Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/2013
07/11/2013US20130177848 Polymer, Resist Material Containing Same, and Method for Forming Pattern Using Same
07/11/2013US20130177847 Photoresist for improved lithographic control
07/11/2013US20130176548 Z-stage with dynamically driven stage mirror and chuck assembly
07/11/2013US20130176547 Lithographic Apparatus and a Method for Determining a Polarization Property
07/11/2013US20130176546 Illumination optical unit with a movable filter element
07/11/2013US20130176545 Projection exposure apparatus
07/11/2013US20130176544 Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus
07/11/2013US20130176543 Optofluidic lithography system, method of manufacturing two-layered microfluid channel, and method of manufacturing three-dimensional microstructures
07/11/2013US20130176521 Photo alignment method, exposure system for performing the same and liquid crystal display panel manufactured by the same
07/11/2013DE19840926B4 Anordnung zur Materialbearbeitung mittels Laserstrahlen und deren Verwendung Arrangement for material processing by laser beams and their use
07/11/2013DE102012207865B3 Optical assembly for use in illumination optics of optical system of projection exposure system for extreme ultraviolet-lithography, has output mirror for outputting extreme ultraviolet light from illumination beam path
07/10/2013EP2613319A1 Coating compound made of a photopolymer film and an adhesive coating
07/10/2013EP2613199A1 Photoresist residue and polymer residue removing liquid composition
07/10/2013EP2613198A1 Photosensitive resin composition, oxime sulfonate compound, method for forming cured film, cured film, organic el display device, and liquid crystal display device
07/10/2013EP2613197A1 Method for producing lithographic printing plate
07/10/2013EP2613196A1 Method for producing lithographic printing plate
07/10/2013EP2613195A2 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
07/10/2013EP2613194A2 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
07/10/2013EP2613193A2 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
07/10/2013EP2613192A2 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
07/10/2013EP2612202A2 Processes for making high resolution, solvent resistant, thin elastomeric printing plates
07/10/2013EP2612201A2 High resolution, solvent resistant, thin elastomeric printing plates
07/10/2013EP2447773B1 Method for producing a pattern, method for producing a MEMS structure, use of a cured film of a photosensitive composition as a sacrificial layer or as a component of a MEMS structure
07/10/2013CN203054452U Positioning assembly for exposing ITO (Indium Tin Oxide) thin film of touch screen
07/10/2013CN203054451U Transmission mechanism of exposure machine
07/10/2013CN203054450U Foreign matter inspection and treatment device and exposure machine
07/10/2013CN1862391B Composition of removing photoresistance layer and use method thereof
07/10/2013CN103201682A Metrology method and apparatus, lithographic system and device manufacturing method
07/10/2013CN103201681A System for laser direct writing of mesa structures having negatively sloped sidewalls
07/10/2013CN103201680A Photoresist composition for negative development and pattern forming method using thereof
07/10/2013CN103201113A Printing device using endless belt-shaped printing plate, printing method thereof, and method for attaching belt-shaped printing plate
07/10/2013CN103199268A Ordered nanostructure membrane based on nanoimprint technology, and preparation and application of ordered nanostructure membrane electrode
07/10/2013CN103199060A Thin film transistor array substrate and thin film transistor array substrate manufacturing method and display device
07/10/2013CN103199032A Gelatinized developing device with clustered structure
07/10/2013CN103199031A Full-automatic glue film coating and developing device
07/10/2013CN103199016A Process method for preventing occurrence of defects of photoresist in wet etching
07/10/2013CN103198879A Positive photoreception electrode grout and preparation method thereof
07/10/2013CN103198877A Light-sensing silver-coated copper electrode slurry capable of sintering in air and preparation method thereof
07/10/2013CN103197793A Micro-structural conductive pattern forming method and system
07/10/2013CN103197519A Offset plate adjusting device
07/10/2013CN103197518A Alignment device and method
07/10/2013CN103197517A Workbench balancing-mass mass-center measuring and correcting method
07/10/2013CN103197516A Composite developing solution for photo-etching
07/10/2013CN103197515A Preparation method of photoetching developing liquid
07/10/2013CN103197514A Developing method capable of effectively reducing defect of pore development
07/10/2013CN103197513A Technical method for preventing photoresist from generating defects during wet etching
07/10/2013CN103197512A Projection lens polarization aberration in-situ detection method of photoetching machine
07/10/2013CN103197511A Device and method for measuring performance of energy sensor of stepper
07/10/2013CN103197510A Method and device for measuring vertical movement component of mask bench
07/10/2013CN103197509A Laser rotating direct-exposure imaging device and method used for revolution surface
07/10/2013CN103197508A Analogue means of optical surface contamination and cleaning under extreme ultraviolet irradiation
07/10/2013CN103197507A Contact exposure method for ultrathin semiconductor chip
07/10/2013CN103197506A Lithography machine using mirror image wafer stage
07/10/2013CN103197505A Mark period level light intensity accumulation based method for determining and searching alignment mark and alignment system
07/10/2013CN103197504A Equal altitude test apparatus of air floatation blocks
07/10/2013CN103197503A Fast simulation method for extreme ultraviolet photoetching thick mask defects
07/10/2013CN103197502A Concentric circle mask, graphical substrate and manufacture method
07/10/2013CN103197501A Array substrate and preparation method thereof, and display device
07/10/2013CN103197500A Method for measuring mirror surface shape compensation effect
07/10/2013CN103197432A Reticle with function of digital display screen and manufacturing method thereof
07/10/2013CN103197418A Alignment 4 F optics system
07/10/2013CN103197396A Objective lens frame fixing device
07/10/2013CN103197377A Method for preparing ridge-shaped polymer optical waveguide
07/10/2013CN103197366A Polarizing filter based on heterojunction grating and preparation method
07/10/2013CN103194123A Aqueous nano-paste and preparation method thereof
07/10/2013CN103193200A Graphical method of collodion membranes
07/10/2013CN102360171B Optimization method of lithography configuration parameter based on pattern search method
07/10/2013CN102354052B Digital micro-mirror device and forming method thereof
07/10/2013CN102334070B Exposure apparatus
07/10/2013CN102334069B Multipurpose acidic, organic solvent based microelectronic cleaning composition
07/10/2013CN102269936B Method and system for simulating moth compound eye optical antireflection structure pattern
07/10/2013CN102147571B Lithography method
07/10/2013CN102063018B Lithographic apparatus and device manufacturing method
07/10/2013CN101971098B Lithography apparatus using extreme uv radiation and having a volatile organic compounds absorbing member comprising a getter material
07/10/2013CN101923285B Lithographic method and arrangement
07/10/2013CN101900951B Lithographic apparatus and device manufacturing method
07/10/2013CN101876787B Preparation of flexographic printing masters using an additive process
07/10/2013CN101872124B Photosensitive resin composition, flexible circuit board employing the same, and circuit board production method
07/10/2013CN101842745B Polar polydimethylsiloxane molds, methods of making the molds, and methods of using the molds for pattern transfer
07/10/2013CN101831163B Sacrificial compositions, methods of use thereof, and methods of decomposition thereof
07/10/2013CN101762986B Fluid extraction system, lithographic apparatus and device manufacturing method
07/10/2013CN101689025B Movable body apparatus
07/10/2013CN101604123B Lithographic apparatus, composite material and manufacturing method
07/10/2013CN101548242B Cleaning compound for removing photoresist
07/10/2013CN101506736B Composition containing liquid additive for forming resist underlayer film, underlayer film forming method and semiconductor device manufacture method
07/10/2013CN101375210B Method of making a lithographic printing plate
07/10/2013CN101373340B Cleaning agent of photoresist
07/10/2013CN101097371B Method for fabricating a thin film transistor for use with a flat panel display device
07/10/2013CN101093355B Compound, photosensitive combination, solidified combination, solidified combination for filter, color filter and manufacturing method thereof
07/09/2013US8484760 Device comprising a cantilever and scanning system
07/09/2013US8482845 Lithographic apparatus and device manufacturing method
07/09/2013US8482716 Exposure apparatus, exposure method, and method for producing device
07/09/2013US8482715 Monitoring apparatus and method particularly useful in photolithographically processing substrates
07/09/2013US8482472 Planar antenna
07/09/2013US8481964 Charged particle beam drawing apparatus and method
07/09/2013US8481248 Method for fabricating micromachine component of resin
07/09/2013US8481247 Resist underlayer film forming composition containing liquid additive
07/09/2013US8481245 System, method and apparatus for pattern clean-up during fabrication of patterned media using forced assembly of molecules
07/09/2013US8481244 Epoxy-containing polymer, photo-curable resin composition, patterning process, and electric/electronic part protective film
07/09/2013US8481243 Resin and photoresist composition comprising the same