| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/23/2013 | DE112011100264B4 Verfahren zur steuerung der elektronenstrahl-belichtung von wafern und masken mit proximity-korrektur Method for controlling the electron beam exposure of wafers and masks with proximity-correction |
| 05/23/2013 | DE102012210035A1 Extreme UV lithography system, has detector detecting radiation of light source scattered on illuminated particles in testing region, and light source serving as extreme UV light source for producing structure on wafer |
| 05/23/2013 | DE102011086949A1 Beleuchtungs- und Verlagerungsvorrichtung für eine Projektionsbelichtungsanlage Lighting and moving apparatus for a projection exposure apparatus |
| 05/23/2013 | DE102011086944A1 Korrekturvorrichtung zur Beeinflussung einer Intensität eines Beleuchtungslicht-Bündels Correction device for influencing an intensity of illumination light beam |
| 05/23/2013 | DE102011086665A1 Projektionsobjektiv einer mikrolithographischen Projektonsbelichtungsanlage Projection objective of a microlithography Projektonsbelichtungsanlage |
| 05/22/2013 | EP2594995A1 A method for providing a nanopattern of metal oxide nanostructures on a substrate |
| 05/22/2013 | EP2593841A2 Methods and systems for detecting, setting, monitoring, determining, storing and compensating the spatial situation of a mobile unit |
| 05/22/2013 | EP2593837A2 Projection system with metrology |
| 05/22/2013 | EP2593836A1 Liquid immersion member and immersion exposure apparatus |
| 05/22/2013 | CN202948247U Detection plate group gluing fixture for photoetching machine |
| 05/22/2013 | CN202948246U Reconfigurable sub-wavelength grating lithography machine based on surface plasma interference |
| 05/22/2013 | CN202947713U Apparatus for detecting foreign matter on substrate, and exposure machine |
| 05/22/2013 | CN103119706A Exposure apparatus, exchange method of object, exposure method, and device manufacturing method |
| 05/22/2013 | CN103119519A Light-exposure system |
| 05/22/2013 | CN103119518A Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method |
| 05/22/2013 | CN103116251A Anti-deformation round development nozzle and preparation method thereof |
| 05/22/2013 | CN103116250A Masking platform system with laser interferometer measurement and six-freedom-degree coarse movement platform |
| 05/22/2013 | CN103116249A Negative stiffness system for gravity compensation of micropositioner |
| 05/22/2013 | CN103116248A 涂布装置及其涂布方法 Coating apparatus and coating method |
| 05/22/2013 | CN103116247A Colored curable resin composition |
| 05/22/2013 | CN103116246A Photosensitive resin composition and application thereof |
| 05/22/2013 | CN103116245A Thermosensitive CTP light-sensitive solution and preparation method thereof |
| 05/22/2013 | CN103116244A 固化性树脂组合物 The curable resin composition of the |
| 05/22/2013 | CN103116243A Colored photosensitive resin composition, color filter and display device |
| 05/22/2013 | CN103116242A Method for preparing heterostructure without aligning nano press printing |
| 05/22/2013 | CN103116232A Array substrate, liquid crystal display device, and process for producing the array substrate |
| 05/22/2013 | CN103116212A Atomic beam two-dimension cooling optical prism frame |
| 05/22/2013 | CN103113827A Compositions and antireflective coatings for photolithography |
| 05/22/2013 | CN102436145B Stereo lithography rapid prototyping photosensitive resin and preparation method thereof |
| 05/22/2013 | CN102375351B Signal normalization mask alignment system |
| 05/22/2013 | CN102298198B Photoetching projection objective with large view field |
| 05/22/2013 | CN102279457B Single-power large-viewing field photoetching projection objective lens |
| 05/22/2013 | CN102253603B Alignment detection device for photoetching equipment |
| 05/22/2013 | CN102236260B Wave aberration correction system and method |
| 05/22/2013 | CN102207684B Installation and maintenance mechanism used in illumination top module of lithography machine |
| 05/22/2013 | CN102207683B Mask alignment surface shape detection device for DUV (deep ultra violet) photolithographic device |
| 05/22/2013 | CN102200698B Cable stage of silicon wafer stage of photo-etching machine |
| 05/22/2013 | CN102200624B Photo-etching projection lens |
| 05/22/2013 | CN102132173B Manufacturing method for pattern-forming body and processing apparatus using electromagnetic beam |
| 05/22/2013 | CN102112651B Method for forming amorphous carbon nitride film, amorphous carbon nitride film, multilayer resist film and method for manufacturing semiconductor device |
| 05/22/2013 | CN102109685B Multilayer electromagnetism modulating structure and preparation method thereof |
| 05/22/2013 | CN102089711B Positive photosensitive resin composition and polyhydroxyamide resin |
| 05/22/2013 | CN102087475B Measuring device and measuring method for position of reticle stage of scanning lithography |
| 05/22/2013 | CN102075395B Data transmission bus system |
| 05/22/2013 | CN101855596B Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device |
| 05/22/2013 | CN101852990B Photosensitive composition, photosensitive resin transfer film and resin pattern |
| 05/22/2013 | CN101727004B Photoacid generator containing aromatic ring |
| 05/22/2013 | CN101689019B Clear and colorless three-dimensional articles made via stereolithography and method of making said articles |
| 05/22/2013 | CN101673011B Colordisc cardinal plate and LCD display device |
| 05/22/2013 | CN101652433B Pigment-dispersed composition, curable composition, and color filter and production method thereof |
| 05/22/2013 | CN101539721B Frequency doubling using a photo-resist template mask |
| 05/22/2013 | CN101395536B Heat treatment of multilayer imageable elements |
| 05/22/2013 | CN101343422B Pigment dispersion liquid, curable composition, color filter produced using the same, and solid state imaging device |
| 05/22/2013 | CN101324754B Photosensitive black composition and color filter |
| 05/22/2013 | CN101276143B Method and system for patterning a mask layer |
| 05/22/2013 | CN101075045B Semi-transmissive type liquid-crystal display device and method of fabricating the same |
| 05/21/2013 | US8446570 System and method for using a two part cover and a box for protecting a reticle |
| 05/21/2013 | US8446568 Lithographic apparatus and device manufacturing method |
| 05/21/2013 | US8445365 Single scan irradiation for crystallization of thin films |
| 05/21/2013 | US8445189 Developing device and developing method |
| 05/21/2013 | US8445188 Process for formation of highly uniform arrays of nano-holes and nano-pillars |
| 05/21/2013 | US8445187 Hardmask composition having antireflective properties and method of patterning material on substrate using the same |
| 05/21/2013 | US8445185 Method of manufacturing piezoelectric vibrating reed, piezoelectric vibrating reed, piezoelectric vibrator, oscillator, electronic apparatus, and radio-controlled timepiece |
| 05/21/2013 | US8445184 Pattern formation method |
| 05/21/2013 | US8445183 Method of manufacturing semiconductor device and pattern formation method |
| 05/21/2013 | US8445182 Double exposure technology using high etching selectivity |
| 05/21/2013 | US8445181 Antireflective coating composition and process thereof |
| 05/21/2013 | US8445180 Water-developable photopolymer plate for letterpress printing |
| 05/21/2013 | US8445179 Method for treating a lithographic printing plate |
| 05/21/2013 | US8445178 Composition for radical polymerization and method of forming pattern using the composition |
| 05/21/2013 | US8445177 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part |
| 05/21/2013 | US8445176 Lithographic printing plate precursor |
| 05/21/2013 | US8445175 Composition containing hydroxylated condensation resin for forming resist underlayer film |
| 05/21/2013 | US8445174 Polyol photosensitizers, carrier gas UV laser ablation sensitizers, and other additives and methods for making and using same |
| 05/21/2013 | US8445167 Metal phthalocyanine dye mixture, curable composition, color filter, and method for producing color filter |
| 05/21/2013 | US8445166 Fabrication method of lithography mask and formation method of fine pattern using the same |
| 05/21/2013 | US8444768 Compositions and methods for removing organic substances |
| 05/16/2013 | WO2013070980A1 Fiber delivery for metrology systems used in lithography tools |
| 05/16/2013 | WO2013070965A1 Thermally stable optical sensor mount |
| 05/16/2013 | WO2013070511A1 Hybrid photoresist composition and pattern forming method using thereof |
| 05/16/2013 | WO2013070499A1 Photoresist and post etch residue cleaning solution |
| 05/16/2013 | WO2013069813A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, manufacturing method of electronic device, and electronic device |
| 05/16/2013 | WO2013069812A1 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, mask blank and method of forming pattern |
| 05/16/2013 | WO2013069811A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, manufacturing method of electronic device, and electronic device |
| 05/16/2013 | WO2013069789A1 Negative-type photosensitive resin composition, partition wall, black matrix, and optical element |
| 05/16/2013 | WO2013069753A1 Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern |
| 05/16/2013 | WO2013069750A1 Composition for forming resist upper layer film, method for forming resist pattern, compound, method for producing compound, and polymer |
| 05/16/2013 | WO2013069544A1 Self-organization composition for pattern formation and pattern formation method |
| 05/16/2013 | WO2013069508A1 Lithographic printing plate precursor and process for producing lithographic printing plate |
| 05/16/2013 | WO2013068198A2 Particle trap for euv source |
| 05/16/2013 | WO2013068197A1 Particle trap for euv source |
| 05/16/2013 | US20130123159 Aqueous cerium-containing solution having an extended bath lifetime for removing mask material |
| 05/16/2013 | US20130122429 Pattern forming method and manufacturing method of semiconductor device |
| 05/16/2013 | US20130122428 Exposure system, method of forming pattern using the same and method of manufacturing display substrate using the same |
| 05/16/2013 | US20130122427 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film |
| 05/16/2013 | US20130122426 Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound |
| 05/16/2013 | US20130122425 Method for forming fine pattern, and coating forming agent for pattern fining |
| 05/16/2013 | US20130122424 Photoresist composition |
| 05/16/2013 | US20130122423 Compound, radiation-sensitive composition and resist pattern formation method |
| 05/16/2013 | US20130122422 Photosensitive Resin Composition and Color Filter Using the Same |