| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/24/2013 | CN102439521B Light-sensitive resin composition and a dry film comprising the same |
| 07/24/2013 | CN102405441B Photosensitive resin laminate, method for forming resist pattern and conductor pattern manufacture method |
| 07/24/2013 | CN102221784B Glue coating device and glue coating method |
| 07/24/2013 | CN102174155B Polyorganosiloxane composition |
| 07/24/2013 | CN102067037B Photosensitive resin composition, photosensitive element wherein same is used, method for forming a resist-pattern, and method for producing a printed wiring board |
| 07/24/2013 | CN101969025B Method for forming self-aligned silicide area block film pattern |
| 07/24/2013 | CN101950127B Novel resins and photoresist compositions comprising same |
| 07/24/2013 | CN101943861B Novel resin and photoresist composition comprising the same |
| 07/24/2013 | CN101923286B Coating and developing device and substrate backside cleaning method |
| 07/24/2013 | CN101910949B Composition having urea group for forming silicon-containing resist underlying film |
| 07/24/2013 | CN101872123B Radioactive rays sensitive resin compound, distance piece or protection film for liquid crystal display and forming method thereof |
| 07/24/2013 | CN101840154B Colored photosensitive resin composition |
| 07/24/2013 | CN101743515B Spatial light modulation unit, illumination apparatus, exposure apparatus, and device manufacturing method |
| 07/24/2013 | CN101655671B Lithographic apparatus and device manufacturing method |
| 07/24/2013 | CN101587298B Photosensitive composition, photosensitive film, photosensitive layered body, permanent pattern forming method and printed circuit board |
| 07/24/2013 | CN101570647B Organic color combination and production method thereof, coloring light-sensitive resin combination, color filter |
| 07/24/2013 | CN101526759B Exposure unit |
| 07/24/2013 | CN101470360B Immersion lithographic apparatus and device manufacturing method |
| 07/24/2013 | CN101467104B Method for processing of photopolymer printing plates with overcoat |
| 07/23/2013 | US8493674 Positioning unit and alignment device for an optical element |
| 07/23/2013 | US8493545 Cleanup method for optics in immersion lithography supplying cleaning liquid onto a surface of object below optical element, liquid supply port and liquid recovery port |
| 07/23/2013 | US8492935 Lithographic apparatus having a Lorentz actuator with a composite carrier |
| 07/23/2013 | US8492450 Siloxane resin composition and protective film for touch panel using the same |
| 07/23/2013 | US8492079 Method of forming a pattern of an array of shapes including a blocked region |
| 07/23/2013 | US8492078 Patterning process |
| 07/23/2013 | US8492077 Method for providing a conductive material structure on a carrier |
| 07/23/2013 | US8492075 Methods of forming electronic devices |
| 07/23/2013 | US8492074 Method of improving print performance in flexographic printing plates |
| 07/23/2013 | US8492073 Method for thermal development with a conformable support |
| 07/23/2013 | US8492072 Method for marking objects |
| 07/23/2013 | US8492070 Photocurable and thermosetting resin composition and printed circuit boards made by using the same |
| 07/23/2013 | US8492069 Lithographic printing plate precursor and plate making method of lithographic printing plate |
| 07/23/2013 | US8492068 Methods of forming electronic devices |
| 07/23/2013 | US8492067 Positive lift-off resist composition and patterning process |
| 07/23/2013 | US8491987 Selectively coated self-aligned mask |
| 07/23/2013 | US8491973 Photo-alignment material and liquid crystal display device and its manufacturing method using the same |
| 07/18/2013 | WO2013105410A1 Photosensitive resin composition, photosensitive laminate, flexible circuit substrate and method for forming permanent pattern |
| 07/18/2013 | WO2013105317A1 Substrate processing device, substrate processing method and cylindrical mask |
| 07/18/2013 | WO2013104744A1 Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus |
| 07/18/2013 | WO2013104482A1 A lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program |
| 07/18/2013 | WO2013104477A1 Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method |
| 07/18/2013 | WO2013104216A1 Light guide plate lattice point manufacturing method, light guide plate manufacturing method, backlight module, and display apparatus |
| 07/18/2013 | WO2013072165A3 Radiation source device, lithographic apparatus, and device manufacturing method |
| 07/18/2013 | US20130184404 Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film |
| 07/18/2013 | US20130183828 Pattern formation method and guide pattern material |
| 07/18/2013 | US20130183627 Exposure method and exposure apparatus, and device manufacturing method |
| 07/18/2013 | US20130183626 Method for forming fine pattern, and coating agent for pattern fining |
| 07/18/2013 | US20130183625 Patterned graphene fabrication method |
| 07/18/2013 | US20130183624 Radiation-sensitive resin composition |
| 07/18/2013 | US20130183623 Exposure apparatus and exposure method, and device manufacturing method |
| 07/18/2013 | US20130183622 Positive-working lithographic printing plate precursors |
| 07/18/2013 | US20130183621 Pattern forming process and resist compostion |
| 07/18/2013 | US20130183609 Thin film patterning method and method of manufacturing semiconductor device using the thin film patterning method |
| 07/18/2013 | US20130183450 Non-photosensitive siloxane coating for processing hydrophobic photoimageable nozzle plate |
| 07/18/2013 | US20130182264 Projection Exposure Tool for Microlithography and Method for Microlithographic Exposure |
| 07/18/2013 | US20130182236 Imprint lithography |
| 07/18/2013 | US20130182235 Measurement system that includes an encoder and an interferometer |
| 07/18/2013 | US20130182234 Projection Exposure System and Projection Exposure Method |
| 07/18/2013 | US20130182233 Exposure apparatus and device fabrication method |
| 07/18/2013 | US20130182232 Exposure method, exposure apparatus, and method for producing device |
| 07/18/2013 | US20130182231 Substrate placement in immersion lithography |
| 07/18/2013 | DE102012200371A1 Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren Optical system for a microlithography projection exposure apparatus and microlithographic exposure method |
| 07/18/2013 | DE102012200368A1 Polarisationsbeeinflussende optische Anordnung, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage Polarization influencing optical arrangement, especially in a microlithography projection exposure apparatus |
| 07/18/2013 | DE10136510B4 Optisches Beleuchtungssystem in einer Belichtungseinheit Illumination optical system in an exposure unit |
| 07/17/2013 | EP2615498A2 Method and apparatus for securing printing forms on a mountable surface |
| 07/17/2013 | EP2615497A1 Resist pattern forming method |
| 07/17/2013 | EP2615480A1 Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
| 07/17/2013 | EP2615479A1 Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
| 07/17/2013 | EP2614407A1 Method and device for the depollution of a pelliculated reticle |
| 07/17/2013 | EP2466379B1 Resist composition and patterning process |
| 07/17/2013 | EP2321702B1 Exposure apparatus and methods |
| 07/17/2013 | CN203069860U Axial adjustment device for lens in focusing and leveling measurement system |
| 07/17/2013 | CN203069858U Projection lens difference fine adjustment device |
| 07/17/2013 | CN1924699B Infrared-sensitive planographic printing plate precursor |
| 07/17/2013 | CN103210350A Method for forming conductive pattern, conductive pattern substrate, and touch panel sensor |
| 07/17/2013 | CN103210349A Positive-type photoresist composition |
| 07/17/2013 | CN103209770A Method for producing finely structured surfaces |
| 07/17/2013 | CN103208867A Magnet unit, magnet array, magnetic levitation planar motor and lithographic device using magnetic levitation planar motor |
| 07/17/2013 | CN103208497A Color filter structure and method for fabricating the same |
| 07/17/2013 | CN103207545A Electron beam exposure method implemented by aid of ultraviolet setting adhesive |
| 07/17/2013 | CN103207544A Dry film development process |
| 07/17/2013 | CN103207543A Developing method |
| 07/17/2013 | CN103207542A Device for maintaining developing solution stability |
| 07/17/2013 | CN103207541A Developing machine with which different developing section lengths can be selected |
| 07/17/2013 | CN103207540A Developing machine spraying device realizing uniform and stable development |
| 07/17/2013 | CN103207539A Non-contact conveying device |
| 07/17/2013 | CN103207538A Developing liquid automatic addition device |
| 07/17/2013 | CN103207537A A spraying and developing system of a developer |
| 07/17/2013 | CN103207536A Horizontal developing machine conveying device |
| 07/17/2013 | CN103207535A A developer |
| 07/17/2013 | CN103207534A A method for improving opening quality of an electroformed plate |
| 07/17/2013 | CN103207533A Developing machine with plate output induction device |
| 07/17/2013 | CN103207532A Coaxial focus detection measuring system and measuring method thereof |
| 07/17/2013 | CN103207531A Synchronous error correction system for scanning motions of reticle stage and wafer stage of stepping scanning protection photoetching machine |
| 07/17/2013 | CN103207530A Pupil reshaping optical system of lithography machine and generation method of off-axis illumination mode |
| 07/17/2013 | CN103207529A Exposure method and exposure apparatus |
| 07/17/2013 | CN103207528A Pupil correction method and lithography exposure system for compensating image quality of photolithography |
| 07/17/2013 | CN103207527A An exposure treatment method for a mask plate |
| 07/17/2013 | CN103207526A Method for exposure compensation and correction |
| 07/17/2013 | CN103207525A A lithography manufacturing method |