Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2013
06/19/2013CN103163737A Monitoring method for developing effect of PCB solder mask layer
06/19/2013CN103163736A Composition including polyamide acid for forming lower layer reflection preventing film
06/19/2013CN103163735A Positive type photosensitive resin composition for electron member, cured film and forming method thereof, and display device
06/19/2013CN103163734A Photosensitive resin composition for color filter and color filter formed thereby
06/19/2013CN103163733A Curable resin composition and its use
06/19/2013CN103163732A Resin composition for laser engraving, flexographic printing plate precursor and process for producing same, and flexographic printing plate and process for making same
06/19/2013CN103163731A Resin composition for laser engraving, flexographic printing plate precursor for laser engraving and process for producing same, and flexographic printing plate and process for making same
06/19/2013CN103163730A Methods for small trench patterning using chemical amplified photoresist compositions
06/19/2013CN103163581A Production method of color filter and display device with color filter
06/19/2013CN103163575A Color microlens array and preparation method for same
06/19/2013CN103163569A Intelligent antifog resin lenses and preparing method thereof
06/19/2013CN103162848A System for detecting plasma state of capillary discharge extreme ultraviolet lithography light source by using YAG-Ce fluorescent screen
06/19/2013CN103160378A Plant oil-based acrylic ester capable of photopolymerization and preparation method thereof
06/19/2013CN103159164A Electric-field-induced impressing method for high-depth-to-width-ratio microcolumn array
06/19/2013CN102566262B Device and method suitable for carrying out wafer-level nano imprinting on uneven substrate
06/19/2013CN102436153B Photosensitive rubber stripping agent for printing screen and stripping method
06/19/2013CN102436152B Deep-ultraviolet lithography illumination system
06/19/2013CN102239446B 凸版印刷板 Letterpress printing plates
06/19/2013CN102224459B Fast freeform source and mask co-optimization method
06/19/2013CN102216849B Optical imaging writer system
06/19/2013CN102103325B Photomask for forming fine pattern and method for forming fine pattern with the photomask
06/19/2013CN102099747B Radiation source, lithographic apparatus, and device manufacturing method
06/19/2013CN102081307B Method for controlling exposure dose of photoetching machine
06/19/2013CN102023487B Clamping mechanism with vacuum edge
06/19/2013CN102023477B Photoetching method
06/19/2013CN101946190B Facet mirror for use in a projection exposure apparatus for microlithography
06/19/2013CN101907733B Incidence surfaces and optical windows that are solvophobic to immersion liquids
06/19/2013CN101887219B Lithography apparatus, immersion projection apparatus, and method of manufacturing device
06/19/2013CN101876793B Method of forming a pattern of an array of shapes including a blocked region
06/19/2013CN101815733B Polymers for use in photoresist compositions
06/19/2013CN101811963B Method for synthesizing photoresist-monomer carbon-rigid-skeleton acrylic ester compounds by transesterification
06/19/2013CN101799632B 光照射装置 Light irradiation device
06/19/2013CN101784961B Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer
06/19/2013CN101689028B Method for processing pattern data and method for manufacturing electronic device
06/19/2013CN101630124B Radiation-sensitive linear composition for forming coloured layer, colour filter and colour liquid crystal display device
06/19/2013CN101614956B Red colored composition and color filter using the same, and manufacturing method thereof
06/19/2013CN101589343B Irradiation strength distribution measuring apparatus and method of measuring
06/19/2013CN101581883B Positive photoresist, insulation layer and organic light emitting diode
06/19/2013CN101419411B System and method for lithography simulation
06/19/2013CN101403859B Photosensitive resin composition and curing article thereof
06/19/2013CN101395534B Heat curable composition for protective film, cured product and liquid crystal display device
06/18/2013US8467033 Method for operating an illumination system of a microlithographic projection exposure apparatus
06/18/2013US8466945 Methods and device for laser processing
06/18/2013US8466440 Charged particle beam drawing apparatus and control method thereof
06/18/2013US8465910 Hybrid lithographic method for fabricating complex multidimensional structures
06/18/2013US8465909 Self-aligned masking for solar cell manufacture
06/18/2013US8465908 Method for forming fine patterns of semiconductor device
06/18/2013US8465907 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
06/18/2013US8465906 Method and mask for enhancing the resolution of patterning 2-row holes
06/18/2013US8465905 Printing conductive lines
06/18/2013US8465904 Method for preparing a printing form from a photopolymerizable element
06/18/2013US8465903 Radiation patternable CVD film
06/18/2013US8465902 Underlayer coating composition and processes thereof
06/18/2013US8465901 Methods of adjusting dimensions of resist patterns
06/18/2013US8465887 Lower cost reusable polymer binder
06/18/2013US8465803 Templated monolayer polymerization and replication
06/18/2013US8464637 Method and apparatus for thermal development having a textured support surface
06/18/2013CA2740695C Composition, process of preparation and method of application and exposure for light imaging paper
06/18/2013CA2443317C Materials, methods, and uses for photochemical generation of acids and/or radical species
06/13/2013WO2013086264A1 Composition comprising fluoroalkyl perfluoroalkene ethers and uses thereof
06/13/2013WO2013085223A1 Polyimide photosensitive composition for laser-induced thermal imaging
06/13/2013WO2013085004A1 Photosensitive resin composition, method for producing hardened relief pattern, semiconductor device and display device
06/13/2013WO2013084932A1 Colorant, colored composition, color filter, and display element
06/13/2013WO2013084927A1 Single-motor-driven gravure cylinder chuck mechanism
06/13/2013WO2013084906A1 Exposure device, and production method for structure
06/13/2013WO2013084898A1 Exposure device and exposure method
06/13/2013WO2013084882A1 Printing surface protective liquid composition for lithographic printing plate, and method for treating lithographic printing plate using same
06/13/2013WO2013084714A1 Black photosensitive resin composition and use of same
06/13/2013WO2013084664A1 Composition for forming antistatic film and oligomer compound
06/13/2013WO2013084574A1 Spin development method and device
06/13/2013WO2013084470A1 Method for forming micro-relief structure, method for manufacturing structure using same forming method, and structure
06/13/2013WO2013084247A1 Resist for electron beam and optical lithography
06/13/2013WO2013083505A1 Oxime ester photoinitiators
06/13/2013WO2013083383A1 A lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method of calculating setpoint data and a computer program
06/13/2013WO2013083371A1 Lithographic apparatus and device manufacturing method
06/13/2013WO2013083335A2 Radiation source
06/13/2013WO2013083332A1 Method for a patterning device support
06/13/2013WO2013083184A1 Nanostructured stamp, embossing roller, and device and method for the continuous embossing of nanostructures
06/13/2013WO2013082851A1 Design method of extreme ultraviolet lithography projection objective
06/13/2013WO2013082782A1 Exposure device and exposure method
06/13/2013WO2013051805A3 Photosensitive resin composition
06/13/2013WO2013049409A3 Substrates having nanostructures having biological species immobilized thereon and methods of forming the same and methods of forming nanostructures on surfaces
06/13/2013WO2013028650A4 Methods for fabricating three-dimensional nano-scale structures and devices
06/13/2013WO2013012230A3 Light curable resin composition
06/13/2013US20130149649 Lithographic apparatus and a device manufacturing method
06/13/2013US20130149648 Method of making nozzle chip
06/13/2013US20130149645 Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film
06/13/2013US20130149494 TiO2-CONTAINING QUARTZ-GLASS SUBSTRATE FOR AN IMPRINT MOLD AND MANUFACTURING METHOD THEREFOR
06/13/2013US20130149493 Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film
06/13/2013US20130149196 Method for Functionalising Fluid Lines Contained in a Micromechanical Device, Micromechanical Device Including Functionalised Lines, and Method for Manufacturing Same
06/13/2013US20130148181 Photorefractive composite, spatial light modulator, and hologram display device using the same
06/13/2013US20130148180 Photorefractive composite, spatial light modulator, and hologram display device using the same
06/13/2013US20130148122 Method of manufacturing device, and substrate
06/13/2013US20130148094 Stage unit, exposure apparatus, and exposure method
06/13/2013US20130148092 Illumination system for a microlithographic projection exposure apparatus
06/13/2013US20130148091 Lithography apparatus and method, and method of manufacturing article
06/13/2013US20130148090 Exposure apparatus
06/13/2013US20130148089 Apparatus and method for preparing relief printing form
06/13/2013US20130146785 Support, lithographic apparatus and device manufacturing method
06/13/2013US20130146776 Flat panel imagers with pixel separation and method of manufacturing the same