| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/16/2013 | US20130122421 Hybrid photoresist composition and pattern forming method using thereof |
| 05/16/2013 | US20130122420 Alkali-developable photosensitive resin composition |
| 05/16/2013 | US20130122419 (meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it |
| 05/16/2013 | US20130122404 Method of forming photomasks and photomasks formed by the same |
| 05/16/2013 | US20130122403 Mask for exposure and method of fabricating substrate using said mask |
| 05/16/2013 | US20130122247 Spacer Wafer For Wafer-Level Camera And Method For Manufacturing Same |
| 05/16/2013 | US20130120732 Cylindrical magnetic levitation stage and lithography |
| 05/16/2013 | US20130120731 Stage unit, exposure apparatus, and exposure method |
| 05/16/2013 | US20130120729 Inspection method for imprint lithography and apparatus therefor |
| 05/16/2013 | US20130120728 Catadioptric projection objective with mirror group |
| 05/16/2013 | US20130120727 Exposure system |
| 05/16/2013 | US20130120726 Method of structuring a photosensitive material |
| 05/16/2013 | US20130120725 Imprint lithography method and imprintable medium |
| 05/16/2013 | US20130120723 Exposure apparatus and measuring device for a projection lens |
| 05/16/2013 | DE102012219169A1 Strahlregelungsvorrichtung für einen Beleuchtungsstrahl sowie Metrologiesystem mit einem eine solche Strahlregelungsvorrichtung enthaltenden optischen System Beam control apparatus for an illuminating beam and metrology system with a control device containing such a beam optical system |
| 05/16/2013 | DE102011118532A1 Exposure device for exposing stainless steel plate coated with photoresist to manufacture measuring scale, has turning device turning elongated thin plate at preset degree, where turning device supports thin plate over whole length |
| 05/16/2013 | DE102011086513A1 Projection exposure method for exposure of semiconductor wafer with image of pattern of reticle for manufacturing semiconductor component, involves heating mask corresponding to two-dimensional heating profile by heating device |
| 05/16/2013 | DE102011086345A1 Spiegel Mirror |
| 05/16/2013 | DE102011086328A1 Spiegel zum Einsatz zur Führung von Beleuchtungs- und Abbildungslicht in der EUV-Projektionslithografie Mirrors are used to guide light illumination and imaging in EUV projection lithography |
| 05/15/2013 | EP2592477A1 Continuous process for preparation of a substrate with a relief structure |
| 05/15/2013 | EP2592476A1 Antireflective coating forming composition containing vinyl ether compound and polyimide |
| 05/15/2013 | EP2592475A1 Photosensitive composition, lithographic printing plate precursor, lithographic printing method, and novel cyanine dyes |
| 05/15/2013 | EP2592131A2 Aqueous cerium-containing solution having an extended bath lifetime for removing mask material |
| 05/15/2013 | EP2591400A1 A method and apparatus for printing a periodic pattern with large depth of focus |
| 05/15/2013 | EP2590757A1 Method for producing finely structured surfaces |
| 05/15/2013 | CN103109235A Lithographic printing plate original |
| 05/15/2013 | CN103109234A Light-sensitive resin composition, a dry film solder resist and a circuit substrate |
| 05/15/2013 | CN103109233A Method for producing flexographic printing plates using uv-led irradiation |
| 05/15/2013 | CN103109225A Imaging optical system |
| 05/15/2013 | CN103108945A Processes and compositions for removing substances from substrates |
| 05/15/2013 | CN103108481A Light focusing system anti-pollution protection device |
| 05/15/2013 | CN103108480A Extreme ultraviolet (EUV) light source pollutant collecting device |
| 05/15/2013 | CN103107133A Array substrate, manufacturing method thereof and displaying device |
| 05/15/2013 | CN103107066A Photoresist removal method and semiconductor production method |
| 05/15/2013 | CN103105744A Etch features with reduced line edge roughness |
| 05/15/2013 | CN103105743A Mask table system with plane diffraction grating measurement and having six freedom degrees macro platform |
| 05/15/2013 | CN103105742A Mask table system of six-degree-of-freedom coarse table with photoelectric position detector measurement function |
| 05/15/2013 | CN103105741A Alignment compensation device and exposure device |
| 05/15/2013 | CN103105740A Solid-liquid combined target-based extreme ultraviolet source generator and light source system |
| 05/15/2013 | CN103105739A Exposure apparatus and exposure method |
| 05/15/2013 | CN103105738A Exposure method and mask plate for exposure |
| 05/15/2013 | CN103105737A Photolithography apparatus adopting spliced multiple light sources |
| 05/15/2013 | CN103105736A Photolithography method and etching method |
| 05/15/2013 | CN103105735A Colored curable resin composition |
| 05/15/2013 | CN103105734A Photosensitive resin composition |
| 05/15/2013 | CN103105733A Colored photosensitive resin composition |
| 05/15/2013 | CN103105732A Polyimide precursor composition and wiring circuit board employing the composition |
| 05/15/2013 | CN103105731A Photosensitive resin composition and color filter using the same |
| 05/15/2013 | CN103105730A Spacer wafer for wafer-level camera and method for manufacturing same |
| 05/15/2013 | CN103105729A Photolithography method capable of preventing ground silicon dust from polluting wafers |
| 05/15/2013 | CN103105724A Quantum dot exposure plate and photolithography technique with the same |
| 05/15/2013 | CN103105666A Exposure projection objective lens |
| 05/15/2013 | CN103105664A Photoetching projective objective glass |
| 05/15/2013 | CN103105638A Etching method of blazing concave surface holographic grating subarea reaction ion beams |
| 05/15/2013 | CN103105127A Detector, imprint apparatus, and article manufacturing method |
| 05/15/2013 | CN103102439A Photopolymerization of crystalline-state monomers and application thereof in reducing volume shrinkage |
| 05/15/2013 | CN103102251A Radiation-sensitive composition |
| 05/15/2013 | CN102308258B Ultra low post exposure bake photoresist materials |
| 05/15/2013 | CN102209935B Methods for model gauge design for lithography calibration |
| 05/15/2013 | CN102143981B Low outgassing photoresist compositions |
| 05/15/2013 | CN102053498B Positive photosensitive resin composition |
| 05/15/2013 | CN102023439B TFT (Thin Film Transistor) array structure and manufacturing method thereof |
| 05/15/2013 | CN101957567B Position calibration of alignment heads in a multi-head alignment system |
| 05/15/2013 | CN101807000B Photosensitive resin composition and method for producing same |
| 05/15/2013 | CN101772734B Positive photosensitive resin composition, cured film, protective film, insulating film and semiconductor device |
| 05/15/2013 | CN101713929B Lithographic apparatus and device manufacturing method |
| 05/15/2013 | CN101675389B Determining a process model that models the impact of car/peb on the resist profile |
| 05/15/2013 | CN101424883B Exposure system and device producing method |
| 05/14/2013 | US8440734 Positive photosensitive resin composition, cured film, protecting film, insulating film, and semiconductor device and display device using the same |
| 05/14/2013 | US8440389 Stripper solutions effective for back-end-of-line operations |
| 05/14/2013 | US8440388 Method to restore hydrophobicity in dielectric films and materials |
| 05/14/2013 | US8440387 Graded topcoat materials for immersion lithography |
| 05/14/2013 | US8440386 Patterning process, resist composition, and acetal compound |
| 05/14/2013 | US8440385 Positive resist composition, method of forming resist pattern and polymeric compound |
| 05/14/2013 | US8440384 Compound, salt, and radiation-sensitive resin composition |
| 05/10/2013 | WO2013067442A1 Method and apparatus for thermal treatment of printing surface in relief printing |
| 05/10/2013 | WO2013067422A1 A method and an apparatus having a compressible collar for thermally treating a photosensitive precursor |
| 05/10/2013 | WO2013067414A1 Method for thermal treatment of relief surface for a relief printing form |
| 05/10/2013 | WO2013067395A2 Method and apparatus for improving ink deposition |
| 05/10/2013 | WO2013066067A1 Phenol monomer, polymer for forming a resist underlayer film including same, and composition for a resist underlayer film including same |
| 05/10/2013 | WO2013065878A1 Method of forming pattern and composition for crosslinked layer formation to be used in the method |
| 05/10/2013 | WO2013065853A1 Method for recycling plate-making processing waste solution |
| 05/10/2013 | WO2013065693A1 Photosensitive resin composition, photosensitive element using same, cured product, method for forming partition wall of image display device, method for manufacturing image display device, and image display device |
| 05/10/2013 | WO2013065451A1 Substrate processing unit and method for processing substrate |
| 05/10/2013 | WO2013065429A1 Substrate processing apparatus and substrate processing method |
| 05/10/2013 | WO2013064892A2 Nanocomposite positive photosensitive composition and use thereof |
| 05/10/2013 | WO2013064890A2 Nanocomposite negative photosensitive composition and use thereof |
| 05/10/2013 | WO2013064782A1 Method for avoiding charge effects for lithography and electron microscopy |
| 05/10/2013 | WO2013064298A1 Lithographic apparatus and device manufacturing method |
| 05/10/2013 | WO2013064025A1 Method for improving gate photo-etching key size uniformity on wafer |
| 05/10/2013 | WO2013027936A3 Black photosensitive resin composition and image display device having same |
| 05/10/2013 | WO2012173506A8 Procedure of 2d and 3d optically assisted fountain pen nanolithography and aperture pen nanolithography |
| 05/10/2013 | CA2854205A1 Metering apparatus for the manually-controlled metering of a light-curing material, kit and method |
| 05/09/2013 | US20130116159 Photoresist and post etch residue cleaning solution |
| 05/09/2013 | US20130115559 Methods of forming photolithographic patterns by negative tone development |
| 05/09/2013 | US20130115558 Selective photo-induced protein immobilization using bovine serum albumin |
| 05/09/2013 | US20130115557 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern |
| 05/09/2013 | US20130115555 Resist composition and method of forming resist pattern |
| 05/09/2013 | US20130115554 Resist composition, method of forming resist pattern and polymeric compound |
| 05/09/2013 | US20130115553 Topcoat compositions and photolithographic methods |