Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/2013
07/17/2013CN103207524A Method and device for forming solder mask and method for forming inner dielectric layer of circuit composition
07/17/2013CN103207523A Resin compositions for light-scattering layer, light-scattering layer and organic electro luminescence device
07/17/2013CN103207522A Color composition for color filter and color filter
07/17/2013CN103207521A Colorant, coloring composition, color filter and display device
07/17/2013CN103207520A Preparation technology of polyimide passive film
07/17/2013CN103207519A A production process for a metal mask plate having a three-dimensional structure with a pattern opening
07/17/2013CN103207516A Lithographic mask, lithographic apparatus and method
07/17/2013CN103207515A A three-dimensional mask plate and a production process thereof
07/17/2013CN103206596A High-stability support table
07/17/2013CN103205671A Composite preparation process of three-dimensional vapor plating mask plate
07/17/2013CN103203976A Three-dimensional mask plate for printing
07/17/2013CN103203974A A production method for an electroformed stencil with mark points
07/17/2013CN103203973A A production method for an electroformed stencil with mark points
07/17/2013CN103203972A A three-dimensional metal mask plate and a hybrid production process thereof
07/17/2013CN103203971A Production process of three-dimensional mask plate
07/17/2013CN103203969A A three-dimensional mask plate and a production process thereof
07/17/2013CN103203966A A production process for an electroformed step stencil
07/17/2013CN103203964A A production process for an electroformed stencil
07/17/2013CN103203960A A production method for a step stencil
07/17/2013CN103203959A A hybrid production process and a step stencil produced by using the process
07/17/2013CN103203958A A production process for an electroformed stencil
07/17/2013CN103203957A A production method for a step stencil
07/17/2013CN103203956A A production process for a step stencil
07/17/2013CN103203955A A hybrid production process for a step stencil
07/17/2013CN103203954A A hybrid production process for a step stencil
07/17/2013CN103203953A A hybrid production process for a step stencil
07/17/2013CN103203952A Production process of step stencil
07/17/2013CN103203951A Flexographic printing plate precursor for laser engraving and process for producing same, layered product, and process for making flexographic printing plate
07/17/2013CN103203925A Method for increasing reliability of photosensitive BCB film
07/17/2013CN102419512B Fine processing method, fine processing apparatus
07/17/2013CN102375352B Environmental compensation alignment system
07/17/2013CN102375332B Suspension photoresist planarization technology for MEMS structure
07/17/2013CN102375214B Projection objective lens for large-area photo-etching
07/17/2013CN102369482B Curable resin composition and printed wiring board
07/17/2013CN102331687B Step optical processing system and processing method
07/17/2013CN102323723B Optimization method of optical proximity effect correction based on Abbe vector imaging model
07/17/2013CN102314091B Lithography machine capable of adjusting size of lighting spot of alignment system
07/17/2013CN102301279B Positive-type photosensitive insulating resin composition, and method for forming pattern using same
07/17/2013CN102301277B Three-dimensional articles using nonlinear thermal polymerization
07/17/2013CN102239447B Flexographic element and method of imaging
07/17/2013CN102203671B Strain and kinetics control during separation phase of imprint process
07/17/2013CN102192988B Substrate mould for microfluidic chip and manufacturing method thereof
07/17/2013CN102162996B Manufacture method for negative type photosensitive resin composition and cured relief pattern
07/17/2013CN102128678B Device and method for measuring and correcting energy sensor
07/17/2013CN102109778B 调整机构 Adjustment mechanism
07/17/2013CN102109768B Rotary silicon wafer carrying platform and method using same for precise alignment of silicon wafer
07/17/2013CN102099748B A method and apparatus for preparing lithographic printing plate precursors
07/17/2013CN102057330B Model-based scanner tuning methods
07/17/2013CN102043344B Monitoring method for exposure machine table
07/17/2013CN102027414B Positive-type photosensitive composition
07/17/2013CN102023492B Charged particle beam drawing apparatus and proximity effect correction method thereof
07/17/2013CN101981508B A method for preparing lithographic printing plates
07/17/2013CN101980082B Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board
07/17/2013CN101918199B Process and freeform fabrication system for producing a three-dimensional object
07/17/2013CN101917925B Process and freeform fabrication system for producing a three-dimensional object
07/17/2013CN101900947B Method for forming exposure pattern
07/17/2013CN101815969B Projection objective for microlithography
07/17/2013CN101799627B Positive photosensitive resin composition, flat display and semiconductor device
07/17/2013CN101794073B A photosensitive resin composition and a method forming a pattern using the same
07/17/2013CN101681109B Patterned photoacid etching and articles therefrom
07/17/2013CN101568884B Optical system, in particular an illumination system or projection objective of a microlithographic projection exposure apparatus
07/17/2013CN101544932B Stripper for dry film removal
07/17/2013CN101427184B 光刻系统和投影方法 Projection lithography system and method
07/17/2013CN101395189B Fluorine-containing polymer, purification method, and radiation-sensitive resin composition
07/17/2013CN101346668B Writing apparatuses and methods
07/17/2013CN101094898B Multi-photon polymerizable pre-ceramic polymeric compositions
07/16/2013US8488261 Replacement apparatus for an optical element
07/16/2013US8488127 System for measuring the image quality of an optical imaging system
07/16/2013US8488108 Exposure method, exposure apparatus, and method for producing device
07/16/2013US8488102 Immersion fluid for immersion lithography, and method of performing immersion lithography
07/16/2013US8488101 Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table on way from exposure position to unload position
07/16/2013US8488100 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
07/16/2013US8488099 Exposure apparatus and device manufacturing method
07/16/2013US8486614 Device and method for exposing a photo material
07/16/2013US8486613 Method of manufacturing nano-structure and method of manufacturing a pattern using the method
07/16/2013US8486612 Methods of forming intermediate semiconductor device structures using spin-on, photopatternable, interlayer dielectric materials
07/16/2013US8486611 Semiconductor constructions and methods of forming patterns
07/16/2013US8486610 Mask material conversion
07/16/2013US8486609 Antireflective coating composition and process thereof
07/16/2013US8486608 Printing substrate for liquid crystal display, and manufacturing method thereof
07/16/2013US8486607 Method of making a relief image
07/16/2013US8486606 Acrylate derivative, haloester derivative, polymer compound and photoresist composition
07/16/2013US8486605 Positive resist composition and method of forming resist pattern
07/16/2013US8486604 Positive-type radiation-sensitive composition, cured film, interlayer insulating film, method of forming interlayer insulating film, display device, and siloxane polymer for forming interlayer insulating film
07/16/2013US8486591 Photosensitive resin composition for color filter and color filter prepared using the same
07/16/2013CA2676890C Machine readable code comprising ultra-violet curable gellant inks
07/11/2013WO2013103152A1 Light exposure device and method for manufacturing exposed material
07/11/2013WO2013102603A1 Layer composite consisting of a photopolymer film and an adhesive layer
07/11/2013WO2013064892A3 Nanocomposite positive photosensitive composition and use thereof
07/11/2013WO2013064890A3 Nanocomposite negative photosensitive composition and use thereof
07/11/2013WO2013039389A3 Target positioning device
07/11/2013WO2013023124A3 Developable bottom antireflective coating compositions for negative resists
07/11/2013US20130177857 Carrier method, exposure method, carrier system and exposure apparatus, and device manufacturing method
07/11/2013US20130177856 Method for producing a led device
07/11/2013US20130177854 Resist composition, method of forming resist pattern and novel compound
07/11/2013US20130177853 Resist composition and method of forming resist pattern
07/11/2013US20130177852 Hydrophilic photoacid generator and resist composition comprising same
07/11/2013US20130177851 Photoresist composition
07/11/2013US20130177850 Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
07/11/2013US20130177849 Epoxy resin composition having monocyclic aliphatic hydrocarbon ring