Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2013
06/05/2013CN103135353A Blue photosensitive resin composition for color filters and uses thereof
06/05/2013CN103135352A Conductive resin composition and conductive circuit
06/05/2013CN103135351A Photosensitive resin composition for color filter and color filter using the same
06/05/2013CN103135350A Photosensitive resin composition for color filter and color filter including the same
06/05/2013CN103135349A Resin composition for laser engraving, flexographic printing plate precursor for laser engraving and process for producing same, and flexographic printing plate and process for making same
06/05/2013CN103135348A Resin composition for laser engraving, flexographic printing plate precursor for laser engraving and process for producing same, and flexographic printing plate and process for making same
06/05/2013CN103135347A Resin composition for laser engraving, flexographic printing plate precursor for laser engraving and process for producing same, and flexographic printing plate and process for making same
06/05/2013CN103135346A Resin composition for flexographic printing plate, flexographic printing plate precursor for laser engraving and process for producing same, and flexographic printing plate and process for making same
06/05/2013CN103135345A Resin composition for laser engraving, flexographic printing plate precursor for laser engraving and process for producing same, and flexographic printing plate and process for making same
06/05/2013CN103135344A Photosensitive resin composition, black array, color filter and liquid crystal display element thereof
06/05/2013CN103135343A Photosensitive resin composition for color filter and color filter prepared using the same
06/05/2013CN103135342A Method for manufacturing nanofluid channel of integrated scaleplate based on flexible template
06/05/2013CN103135341A Imprint apparatus, manufacturing method for article using the same, and imprint method
06/05/2013CN103135340A Imprint apparatus, imprint method and article manufacturing method
06/05/2013CN103135339A Pattern forming apparatus and pattern forming method
06/05/2013CN103135338A Nanoscale soft mold manufacturing method and device
06/05/2013CN103135337A Method and system of exposure of alignment mark
06/05/2013CN103135336A Imaging method
06/05/2013CN103135284A Forming method of alignment film
06/05/2013CN103130955A Photosensitive oligomer for photoresist, preparation method and negative photoresist composition thereof
06/05/2013CN103130833A Soluble oxime ester and aromatic ketone photo polymerization initiator
06/05/2013CN103130826A Silicon compound, condensation product, resist compostion and pattern formation method
06/05/2013CN103130417A Manufacture technology of glass panel of electronic product
06/05/2013CN102645838B Mask and manufacturing method thereof
06/05/2013CN102445838B Method for reforming photo-resist pattern
06/05/2013CN102402135B Method for designing extreme ultraviolet lithography projection objective
06/05/2013CN102393600B Preparation method of nano-imprinting composite template
06/05/2013CN102331593B Self-supporting nano-transmission grating with high duty ratio and manufacturing method thereof
06/05/2013CN102298266B Method for manufacturing standard wafer
06/05/2013CN102289156B Optimization method for NA-Sigma configuration of photoetching machine
06/05/2013CN102289149B Photoacid generator, method for manufacturing same, and resist composition comprising same
06/05/2013CN102193332B 光刻设备和方法 Lithographic apparatus and method
06/05/2013CN102183879B Method for realizing BL (Boundary Layer) model based three-dimensional mask air imaging
06/05/2013CN102171613B Ultraviolet light absorbing ketones of 2-(2-hydroxyphenyl) benzotriazole
06/05/2013CN102164751B Bidirectional imaging with varying intensities
06/05/2013CN102163008B Online detection method of wave aberration of projection objective of lithography machine for self-calibrating system error
06/05/2013CN102119365B Radiation source, lithographic apparatus and device manufacturing method
06/05/2013CN102112923B Negative working photosensitive composition, partition wall for optical element using nagative working photosensitive composition, and optical element comprising partition wall
06/05/2013CN102103222B Method for fabricating color filter using surface plasmon and method for fabricating liquid crystal display device
06/05/2013CN102077144B Resin composition for making insoluble resist pattern, and method for formation of resist pattern by using the same
06/05/2013CN102053501B Calibration method and lithographic apparatus using such a calibration method
06/05/2013CN102040700B Deprotection method of protected polymer
06/05/2013CN102034679B Wafer cleaning method
06/05/2013CN102017072B Stage apparatus, patterning apparatus, exposure apparatus, stage drive method, exposure method, and device fabrication method
06/05/2013CN102012632B Method for preparing bionic adhesion arrays with different top end structures
06/05/2013CN101957561B Sensor, table and lithographic apparatus
06/05/2013CN101957475B Method of manufacturing optical waveguide device
06/05/2013CN101900948B Pulse stretcher with reduced energy density on optical components
06/05/2013CN101846876B Photomask blank, processing method, and etching method
06/05/2013CN101845137B Alkaline water-soluble resin, its producing method and photosensitive resin composition using same
06/05/2013CN101833239B Substrate processing method
06/05/2013CN101718956B Exposure method and alignment device thereof for substrate manufacturing
06/05/2013CN101713921B Photosensitive resin composition and a sealant
06/05/2013CN101622581B Process, apparatus and device
06/05/2013CN101520611B Lithographic apparatus and device manufacturing method
06/05/2013CN101515116B Mark structure for coarse wafer alignment and method for manufacturing such a mark structure
06/05/2013CN101419409B Exposure device and rectification device of baseal plate
06/04/2013US8456612 Exposure apparatus and method of manufacturing device
06/04/2013US8456610 Environmental system including vacuum scavenge for an immersion lithography apparatus
06/04/2013US8455420 Spin-on formulation and method for stripping an ion implanted photoresist
06/04/2013US8455183 Resist pattern slimming treatment method
06/04/2013US8455182 Composition for antireflection film formation and method for resist pattern formation using the composition
06/04/2013US8455181 Method for manufacturing a patterned retarder
06/04/2013US8455180 Gate CD control using local design on both sides of neighboring dummy gate level features
06/04/2013US8455179 Method of forming semiconductor device by using reduction projection aligner
06/04/2013US8455178 Coating compositions for photolithography
06/04/2013US8455177 Method for making a lithographic printing plate
06/04/2013US8455176 Coating composition
06/04/2013US8455175 Photosensitive composition
06/04/2013US8455174 Polymers, methods of use thereof, and methods of decomposition thereof
06/04/2013US8455173 Photosensitive insulating resin composition, cured product of the composition, and method of producing insulating film
06/04/2013US8455161 Method for erasing image on thermoreversible recording medium
05/2013
05/30/2013WO2013078211A1 Assist layers for euv lithography
05/30/2013WO2013077467A1 Liquid immersion member and immersion exposure apparatus
05/30/2013WO2013077430A1 Reflective mask blank for euv lithography and production method thereof
05/30/2013WO2013077358A1 Photosensitive resin composition, photosensitive resin film produced using said composition, and electronic component produced using said composition or said film
05/30/2013WO2013077266A1 Thermally reactive resist material, method for producing mold, mold, developing method, and pattern-forming material
05/30/2013WO2013077261A1 Concentration control method and concentration control device
05/30/2013WO2013075930A1 Illumination and displacement device for a projection exposure apparatus
05/30/2013WO2013075923A1 Correcting an intensity of an illumination beam
05/30/2013WO2013075878A1 Lithographic apparatus and device manufacturing method
05/30/2013US20130137049 Method of forming polymeric compound, resist composition and method of forming resist pattern
05/30/2013US20130137048 Resist composition and method of forming resist pattern
05/30/2013US20130137047 Method of forming resist pattern
05/30/2013US20130137046 Phase difference layer laminated body for three dimensional liquid crystal display device and manufacturing method thereof
05/30/2013US20130137045 UV Glass Production Method
05/30/2013US20130137044 Scanning apparatus, drawing apparatus, and method of manufacturing article
05/30/2013US20130137043 Photosensitive element having reinforcing particles and method for preparing a printing form from the element
05/30/2013US20130137042 Photosensitive composition and photoresist
05/30/2013US20130137041 Silicon-containing resist underlayer film-forming composition and patterning process
05/30/2013US20130137040 Lithographic printing plate precursor and method of producing thereof
05/30/2013US20130137039 Photosensitive Resin Composition for Color Filter and Color Filter Prepared Using the Same
05/30/2013US20130137038 Photoresist composition
05/30/2013US20130137037 Silicon Compound, Condensation Product, Resist Compostion and Pattern Formation Method
05/30/2013US20130137036 Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film
05/30/2013US20130137034 Method of pre-treating a wafer surface before applying a solvent-containing material thereon
05/30/2013US20130137018 Dye compound, method of producing dipyrromethene metal complex compound, method of producing dye multimer, substituted pyrrole compound, colored curable composition, color filter, method of producing color filter, solid-state image sensor and liquid crystal display device
05/30/2013US20130137015 Mask and pattern forming method
05/30/2013US20130136900 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the composition
05/30/2013US20130136897 Resists for lithography