| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 08/14/2013 | CN102067282B Method for forming fine pitch structures |
| 08/14/2013 | CN102063025B Measurement method of two-faced registration error and lithographic equipment applying measurement method |
| 08/14/2013 | CN101989161B Projected capacitive touch panel and manufacturing method thereof |
| 08/14/2013 | CN101750916B Composition for photoresist stripper and method of fabricating thin film transistor array substrate |
| 08/14/2013 | CN101654617B Medicine liquid for dissolving deformation and dissolving deformation processing method |
| 08/14/2013 | CN101587299B Photosensitive coloring composition for a filter and a filter |
| 08/14/2013 | CN101561632B Photoresist resin, and method for forming pattern and method for manufacturing display panel using the same |
| 08/14/2013 | CN101542392B Photocurable resin composition, dry film, cured product, and printed wiring board |
| 08/14/2013 | CN101398621B Colored curable composition, colored pattern and color filter using the same |
| 08/13/2013 | USRE44434 Optical position measuring system and method using a low coherence light source |
| 08/13/2013 | US8508718 Wafer table having sensor for immersion lithography |
| 08/13/2013 | US8507880 Illuminating waveguide fabrication method |
| 08/13/2013 | US8507570 Radical polymerization inhibitors for light-curable dental materials |
| 08/13/2013 | US8507194 Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method |
| 08/13/2013 | US8507193 Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method |
| 08/13/2013 | US8507192 Antireflective compositions and methods of using same |
| 08/13/2013 | US8507191 Methods of forming a patterned, silicon-enriched developable antireflective material and semiconductor device structures including the same |
| 08/13/2013 | US8507190 Method for preparing alignment mark for multiple patterning |
| 08/13/2013 | US8507189 Upper layer film forming composition and method of forming photoresist pattern |
| 08/13/2013 | US8507188 Flexible micro/nanofluidic devices |
| 08/13/2013 | US8507187 Multi-exposure lithography employing a single anti-reflective coating layer |
| 08/13/2013 | US8507185 Methods of forming electronic devices |
| 08/13/2013 | US8507184 Method of manufacturing semiconductor device |
| 08/13/2013 | US8507183 Method of manufacturing a coordinate detector |
| 08/13/2013 | US8507182 Method of providing lithographic printing plates |
| 08/13/2013 | US8507181 Method for developing and sealing of lithographic printing plates |
| 08/13/2013 | US8507180 Chemically amplified positive-type photoresist composition for thick film, chemically amplified dry film for thick film, and method for production of thick film resist pattern |
| 08/13/2013 | US8507179 Switchable antireflective coatings |
| 08/13/2013 | US8507178 Polychromic substances and their use |
| 08/13/2013 | US8507177 Photoresist materials and photolithography processes |
| 08/13/2013 | US8507176 Photosensitive compositions |
| 08/13/2013 | US8507175 Patterning process and resist composition |
| 08/13/2013 | US8507174 Positive resist composition, pattern forming method using the composition, and compound for use in the composition |
| 08/13/2013 | US8507173 Patterning process |
| 08/13/2013 | US8507172 Positive resist composition and pattern forming method using the positive resist composition |
| 08/13/2013 | US8507171 Positive photosensitive composition |
| 08/13/2013 | US8505451 Method of making a photopolymer sleeve blank having an integral cushion layer for flexographic printing |
| 08/13/2013 | CA2773364C Method of improving print performance in flexographic printing plates |
| 08/08/2013 | WO2013115521A1 Novel compound, and photosensitive composition and photosensitizer containing same |
| 08/08/2013 | WO2013115393A1 Photosensitive negative resin composition, fine structure, production process of fine structure and liquid ejection head |
| 08/08/2013 | WO2013115345A1 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device and electronic device |
| 08/08/2013 | WO2013113634A2 Lithographic apparatus and device manufacturing method |
| 08/08/2013 | WO2013113633A1 Lithographic apparatus with a metrology system for measuring a position of a substrate table |
| 08/08/2013 | WO2013113632A2 A stage system and a lithographic apparatus |
| 08/08/2013 | WO2013113569A1 Substrate holder and method of manufacturing a substrate holder |
| 08/08/2013 | WO2013113568A2 Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder |
| 08/08/2013 | WO2013113537A2 Optical element, lithographic apparatus incorporating such an element, method of manufacturing an optical element |
| 08/08/2013 | WO2013113480A1 Projection exposure apparatus comprising a measuring system for measuring an optical element |
| 08/08/2013 | WO2013113336A1 Method of operating a microlithographic projection exposure apparatus and projection objective of such an apparatus |
| 08/08/2013 | WO2013027075A3 Colloidal near field lithography method using a beam with spatially modulated intensity distribution |
| 08/08/2013 | US20130203001 Multiple-Grid Exposure Method |
| 08/08/2013 | US20130203000 Radiation-sensitive resin composition, polymer, and resist pattern-forming method |
| 08/08/2013 | US20130202999 Pattern forming method, chemical amplification resist composition and resist film |
| 08/08/2013 | US20130201468 Lithography method with combined optimization of radiated energy and design geometry |
| 08/08/2013 | US20130201467 Large-mesh cell-projection electron-beam lithography method |
| 08/08/2013 | US20130201466 Lithographic Apparatus and Device Manufacturing Method |
| 08/08/2013 | US20130201460 Exposure method, exposure apparatus and cleaning method |
| 08/08/2013 | US20130200500 Resist pattern thickening material, method for forming resist pattern, semiconductor device and method for manufacturing the same |
| 08/08/2013 | US20130200040 Titanium nitride removal |
| 08/08/2013 | DE112011102793T5 Positiv arbeitende lichtempfindliche Siloxanzusammensetzung Positive working photosensitive siloxane |
| 08/08/2013 | DE112011102260T5 Photohärtbare Zusammensetzung zum Prägedruck und Verfahren zum Bilden eines Musters mittels der Zusammensetzung A photocurable composition for relief printing and method of forming a pattern by means of the composition |
| 08/08/2013 | DE112004001662B4 Verfahren zur Erzeugung einer Reliefdruckplatte A method for producing a relief printing plate |
| 08/08/2013 | DE102012211320A1 Actuator for projection exposure system used during semiconductor lithography process, has rotor which is rotated for shaping one spacing element, such that space between first and second function portions is changed |
| 08/08/2013 | DE102006060180B9 Verfahren und Vorrichtung zum räumlich hochaufgelösten Abbilden einer mit einer Substanz markierten Struktur Method and apparatus for high spatial resolution imaging of a structure labeled with a substance |
| 08/07/2013 | EP2624282A2 Exposure apparatus, exposure method, and method for producing device |
| 08/07/2013 | EP2624053A1 Direct drawing-type waterless lithographic printing original plate |
| 08/07/2013 | EP2623632A2 Method of forming a microstructure |
| 08/07/2013 | EP2623558A1 Radiation-sensitive resin composition, polymer, and compound |
| 08/07/2013 | EP2622414A1 Production methods using two exposure tools and adjacent exposures |
| 08/07/2013 | EP2622413A1 Production methods using two exposure tools and adjacent exposures |
| 08/07/2013 | EP2622412A1 Mirror, optical system for euv projection exposure system and method of producing a component |
| 08/07/2013 | EP2622411A1 Optical system of a microlithographic projection exposure apparatus and method of reducing image placement errors |
| 08/07/2013 | EP2622410A1 Norbornane-based pac ballast and positive-tone photosensitive resin composition encompassing the pac |
| 08/07/2013 | EP2622342A1 Device for high throughput investigations of cellular interactions |
| 08/07/2013 | CN203117642U Photoresist soft bake device |
| 08/07/2013 | CN203117641U Exposure device |
| 08/07/2013 | CN203117640U Glass substrate support mechanism for exposure machine |
| 08/07/2013 | CN203117639U Platform device used for exposure machine |
| 08/07/2013 | CN203117638U Adjustable exposure machine lifting platform device |
| 08/07/2013 | CN203117637U Glass substrate gluing device and fixing seat thereof |
| 08/07/2013 | CN203117636U Aligned roll-to-roll ultraviolet (UV) forming device |
| 08/07/2013 | CN1447981B Organosilicate resins as hardmasks for organic polymer dielectrics in fabrication of microelectronic devices |
| 08/07/2013 | CN103238113A Lithographic apparatus and device manufacturing method |
| 08/07/2013 | CN103238112A Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method |
| 08/07/2013 | CN103238111A Negative-type photosensitive resin composition, partition wall for use in optical elements and manufacturing method thereof, manufacturing method of an optical element having said partition walls, and ink-epellent agent solution |
| 08/07/2013 | CN103236440A Thin film transistor, array substrate, manufacture method of thin film transistor, manufacture method of array substrate, and display device |
| 08/07/2013 | CN103235491A Resist stripper and application thereof |
| 08/07/2013 | CN103235490A Method for improving photoresist pattern |
| 08/07/2013 | CN103235489A Variable-cycle multi-beam interference photoetching method |
| 08/07/2013 | CN103235488A Exposure energy homogenization method for surface exposure rapid shaping system |
| 08/07/2013 | CN103235487A Generation method and generation apparatus for laser plasma extreme ultraviolet light source droplet target |
| 08/07/2013 | CN103235486A Method for correction of exposed pattern |
| 08/07/2013 | CN103235485A Photosensitive dry film and detection method thereof |
| 08/07/2013 | CN103235484A Light resistance composition as well as preparation method and display device thereof |
| 08/07/2013 | CN103235483A Large-area nanometer imaging device and large-area nanometer imaging method |
| 08/07/2013 | CN103235482A PDMS (polydimethylsiloxane)-based functional polymer patterning method |
| 08/07/2013 | CN103235458A TFT-LCD (thin-film transistor liquid-crystal display) array substrate and manufacturing method thereof |
| 08/07/2013 | CN103235450A Display panel and preparation method thereof, mask plate the preparation method thereof, and display device |
| 08/07/2013 | CN103233229A Simplified tungsten-titanium alloy film photolithography process |
| 08/07/2013 | CN103232603A Alkali-soluble resin and preparation method thereof, and photoresist composition |