Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2013
05/30/2013US20130135763 Photosensitive resin composition and application of the same
05/30/2013US20130135760 Positioning unit and alignment device for an optical element
05/30/2013US20130135740 Optical wavelength dispersion device and method of manufacturing the same
05/30/2013US20130135602 Scanning exposure apparatus using microlens arrays
05/30/2013US20130135598 Method and system for controlling critical dimension and roughness in resist features
05/30/2013US20130135597 Exposure apparatus, method for producing device, and method for controlling exposure apparatus
05/30/2013US20130135596 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method
05/30/2013US20130135595 Lithographic apparatus and device manufacturing method
05/30/2013US20130135594 Liquid immersion member, immersion exposure apparatus, exposure method, device manufacturing method, program, and recording medium
05/30/2013US20130134624 Composite substrate carrier
05/30/2013US20130134426 Composition of organic insulating layer and thin film transistor substrate and display device using the same
05/30/2013US20130133573 Mask for Deposition and Manufacturing Method of the Same
05/30/2013US20130133402 Multi-layer chip for gas chromatography and fabrication method thereof
05/29/2013EP2597518A2 Compositions and antireflective coatings for photolithography
05/29/2013EP2597108A1 Resin composition for laser engraving, flexographic printing plate precursor for laser engraving and process for producing same, and flexographic printing plate and process for making same
05/29/2013EP2596404A1 Method for producing flexographic printing plates using uv-led irradiation
05/29/2013DE102012214198A1 Illumination device for use in microlithographic projection exposure system, has polarization influencing optical element attached to reflecting side surface so that state of polarization of light beam on beam path is differently influenced
05/29/2013DE102012212394A1 Device for separating regions and/or optical elements in projection exposure system, has feed line and return line for conducting fluid, which are arranged to fluid in separating area for forming fluid curtain
05/29/2013DE102012208096A1 Lighting system for extreme ultraviolet-projection lithography in projection exposure apparatus, has optical illumination angel-variation component is provided in beam path of illumination light
05/29/2013CN202958051U Printed circuit board (PCB) sheet development extradition bridge
05/29/2013CN202956584U Photomask positioning structure and photomask box
05/29/2013CN202953546U Automatic loading and unloading device of exposure machine
05/29/2013CN103124929A Pattern forming method, substrate manufacturing method, and mold manufacturing method
05/29/2013CN103124928A Pattern forming method
05/29/2013CN103124927A Optical lithography using graphene contrast enhancement layer
05/29/2013CN103123896A Preparation method of non-photosensitive polyimide passivation layer
05/29/2013CN103123444A Developing method of photolithography process
05/29/2013CN103123443A Thermally reactive resist material, laminated body for thermal lithography using the material, and mold manufacturing method using the material and the laminated body
05/29/2013CN103121951A Monomers, polymers and photoresist compositions
05/29/2013CN102385082B Production method for compound eye reflecting mirror for EUV photoetching system
05/29/2013CN102099743B Illumination system of a microlithographic projection exposure apparatus
05/29/2013CN102033423B Device and method for calibrating photoetching tool
05/29/2013CN101989046B Pattern transfer method and mask manufacturing method
05/29/2013CN101872136B Developing solution for panel display
05/29/2013CN101134800B Pigment dispensing composition, optical solidified composition, color filter and manufacturing method thereof
05/28/2013US8451454 Stage system, lithographic apparatus including such stage system, and correction method
05/28/2013US8451429 Dichroic mirror, method for manufacturing a dichroic mirror, lithographic apparatus, semiconductor device and method of manufacturing therefor
05/28/2013US8451424 Exposure apparatus, method for producing device, and method for controlling exposure apparatus
05/28/2013US8450052 Double patterning strategy for contact hole and trench in photolithography
05/28/2013US8450051 Use of patterned UV source for photolithography
05/28/2013US8450049 Process for forming an anti-oxidant metal layer on an electronic device
05/28/2013US8450048 Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film
05/28/2013US8450047 Method of controlling the states and vortex chirality in hexagonal ring structures comprising nanoscale magnetic elements
05/28/2013US8450046 Methods for enhancing photolithography patterning
05/28/2013US8450045 Pattern forming method
05/28/2013US8450044 Positive resist composition and method of forming resist pattern
05/28/2013US8450043 Patterning nano-scale patterns on a film comprising unzipping copolymers
05/28/2013US8450042 Positive resist composition and patterning process
05/28/2013US8450041 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
05/28/2013US8449293 Substrate treatment to reduce pattern roughness
05/23/2013WO2013074622A1 Method for patterning an organic material using a non-fluorinated photoresist
05/23/2013WO2013074316A1 Stamp for microcontact printing
05/23/2013WO2013073873A1 Linear light source generating device, exposure having linear light source generating device, and lenticular system used for linear light source generating device
05/23/2013WO2013073714A1 Infrared ray shielding composition, infrared ray shielding film, pattern forming method and solid-state imaging device
05/23/2013WO2013073583A1 Cyclic compound, method for producing same, radiation-sensitive composition, and method for forming resist pattern
05/23/2013WO2013073582A1 Cyclic compound, method for producing same, radiation-sensitive composition, and method for forming resist pattern
05/23/2013WO2013073538A1 Encoder device, movement amount measurement method, optical device, and exposure method and device
05/23/2013WO2013073518A1 Carboxyl-containing resin, resin composition for use in solder resist, and manufacturing process for carboxyl-containing resin
05/23/2013WO2013072516A1 A method for providing a nanopattern of metal oxide nanostructures on a substrate
05/23/2013WO2013072388A1 Projection lens of a microlithographic projection exposure apparatus
05/23/2013WO2013072352A1 Mirror system comprising at least one mirror for use for guiding illumination and imaging light in euv projection lithography
05/23/2013WO2013072350A1 Continuous process for preparation of a substrate with a relief structure
05/23/2013WO2013072165A2 Radiation source device, lithographic apparatus, and device manufacturing method
05/23/2013WO2013072154A1 Radiation source and method for operating the same, lithographic apparatus comprising the radiation source, and device manufacturing method
05/23/2013WO2013072144A1 Lithographic apparatus and device manufacturing method
05/23/2013WO2013071940A1 Light modulator and illumination system of a microlithographic projection exposure apparatus
05/23/2013WO2013071838A1 Color film substrate, tft array substrate, manufacturing method thereof and liquid crystal display panel
05/23/2013WO2013071631A1 Method for manufacturing small-line-space wire
05/23/2013WO2013048997A3 Three-dimensional imaging systems, components thereof, and methods of three-dimensional imaging
05/23/2013WO2013042973A3 I-line photoresist composition and method for forming fine pattern using same
05/23/2013WO2013017924A3 Method for correcting misalignment of positions on a first wafer bonded to a second wafer
05/23/2013US20130131282 Production method of polyhydroxyimide and positive photosensitive resin composition containing polyhydroxyimide obtained by the production method
05/23/2013US20130130183 Negative pattern forming process
05/23/2013US20130130182 Apparatus and method of direct writing with photons beyond the diffraction limit
05/23/2013US20130130181 Method of forming alignment film
05/23/2013US20130130180 Method for Producing a GaNLED Device
05/23/2013US20130130179 Polysiloxane composition and pattern-forming method
05/23/2013US20130130178 Actinic-ray-or radiation-sensitive resin composition and method of forming pattern therewith
05/23/2013US20130130177 Negative pattern forming process and negative resist composition
05/23/2013US20130130176 Alkali-soluble resin and negative-type photosensitive resin composition comprising the same
05/23/2013US20130129995 Assist layers for euv lithography
05/23/2013US20130129991 Multiple exposure with image reversal in a single photoresist layer
05/23/2013US20130129988 Chemically amplified positive resist composition and pattern forming process
05/23/2013US20130129986 Techniques for marking product housings
05/23/2013US20130129941 Negative light sensitive resin composition, color filter and liquid crystal display device
05/23/2013US20130128713 Reverse saturable absorbtion sensitizers for optical data storage media and methods for use
05/23/2013US20130128712 Reactants for optical data storage media and methods for use
05/23/2013US20130128256 Lithographic apparatus and device manufacturing method
05/23/2013US20130128254 Thermally Stable Optical Sensor Mount
05/23/2013US20130128252 Multi facet mirror of a microlithographic projection exposure apparatus
05/23/2013US20130128251 Imaging optical system
05/23/2013US20130128250 Reticle assembly, a lithographic apparatus, the use in a lithographic process, and a method to project two or more image fields in a single scanning movement of a lithographic process
05/23/2013US20130128249 Fiber Delivery for Metrology Systems Used in Lithography Tools
05/23/2013US20130128248 Light source apparatus, optical apparatus, exposure apparatus, device manufacturing method, illuminating method, exposure method, and method for manufacturing optical apparatus
05/23/2013US20130128246 Lithography Method and Apparatus
05/23/2013US20130128245 Exposure Apparatus and Device Manufacturing Method
05/23/2013US20130128244 Exposure Apparatus and Device Manufacturing Method Having Lower Scanning Speed to Expose Peripheral Shot Area
05/23/2013US20130126833 Method of manufacturing organic el apparatus
05/23/2013US20130126472 Substrate with adhesion promoting layer, method for producing mold, and method for producing master mold
05/23/2013US20130126470 Stripping solution for photolithography and pattern formation method