Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2013
05/09/2013US20130115547 Substrate with reflective layer for euv lithography and reflective mask blank for euv lithography
05/09/2013US20130115430 Patterning of Biomaterials Using Fluorinated Materials and Fluorinated Solvents
05/09/2013US20130115426 Method of manufacturing flexible electronic device
05/09/2013US20130115419 Optical element, lithographic apparatus including such optical element and device manufacturing method, and device manufactured thereby
05/09/2013US20130114928 Optical wavelength dispersion device and method of manufacturing the same
05/09/2013US20130114126 Multi-color electrophoretic display device, image sheet, and manufacturing method thereof
05/09/2013US20130114060 Illumination system of a microlithographic projection exposure apparatus
05/09/2013US20130114059 Components for EUV Lithographic Apparatus, EUV Lithographic Apparatus Including Such Components and Method for Manufacturing Such Components
05/09/2013US20130114058 Illumination optics apparatus, exposure method, exposure apparatus, and method of manufacturing electronic device
05/09/2013US20130114057 Optical imaging device with thermal attenuation
05/09/2013US20130114056 Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus
05/09/2013US20130114011 Pixel array and fabrication thereof
05/09/2013US20130113082 Method of forming pattern and developer for use in the method
05/09/2013US20130112097 Imprint method imprint apparatus, and article manufacturing method
05/08/2013EP2590025A1 Photosensitive resin composition, photosensitive resin composition film, and semiconductor device using the photosensitive resin composition or the photosensitive resin composition film
05/08/2013EP2589636A1 Fluorine-based surfactant, and coating composition and resist composition each using same
05/08/2013EP2588920A1 Method of improving print performance in flexographic printing plates
05/08/2013EP2588919A1 Multi-layer compressible foam sheet and method of making the same
05/08/2013EP2588914A1 Light integrator for rectangular beam cross sections of different dimensions
05/08/2013DE102012213937A1 Mirror exchange array of set structure for illumination optics used in e.g. scanner for performing microlithography, has single mirrors of mirror exchange array unit that are set with high reflecting coating portion
05/08/2013DE102012211850A1 Arrangement for determining radius of curvature of curved mirror, used in lithography plant, has evaluating device that determines deviation between target and actual object planes, if radius of curvature corresponds to target radius
05/08/2013DE102012208016A1 Illumination lens for lighting system of scanner to manufacture e.g. memory chips, has optical component for guiding light to field, where lens is formed such that beam tufts are overlaid for coinciding edges of beam tufts in sections
05/08/2013DE102012207572A1 Illumination optics of optical system used in scanner for performing microlithography, has lighting channels whose total intensity in region of optical field is adapted by tilting specific number of individual mirrors to preset value
05/08/2013DE102012207511A1 Facet mirror e.g. field facet mirror, for channel-wise reflection of light radiation in UV micro-lithographic projection exposure system, has displaceable micro mirrors whose facet reflecting surfaces exhibit specific area
05/08/2013CN202929350U Dry film shred filtering device for PCB (printed circuit board) dry film developer
05/08/2013CN103098561A Flexible printed circuit board integrated with reinforcing plate, and method for manufacturing flexible printed circuit board integrated with reinforcing plate
05/08/2013CN103097959A Movable body apparatus, exposure apparatus, device manufacturing method, flat-panel display manufacturing method, and object exchange method
05/08/2013CN103097958A Correction for flare effects in lithography system
05/08/2013CN103097957A Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
05/08/2013CN103097956A Method and apparatus for performing pattern alignment
05/08/2013CN103097955A Illumination system of a microlithographic projection exposure apparatus
05/08/2013CN103097954A Positive photosensitive resin composition, method of creating resist pattern, and electronic component
05/08/2013CN103097460A Phenolic resin composition, and method for producing cured relief pattern and semiconductor
05/08/2013CN103097371A Homoadamantane derivative, method for producing same, and photosensitive material for photoresist
05/08/2013CN103094204A Method of fabricating array substrate for liquid crystal display device
05/08/2013CN103094096A Peeling craft method used for forming semiconductor component metal graph
05/08/2013CN103094093A Method and device for photoresist coating
05/08/2013CN103094072A Method of improving uniformity of photoetching critical size of wafer upper gate electrode
05/08/2013CN103092114A Embedded control equipment for lithography machine and control method thereof
05/08/2013CN103092011A Aligning device used in photolithographic system
05/08/2013CN103092010A Method for regenerating template and regenerating equipment
05/08/2013CN103092009A Removing method of photoresist used as masking layer of plasma injection
05/08/2013CN103092008A Non-photosensitive polyimide photo-etching process
05/08/2013CN103092007A Mask plate installing device of exposure machine
05/08/2013CN103092006A Lithography illumination system
05/08/2013CN103092005A Exposure alignment method for glass substrate
05/08/2013CN103092004A Holographic system for manufacturing three-dimensional closely-arrayed photonic crystal array structure
05/08/2013CN103092003A Laser interference lithography system
05/08/2013CN103092002A Laser interference lithography system with pattern locking function
05/08/2013CN103092001A Device for adjusting position and angle of light beam
05/08/2013CN103092000A EUVL (Extreme Ultraviolet Lithography) compound eye dodging off-axis Illumination system and method for realizing off-axis Illumination
05/08/2013CN103091999A Lithographic apparatus and device manufacturing method
05/08/2013CN103091998A Lithographic apparatus and substrate handling method
05/08/2013CN103091997A Gluing method of wedge-shaped plate group and fixture
05/08/2013CN103091996A Photo-etching parameter correction method and system thereof
05/08/2013CN103091995A Method for reducing chip edge photoresistance slope region
05/08/2013CN103091994A Gas precise temperature control device
05/08/2013CN103091993A Test mark and measuring method used in lithography machine lens thermal effect measuring
05/08/2013CN103091992A Workpiece position correction device and correction method
05/08/2013CN103091991A Diffraction optical device used in extreme ultraviolet lithography
05/08/2013CN103091990A Mechanism and method for adjusting light spot horizontal position in focusing and leveling system
05/08/2013CN103091989A Layered product of photosensitive resin
05/08/2013CN103091988A Radiation curable silicone rubber composition
05/08/2013CN103091987A Positive-type photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device
05/08/2013CN103091986A Positive-type photosensitive resin composition, cured film and method for producing cured film, liquid crystal display device, and organic electroluminescent display device
05/08/2013CN103091985A Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board
05/08/2013CN103091984A Preparation method of laser holographic display photopolymer film
05/08/2013CN103091983A Preparation method of surface-enhanced Raman scattering substrate
05/08/2013CN103091982A Microtube fabrication process
05/08/2013CN103091981A Method for manufacturing metal grid template for photolithography by utilizing self-assembling ball
05/08/2013CN103091980A Porous nano imprinting template and preparation method thereof
05/08/2013CN103091979A Nanoimprint template as well as preparation method and application thereof
05/08/2013CN103091978A Methods of forming photolithographic patterns by negative tone development
05/08/2013CN103091977A Imprint apparatus, imprint method, imprint system, and device manufacturing method
05/08/2013CN103091973A Photolithography mask
05/08/2013CN103091897A Liquid crystal display device
05/08/2013CN103091840A Optical apparatus, position detection apparatus, microscope apparatus, and exposure apparatus
05/08/2013CN103091778A Method of preparation of quantum cascading laser buried double-cycle grating with double holographic exposure
05/08/2013CN103091753A Method for adjusting perpendicularity between grating line and beam current in blazed grating ion beam etching device
05/08/2013CN103091752A Manufacturing method of quarter-wave phase shift grating
05/08/2013CN103091747A Prepared method of optical grating
05/08/2013CN103091744A Novel multilayer film capable of improving extreme ultraviolet spectrum purity and thermal stability
05/08/2013CN103087606A Topcoat compositions and photolithographic methods
05/08/2013CN103087276A Active energy ray-curable resin, active energy ray-curable resin composition, active energy ray-curable hard coating agent, cured film using them, decoration film laminated with the cured film and plastic injection-molded product using the decoration film
05/08/2013CN103087087A Sulfhydryl multifunctional group-containing polyhedral oligomeric silsesquioxane compound and composition thereof, and imprinted soft template
05/08/2013CN103086934A Photoacid generator and photoresist comprising same
05/08/2013CN103086612A Nozzle maintenance apparatus and coating treatment apparatus using the same
05/08/2013CN103085451A Silk screen printing board and preparation method thereof and printed circuit board and preparation method thereof
05/08/2013CN102455596B Photoresist and lift off method as well as manufacturing method of TFT (Thin Film Transistor) array substrate
05/08/2013CN102385249B Photoresist composition, and preparation method and application thereof
05/08/2013CN102314095B Adaptive centering wave aberration detection method of projection lens in mask aligner
05/08/2013CN102231048B Method for detecting wave aberration of projection objective on basis of self-centering of space images
05/08/2013CN102099746B Extreme uv radiation generating device comprising a contamination captor
05/08/2013CN102067040B Overlay measurement apparatus, lithographic apparatus, and device manufacturing method using such overlay measurement apparatus
05/08/2013CN102027577B Selective inductive double patterning
05/08/2013CN102023498B Resist coating and developing apparatus and method
05/08/2013CN102004395B Positive typed photosensitive composition
05/08/2013CN101995776B Lithographic apparatus and device manufacturing method
05/08/2013CN101989038B Mask detection device and detection method
05/08/2013CN101971099B Laser processing a multi-device panel