Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/2013
07/31/2013CN103226241A Optical system analysis design method based on energy conservation law
07/31/2013CN103226215A Preparation method of holographic grating provided with surface with periodically graded width
07/31/2013CN103224609A Reactive carboxylate compound, active-energy-ray-curable resin composition utilizing the same, and use of the same
07/31/2013CN102549497B Photosensitive resin composition and method for producing photosensitive resin film
07/31/2013CN102495535B Method for obtaining mask three-dimensional vector space image based on Abbe vector imaging model
07/31/2013CN102445850B Alkali development-type solder resist, cured product thereof, and printed wiring board prepared by using the same
07/31/2013CN102314099B Method for removing photoresist layer on wafer
07/31/2013CN102272676B Photosensitive resin composition, and photosensitive element, resist pattern formation method and printed circuit board production method each utilizing same
07/31/2013CN102227683B Methods for performing photolithography using barcs having graded optical properties
07/31/2013CN102216850B Pellicle film, pellicle used with mask for tft liquid crystal panel production, and photomask containing the pellicle
07/31/2013CN102186890B Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same
07/31/2013CN102165374B Process for producing lithographic printing plate
07/31/2013CN102109775B Lithographic apparatus and device manufacturing method utilizing data filtering
07/31/2013CN102043348B Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate
07/31/2013CN101872135B Exposure system and device producing method
07/31/2013CN101636696B Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
07/31/2013CN101588988B Two-dimensional arrays of holes with sub-lithographic diameters formed by block copolymer self-assembly
07/31/2013CN101551588B Light-sensitive resin composition, light spacer, protective film, coloring pattern, display device and substrate thereof
07/31/2013CN101504511B Photo-etching apparatus and calibration method
07/31/2013CN101265368B Pigment dispersion composition, optical solidifying composition, color filter and manufacturing method thereof
07/31/2013CN101152919B Mask shell, mask box, pattern trasscription mehod and method for manufacturing display device
07/30/2013US8497979 Exposure method and exposure apparatus
07/30/2013US8497973 Immersion lithography fluid control system regulating gas velocity based on contact angle
07/30/2013US8497062 Resin for formation of upper antireflective film, composition for formation of upper antireflective film, and resist pattern formation method
07/30/2013US8497061 Method for replicating production of 3D parallax barrier
07/30/2013US8497060 Manufacturing method of semiconductor device
07/30/2013US8497053 Pigment dispersion composition, resist composition for color filter including the same, and color filter using the same
07/30/2013US8496761 Substrate processing apparatus and substrate processing method
07/30/2013US8496356 High efficiency solid-state light source and methods of use and manufacture
07/25/2013WO2013109684A1 Silicon-rich antireflective coating materials and method of making same
07/25/2013WO2013109529A1 Thermo-oxidatively stable, side chain polyether functionalized polynorbornenes for microelectronic and optoelectronic devices and assemblies thereof
07/25/2013WO2013108716A1 Negative photosensitive resin composition
07/25/2013WO2013108696A1 Conductive paste and method for producing conductive pattern
07/25/2013WO2013108560A1 Drive method for spatial light modulator, method for generating pattern for exposure, and exposure method and device
07/25/2013WO2013108087A1 A system and a method to detect hydrogen leakage using nano-crystallised palladium gratings
07/25/2013WO2013107762A1 Mirror arrangement, in particular for use in a microlithographic projection exposure apparatus
07/25/2013WO2013107686A2 Source-collector device, lithographic apparatus, and device manufacturing method
07/25/2013WO2013107684A2 A method of loading a flexible substrate, a device manufacturing method, an apparatus for loading a flexible substrate, and a lithography apparatus
07/25/2013WO2013107595A1 Lithographic apparatus and device manufacturing method
07/25/2013WO2013107148A1 A method for improving the reliability in thick bcb application utilizing bcb lithography
07/25/2013WO2013079316A3 Apparatus and method for providing data to a programmable patterning device, a lithography apparatus and a device manufacturing method
07/25/2013US20130189850 Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating
07/25/2013US20130189627 Gap embedding composition, method of embedding gap and method of producing semiconductor device by using the composition
07/25/2013US20130189626 Liquid crystal display device treated by uv irradiation
07/25/2013US20130189625 Laminating Apparatus and Method of Using the Same
07/25/2013US20130189624 Novel photosensitive resin composition production kit, and use thereof
07/25/2013US20130189623 Positive-type photosensitive resin composition and black bank of an organic light-emitting device including same
07/25/2013US20130189622 Block copolymer of polymide and polyamic acid, method for producing the block copolymer, photosensitive resin composition comprising the block copolymer and protective film formed using the block copolymer
07/25/2013US20130189621 Radiation-sensitive resin composition, polymer and compound
07/25/2013US20130189620 Polymerizable tertiary ester compound, polymer, resist composition, and patterning process
07/25/2013US20130189619 Resist composition and method of forming resist pattern
07/25/2013US20130189618 Method of forming resist pattern
07/25/2013US20130189617 Laser Imageable Polyolefin Film
07/25/2013US20130189533 Resist underlayer film forming composition for lithography containing polyether structure-containing resin
07/25/2013US20130188162 Method for Operating a Projection Exposure Tool and Control Apparatus
07/25/2013US20130188160 Optical System of a Microlithographic Projection Exposure Apparatus and Method of Reducing Image Placement Errors
07/25/2013US20130188159 Liquid immersion member, exposure apparatus, exposure method, and device manufacturing method
07/25/2013US20130188158 Resist coating and developing apparatus, resist coating and developing method, resist-film processing apparatus, and resist-film processing method
07/25/2013US20130187312 Nanoimprint lithography
07/25/2013US20130187144 Radiation curable composition
07/25/2013US20130186856 Method of fabricating servo integrated template
07/25/2013US20130186439 Semiconductor development apparatus and method using same
07/25/2013DE102012201075A1 Optische Anordnung, EUV-Lithographieanlage und Verfahren zum Konfigurieren einer optischen Anordnung Optical arrangement, EUV lithography apparatus and method for configuring an optical arrangement
07/25/2013DE102012201029A1 Anordnung zur Lagesicherung eines Bauteils innerhalb eines Gehäuses Arrangement for securing the position of a component within a housing
07/25/2013DE102012200915A1 Verfahren zur Herstellung eines strukturierten Mehrschichtsystems Process for the preparation of a structured multi-layer system
07/25/2013DE102012200736A1 Spiegelanordnung, insbesondere zum Einsatz in einer mikrolithographischen Projektionsbelichtungsanlage Mirror assembly, particularly for use in a microlithography projection exposure apparatus
07/24/2013EP2618216A1 Positive photosensitive resin composition, method of creating resist pattern, and electronic component
07/24/2013EP2618215A1 Method for producing a lithographic printing plate
07/24/2013EP2618213A2 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
07/24/2013EP2618188A1 Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
07/24/2013EP2617791A1 UV-curable adhesive silicone composition, UV-curable adhesive silicone composition sheet, optical semiconductor apparatus and method for manufacturing the same
07/24/2013EP2617773A1 Resin composition for flexographic printing plate, laser-engraving type flexographic printing plate precursor and process for producing same, and flexographic printing plate and process for making same
07/24/2013EP2616881A1 Method of forming pattern
07/24/2013EP2616865A2 Imaging optical system
07/24/2013EP2616500A1 Method for producing fluorinated polysilanes
07/24/2013CN203084415U Developing circulating cold and hot exchange constant temperature device for plate developer
07/24/2013CN203084414U Exposure machine
07/24/2013CN203084376U Color film repairing device
07/24/2013CN103221888A Resist underlayer film forming composition, and method for forming resist pattern using same
07/24/2013CN103221887A Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board
07/24/2013CN103221886A Nanoscale photolithography
07/24/2013CN103221437A Polymer compound, and resist-protecting film composition including same for a liquid immersion exposure process
07/24/2013CN103217875A PCB (printed circuit board) exposure machine and correction mechanism thereof
07/24/2013CN103217874A Maskless photoetching system based on colloid microballoon nanometer lens
07/24/2013CN103217873A Focus detecting device based on double-grating moire fringes
07/24/2013CN103217872A Detection device and detection method of micro-lens array for photoetching machine
07/24/2013CN103217871A Projection objective wave aberration detection method based on phase ring space image principle component analysis
07/24/2013CN103217870A Droplet target control system guided by laser beam
07/24/2013CN103217869A Liquid tin target generator for laser plasma extreme ultraviolet light source
07/24/2013CN103217868A Photoacid generator containing double-branched sulfonium salt, preparation method and application thereof
07/24/2013CN103217867A Resin composition for flexographic printing plate, laser-engraving type flexographic printing plate precursor and process for producing same, and flexographic printing plate and process for making same
07/24/2013CN103217866A Photosensitive resin composition
07/24/2013CN103217865A Method for pasting film on ultrathin steel sheet
07/24/2013CN103217864A Exposure method of electroformed mask plate
07/24/2013CN103217728A Micro-lens array with filtering function and preparation method thereof
07/24/2013CN102640054B Photosensitive resin composition, laminate utilizing same, and solid-state imaging device
07/24/2013CN102591140B Nanoimprint method
07/24/2013CN102576191B Photosensitive resin composition and use thereof
07/24/2013CN102566325B Optical processing system and method
07/24/2013CN102468209B Method for forming buried layer of SiGe heterojunction bipolar transistor (HBT)