radiation sensitive resin composition for forming space body, space body and its forming method |
| 07/03/2013 | CN101144977B Mold for nano-imprinting and method of manufacturing the same |
| 07/02/2013 | US8476665 Display device |
| 07/02/2013 | US8476606 Drawing apparatus and method of manufacturing article |
| 07/02/2013 | US8476004 Method for forming photoresist patterns |
| 07/02/2013 | US8476003 Iterative rinse for semiconductor fabrication |
| 07/02/2013 | US8476002 Methods of forming patterned masks |
| 07/02/2013 | US8476001 Pattern forming method |
| 07/02/2013 | US8476000 Method of producing a relief image from a liquid photopolymer resin |
| 07/02/2013 | US8475998 Compound synthesis method, microarray, acid-transfer composition, and biochip composition |
| 07/02/2013 | US8475997 Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound |
| 07/02/2013 | US8475996 Photosensitive resin composition |
| 06/27/2013 | WO2013096009A1 Precision continuous stamp casting method for roll-based soft lithography |
| 06/27/2013 | WO2013095069A1 Exposure apparatus |
| 06/27/2013 | WO2013094828A1 Photosensitive resin composition and color filter using the same |
| 06/27/2013 | WO2013094827A1 Photosensitive resin composition for color filter and color filter using the same |
| 06/27/2013 | WO2013094756A1 Large phase shift mask and method for manufacturing phase shift mask |
| 06/27/2013 | WO2013094733A1 Measurement method and device, and maintenance method and device |
| 06/27/2013 | WO2013094555A1 Exposure device and exposure mask |
| 06/27/2013 | WO2013094554A1 Exposure system, and control device and control method therefor |
| 06/27/2013 | WO2013094286A1 Substrate processing device, device manufacturing system and device manufacturing method |
| 06/27/2013 | WO2013093577A1 Laser apparatus |
| 06/27/2013 | WO2013059670A3 Octahedral and pyramid-on-post tips for microscopy and lithography |
| 06/27/2013 | WO2013043421A3 Negative-working lithographic printing plate precursors |
| 06/27/2013 | WO2013002883A3 Slip film for relief image printing element |
| 06/27/2013 | WO2012173506A3 Procedure of 2d and 3d optically assisted fountain pen nanolithography and aperture pen nanolithography |
| 06/27/2013 | US20130164938 Selective Bias Compensation for Patterning Steps in CMOS Processes |
| 06/27/2013 | US20130164695 Method for forming pattern |
| 06/27/2013 | US20130164694 Rinse solution for lithography and pattern formation method employing the same |
| 06/27/2013 | US20130164693 Method of forming resist pattern |
| 06/27/2013 | US20130164691 Method for forming pattern |
| 06/27/2013 | US20130164689 Photomask and method for forming overlay mark using the same |
| 06/27/2013 | US20130164688 Support, Lithographic Apparatus and Device Manufacturing Method |
| 06/27/2013 | US20130164687 Hybrid cooling and thermal shield for electromagnetic actuators |
| 06/27/2013 | US20130164686 Method for Patterning a Photosensitive Layer |
| 06/27/2013 | US20130164685 Method and apparatus for drying a wafer |
| 06/27/2013 | US20130164683 Photosensitive Resin Composition for Color Filter and Color Filter Using the Same |
| 06/27/2013 | US20130164682 Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film |
| 06/27/2013 | US20130164681 Pigment Dispersion Composition, Photosensitive Resin Composition Including the Same and Color Filter Using the Same |
| 06/27/2013 | US20130164680 Photoresist composition for negative development and pattern forming method using thereof |
| 06/27/2013 | US20130164679 Inorganic filler and organic filler-containing curable resin composition, resist film coated printed wiring board, and method for producing the same |
| 06/27/2013 | US20130164678 Photosensitive Resin Composition for Color Filter and Color Filter Using the Same |
| 06/27/2013 | US20130164677 Spin-On Anti-Reflective Coatings for Photolithography |
| 06/27/2013 | US20130164676 Carbamoyloxyadamantane derivative, polymer compound, and photoresist composition |
| 06/27/2013 | US20130164675 Acrylic ester derivative, high-molecular compound and photoresist composition |
| 06/27/2013 | US20130164674 Novel acryl monomer, polymer and resist composition comprising same |
| 06/27/2013 | US20130164661 Method for making a retardation film |
| 06/27/2013 | US20130164461 Positive photosensitive resin composition and uses thereof |
| 06/27/2013 | US20130162996 Inspection Method and Apparatus, and Lithographic Apparatus |
| 06/27/2013 | US20130162966 Lithographic Apparatus and Method |
| 06/27/2013 | US20130162964 Lithographic Apparatus and Device Manufacturing Method |
| 06/27/2013 | US20130162737 Polymer internal contamination filter for ink jet printhead |
| 06/27/2013 | US20130161178 Touch panel and method for manufacturing the same |
| 06/27/2013 | US20130161070 Touch panel and method for manufacturing the same |
| 06/27/2013 | US20130160939 Film, method for manufacturing the film and masking method using the film |
| 06/27/2013 | US20130160665 Plate for producing stereotype and method for producing said plate for producing stereotype |
| 06/27/2013 | DE112011103109T5 Zeichenverfahren und Zeichenvorrichtung The drawing method and drawing device |
| 06/27/2013 | DE102012208521A1 Illumination system for microlithography projection exposure system, has illumination optical unit that is designed so that each of the frames is illuminated with respect to illumination light with two states of polarization |
| 06/27/2013 | DE102011089779A1 Device for suppression of foreign particles carried with light beam from light source system for metrology system, sets axial distance of chopper rotational axis smaller than radius maximum value and greater than radius minimum value |
| 06/26/2013 | EP2607299A1 Method for producing a ceramic workpiece |
| 06/26/2013 | CN203025475U Transposition mechanism |
| 06/26/2013 | CN203025474U Gas-sealing and gas-liquid isolating device for immersed photo-etching machine |
| 06/26/2013 | CN203025473U Nanoimprint composite template |
| 06/26/2013 | CN103180784A Photosensitive composition, cured film formed from same, and element having cured film |
| 06/26/2013 | CN103180783A Processes for making high resolution, solvent resistant, thin elastomeric printing plates |
| 06/26/2013 | CN103176643A Touch device and manufacturing method thereof |
| 06/26/2013 | CN103176372A Bifocal wave zone plate interference microscopic-inspection device based on phase grating light splitting |
| 06/26/2013 | CN103176371A Automated mask management system and method |
| 06/26/2013 | CN103176370A Immersion liquid temperature control system for immersion lithography |
| 06/26/2013 | CN103176369A Immersion liquid temperature control device for immersion lithography |
| 06/26/2013 | CN103176368A Gas-seal and gas-liquid vibration damping recovery device used in immersion lithographic machine |
| 06/26/2013 | CN103176367A Pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method |
| 06/26/2013 | CN103176366A Active drive cable table of lithography machine wafer stage |
| 06/26/2013 | CN103176365A Film and manufacture method and method for shielding by utilizing film |
| 06/26/2013 | CN103176364A Positive photosensitive resin composition and uses thereof |
| 06/26/2013 | CN103176363A Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film |
| 06/26/2013 | CN103176362A Photosensitive resin composite for dry film photoresist |
| 06/26/2013 | CN103176361A 着色固化性树脂组合物 The colored curable resin composition |
| 06/26/2013 | CN103176360A 感光性组合物 The photosensitive composition |
| 06/26/2013 | CN103176359A Resin composition for forming optical waveguide and optical waveguide using the composition |
| 06/26/2013 | CN103176358A Water-soluble resin component used for forming subtle patterns and method for forming subtle patterns by using the same |
| 06/26/2013 | CN103176357A Coloring composition used for color filter and color filter |
| 06/26/2013 | CN103176356A Photosensitive resin composition for color filter and color filter using the same |
| 06/26/2013 | CN103176355A Photosensitive resin composition for color filter and color filter using the same |
| 06/26/2013 | CN103176354A Electron beam exposure patterning method on insulating substrate |