| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/26/2013 | CN103176353A Chemically amplified negative resist composition and patterning process |
| 06/26/2013 | CN103176352A Method for manufacturing lithographic printing plates |
| 06/26/2013 | CN103176231A Single-layer film reflective plane metal grating and manufacturing method thereof |
| 06/26/2013 | CN103175468A Position detection apparatus, imprint apparatus, and method for manufacturing device |
| 06/26/2013 | CN103173068A Pigment dispersion composition, photosensitive resin composition including the same and color filter using the same |
| 06/26/2013 | CN103172626A Dye compound |
| 06/26/2013 | CN103172518A Novel acryl monomer, polymer and resist composition comprising same |
| 06/26/2013 | CN103171247A Method for electrotyping electrode printing mask plate of solar battery |
| 06/26/2013 | CN102540705B Preparation method of bionic PDMS (Polydimethylsiloxane) curved compound eye |
| 06/26/2013 | CN102492060B Photoinitiator of diphenyl sulfide oxime esters as well as preparation method and application thereof |
| 06/26/2013 | CN102455595B Method for prolonging storage period of photoresist solvent and device thereof |
| 06/26/2013 | CN102402119B 正性光刻胶组成物及其制备方法 And preparation method positive photoresist composition |
| 06/26/2013 | CN102360165B 3-PSR-V parallel mechanism for adjusting immersion units |
| 06/26/2013 | CN102354085B Super-resolution direct-writing photoetching machine based on waveguide mode interference and photoetching method thereof |
| 06/26/2013 | CN102331688B Pupil uniformity compensation device |
| 06/26/2013 | CN102298271B Leveling device for flexible mechanism of projection object lens |
| 06/26/2013 | CN102257431B Positive-type photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device |
| 06/26/2013 | CN101983358B Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device |
| 06/26/2013 | CN101982808B Chemically amplified resist composition and pattern forming process |
| 06/26/2013 | CN101978255B A method of assessing a model of a substrate, an inspection apparatus and a lithographic apparatus |
| 06/26/2013 | CN101923288B Chemically amplified positive photoresist composition and pattern forming process |
| 06/26/2013 | CN101908526B Alignment mark arrangement and alignment mark structure |
| 06/26/2013 | CN101849205B Chromatically corrected catadioptric objective and projection exposure apparatus including the same |
| 06/26/2013 | CN101770168B 感光性树脂组合物 The photosensitive resin composition |
| 06/26/2013 | CN101679800B An antireflective coating composition comprising fused aromatic rings |
| 06/26/2013 | CN101652713B Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin |
| 06/25/2013 | US8472006 Lithographic apparatus and device manufacturing method |
| 06/25/2013 | US8472002 Lithographic apparatus and device manufacturing method |
| 06/25/2013 | US8472001 Exposure method, exposure apparatus, and method for producing device |
| 06/25/2013 | US8470519 Method for removing photoresist pattern |
| 06/25/2013 | US8470518 Photosensitive element having reinforcing particles and method for preparing a printing form from the element |
| 06/25/2013 | US8470516 Method of forming a relief pattern by e-beam lithography using chemical amplification, and derived articles |
| 06/25/2013 | US8470512 Polymer, chemically amplified negative resist composition, and patterning process |
| 06/25/2013 | US8470511 Chemically amplified negative resist composition for EB or EUV lithography and patterning process |
| 06/25/2013 | US8470510 Polymer for lithographic purposes and method for producing same |
| 06/25/2013 | US8470509 Negative resist composition and patterning process |
| 06/25/2013 | US8470502 Photosensitive resin composition, color filter and method of producing the same, and solid-state imaging device |
| 06/25/2013 | US8470501 Mask used for fabrication of microlens, and fabrication method for microlens using the mask |
| 06/25/2013 | US8468941 Method for thermal development with supporting surface for a development medium |
| 06/20/2013 | WO2013090529A1 Near-infrared absorbing film composition for lithographic application |
| 06/20/2013 | WO2013089403A1 Photoresist composition |
| 06/20/2013 | WO2013089277A1 Composition for forming a developable bottom anti-reflective coating |
| 06/20/2013 | WO2013089204A1 Liquid repellent compound, liquid repellent polymer, curable composition, coating composition, article having cured film, article having pattern with lyophilic region and liquid repellent region, and method for producing same |
| 06/20/2013 | WO2013089082A1 Substrate exposure device and substrate exposure method |
| 06/20/2013 | WO2013088931A1 Composition for forming resist underlayer film and method for forming resist pattern using same |
| 06/20/2013 | WO2013088852A1 Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component |
| 06/20/2013 | WO2013088551A1 Exposure device and method for manufacturing device |
| 06/20/2013 | WO2013087431A2 Device manufacturing method and associated lithographic apparatus, inspection apparatus, and lithographic processing cell |
| 06/20/2013 | WO2013087344A1 Method for producing an inscribed battery cell housing |
| 06/20/2013 | WO2013087300A1 Optical arrangement and optical element for immersion lithography |
| 06/20/2013 | WO2013086730A1 Exposure device and exposure method |
| 06/20/2013 | WO2013062255A3 Monomer coupled with thermal acid generator, polymer gained from monomer coupled with thermal acid generator, composition for resist underlayer film including polymer, and method for forming pattern using composition for resist underlayer film |
| 06/20/2013 | WO2013056238A3 Programmable photolithography |
| 06/20/2013 | WO2013029985A3 Method for manufacturing periodic structures on a surface of a substrate |
| 06/20/2013 | WO2013029893A3 Lithographic system, method of controlling a lithographic apparatus and device manufacturing method |
| 06/20/2013 | US20130157463 Near-infrared absorbing film composition for lithographic application |
| 06/20/2013 | US20130157201 Resist composition, method of forming resist pattern, and polymeric compound |
| 06/20/2013 | US20130157200 Suspension board with circuit and producing method thereof |
| 06/20/2013 | US20130157199 Method of preparing lithographic printing plate |
| 06/20/2013 | US20130157198 Multi charged particle beam writing apparatus and multi charged particle beam writing method |
| 06/20/2013 | US20130157197 Resist composition, method of forming resist pattern and compound |
| 06/20/2013 | US20130157196 Composition for forming a developable bottom antireflective coating |
| 06/20/2013 | US20130157195 Calixarene compound and photoresist composition comprising same |
| 06/20/2013 | US20130157194 Patterning process, resist composition, polymer, and polymerizable ester compound |
| 06/20/2013 | US20130155536 Photoresist composition for forming a color filter and display substrate |
| 06/20/2013 | US20130155406 Diffraction Based Overlay Metrology Tool and Method of Diffraction Based Overlay Metrology |
| 06/20/2013 | US20130155384 Exposure apparatus and method of manufacturing device |
| 06/20/2013 | US20130155382 Work stage of exposing apparatus, exposing method and method of manufacturing a structure |
| 06/20/2013 | US20130155380 Pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method |
| 06/20/2013 | US20130153535 Resin composition, resist underlayer film, resist underlayer film-forming method and pattern-forming method |
| 06/20/2013 | DE102012206159A1 Optical arrangement of illumination device of micro-lithographic projection exposure system, converts input polarization distribution of light into desired output polarization distribution due to Faraday rotation of optical element |
| 06/20/2013 | DE102011088846A1 Optische Anordnung und optisches Element für die Immersionslithographie Optical assembly and optical element for immersion lithography |
| 06/20/2013 | DE102008016887B4 Verfahren zum Evaluieren eines optischen Abbildungsprozesses A method for evaluating an optical imaging process |
| 06/20/2013 | DE102007015351B4 Verfahren und Vorrichtung zur präzisen Positionierung eines Ionenstrahles bei gleichzeitiger Bestimmung seines Abtragsprofiles Method and device for the precise positioning of an ion beam while simultaneously determining its Abtragsprofiles |
| 06/20/2013 | DE10049296B4 Optische Anordnung und Verfahren zur Ablenkung eines Lichtstrahls Optical assembly and method for deflecting a light beam |
| 06/19/2013 | EP2605069A1 Rinse liquid for lithography and method for forming pattern using same |
| 06/19/2013 | EP2605068A2 Exposure apparatus, exposure method, and method for producing device |
| 06/19/2013 | EP2605067A2 Mould for lithography by nanoimprinting |
| 06/19/2013 | EP2604644A1 Photosensitive silicone resin composition |
| 06/19/2013 | EP2603836A2 Carboxy ester ketal removal compositions, methods of manufacture, and uses thereof |
| 06/19/2013 | EP2603488A1 Difunctional (meth)acrylate writing monomers |
| 06/19/2013 | CN203012351U Holographic system for manufacturing three-dimensional dense-array photonic crystal array structure |
| 06/19/2013 | CN203012350U Fine convex-concave pattern substrate, mould and wire grid polarizer |
| 06/19/2013 | CN1448994B Device for treating substrate |
| 06/19/2013 | CN103168275A 曝光装置 Exposure device |
| 06/19/2013 | CN103168274A Composition for forming overlaying film for resist for EUV lithography |
| 06/19/2013 | CN103168273A High resolution, solvent resistant, thin elastomeric printing plates |
| 06/19/2013 | CN103165533A Process method for preventing defects of photoresist during wet etching |
| 06/19/2013 | CN103165503A Warping sheet tool and warping sheet tool using method and warping sheet connection device of warping sheet tool |
| 06/19/2013 | CN103165406A Etching method for etching super-thick non-photosensitive photoresist |
| 06/19/2013 | CN103163747A Small spot off-axis alignment system based on area lighting |
| 06/19/2013 | CN103163746A Mask alignment detector having temperature detection function, photoetching apparatus and alignment detection method |
| 06/19/2013 | CN103163745A Removal method for photoresist layer and formation method for transistor |
| 06/19/2013 | CN103163744A Novel organic photoresist stripper and preparation process thereof |
| 06/19/2013 | CN103163743A Generation device and method of laser plasma extreme ultraviolet light source |
| 06/19/2013 | CN103163742A Photolithography device and photolithography method thereof |
| 06/19/2013 | CN103163741A A measurement method for the optimum position of a variable gap of a lithographic machine |
| 06/19/2013 | CN103163740A Position measuring device for tilted object |
| 06/19/2013 | CN103163739A Ultraviolet LED lighting device |
| 06/19/2013 | CN103163738A A device for compensating knife edge-driving reaction force in a lighting scanning direction and a lithographic apparatus |