| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/10/2013 | US8529803 Curable coloring composition, color filter and method for producing same, and quinophthalone dye |
| 09/10/2013 | US8528461 Force actuator |
| 09/06/2013 | WO2013131064A1 Laser absorbing compounds |
| 09/06/2013 | WO2013130939A1 Pressure sensitive coating for image forming |
| 09/06/2013 | WO2013130297A1 Multiphoton curing methods using negative contrast compositions |
| 09/06/2013 | WO2013130232A1 Clean flexographic printing plate and method of making the same |
| 09/06/2013 | WO2013129702A1 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, photomask blank and method of forming pattern |
| 09/06/2013 | WO2013129697A1 Pigment dispersion and yellow resist composition for color filter and ink composition containing the pigment dispersion |
| 09/06/2013 | WO2013128313A1 Metal peroxo compounds with organic co-ligands for electron beam, deep uv and extreme uv photoresist applications |
| 09/06/2013 | WO2013128158A1 Method of processing a photosensitive structure |
| 09/06/2013 | WO2013127589A1 Electrostatic clamp |
| 09/06/2013 | WO2013127587A2 Source collector apparatus, lithographic apparatus and device manufacturing method |
| 09/06/2013 | WO2013083335A3 Radiation source |
| 09/05/2013 | US20130231491 Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process |
| 09/05/2013 | US20130231271 Photoresist residue and polymer residue removing liquid composition |
| 09/05/2013 | US20130230979 Method of forming a pattern in a semiconductor device and method of forming a gate using the same |
| 09/05/2013 | US20130230809 Resist underlayer film forming composition, and method for forming resist pattern using the same |
| 09/05/2013 | US20130230805 Drawing apparatus, reference member, and method of manufacturing article |
| 09/05/2013 | US20130230804 Pattern-forming method, and radiation-sensitive composition |
| 09/05/2013 | US20130230803 Resist pattern-forming method, and radiation-sensitive resin composition |
| 09/05/2013 | US20130230802 Acrylamide derivative, polymer compound and photoresist composition |
| 09/05/2013 | US20130230801 Positive-type photoresist composition, photoresist laminate, method for producing photoresist pattern, and method for producing connecting terminal |
| 09/05/2013 | US20130230799 Film exposure method |
| 09/05/2013 | US20130230797 Method of Applying a Pattern to a Substrate, Device Manufacturing Method and Lithographic Apparatus for Use in Such Methods |
| 09/05/2013 | US20130229640 Exposure apparatus and device manufacturing method using same |
| 09/05/2013 | US20130229639 Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method |
| 09/05/2013 | US20130229637 Exposure apparatus, and device manufacturing method |
| 09/05/2013 | US20130228727 Photosensitive resin composition and application of the same |
| 09/05/2013 | US20130228714 Compositions containing chlorofluoroolefins or fluoroolefins |
| 09/05/2013 | DE102012217700A1 Measuring device for measuring position of radiation in form of beam, has resonator mirror having thin-film element which is configured in such manner that thin-film element takes curved shape for selective heating in region of heating |
| 09/05/2013 | DE102012216478A1 Imaging optical system for imaging object field in object plane onto image field in image plane by projection lens of extreme-ultraviolet lithography system, has obscuration aperture to reflect light incidented on optically inactive surface |
| 09/05/2013 | DE102012212852A1 Optical system for use in e.g. projection lens of microlithographic projection exposure system for manufacturing LCD, has lens group comprising lens, where angle between fast axes of double refraction distributions is in specified range |
| 09/04/2013 | EP2634631A1 Acid generator, chemically amplified resist composition, and patterning process |
| 09/04/2013 | EP2633569A1 Multilayered protective layer, organic opto-electric device and method of manufacturing the same |
| 09/04/2013 | EP2633368A1 Lithography method and apparatus |
| 09/04/2013 | EP2633367A1 Device for homothetic projection of a pattern onto the surface of a sample, and lithography method using such a device |
| 09/04/2013 | EP2633366A1 System for laser direct writing of mesa structures having negatively sloped sidewalls |
| 09/04/2013 | CN203178668U Frame opening device |
| 09/04/2013 | CN1637598B Surface protective film and surface protection material using the same film |
| 09/04/2013 | CN103282832A Exposure apparatus |
| 09/04/2013 | CN103282831A Liquid immersion member, immersion exposure apparatus, exposing method, device fabricating method, program, and storage medium |
| 09/04/2013 | CN103282830A Novel photosensitive resin composition and use thereof |
| 09/04/2013 | CN103282829A 感光性树脂组合物 The photosensitive resin composition |
| 09/04/2013 | CN103282828A Photocurable resin composition |
| 09/04/2013 | CN103282396A Aromatic hydrocarbon resin, composition for forming lithographic underlayer film, and method for forming multilayer resist pattern |
| 09/04/2013 | CN103282211A Planographic printing plate precursor and planographic printing method |
| 09/04/2013 | CN103282131A Method of improving print performance in flexographic printing plates |
| 09/04/2013 | CN103281855A Liquid metal target generating device for laser source |
| 09/04/2013 | CN103280416A Heat treatment device |
| 09/04/2013 | CN103279015A Photoresist treatment method and preparation method of semiconductor devices |
| 09/04/2013 | CN103279014A Device and method for preparing nano imaged substrate |
| 09/04/2013 | CN103279013A Three-freedom-degree precise regulating device based on ball location |
| 09/04/2013 | CN103279012A Novel etched wafer continuous exposing machine and process thereof |
| 09/04/2013 | CN103279011A Thiol-ene ultraviolet light curing nano imprinting material |
| 09/04/2013 | CN103279010A Method for preparing dual-curing single-component silk-screen printing photosensitive adhesive |
| 09/04/2013 | CN103279009A Flexible ultraviolet light imprinting composite template and preparation method thereof |
| 09/04/2013 | CN103278982A Liquid crystal display panel and forming method thereof |
| 09/04/2013 | CN103278913A Aspheric photoetching coupling object lens |
| 09/04/2013 | CN103278912A Reflective type ultra-violet lithography objective lens |
| 09/04/2013 | CN103278907A Axial unloading device for index mirror |
| 09/04/2013 | CN103278906A Axial vernier device for lens with flexible ring piece structure |
| 09/04/2013 | CN102707378B Method for manufacturing silicone micro-nano optical structure by using imprinting technology |
| 09/04/2013 | CN102608877B Photoetching nesting method and photoetching method |
| 09/04/2013 | CN102428407B Photocurable thermosetting resin composition, dry film and cured product thereof, and printed wiring board using those materials |
| 09/04/2013 | CN102339733B Method for controlling critical size of graph on uneven silicon slice surface |
| 09/04/2013 | CN102331595B Liquid crystal display panel, colour filter and manufacturing method of colour filter |
| 09/04/2013 | CN102301278B Means for attaching a printing plate to a printing cylinder |
| 09/04/2013 | CN102300719B Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method for producing relief printing plate |
| 09/04/2013 | CN102272677B Photocurable resin composition, dry film and cured product of the photocurable resin composition, and printed wiring board using the photocurable resin composition, the dry film, and the cured product |
| 09/04/2013 | CN102156388B Object with an improved suitability for a plasma cleaning treatment |
| 09/04/2013 | CN102150083B Radiation-sensitive resin composition, and resist pattern formation method |
| 09/04/2013 | CN102135734B Photoresistance removing method |
| 09/04/2013 | CN102087472B Method for fabricating cliche and method for forming thin film pattern by using the same |
| 09/04/2013 | CN102077139B Print plate handling system |
| 09/04/2013 | CN102053505B Method for dynamically regulating focal depth of focal lens in photoetching imaging equipment |
| 09/04/2013 | CN102034749B Array substrate and manufacturing method thereof |
| 09/04/2013 | CN101981503B Original plate for lithographic printing plate, and method for production of lithographic printing plate using the same |
| 09/04/2013 | CN101971095B Negative-working imageable elements with improved abrasion resistance |
| 09/04/2013 | CN101592871B Manufacturing method of semiconductor integrated circuit device |
| 09/04/2013 | CN101535900B Process for preparing a polymeric relief structure |
| 09/04/2013 | CN101416112B Photosenstive resist composition for color filters for use in electronic paper display devices |
| 09/04/2013 | CN101315521B Light-sensitive resin composition |
| 09/04/2013 | CN101308329B Coating compositions |
| 09/03/2013 | US8525994 Periodic patterns and technique to control misaligment between two layers |
| 09/03/2013 | US8525971 Lithographic apparatus with cleaning of substrate table |
| 09/03/2013 | US8525140 Chamber apparatus, extreme ultraviolet light generation system, and method for controlling the extreme ultraviolet light generation system |
| 09/03/2013 | US8525134 Lithography system |
| 09/03/2013 | US8524443 Method and apparatus for printing a periodic pattern with a large depth of focus |
| 09/03/2013 | US8524440 Photoresist composition |
| 09/03/2013 | US8524439 Silsesquioxane resin systems with base additives bearing electron-attracting functionalities |
| 09/03/2013 | US8524425 Oxime ester photoinitiators |
| 08/29/2013 | WO2013126750A1 Large area imprint lithography |
| 08/29/2013 | WO2013126153A1 Method for processing semiconductors using a combination of electron beam and optical lithography |
| 08/29/2013 | WO2013126135A1 Dual hard mask lithography process |
| 08/29/2013 | WO2013126018A1 A method for plating a component |
| 08/29/2013 | WO2013125854A1 Radiation curable and thermosettable resin composition, and dry film solder resist |
| 08/29/2013 | WO2013125733A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device |
| 08/29/2013 | WO2013124224A1 Method for optimizing a protective layer system for an optical element, optical element and optical system for euv lithography |
| 08/29/2013 | WO2013124205A1 Projection exposure method and projection exposure apparatus for microlithography |
| 08/29/2013 | WO2013124114A1 Device, lithographic apparatus, method for guiding radiation and device manufacturing method |